Patent application number | Description | Published |
20080309793 | IMAGING APPARATUS, CONTINUOUS SHOOTING CONTROL METHOD, AND PROGRAM THEREFOR - Herein disclosed is an imaging apparatus, carrying out a step of calculating an exposure value based on image data obtained by the imaging section, a step of computing a shutter speed by mean of, for example, a program AE control in accordance with the exposure value calculated in the calculation step; a step of determining, in accordance with the shutter speed computed in the computation step, a continuous shooting speed indicative of the number of photographs per unit time; and a step of driving the imaging section so that a photographing operation is carried out with the continuous shooting speed thus determined. | 12-18-2008 |
20090066803 | IMAGE PICKUP APPARATUS PERFORMING AUTOMATIC PHOTOGRAPHING PROCESSING, IMAGE PICKUP METHOD AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH PROGRAM THEREOF - Disclosed is an image pickup apparatus comprising: an image pickup section to pick up a subject image; and a central processing section to perform processing of arbitrarily setting at least one automatic photographing condition among a plurality of kinds of automatic photographing conditions, judging whether “the set automatic photographing condition” is satisfied or not, and instructing the image pickup section to pick up a recording subject image when “the set automatic photographing condition” is judged to be satisfied. | 03-12-2009 |
20090102962 | IMAGE SENSING APPARATUS, IMAGE SENSING METHOD, AND RECORDING MEDIUM WHICH RECORDS PHOTOGRAPHING METHOD - Photographing at a fixed focus is executed by quickly canceling the autofocus without any labor for mode switching or the like. An image sensing apparatus includes a photographing unit which has an autofocus function and photographs an object image, a key input unit including a shutter key which has two operation strokes and designates autofocus and autoexposure by operation of the first stroke and photographing by operation of the second stroke, and a focus control unit which automatically sets a correct exposure value in the photographing unit, detects predetermined operation states of the first and second strokes designated by the shutter key, and switches and selects, on the basis of the detection result, whether to operate the autofocus function or set a fixed-focus position at which a predetermined depth of field is obtained. | 04-23-2009 |
20110080412 | DEVICE FOR DISPLAYING CUTTING SIMULATION, METHOD FOR DISPLAYING CUTTING SIMULATION, AND PROGRAM FOR DISPLAYING CUTTING SIMULATION - In order to reduce the amount of computation required for ray tracing and facilitate simulating of changes in workpiece shape even on an inexpensive, low-performance computer, a device for displaying a cutting simulation includes: a rendered workpiece image update section for updating by ray tracing a portion of a rendered workpiece image buffer and a rendered workpiece depth buffer, the portion being associated with a rendering region corresponding to a change in the shape of the workpiece; a rendered tool image creation section for rendering a tool image by ray tracing for the current tool rendering region; and an image transfer section for transferring a partial image of the previous tool rendering region and the current workpiece rendering region to be updated from the rendered workpiece image buffer to a display frame buffer as well as transferring the current tool rendering image to the display frame buffer. | 04-07-2011 |
20110228129 | IMAGE PICKUP APPARATUS PERFORMING AUTOMATIC PHOTOGRAPHING PROCESSING, IMAGE PICKUP METHOD AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH PROGRAM THEREOF - Disclosed is an image pickup apparatus comprising: an image pickup section to pick up a subject image; and a central processing section to perform processing of arbitrarily setting at least one automatic photographing condition among a plurality of kinds of automatic photographing conditions, judging whether “the set automatic photographing condition” is satisfied or not, and instructing the image pickup section to pick up a recording subject image when “the set automatic photographing condition” is judged to be satisfied. | 09-22-2011 |
20110267249 | WAVEGUIDE/PLANAR LINE CONVERTER - A waveguide/planar line converter ( | 11-03-2011 |
20110295576 | COLLISION DETERMINATION DEVICE AND COLLISION DETERMINATION PROGRAM - A collision determination device includes a target cell designation unit that designates a target cell for a voxel model which represents the shape of a first object. A determination test point generation unit generates determination test points for the target cell. A spatial curve creation unit creates a spatial curve as the trajectory curve of a determination test point. A curve intersecting determination unit determines whether or not each boundary element of a boundary representation model representing the shape of a second object is intersecting the spatial curve. A distance computation unit computes the closest distance from the spatial curve to the boundary surface of the boundary representation model. A collision determination unit determines, based on the determination result and the computation result, whether there is a possibility of collision between both objects. | 12-01-2011 |
20110304742 | IMAGE REPRODUCTION APPARATUS CAPABLE OF SIMULTANEOUSLY REPRODUCING PLURALITY OF IMAGES - An image reproduction apparatus includes a flash memory which adds recording time information to an image and records the image, and a control unit which classifies images in the memory on the basis of the added time information, limits the number of classified images for each date to one, and causes a display unit to display a calendar image as a list of images. | 12-15-2011 |
20120069210 | IMAGE PICKUP APPARATUS PERFORMING AUTOMATIC PHOTOGRAPHING PROCESSING, IMAGE PICKUP METHOD AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH PROGRAM THEREOF - An image pickup apparatus includes an image pickup section to pick up a subject image; and a central processing section to perform processing of arbitrarily setting at least one automatic photographing condition among a plurality of kinds of automatic photographing conditions, judging whether the set automatic photographing condition is satisfied or not, and instructing the image pickup section to pick up a recording subject image when the set automatic photographing condition is judged to be satisfied. | 03-22-2012 |
20120089242 | AUTOMATIC PROGRAMMING APPARATUS AND AUTOMATIC PROGRAMMING METHOD - Automatic programming apparatus includes: a material shape data input unit that receives input of data of material shape; a processing program storage unit that stores therein data of material shape and processed unit data; a processed unit data input part that receives an input of other-processed-unit-reference-type processed unit data referencing processed region shape data contained in the processed unit data; a processed region shape generating unit that generates processed region shape data in the processed unit data for partial processing, based on data of material shape and processed region shape data referenced by other-processed-unit-reference-type processed unit data; and a control command generating unit that generates control command data, based on processed unit data for partial processing containing processed region shape data. | 04-12-2012 |
20120089246 | AUTOMATIC PROGRAMMING APPARATUS AND AUTOMATIC PROGRAMMING METHOD - To obtain an automatic programming apparatus, capable of generating a tool path for the chamfering process with a simple operation and capable of shortening the operation period and improving machining efficiency, the automatic programming apparatus includes a chamfering tool path generating unit and machining condition data. The chamfering tool path generating unit includes: a chamfered plane defining unit that generates shape data defining a chamfered plane obtained after the chamfering process is performed with respect to a shape of the chamfering target part; a reference point sequence generating unit that generates a reference point sequence used as a reference for generating the tool path data used for performing the chamfering process; and a tool reference position generating unit that, generates a reference position of a machining tool used when the machining tool passes while performing the chamfering process. | 04-12-2012 |
20120146860 | COMMUNICATION SYSTEM AND COMMUNICATION APPARATUS - A communication system according to the present invention includes: a communication coupler that transmits a signal outputted from a communication equipment; and a signal transmission apparatus that performs communication by propagating, as an electromagnetic field, a signal transmitted from the communication coupler. The communication coupler includes: a coupler case; and an extended conductor portion that is provided at an end portion of the coupler case, the end portion facing the signal transmission apparatus, the extended conductor portion extends so as to be parallel to the signal transmission apparatus, and the extended conductor portion increases electromagnetic coupling between the communication coupler and the signal transmission apparatus. | 06-14-2012 |
20120284686 | SYSTEM AND METHOD FOR MOBILE APPLICATION DEVELOPMENT - The present invention relates to the field of mobile applications and, more specifically, to a system and method for building a mobile application in a mobile application development environment in a simple and cost effective manner. | 11-08-2012 |
20120319796 | WAVEGUIDE/PLANAR LINE TRANSDUCER - A waveguide/planar line transducer of the present invention includes a waveguide that transmits electromagnetic waves through an opening portion, and a multiplayer substrate that includes a plurality of conductive layers. The multilayer substrate includes: a first conductive layer that is in close contact with the opening portion of the waveguide, and includes a first coupling hole provided at a position overlapping the opening portion of the waveguide when viewed in a plate thickness direction of the multilayer substrate; a strip electrode that is electromagnetically coupled to the first conductive layer, arranged on an opposite side to the first conductive layer in the plate thickness direction, and extending in one of a planar direction of the multilayer substrate; and a second conductive layer that is arranged between the first conductive layer and the strip conductor in the plate thickness direction, and includes a second coupling hole having a protuberance facing at least one of directions in which the strip electrode extends. | 12-20-2012 |
20130002922 | IMAGING APPARATUS AND COMPUTER READABLE RECORDING MEDIUM - Once an imaging mode is set, an imaging apparatus displays a through image with a tracking frame on the predetermined position. If a shutter button is pressed halfway, an object that is overlapped by the tracking frame is recognized as a main subject that a user wants to capture. Until the shutter button is fully pressed or until the halfway-press is released, it is detected where the recognized subject is in frame image data that is captured in sequence, and the tracking frame is displayed based on the detected position. If the halfway press of the shutter button is released before the shutter button is fully pressed, the tracking frame is displayed on the predetermined position. Then if the shutter button is pressed halfway once again, the process is repeated. | 01-03-2013 |
20130012145 | RADIO MODULE AND MANUFACTURING METHOD THEREFOR - Provided is a radio module that includes a radio signal connection portion having a low insertion loss and high reliability. | 01-10-2013 |
20140063319 | IMAGING APPARATUS WHICH CONTROLS DISPLAY REGARDING CAPTURING, IMAGING METHOD, AND STORAGE MEDIUM - An imaging apparatus which controls display regarding capturing, an imaging method and a storage medium are shown. According to one implementation, an imaging apparatus includes, an imaging section, a display section, an imaging control section, a condition related information setting section, a first specifying section, and a display control section. The imaging control section controls automatic imaging processing in which the imaging section automatically images a subject under a predetermined condition. The condition related information setting section sets condition related information regarding the predetermined condition which changes during the automatic imaging processing. The first specifying section specifies a number of subjects as a target of imaging. The display control section displays the set condition related information changing at least one of a size and/or a position according to the number of subjects specified by the first specifying section. | 03-06-2014 |
20140114458 | MACHINING SIMULATION DEVICE AND METHOD - A machining simulation device includes a local-region setting unit that sets a local region for a workpiece, an offset-deformation processing unit that offsets and deforms a shape of a part of a whole three-dimensional shape model of the workpiece, for which the local region is set, and generates a local three-dimensional shape model of the workpiece, a local tool-movement-data output unit that outputs local tool movement data from whole tool movement data based on a tool model and movement path data of a tool, a local cutting-deformation processing unit that cuts and deforms the local three-dimensional shape model of a workpiece based on the local tool movement data, and a display superimposing unit that superimposes the cut and deformed local three-dimensional shape model of the workpiece on the whole three-dimensional shape model of the workpiece, and displays the superimposed result. | 04-24-2014 |
20140340179 | COMMUNICATION SHEET, SMART SHELF - The communication sheet according to the present invention includes a dielectric layer including a dielectric substrate, a first conductor layer that is a conductor layer including a mesh sheet-like mesh conductor disposed on one surface of the dielectric substrate, wherein an opening region from where the mesh conductor is removed is formed, and a second conductor layer that is a conductor layer including a sheet-like sheet conductor disposed on another surface of the dielectric substrate opposite to the first conductor layer, wherein the sheet conductor in a region opposite to the opening region from where the mesh conductor is removed is not removed. | 11-20-2014 |
20140361855 | COMMUNICATION SHEET, SMART SHELF - A communication sheet ( | 12-11-2014 |
Patent application number | Description | Published |
20080299502 | COATING AND DEVELOPING APPARATUS, OPERATING METHOD FOR SAME, AND STORAGE MEDIUM FOR THE METHOD - In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called “scheduled transfer” from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate. | 12-04-2008 |
20090003825 | SUBSTRATE PROCESSING SYSTEM - A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette. | 01-01-2009 |
20090021704 | COATING/DEVELOPING APPARATUS AND OPERATION METHOD THEREOF - A coating/developing apparatus has a carrier block including a first transfer device, a process block including processing modules, an examination block including examination modules and a second transfer device, and first to forth stages. A controller executes a first operation mode preset to transfer substrates from the process block and carrier block into the examination block in parallel. The first operation mode includes transferring substrates processed by the process block to the third or fourth stage through or not through an examination module by the second transfer device, transferring substrates to be only examined from a carrier in the carrier block to the second stage by the first transfer device, and transferring these substrates from the second stage to an examination modules by the second transfer device, and transferring substrates thus examined from the examination block to the third or fourth stage by the second transfer device. | 01-22-2009 |
20090041926 | COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER-READABLE RECORDING MEDIUM - With regard to a group of substrates preceding a substrate of which residence time is under calculation, a time t | 02-12-2009 |
20090098298 | COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND COMPUTER READABLE STORING MEDIUM - A transfer flow is produced in accordance with a process recipe of a process to be carried out. In the transfer flow, a type of modules listed in accordance with a substrate transfer order is associated with a necessary staying time from when the substrate is transferred into a module by a substrate transfer unit to when the substrate is ready to be transferred back to the substrate transfer unit after the corresponding process is finished. A cycle limiting time is determined to be the longest necessary transfer cycle time among those obtained by dividing the necessary staying time by the number of the modules mounted in the coater/developer. The number of the modules to be used is determined to be a value obtained by dividing the necessary staying time by the cycle limiting time or a nearest integer to which the value is raised. | 04-16-2009 |
20110014562 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block. | 01-20-2011 |
20110029122 | COATING AND DEVELOPING SYSTEM, METHOD OF CONTROLLING COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM - A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode. | 02-03-2011 |
20110262623 | COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND COMPUTER READABLE STORING MEDIUM - A transfer flow is produced in accordance with a process recipe of a process to be carried out. In the transfer flow, a type of modules listed in accordance with a substrate transfer order is associated with a necessary staying time from when the substrate is transferred into a module by a substrate transfer unit to when the substrate is ready to be transferred back to the substrate transfer unit after the corresponding process is finished. A cycle limiting time is determined to be the longest necessary transfer cycle time among those obtained by dividing the necessary staying time by the number of the modules mounted in the coater/developer. The number of the modules to be used is determined to be a value obtained by dividing the necessary staying time by the cycle limiting time or a nearest integer to which the value is raised. | 10-27-2011 |
20120008936 | COATING AND DEVELOPING APPARATUS - A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks. | 01-12-2012 |
20120009528 | COATING AND DEVELOPING APPARATUS AND METHOD - In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units. | 01-12-2012 |
20120013859 | COATING AND DEVELOPING APPARATUS AND METHOD - In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M | 01-19-2012 |
20120015307 | COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM - In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks. | 01-19-2012 |
20120057861 | COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM - In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof. | 03-08-2012 |
20120057862 | COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM - A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate. | 03-08-2012 |
20120063765 | COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD AND NON-TRANSITORY TANGIBLE MEDIUM - A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed. | 03-15-2012 |
20130078059 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit. | 03-28-2013 |
20130329199 | COATING AND DEVELOPING APPARATUS - A coating and developing apparatus includes a processing block having at least one coating film-forming unit block stack and a vertically stacked developing unit block stack. Each unit block stack includes vertically stacked unit blocks, and each unit block includes processing modules containing liquid processing modules and heating modules. Each unit block includes a transport mechanism moveable along a transport passage from a carrier block side to an interface block side, to transport a substrate between the processing modules belonging to the unit block. Transfer units are provided on the carrier block sides of the coating film-forming unit blocks and the developing unit blocks respectively, for transferring a substrate to and from the transport mechanism of the associated coating film-forming or developing unit blocks. A first transfer mechanism transfers a substrate removed from a carrier to one of the transfer units associated with the coating film-forming unit blocks. | 12-12-2013 |
20140327890 | COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM - In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks. | 11-06-2014 |
Patent application number | Description | Published |
20080240520 | Imaging apparatus, display control method and recording medium - In a digital camera | 10-02-2008 |
20090041444 | IMAGE CAPTURE DEVICE WITH AUTOMATIC FOCUSING FUNCTION - In an image capture device comprising an image capture unit which captures an object and outputs image data, and a shutter button which is half pressable, fully pressable, and pressable at one stroke, a first determining unit determines whether the shutter button is half pressed, and a second determining unit which determines whether the shutter button is pressed at one stroke. When the first determining unit determines that the shutter button is half pressed, a first capture control unit executes a first capture process for recording the image data, and when the second determining unit determines that the shutter button is pressed at one stroke, a stop control unit stops the first capture process, and a second capture control unit executes a second capture process which differs from the first capture process after the first capture process is stopped by the stop control unit. | 02-12-2009 |
20090322895 | IMAGE SENSING APPARATUS AND STORAGE MEDIUM - An image sensing apparatus according to this invention includes an image sensing unit which sequentially generates still image data, a holding unit which holds a plurality of still image data, a display unit which displays the still image data, a setting unit which sets a predetermined state as the start timing of shooting by the image sensing unit, a determination unit which determines whether the predetermined state has been obtained, a shooting control unit which causes the image sensing unit to start shooting when the determination unit determines that the predetermined state has been obtained, a display control unit which causes the display unit to sequentially display, at a display speed lower than an actual time, the still image data, a selection unit which selects one of a plurality of image data displayed on the display unit, and a recording unit which records the selected image data. | 12-31-2009 |
20100067887 | IMAGE CAPTURE DEVICE WITH AUTOMATIC FOCUSING FUNCTION - In a digital camera, a focus lens is moved at a low speed between a timing at which a shutter key is half pressed and a timing at which the shutter key is fully pressed to detect a focused position. When the shutter key is fully pressed by a user before the focus lens reaches a focused position, the focus lens is moved at a higher speed than that of a case in which the shutter key is half pressed, and a focused position is detected. Thereby, even when the shutter key is fully pressed by a user before the focus lens reaches the focused position, the digital camera can realize focusing with less delay in capturing. | 03-18-2010 |
20100238304 | DIGITAL CAMERA FOR RECORDING STILL IMAGE WITH SPEECH - An image pickup method includes determining a start timing and an end timing of obtaining the speech to have a photographing timing of the still image taken by the image pickup unit therebetween, in accordance with a period in which the speech stored in the temporary speech storing unit satisfies a predetermined condition, and cutting out the speech stored in the temporary speech storing unit for a period from the start timing to the end timing determined, and storing the cut speech in the storing unit in association with the still image taken by the image pickup unit. | 09-23-2010 |
20130010171 | IMAGE SENSING APPARATUS AND STORAGE MEDIUM - An image sensing apparatus includes an image sensing unit which sequentially generates still image data, a holding unit which holds a plurality of still image data, a display unit which displays the still image data, a setting unit which sets a predetermined state as the start timing of shooting by the image sensing unit, a determination unit which determines whether the predetermined state has been obtained, a shooting control unit which causes the image sensing unit to start shooting when the determination unit determines that the predetermined state has been obtained, a display control unit which causes the display unit to sequentially display, at a display speed lower than an actual time, the still image data, a selection unit which selects one of a plurality of image data displayed on the display unit, and a recording unit which records the selected image data. | 01-10-2013 |
Patent application number | Description | Published |
20120058253 | Substrate Processing Apparatus and Substrate Processing Method - Provided is a substrate processing apparatus in which after a module is disabled, a substrate is provided to a carry-in module capable of placing the wafers most rapidly in the plurality of unit blocks and the substrates are sequentially transported to the module group by the transportation means to be delivered to the carry-out module according to a providing sequence of the substrate to the carry-in module in each of the plurality of unit blocks. In particular, the substrates are extracted from the carry-out module according to a providing sequence of the substrate to the carry-in module and transported to a rear module or a substrate placing part. Thereafter, the substrates are transported to the rear module from the carry-out module or the substrate placing part according to a predetermined sequence in which the substrate is provided to the carry-in module in a normal state. | 03-08-2012 |
20120164572 | COATING METHOD, COATING DEVICE, AND STORAGE MEDIUM - A device to form a coating film which can quickly coat a substrate of a follow-up lot after coating a preceding lot. The device is configured such that nozzles for a preceding lot and a following lot are integrated into a common movement mechanism and moved between an upper side of a liquid processing unit and a standby area. A coating method includes sucking air into the nozzle for the preceding lot to form an upper gas layer, sucking a solvent for the preceding lot in the standby area to form a thinner layer, and sucking air into the nozzle for the preceding lot to form a lower gas layer within the nozzle, and thus forming a state that a solvent layer is interposed between the upper gas layer and the lower gas layer. | 06-28-2012 |
20130078061 | SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM - A substrate treatment system comprise a treatment station having a plurality of treatment units provided at multiple tiers in an up-down direction, a cassette mounting table on which a cassette housing a plurality of wafers W is mounted, and a wafer transfer mechanism arranged between the treatment station and the cassette mounting table, wherein a delivery block in which a plurality of delivery units are provided at multiple tiers is provided between the treatment station and the wafer transfer mechanism, the delivery units temporarily housing a wafer to be transferred between the cassette mounting table and the treatment station and a wafer to be transferred between the tiers of the treatment units. The wafer transfer mechanism includes a first transfer arm that transfers a wafer between the cassette mounting table and the delivery block, and a second transfer arm that transfers a wafer between the tiers of the delivery units. | 03-28-2013 |
20130112223 | SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND A NON-TRANSITORY COMPUTER STORAGE MEDIUM - In a coating and developing treatment system including a treatment station and an interface station, the interface station has: a cleaning unit cleaning a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting whether the cleaned wafer is in an exposable state; and a wafer transfer mechanism including an arm transferring the wafer between the cleaning unit and the inspection unit. Each of the cleaning unit and the inspection unit is provided at multiple tiers in an up and down direction on the front side in the interface station, and the wafer transfer mechanism is provided in a region adjacent to the cleaning units and the inspection units. | 05-09-2013 |
20130112224 | SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD AND COMPUTER STORAGE MEDIUM - An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit. | 05-09-2013 |