Patent application number | Description | Published |
20090306284 | Curable Fluorinated Copolymers and Coatings and Processes Thereof - A process for coating flexible substrates applying a curable fluorinated copolymer A which is the reaction product of FC and
| 12-10-2009 |
20100227173 | WATER-REPELLENT OIL-REPELLENT ANTIFOULING AGENT HAVING GOOD SOLUBILITY IN SOLVENT - Disclosed is a water-repellent oil-repellent antifouling agent containing a fluorine-containing polymer for a treatment for providing water repellency, oil repellency and antifouling property. The fluorine-containing polymer has a repeating unit (A) derived from a fluorine-containing acrylate monomer, and a repeating unit (B) derived from at least one non-fluorine acrylate monomer selected from the group consisting of a monomer (B1) having a cyclic hydrocarbon group and a monomer (B2) having a short chain hydrocarbon group. This water-repellent oil-repellent antifouling agent has good solubility in solvents, and exhibits excellent effects on various bases, especially on masonries. | 09-09-2010 |
20100261020 | FLUORINE-CONTAINING POLYMER AND AQUEOUS TREATMENT AGENT - Disclosed is a fluorine-containing polymer having (A) repeating units derived from a fluorine-containing acrylate monomer, and (B) repeating units derived from an amino group-containing monomer, wherein the fluorine-containing polymer is water-soluble. The fluorine-containing polymer has sufficiently high solubility, and can impart high water repellency, high oil repellency and high soil resistance to a porous substrate. | 10-14-2010 |
20130184400 | Coating of substrates with curable fluorinated copolymers - A process for coating flexible substrates applying a curable fluorinated copolymer A which is the reaction product of FC and
| 07-18-2013 |
Patent application number | Description | Published |
20090120366 | MICROWAVE PLASMA CVD DEVICE - The present invention provides a microwave plasma CVD device that can satisfactorily perform plasma position control under a condition capable of fabricating a large-area high-quality diamond thin film or the like. A microwave plasma CVD device includes: a vacuum chamber | 05-14-2009 |
20090160307 | DIAMOND ELECTRON SOURCE AND METHOD FOR MANUFACTURING THE SAME - A diamond electron source in which a single sharpened tip is formed at one end of a pillar-shaped diamond monocrystal of a size for which resist application is difficult in a microfabrication process, as an electron emission point used in an electron microscope or other electron beam device, and a method for manufacturing the diamond electron source. One end of a pillar-shaped diamond monocrystal | 06-25-2009 |
20090160308 | DIAMOND ELECTRON RADIATION CATHODE, ELECTRON SOURCE, ELECTRON MICROSCOPE, AND ELECTRON BEAM EXPOSER - An object is to provide an electron emitting cathode achieving high luminance, low energy dispersion, and long life. It is therefore an object to provide a diamond electron emitting cathode graspable on a sufficiently stable basis, sharpened at the tip, and improved in electric field intensity. A diamond electron emitting cathode | 06-25-2009 |
20090169814 | METHOD FOR MANUFACTURING DIAMOND MONOCRYSTAL HAVING A THIN FILM, AND DIAMOND MONOCRYSTAL HAVING A THIN FILM - A method for growing a low-resistance phosphorus-doped epitaxial thin film having a specific resistance of 300 Ωcm or less at 300 K on a principal surface of a {111} monocrystal substrate under conditions in which the phosphorus atom/carbon atom ratio is 3% or higher, includes the principal surface having an off-angle of 0.50° or greater. The diamond monocrystal having a low-resistance phosphorus-doped diamond epitaxial thin film is such that the thin-film surface has an off-angle of 0.50° or greater with respect to the {111} plane, and the specific resistance of the low-resistance phosphorus-doped diamond epitaxial thin film is 300 Ωcm or less at 300 K. | 07-02-2009 |