Aiura
Hiromichi Aiura, Yokohama-Shi JP
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20140297909 | STORAGE APPARATUS AND HIERARCHY CONTROL METHOD - Proposed are a storage apparatus and a hierarchy control method capable of reducing the workload of system operation and the workload of performance investigation. | 10-02-2014 |
Kazuhiro Aiura, Kumamoto JP
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20140045281 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - Provided is a substrate processing apparatus in which flexibility of disposing a device configured to determine a holding state of a substrate and the flexibility of timing of determining the holding state are enhanced. The substrate processing apparatus includes a light projector configured to radiate detection light toward a region where a substrate may exist when the substrate is held by a substrate holding member and a light receiver configured to receive the detection light radiated from the light projector. A light path of the detection light from the light projector toward the light receiver passes a substrate surrounding member installed around the substrate held by the substrate holding member. The detection light penetrates the substrate surrounding member and has a wavelength which does not penetrate the substrate. | 02-13-2014 |
Kazuhiro Aiura, Koshi City JP
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20120180828 | Liquid Processing Apparatus and Liquid Processing Method - Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus. | 07-19-2012 |
20140137902 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a rotary cup that is provided at a substrate holding unit to surround a substrate held thereon and to be rotated along with the substrate holding unit, and configured to guide a processing liquid dispersed from the substrate; and an outer cup that is provided around the rotary cup with a gap therebetween and configured to collect the guided processing liquid by the rotary cup. Further, a height of an upper end of the rotary cup is higher than that of the outer cup. Furthermore, an outward protrusion protruded outwards in a radial direction thereof and extended along a circumference thereof is provided at an upper end portion of an outer surface of the rotary cup, and the outward protrusion blocks mist of the processing liquid dispersed from the gap between the rotary cup and the outer cup toward a space above the substrate. | 05-22-2014 |
Kazuhiro Aiura, Koshi-Shi JP
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20120312336 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM - There is provided a liquid processing apparatus capable of efficiently processing a pattern formation surface of a wafer, while preventing diffusion of a chemical-liquid atmosphere which might possibly occurs during a chemical-liquid process. | 12-13-2012 |
20130014786 | LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHODAANM Ito; NorihiroAACI Koshi-shiAACO JPAAGP Ito; Norihiro Koshi-shi JPAANM Aiura; KazuhiroAACI Koshi-shiAACO JPAAGP Aiura; Kazuhiro Koshi-shi JPAANM Shindo; NaokiAACI Koshi-shiAACO JPAAGP Shindo; Naoki Koshi-shi JPAANM Hachiya; YosukeAACI Koshi-shiAACO JPAAGP Hachiya; Yosuke Koshi-shi JPAANM Nagai; TakashiAACI Koshi-shiAACO JPAAGP Nagai; Takashi Koshi-shi JP - A top plate | 01-17-2013 |
20130180659 | LIQUID TREATMENT APPARATUS - A liquid treatment apparatus includes a substrate holder ( | 07-18-2013 |
20130319476 | LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD - A liquid treatment apparatus includes a substrate holding member ( | 12-05-2013 |
20140248774 | LIQUID TREATMENT APPARATUS AND LIQUID TREATMENT METHOD - The liquid treatment apparatus according to the present invention includes a substrate holder configured to horizontally hold a substrate, and a top plate configured to be rotatable and to cover the substrate held by the substrate holder from above so as to define a treatment space. In the treatment space, a chemical liquid is supplied by a chemical liquid nozzle onto the substrate, and an atmosphere replacement gas is supplied by a replacement nozzle into the treatment space. The replacement nozzle is supported by a replacement nozzle support arm configured to be horizontally moved between an advanced position at which the replacement nozzle support arm is advanced into the treatment space and a retracted position at which the replacement nozzle support arm is retracted outside from the treatment space. The replacement nozzle is configured to discharge, above the substrate, the atmosphere replacement gas upward. | 09-04-2014 |
20140352726 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end thereof above the substrate and to receive the first or second processing liquid that has been supplied to the substrate, a first tubular outer cup including an upper opening and disposed around the liquid receiving cup, vertically movable between a lifted position to which the first tubular outer cup is lifted so that its upper end is positioned above the liquid receiving cup, and a lowered position lower than the lifted position, and a second tubular outer cup disposed externally to the first tubular outer cup. The tubular outer cup is selected according to the kind of processing liquid. | 12-04-2014 |
Masami Aiura, Tokyo JP
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20130187612 | BALANCE CHARGING CIRCUIT FOR SERIES-CONNECTED STORAGE CELLS AND BALANCE CHARGING METHOD FOR SERIES-CONNECTED STORAGE CELLS - A coil is electrically connected to one of storage cells to charge it, and after that, the coil is electrically connected to the other one thereof to charge it. In a first charging period, a path of a charging current flowing into a reference voltage through the coil is formed, in a second charging period, a path of a charging current flowing into a second cell from the coil is formed, in a third charging period, a path of a charging current flowing into the reference voltage through the coil is formed, and in a forth charging period, one end of the coil is electrically conducted with one end of the first cell and another end of the coil is electrically conducted with another end of the first cell to form a path of a charging current flowing into the first cell from the coil. | 07-25-2013 |
20140092656 | POWER SUPPLY CIRCUIT - A power supply circuit is intended to suppress power consumption when a load is not driven and to shorten a required time to be taken until a boosted voltage to be supplied to a high-side MOS transistor is stabilized when the load is changed from a deactivated state to an activated state. | 04-03-2014 |
Yasuyuki Aiura, Myoko-Shi JP
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20130323155 | PROCESS FOR PRODUCING FLUORINE-CONTAINING SULFONYLIMIDE SALT - By reacting a fluorine-containing sulfonylimide ammonium salt such as ammonium N,N-di(fluorosulfonyl)imide with an alkali metal hydroxide such as lithium hydroxide, potassium hydroxide or sodium hydroxide under reduced pressure and at a low temperature of approximately 40° C., a fluorine-containing sulfonylimide alkali metal salt such as lithium N,N-di(fluorosulfonyl)imide, potassium N,N-di(fluorosulfonyl)imide or sodium N,N-di(fluorosulfonyl)imide is obtained. | 12-05-2013 |
Yasuyuki Aiura, Joetsu-Shi JP
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20130331609 | PRODUCTION PROCESS FOR FLUOROSULFONYLIMIDE AMMONIUM SALT - A compound [II] such as ammonium N,N-di(fluorosulfonyl)imide is obtained by reacting a compound [I] such as N,N-di(chlorosulfonyl)imide and NH | 12-12-2013 |