Patent application number | Description | Published |
20080252872 | METHOD OF EVALUATING OPTICAL BEAM SOURCE OF EXPOSURE DEVICE, METHOD OF DESIGNING ILLUMINATION SHAPE OF EXPOSURE DEVICE, AND SOFTWARE FOR OPTIMIZING ILLUMINATION SHAPE OF EXPOSURE DEVICE - A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing an exposure optical beam source into a plurality of unit optical beam sources in a unit size determined by an exposure device, acquiring a difference between an evaluation amount of a target pattern on a semiconductor substrate when a unit optical beam source is turned on and an evaluation amount of the target pattern on the semiconductor substrate when the unit optical beam source is turned off, and evaluating the exposure optical beam source by using the acquired difference as an index. | 10-16-2008 |
20080301621 | MASK PATTERN CORRECTING METHOD - In a model-based OPC which makes a suitable mask correction for each mask pattern using an optical image intensity simulator, a mask pattern is divided into subregions and the model of optical image intensity simulation is changed according to the contents of the pattern in each subregion. When the minimum dimensions of the mask pattern are smaller than a specific threshold value set near the exposure wavelength, the region is calculated using a high-accuracy model and the other regions are calculated using a high-speed model. | 12-04-2008 |
20090217233 | SIMULATION METHOD AND SIMULATION PROGRAM - A method of simulating an optical intensity distribution on a substrate when a mask pattern formed on the mask is transferred to the substrate through a projection optical system by irradiating an illumination light obliquely on a mask surface of the mask, which comprises setting a phase difference between a zero-order diffraction light and a first-order diffraction light determined according to at least one of a distance between the zero-order diffraction light and the first-order diffraction light on a pupil of the projection optical system, thickness of a light-shielding portion formed on the mask, angle defined by an optical axis direction of the illumination light and an incident direction on the mask, and a difference between a size of the mask pattern and a half cycle of the mask pattern, and carrying out a simulation of the optical intensity distribution on the substrate according to the set phase difference. | 08-27-2009 |
20090305172 | LITHOGRAPHY SIMULATION METHOD, COMPUTER PROGRAM PRODUCT, AND PATTERN FORMING METHOD - A lithography simulation method for estimating an optical image to be formed on a substrate when a mask pattern is transferred onto the substrate includes dividing the mask pattern into first calculation areas having sizes determined by a range affected by OPC, the range being obtained correspondingly to an exposure wavelength, a numerical aperture and an illumination shape which are used in the transferring the mask pattern onto the substrate, dividing the each of the first calculation areas into second calculation areas, calculating first electromagnetic field distributions formed by illuminating the mask pattern with exposure light and corresponding to the second calculation areas, obtaining second electromagnetic field distributions corresponding to the first calculation areas by synthesizing the first electromagnetic field distributions for each of the first calculation areas, and calculating the optical image to be formed on the substrate by using the second electromagnetic field distributions. | 12-10-2009 |
20120068372 | NANOIMPRINT TEMPLATE AND PATTERN TRANSCRIPTION APPARATUS - According to one embodiment, a nanoimprint template using a pattern transcription to a substrate by a nanoimprint technique, the template includes a transcription pattern and an alignment mark on a main surface of a main body, wherein the alignment mark comprises a polarizer. | 03-22-2012 |
20120214272 | METHOD OF MANUFACTURING ORGANIC THIN FILM SOLAR CELL - Certain embodiments provide a method of manufacturing an organic thin film solar cell comprising forming, on a first electrode, a first transport layer having an uneven pattern and a photoelectric conversion layer provided on a surface of the uneven pattern, forming a second transport layer on a second electrode, and bringing the uneven pattern having the photoelectric conversion layer is formed thereon into contact with the second transport layer to mold the second transport layer. | 08-23-2012 |
20130055172 | ORIGINAL PLATE EVALUATION METHOD, COMPUTER READABLE STORAGE MEDIUM, AND ORIGINAL PLATE MANUFACTURING METHOD - According to one embodiment, an original plate evaluation method is disclosed. The original plate includes a substrate and N patterns differing from one another in shape. The method includes selecting N1 patterns from the N patterns based on first criterion, obtaining measured values for the N1 patterns, performing a decision whether the obtained measured values satisfy first specification value, selecting N2 patterns from the N patterns based on second criterion, predicting shapes of transfer patterns corresponding to N2 patterns, performing a decision whether the predicted shapes satisfy second specification value, and evaluating the plate based on the decision. | 02-28-2013 |
20130080991 | PATTERN FORMING APPARATUS - According to one embodiment, a pattern forming apparatus includes a control unit. The control unit is configured to execute a test patterning to same patterns using probes under same conditions, obtain a position error and a size error by comparing a position and a size of the same patterns with a target value, select a normal probe in which the position error and the size error is in an allowable range among the probes, execute a correction process which adjusts sub patterning areas which are patterned by the normal probe among a main patterning area of a substrate, and execute a patterning of the sub patterning areas using the normal probe. | 03-28-2013 |
20130130157 | METHOD FOR MANUFACTURING PHOTO MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM - According to one embodiment, a method for manufacturing a photo mask, includes acquiring first data on respective shapes of a plurality of mask substrates, acquiring second data on respective shapes of a plurality of pellicles, and determining a combination of the mask substrate and the pellicle based on the first data and the second data. | 05-23-2013 |
20150021191 | PATTERN TRANSFER MOLD AND PATTERN FORMATION METHOD - According to one embodiment, a pattern transfer mold includes a base body, first and second stacked bodies, first and second electrodes. The base body includes a base unit including a first surface, a first protrusion provided on the first surface and having a first side surface, and a second protrusion provided on the first surface, separated from the first protrusion, and having a second side surface opposing the first side surface. The first stacked body is provided on the first side surface, and includes first conductive layers and a first insulating layer. The second stacked body is provided on the second side surface, separated from the first stacked body, and includes second conductive layers and a second insulating layer. The first electrode is electrically connected to at least one of the first conductive layers. The second electrode is electrically connected to at least one of the second conductive layers. | 01-22-2015 |