Patent application number | Description | Published |
20080242197 | Wafer polish monitoring method and device - The present invention aims to provide a wafer polish monitoring method and device for detecting the end point of the polishing of a conductive film with high precision and accuracy by monitoring the variation of the film thickness of the conductive film without adverse influence of slurry or the like after the film thickness of the conductive film decreases to an extremely small film thickness defined by the skin depth. To achieve this objective, the present invention provides a wafer polish monitoring method by which a high-frequency transmission path is formed in a portion facing the conductive film on the surface of the wafer, the polishing removal state of the conductive film is evaluated based at least on the transmitted electromagnetic waves passing through the high-frequency transmission path or the reflected electromagnetic waves that are reflected without passing through the high-frequency transmission path, and the end point of the polishing removal and the point equivalent to the end point of the polishing removal are detected. | 10-02-2008 |
20080290865 | Method of forecasting and detecting polishing endpoint and the device thereof and real time film thickness monitoring method and the device thereof - An object of the present invention is to provide a method of forecasting and detecting a polishing endpoint and the device thereof and a real time film thickness monitoring method and the device thereof capable of suppressing a Joule heat loss to the minimum due to an eddy current, and precisely forecasting and detecting the polishing endpoint, and moreover, precisely calculating a remaining film amount to be removed and a polishing rate and the like on the spot so as to be able to accurately evaluate whether the predetermined conductive film is appropriately removed. | 11-27-2008 |
20090061733 | Method and device for forecasting/detecting polishing end point and method and device for monitoring real-time film thickness - [Problem to be Solved] To provide a method and device for forecasting/detecting a polishing end point and a method and device for monitoring a real-time film thickness to suppress Joule heat loss due to the eddy current to the minimum, to precisely forecast/detect an polishing end point, to precisely calculate the remaining film thickness to be removed, polishing rate and the like on the spot, and to precisely evaluate whether the predetermined conductive film is appropriately removed | 03-05-2009 |
20090256558 | Film thickness measuring apparatus and film thickness measuring method - Coil is made to be disposed with gap opposed to the surface of wafer, and wafer stage is made to move in X and Y direction and R and θ direction. When supplying an alternating current to coil with the frequency swept by impedance analyzer, the magnetic field made to be induced in coil will operate on the conductive film of wafer. By changing a parameter (a frequency or an angle) influencing the skin effect of the conductive film and giving the parameter to coil, the state where a magnetic field is not made to penetrate relatively the film of wafer and the state where the magnetic field is made to penetrate relatively the film can be formed. From the variation of various values corresponding to the eddy current induced based on the change of state influenced by the skin effect of the conductive film, the film thickness of wafer can be measured with sufficient accuracy. | 10-15-2009 |
Patent application number | Description | Published |
20090271195 | SPEECH RECOGNITION APPARATUS, SPEECH RECOGNITION METHOD, AND SPEECH RECOGNITION PROGRAM - A speech recognition apparatus capable of attaining high recognition accuracy within practical processing time using a computing machine having standard performance by appropriately adapting a language model to a speech about a certain topic, irrespectively of a degree of detail and diversity of the topic and irrespectively of a confidence score of an initial speech recognition result is provided. The speech recognition apparatus includes hierarchical language model storage means for storing a plurality of language models structured hierarchically, text-model similarity calculation means for calculating a similarity between a tentative recognition result for an input speech and each of the language models, recognition result confidence score calculation means for calculating a confidence score of the recognition result, topic estimation means for selecting at least one of the language models based on the similarity, the confidence score, and a depth of a hierarchy to which each of the language models belongs, and topic adaptation means for mixing up the language models selected by the topic estimation means, and for creating one language model. | 10-29-2009 |
20090313017 | Language model update device, language Model update method, and language model update program - A framework in which a numerical value that represents a statistical appearance tendency of each of words in a language model is set with respect to the words not only as a constant, but also as an update function that changes in time, is included. The numerical value that represents the set statistical appearance tendency of a word is automatically updated in accordance with passage of time. A time information inputting section | 12-17-2009 |
20100292989 | SYMBOL INSERTION APPARATUS AND SYMBOL INSERTION METHOD - Enables symbol insertion evaluation in consideration of a difference in speaking style features between speakers. For a word sequence transcribing voice information, the symbol insertion likelihood calculation means | 11-18-2010 |
20110010175 | TEXT DATA PROCESSING APPARATUS, TEXT DATA PROCESSING METHOD, AND RECORDING MEDIUM STORING TEXT DATA PROCESSING PROGRAM - Provided is to a text data processing apparatus, method and program to add a symbol at an appropriate position. The apparatus according to this embodiment is a text data processing apparatus that executes edit of a symbol in input text, the apparatus including symbol edit determination means | 01-13-2011 |
20120035915 | LANGUAGE MODEL CREATION DEVICE, LANGUAGE MODEL CREATION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM - The present invention uses a language model creation device | 02-09-2012 |
20140074475 | SPEECH RECOGNITION RESULT SHAPING APPARATUS, SPEECH RECOGNITION RESULT SHAPING METHOD, AND NON-TRANSITORY STORAGE MEDIUM STORING PROGRAM - There is provided a speech recognition result forming apparatus ( | 03-13-2014 |