Patent application number | Description | Published |
20090190112 | Exposure apparatus, and device manufacturing method - A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate. | 07-30-2009 |
20110025996 | Exposure apparatus, and device manufacturing method - An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. A liquid retaining member is replaced with a table member that holds the substrate at an opposite position to the projection system while the liquid is maintained in contact with the projection system so as to transit from a first state to a second state, the first state in which the liquid is maintained between the projection system and the liquid retaining member, the second state in which the liquid is maintained between the projection system and the table member. | 02-03-2011 |
20110025997 | Exposure apparatus, and device manufacturing method - An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. Substrates can be held on first and second tables. The first and second tables are moved together so as to transit from a first state to a second state, the first state in which the liquid immersion is maintained between the projection system and one of the first and second tables, the second state in which the liquid immersion is maintained between the projection system and the other one of the first and second tables. During the transition, the liquid immersion is maintained just below the projection system. | 02-03-2011 |
20110043781 | Projection optical device and exposure apparatus - A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system. | 02-24-2011 |
20120008111 | Exposure apparatus, and device manufacturing method - A support structure of a lithographic projection apparatus is configured to hold a patterning device, the patterning device being configured to pattern a beam of radiation according to a desired pattern. A substrate table is configured to hold a substrate. A projection system is configured to project the patterned beam onto a target portion of the substrate. A liquid supply system includes a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, the aperture having an area smaller than an area of the substrate, the patterned beam capable of being projected through liquid in the space and the aperture onto the substrate. A closure is configured to selectively close and open the aperture, and the closure is separable from the remainder of the apparatus. | 01-12-2012 |
20120200837 | EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate. | 08-09-2012 |
20130215403 | EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus and method exposes a substrate via a projection optical system and liquid. A liquid immersion member having a lower surface and a recovery port at its lower surface side supplies liquid to form a liquid immersion region below the projection optical system and recovers the liquid via the recovery port. First and second tables, on which a substrate is mountable, are positionable opposite to the lower surface of the liquid immersion member. A drive system moves the first and second tables below the projection optical system relative to the liquid immersion member to replace one of the tables positioned opposite to the lower surface of the liquid immersion member with the other of the tables, whereby the liquid immersion region is transferred from the one to the other of the tables while the liquid immersion region is maintained below and in contact with the projection optical system. | 08-22-2013 |
20130229637 | EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus and method exposes a substrate via a projection optical system and a liquid. A liquid immersion system supplies liquid to form a liquid immersion region below the projection optical system. First and second tables each can mount a substrate. A drive system drives the first and second tables, which are positionable below the projection optical system. The drive system is controlled to move the first and second tables below the projection optical system relative to the liquid immersion region to replace one of the first and second tables positioned below the projection optical system with the other of the first and second tables such that the liquid immersion region is transferred from the one of the first and second tables to the other of the first and second tables while the liquid immersion region is maintained below and in contact with the projection optical system. | 09-05-2013 |
20130250257 | EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - Exposure apparatus and methods expose a substrate with an energy beam via a projection optical system and has first and second tables on each of which a substrate is mountable. A mark detection system is arranged in a second area different from a first area in which the projection optical system is arranged. A substrate mounted on one of the first and second tables is moved in the first area while the one table is held by a first movable member. A substrate mounted on another of the first and second tables is moved in the second area while the another table is held by a second movable member. The tables held by the first and second movable members are driven so that the another table is moved from the second to the first movable member to be held in place of the one table. | 09-26-2013 |
20140211176 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus and method exposes a substrate via a projection optical system and a liquid supplied to an immersion area below the projection optical system. First and second movable members move below the projection optical system. The first movable member has a mount area that mounts a substrate located in a hole of an upper surface of the first movable member. The upper surface outside the hole can maintain at least a part of the immersion area outside the substrate mounted in the hole. A drive system drives the first and second movable members to move the first and second movable members below the projection optical system relative to the liquid immersion region to replace one member positioned below the projection optical system with the other member such that the liquid immersion area is maintained below the projection optical system. | 07-31-2014 |
20140211177 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate with an energy beam via a projection system and liquid and an immersion member forms an immersion area under the projection system with the liquid. A controller controls a stage system having first and second substrate holding members that hold first and second substrates, (i) to execute a relative movement between the first and second substrate holding members such that, while one of the substrate holding members is arranged opposed to the projection system, the other of the substrate holding members comes close to the one substrate holding members, and (ii) to move the close substrate holding members relative to the immersion member below the projection system such that the other of the substrate holding members is arranged opposite to the projection system in place of the one substrate holding members while substantially maintaining the immersion area under the projection system. | 07-31-2014 |
20140293252 | EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate with illumination light via a projection optical system and liquid, and includes a controller that controls movement of first and second movable members each of which can hold a substrate. The controller executes a relative movement between the first and second movable members such that, while one of the movable members is arranged opposed to the projection optical system, the other of the movable members comes close to the one of the movable members, and so as to move the close first and second movable members relative to the projection optical system such that the other of the movable members is arranged opposed to the projection optical system in place of the one of the movable members while substantially maintaining a liquid immersion region under the projection optical system. | 10-02-2014 |