Patent application number | Description | Published |
20080234460 | Fluorine-Containing Polymerizable Monomer and Polymer Compound Using Same - Disclosed is a fluorine-containing polymerizable monomer represented by the formula [1] below. (In the formula, A represents a single bond, an oxygen atom, a sulfur atom, CO, CH | 09-25-2008 |
20090023886 | Fluorine-containing polymerizable monomer and polymer compound using same - Disclosed is a fluorine-containing polymerizable monomer represented by the formula [1] below. (In the formula [1], a represents an integer of 1-4.) By having a plurality of polymerizable amines in a molecule while containing a hexafluoroisopropyl group, this fluorine-containing polymerizable monomer exhibiting water repellancy, oil repellency, low water absorbency, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index, low dielectric properties, and the like, and thus can be applied to the field of advanced polymer materials. | 01-22-2009 |
20090292104 | Fluorine-Containing Polymerizable Monomer and Polymer Compound Using Same - Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] | 11-26-2009 |
20100152401 | POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME - Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): | 06-17-2010 |
20100234556 | Fluorine-Containing Polymerizable Monomer and Polymer Compound Using Same - Polymers made by polymerization or cyclization condensation of a fluorine-containing polymerizable monomer represented by the formula [1] | 09-16-2010 |
20100248136 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises a hydrophobic resin (HR) containing a fluorine atom, wherein the hydrophobic resin (HR) comprises any of repeating units (a) of general formula (I) or (II) below: | 09-30-2010 |
20110091809 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. | 04-21-2011 |
20110143280 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD - A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass % based on all solvents of the mixed solvent (D). | 06-16-2011 |
20110236828 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups. | 09-29-2011 |
20110318687 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION - Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom. | 12-29-2011 |
20120009522 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided. | 01-12-2012 |
20120015301 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: | 01-19-2012 |
20120271021 | POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME - Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): | 10-25-2012 |
20130337384 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD - A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a resin having at least either one of a fluorine atom and a silicon atom; and (D) a mixed solvent containing at least one kind of a solvent selected from the group consisting of solvents represented by any one of the following formulae (S1) to (S3) as defined in the specification, in which a total amount of the at least one kind of the solvent is from 3 to 20 mass % based on all solvents of the mixed solvent (D). | 12-19-2013 |
Patent application number | Description | Published |
20090270204 | METHOD FOR GOLF CLUB SELECTION, AND GOLF CLUB - A method for golf club selection uses a behavior of the golf swing when a golf club is gripped and swung. The method for golf club selection has a step of obtaining information of a vertical movement direction relative to a horizontal plane of a golf club head immediately before striking a golf ball, and information of the horizontal movement direction of the golf club head immediately before striking the golf ball on a plane parallel to the horizontal plane, a step of classifying the golf swing step as a predetermined type using the information of the vertical movement direction and information of the horizontal movement direction obtained, and a step of selecting a golf club suited for the classification according to the classification result. | 10-29-2009 |
20140194233 | Ball for Ball Game - A hard baseball ball is configured including a core layer, an intermediate layer, and the cover layer. The intermediate layer is formed on a spherical body by winding yarn having radio wave transmissivity, which allows radio waves to pass through, in a spherical shape around the core layer. The cover layer covers the intermediate layer, and is formed from a material with radio wave transmissivity. The hard baseball ball also includes the reflecting portion. The reflecting portion is formed on a spherical surface whose center is the center of the spherical body, and has radio wave reflectability. The reflecting portion is configured using yarn from which the intermediate layer is formed. At least a portion of the yarn from which the intermediate layer is formed is given radio wave reflectability, and the reflecting portion is configured from the portion of the yarn that has been given radio wave reflectability. | 07-10-2014 |
Patent application number | Description | Published |
20120022215 | URETHANE RESIN, FIXING MEMBER, AND IMAGE FORMING APPARATUS - A urethane resin that is formed by polymerizing an acrylic resin including a hydroxyl group and an isocyanate is provided. The urethane resin has a Martens hardness of 1 N/mm | 01-26-2012 |
20120195656 | RESIN MATERIAL, ENDLESS BELT, ROLL, IMAGE FIXING UNIT, AND IMAGE FORMING APPARATUS - Provided is a resin material including at least one of a reaction product and a mixture of a polyimide and a polyurethane that is a polymer of an isocyanate with an acrylic resin containing a side chain having a hydroxyl group. | 08-02-2012 |
20130079460 | TRANSPARENT PROTECTIVE FILM - Provided is a transparent protective film having a self-repairability and a surface coefficient of kinetic friction with respect to copy paper which is measured based on JISK7125 (1999) of 0.7 or less and a transparent protective film having a self-repairability and a coefficient of kinetic friction of 0.4 or less when a sapphire needle is made to reciprocate on the surface under a certain load. | 03-28-2013 |
20130240793 | SURFACE PROTECTIVE FILM, TRANSFER MEMBER, IMAGE FORMING APPARATUS, AND METHOD FOR FORMING IMAGE - A surface protective film includes a self-healing urethane resin and a conductive powder. In the surface protective film, the content of the conductive powder is about 5 vol % or more and about 25 vol % or less relative to the volume of the urethane resin. | 09-19-2013 |
20130245195 | ELASTIC MEMBER, PROCESS CARTRIDGE AND IMAGE FORMING APPARATUS - There is provided an elastic member including a surface resin layer including a crosslinked product of a dimethyl silicone compound having a reactive group and a fluoroalkyl compound having a reactive group. | 09-19-2013 |
20140295139 | SURFACE PROTECTION FILM - A surface protection film contains a urethane resin formed by polymerizing an acrylic resin having a hydroxyl group at a side chain and an isocyanate, and has a Martens' hardness of 50 N/mm | 10-02-2014 |
20140296363 | SURFACE PROTECTIVE FILM - A surface protective film includes a structure in which a fluorine resin having a perfluoroalkylene ether structure in a main chain is crosslinking polymerized, wherein a storage elastic modulus E′ is in the range of 10 MPa to 1000 MPa at a temperature which is 40 K higher than a dynamic glass transition temperature Tg in dynamic viscoelasticity measurement at a measurement frequency of 10 Hz. | 10-02-2014 |