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Aiko, JP
Kazuhiko Aiko, Saitama JP
| Patent application number | Description | Published |
|---|---|---|
| 20100181222 | PACKAGING MATERIAL - A packaging material includes: a pair of clam shells; a plurality of welding portions provided at marginal portions of the pair of clam shells and welded to each other with a product contained between the pair of clam shells in a sandwiched state; and a cutout formed in a part of at least either of the pair of clam shells surrounding the welding portions. | 07-22-2010 |
Kenji Aiko, Hitachinaka JP
| Patent application number | Description | Published |
|---|---|---|
| 20080291436 | Defect inspection system - A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is | 11-27-2008 |
| 20100271473 | DEFECT INSPECTION SYSTEM - A defect inspection system can suppress an effect of light from a sample rough surface or a regular circuit pattern and increasing a gain of light from a defect such as a foreign material to detect the defect on the sample surface with high sensitivity. When a lens with a large NA value is used, the outer diameter of the lens is | 10-28-2010 |
| 20110141463 | DEFECT INSPECTION METHOD, AND DEFECT INSPECTION DEVICE - Provided are a defect inspection device and a defect inspecting method, which enlarge the uptake range of a light scattered from a fine defect thereby to heighten signal intensity. The defect inspection device is provided with: a stage unit ( | 06-16-2011 |
Kenji Aiko, Ninomiya JP
| Patent application number | Description | Published |
|---|---|---|
| 20080204736 | Defect Inspection Method and Defect Inspection Apparatus - Provided are a defect inspection apparatus having a large range for receiving light scattering from fine defects while securing a sufficiently large signal strength; and a defect inspection method for the same. The defect inspection apparatus includes: a stage part capable of traveling relative to optical systems with a substrate to be inspected mounted on the stage part; an illumination optical system for illuminating an inspection area on the substrate; a detection optical system for detecting light coming from the inspection area on the substrate; an image sensor for converting, to a signal, an image which is formed on the image sensor by the detection optical system; a signal processor for detecting defects by processing the signal from the image sensor; and a plane reflecting mirror, arranged between the detection optical system and the substrate, for transmitting the light, which comes from the substrate, to the detection optical system. | 08-28-2008 |
| 20090207405 | DEFECT INSPECTING APPARATUS - A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition. | 08-20-2009 |
| 20100214561 | DEFECT INSPECTING APPARATUS - A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition. | 08-26-2010 |
| 20100271627 | Defect Inspection Method and Defect Inspection Apparatus - Provided are a defect inspection apparatus having a large range for receiving light scattering from fine defects while securing a sufficiently large signal strength; and a defect inspection method for the same. The defect inspection apparatus includes: a stage part capable of traveling relative to optical systems with a substrate to be inspected mounted on the stage part; an illumination optical system for illuminating an inspection area on the substrate; a detection optical system for detecting light coming from the inspection area on the substrate; an image sensor for converting, to a signal, an image which is formed on the image sensor by the detection optical system; a signal processor for detecting defects by processing the signal from the image sensor; and a plane reflecting mirror, arranged between the detection optical system and the substrate, for transmitting the light, which comes from the substrate, to the detection optical system. | 10-28-2010 |
Kenji Aiko, Hitachinaka-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100106443 | Defect Inspection Apparatus and Defect Inspection Method - A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors. Moreover, the illumination optical system illuminates the inspecting object with another slit beam from a direction opposite to an incident direction of the slit beam on a plane. | 04-29-2010 |
Naoto Aiko, Koshigaya-Shi JP
Yasuyuki Aiko, Toride-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20090073472 | IMAGE FORMING APPARATUS AND CONTROL METHOD THEREFOR - An image forming apparatus which is capable of correctly and accurately detecting a sheet leading edge position and carrying out image formation in appropriate image write timing. a detection device is disposed at a reference position upstream from the transfer position and detects the recording medium being conveyed. A determining device determines image write timing for forming the electrostatic latent image on the photosensitive drum based on a difference in position between a leading edge position of the recording medium detected by the detection device and the reference position. The detection device respectively include a plurality of light detecting pixels disposed in a recording medium conveying direction, and the leading edge position of the recording medium detected by the respective light detecting pixels. | 03-19-2009 |
| 20100028034 | IMAGE FORMING APPARATUS AND CONTROL METHOD THEREFOR - An image forming apparatus which is capable of correctly and accurately detecting a sheet leading edge position and carrying out image formation in appropriate image write timing, includes a detection device disposed at a reference position upstream from the transfer position and detects the recording medium being conveyed. A determining device determines image write timing for forming the electrostatic latent image on the photosensitive drum based on a difference in position between a leading edge position of the recording medium detected by said detection device and the reference position. The detection device respectively include a plurality of light detecting pixels disposed in a recording medium conveying direction, and the leading edge position of the recording medium detected by the respective light detecting pixels. | 02-04-2010 |
| 20100124425 | IMAGE FORMING APPARATUS AND CONTROL METHOD THEREFOR - An image forming apparatus that is capable of preventing an abnormal operation due to a voltage drop of a commercial power source and continuing an image forming operation efficiently even if the voltage drop occurs. A fixing unit fixes a toner image transferred onto a sheet. A voltage detection unit detects an input voltage of the commercial power source. A setting unit sets a fixing electric power supplied to the fixing unit from the commercial power source. A control unit suspends an operation when the set fixing electric power is less than a predetermined electric power and when the input voltage is less than a first voltage, and to continue the operation while reducing the set fixing electric power when the set fixing electric power is not less than the predetermined electric power and when the input voltage is less than a second voltage. | 05-20-2010 |