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Akio Yasuda, Esslingen DE

Akio Yasuda, Esslingen DE

Patent application numberDescriptionPublished
20080280110METHOD OF ACTIVATING A SILICON SURFACE FOR SUBSEQUENT PATTERNING OF MOLECULES ONTO SAID SURFACE - The present invention relates to a method of activating a silicon surface for subsequent patterning of molecules onto said surface, and to patterns produced by this method, and further to uses of said pattern.11-13-2008
20080283119Method of Producing a Porous Semiconductor Film on a Substrate - The invention relates to a method of producing a porous semiconductor film and to a suspension of semiconductor particles. It further relates to a porous semiconductor film produced by the method, and to an electronic device, in particular a solar cell comprising said semiconductor film.11-20-2008
20090030102METHOD OF FORMING A CROSSLINKED POLYMER GEL - The present invention relates to a method of forming a crosslinked polymer gel, to a polymer gel produced by such method and to uses of such polymer gel.01-29-2009
20090084162CHEMICAL SENSOR - The application relates to a chemical sensor device comprising a substrate (04-02-2009
20090178559SOLUBLE CARBON NANOTUBES - The present invention relates to a method of solubilizing carbon nanotubes, to carbon nanotubes produced thereby and to uses of said carbon nanotubes.07-16-2009
20100102975BATTERY LEAKAGE DETECTION SYSTEM - Battery leakage detection system comprising a gas sensor having a gas sensitive nanoparticle structure.04-29-2010
20100298169METHOD OF PATTERNING MOLECULES ON A SUBSTRATE USING A MICRO-CONTACT PRINTING PROCESS - The present invention relates to a method of patterning molecules on a substrate using a micro-contact printing process, to a substrate produced by said method and to uses of said substrate. It also relates to a device for performing the method according to the present invention.11-25-2010

Patent applications by Akio Yasuda, Esslingen DE