| Patent application number | Description | Published |
| 20090101885 | Method of producing phase change memory device - An area where a lower electrode is in contact with a variable resistance material needs to be reduced in order to lower the power consumption of a variable resistance memory device. The present invention provides a method of producing a variable resistance memory element whereby the lower electrode can be more finely formed. The method of producing a semiconductor device according to the present invention includes forming a small opening by utilizing cubical expansion due to the oxidation of silicon. Thereby forming the lower electrode smaller than that can be formed by lithography techniques. | 04-23-2009 |
| 20090104779 | Method of producing phase change memory device - An area where a lower electrode is in contact with a variable resistance material needs to be reduced to lower the power consumption of a variable resistance memory device. The present invention is to provide a method of producing a variable resistance memory element whereby the lower electrode can be formed smaller. Combining an anisotropic etching process with an isotropic etching process enables the lower electrode to be formed smaller. | 04-23-2009 |
| 20090221146 | Nonvolatile memory device and manufacturing method for the same - The object of the present invention is to provide a manufacturing method for a nonvolatile memory device including a variable resistance having a constricted shape. The nonvolatile memory device of the present invention has a storage section composed of two electrodes and a variable resistance sandwiched between the electrodes. The variable resistance is formed to a constricted shape between the electrodes. | 09-03-2009 |
| 20100078616 | NONVOLATILE MEMORY DEVICE AND MANUFACTURING PROCESS THEREOF - A nonvolatile memory device has a first insulating layer, a variable resistance layer provided on the first insulating layer and having a variable resistance material, and a first electrode and second electrode electrically connected with the variable resistance layer. The variable resistance layer has a variable resistance region as a data storing region and a thickness-changing region continuously extending from the variable resistance region and gradually becoming thicker from the variable resistance region. | 04-01-2010 |
| 20100123114 | NONVOLATILE MEMORY DEVICE - A nonvolatile memory device ( | 05-20-2010 |
| 20100195415 | Semiconductor memory device and reading method therefor - A memory device is configured such that, in a read access: a first switch and a second switch are turned on in a pre-charge period before a memory cell is accessed so that charges of a bit line charge voltage generating circuit are distributed to a bit line and a reference bit line, to thereby charge the bit line and the reference bit line to an initial voltage. After the charge, a selected memory cell is connected to the bit line, the reference bit line is connected to a reference voltage generating circuit, and a voltage differential type sense amplifier amplifies a difference voltage between a voltage of the bit line decreased by discharge of the selected memory cell and a voltage of the reference bit line generated by the reference voltage generating circuit, to thereby read out memory cell data. | 08-05-2010 |