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Akio Koike, Tokyo JP
Akio Koike, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100179047 | OPTICAL MEMBER COMPRISING TIO2-CONTAINING SILICA GLASS - The present invention relates to an optical member including a TiO | 07-15-2010 |
| 20100261597 | TIO2-CONTAINING SILICA GLASS - The present invention is to provide a TiO | 10-14-2010 |
| 20100317505 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention is to provide a TiO | 12-16-2010 |
| 20100323872 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20100323873 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20110028299 | TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention provides a TiO | 02-03-2011 |
| 20110179827 | PROCESS FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS - The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F | 07-28-2011 |
| 20110239706 | METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS - The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F | 10-06-2011 |
| 20110239707 | METHOD FOR PRODUCTION OF SYNTHETIC QUARTZ GLASS - The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F | 10-06-2011 |