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Aiyoshizawa
Eiji Aiyoshizawa, Yokohama-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080276886 | INTERNAL COMBUSTION ENGINE COOLING SYSTEM - An engine cooling system has an engine water jacket, a coolant circulation passage connecting a water jacket outlet to a water jacket inlet and a radiator disposed in the coolant circulation passage. A thermostat valve selectively closes and opens the coolant circulation passage leading to the radiator. A bypass passage extends from between the water jacket outlet and the thermostat valve to an outlet side of the radiator. A bridge passage connects a portion of the bypass passage to a portion of the coolant circulation passage located downstream of the radiator and upstream of where the bypass passage merges therewith. A resistance generating section is located downstream of the bridge passage connection to the coolant circulation passage and upstream of the bypass passage connection to the coolant circulation passage. The bridge passage has an oil heat exchanger to exchange heat between the cooling medium and transmission oil passing therethrough. | 11-13-2008 |
Shunichi Aiyoshizawa, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20080311823 | Apparatus for heating or cooling a polishing surface of a polishing appratus - The present invention provides an apparatus for heating or cooling a polishing surface. This apparatus includes a heat exchanger arranged so as to face the polishing surface when the workpiece is polished. The heat exchanger includes a medium passage through which a heat-exchanging medium flows, and a bottom surface facing the polishing surface. At least a part of the bottom surface is inclined with an upward gradient above the polishing surface such that a polishing liquid on the polishing surface generates a lift exerted on the bottom surface during movement of the polishing surface. | 12-18-2008 |
Shunichi Aiyoshizawa, Fujisawa-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080220621 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment. | 09-11-2008 |