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Akio Koike
Akio Koike, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100179047 | OPTICAL MEMBER COMPRISING TIO2-CONTAINING SILICA GLASS - The present invention relates to an optical member including a TiO | 07-15-2010 |
| 20100261597 | TIO2-CONTAINING SILICA GLASS - The present invention is to provide a TiO | 10-14-2010 |
| 20100317505 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention is to provide a TiO | 12-16-2010 |
| 20100323872 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20100323873 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20110028299 | TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention provides a TiO | 02-03-2011 |
Akio Koike, Chiyoda-Ku JP
| Patent application number | Description | Published |
|---|---|---|
| 20090208760 | ENERGY-TRANSMITTING OR ULTRAVIOLET LIGHT-TRANSMITTING OPTICAL FIBER PREFORM AND PRODUCTION PROCESS THEREOF - The present invention is to provide an optical fiber preform suitable for the production of an energy-transmitting or ultraviolet light-transmitting optical fiber, which has an excellent transmittance of a high-energy light of 50 KW/cm | 08-20-2009 |
| 20100028787 | SUBSTRATE FOR EUV MASK BLANKS - A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. | 02-04-2010 |
| 20100323871 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE - The present invention provides a TiO | 12-23-2010 |
Akio Koike, Yokohama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090122281 | SILICA GLASS CONTAINING TIO2 AND PROCESS FOR ITS PRODUCTION - A silica glass containing TiO | 05-14-2009 |
| 20090242387 | PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 - The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO | 10-01-2009 |