Patent application number | Description | Published |
20090190100 | IMAGE PROJECTION APPARATUS - An image projection apparatus that illuminates an image forming element arranged downstream of the image forming element and configured to form an original image by using light form a light source, and projects light from the image forming element onto a projected screen includes a housing having an inlet port with a dust removal filter, a fan configured to draw air into the housing through the inlet port, a duct configured to lead the air drawn from the inlet port into a space that contains the image forming element, and a chamber provided between the inlet port and the duct, wherein a sectional area of the chamber is larger in a direction orthogonal to an inflow direction of air into the duct at a connection part between the chamber and the duct than a sectional area of the connection part. | 07-30-2009 |
20090201468 | IMAGE DISPLAY APPARATUS - An image display apparatus includes a light source, a color separation unit configured to separate light from the light source into colored light beams, liquid crystal display devices each configured to modulate a corresponding one of the colored light beams in accordance with an image signal, light-shielding members each configured to block light that enters an area outside an effective display area of a corresponding one of the liquid crystal display devices, a color combination unit configured to combine the colored light beams that have been modulated by the liquid crystal display devices, and a projection unit configured to project light produced by combining the colored light beams with the color combination unit, wherein the liquid crystal display devices are fixed to a heatsink, and wherein the light-shielding members each include a base member fixed to the heatsink and a mask member detachably mounted on the base member. | 08-13-2009 |
20100091201 | OPTICAL MODULATION ELEMENT UNIT, PROJECTION OPTICAL UNIT, AND IMAGE PROJECTION APPARATUS - An optical modulation element unit is disclosed which employs a film-type optical function member and a reflective optical modulation element and allows dust prevention for the reflective optical modulation element while preventing an increased number of parts other than optically required parts. The optical modulation element unit includes a light-transmissive substrate, a film-type optical function member attached to the light-transmissive substrate, a reflective optical modulation element separately placed from the light-transmissive substrate, a cover member which surrounds a space between the light-transmissive substrate and the reflective optical modulation element, and a holding member which holds the light-transmissive substrate. The holding member has a guide portion which guides an air flow to a space along a surface of the light-transmissive substrate, the surface being a surface on the side opposite to the reflective optical modulation element. | 04-15-2010 |
20110279489 | IMAGE DISPLAY APPARATUS - An image display apparatus includes a light source, a color separation unit configured to separate light from the light source into colored light beams, liquid crystal display devices each configured to modulate a corresponding one of the colored light beams in accordance with an image signal, light-shielding members each configured to block light that enters an area outside an effective display area of a corresponding one of the liquid crystal display devices, a color combination unit configured to combine the colored light beams that have been modulated by the liquid crystal display devices, and a projection unit configured to project light produced by combining the colored light beams with the color combination unit, wherein the liquid crystal display devices are fixed to a heatsink, and wherein the light-shielding members each include a base member fixed to the heatsink and a mask member detachably mounted on the base member. | 11-17-2011 |
Patent application number | Description | Published |
20080293237 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING DUAL DAMASCENE PROCESS AND METHOD FOR MANUFACTURING ARTICLE HAVING COMMUNICATING HOLE - A method for manufacturing a semiconductor device is provided, in which the lengths of a wiring trench and a via hole in a depth direction are easily controlled. A component having a first insulating film is prepared on a substrate, and a layer is disposed on the above-described first insulating film. A mold having a pattern is imprinted on the above-described layer so as to form a second insulating film having a wiring trench and a first via, the pattern corresponding to the wiring trench and the first via. Thereafter, the above-described first insulating film is etched by using the above-described second insulating film as a mask so as to form a second via, which is connected to the first via, in the first insulating film. | 11-27-2008 |
20120178025 | CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING METHOD - The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens. | 07-12-2012 |
20120288799 | CHARGED-PARTICLE BEAM LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE - A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case. | 11-15-2012 |
20130216959 | CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD - A charged particle beam apparatus for processing an object using a charged particle beam includes a charged particle lens in which an array of apertures, through each of which a charged particle beam passes, is formed; a vacuum container which contains the charged particle lens; and a radiation source configured to generate an ionizing radiation; wherein the apparatus is configured to cause the radiation source to pass the ionizing radiation through the array of apertures in a state in which a pressure in the vacuum container is changing. | 08-22-2013 |
20140168628 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a first member in which an aperture, through which the charged particle beam passes, is formed, a chamber including a first space and a second space which are partitioned by the first member, and a removing device including a first supply device configured to supply a first gas containing unsaturated hydrocarbon to the first space and a second supply device configured to supply a second gas containing ozone to the second space, and configured to remove contamination on the first member by active species generated by reaction of the first gas with the second gas. | 06-19-2014 |
Patent application number | Description | Published |
20110310267 | IMAGE PROCESSING APPARATUS AND IMAGE PICKUP APPARATUS - The image processing apparatus includes an area dividing part that divides an input image produced by an image pickup system into plural image areas whose evaluation values are mutually different. The evaluation value is obtained by using a response function of the image pickup system. The apparatus further includes a processing part that performs image processing to produce an output image whose definition is higher than that of the input image by using the response functions different for the respective image areas. | 12-22-2011 |
20130308007 | IMAGE PROCESSING APPARATUS, IMAGE PICKUP APPARATUS, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING PROGRAM - An image processing apparatus that blurs a picked-up image based on distance information on a subject, comprises a restoration kernel acquisition section that acquires a restoration kernel as a kernel for eliminating degradation of an image; a blur kernel acquisition section that acquires a blur kernel as a kernel for blurring the image; a compound kernel acquisition section that acquires a compound kernel obtained by merging the restoration kernel with the blur kernel; and an image processing section that eliminates the degradation of the picked-up image and blurs the picked-up image by using the compound kernel. | 11-21-2013 |
20140104458 | IMAGE PROCESSING APPARATUS, IMAGE PICKUP APPARATUS, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING PROGRAM - An image processing apparatus | 04-17-2014 |
20140211045 | IMAGE PROCESSING APPARATUS AND IMAGE PICKUP APPARATUS - An image processing apparatus has: a depth map acquiring unit configured to acquire a depth map that records information indicating a depth distance corresponding to each point on a photographed image; an in-focus position acquiring unit configured to acquire an in-focus position on the photographed image; a reference distance determining unit configured to acquire a depth distance corresponding to the in-focus position from the depth map and sets the acquired depth distance as a reference distance; and an image processing unit configured to perform image processing on the photographed image by using the depth map and the reference distance. | 07-31-2014 |
20150043808 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND IMAGING APPARATUS - An image processing apparatus comprising: an image acquisition unit configured to acquire an image; a depth map acquisition unit configured to acquire a depth map corresponding to the image; a refinement unit configured to detect a saliency region from the image and to refine the depth map on the basis of the saliency region, the saliency region being a region on which a person tends to focus; and an image processing unit configured to apply image processing to the image using the depth map refined by the refinement unit. | 02-12-2015 |
20150054986 | IMAGE PROCESSING APPARATUS, IMAGING APPARATUS, AND IMAGE PROCESSING METHOD - An image processing apparatus for adding a blur to an image in use of depth information corresponding to the image, comprising: a conversion unit configured to convert the depth information into blur size information; a division unit configured to divide the image into a plurality image areas having a same blur size; an image generation unit configured to perform blur processing on each of the plurality of image areas with the blur size to generate blurred images; and a synthesizing unit configured to synthesize the plurality of blurred images generated by the image generation unit. | 02-26-2015 |
20150116464 | IMAGE PROCESSING APPARATUS AND IMAGE CAPTURING APPARATUS - An image processing apparatus includes: an acquisition unit configured to acquire captured image data and depth map data representing a distribution of depth information of an object acquired from the captured image data; a reduction unit configured to reduce the captured image data acquired by the acquisition unit in accordance with a data amount of the depth map data; and a correction unit configured to correct the depth map data by using the reduced captured image data. | 04-30-2015 |
20150116546 | IMAGE PROCESSING APPARATUS, IMAGING APPARATUS, AND IMAGE PROCESSING METHOD - An image processing apparatus according to an embodiment of the present invention which performs blurring processing on captured image data based on distance information of a subject includes a dividing unit configured to divide the captured image data into a plurality of image data pieces corresponding to pieces of the distance information different from each other, a generating unit configured to generate a plurality of blurred image data pieces by performing blurring processing on the plurality of divided image data pieces including an occlusion region, and a synthesizing unit configured to synthesize the plurality of blurred image data pieces. | 04-30-2015 |
Patent application number | Description | Published |
20120056350 | ORIGINAL AND ARTICLE MANUFACTURING METHOD USING SAME - The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate. | 03-08-2012 |
20130037981 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus that molds an imprint material on a substrate using a mold, and forms a pattern on the substrate, the imprint apparatus includes a mold holding unit configured to hold the mold, which includes a surface including a pattern area, a substrate holding unit configured to hold the substrate, a first acquisition unit configured to acquire information concerning a difference in shape between the pattern area and a shot already formed on the substrate, and a control unit configured to control at least one of the mold holding unit and the substrate holding unit to adjust a spacing between the mold and the substrate, based on the information concerning the difference in shape acquired by the first acquisition unit, in a state where the pattern area and the imprint material are in contact with each other. | 02-14-2013 |
20130093113 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME - An imprint apparatus transfers a pattern formed on a mold to a resin on a substrate. The imprint apparatus includes a shape correction mechanism configured to apply a force to the mold to thereby deform a pattern region formed on the mold; a heating mechanism configured to heat a substrate-side pattern region formed on the substrate to thereby deform the substrate-side pattern region; and a control unit configured to obtain information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and control the shape correction mechanism and the wafer heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information. | 04-18-2013 |
20130300031 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process in which a resin on a substrate is cured while a mold having a pattern formed thereon is pressed against the resin to transfer the pattern onto the substrate, the apparatus comprising a changing unit which includes a contact member having a contact surface that comes into contact with a side surface of the mold, and is configured to apply a force to the side surface of the mold through the contact member to change a shape of the pattern formed on the mold, and an adjusting unit configured to change at least one of an angle and a position of the contact member to adjust a contact state between the contact surface and the side surface of the mold. | 11-14-2013 |
20140054823 | ORIGINAL AND ARTICLE MANUFACTURING METHOD USING SAME - The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate. | 02-27-2014 |
20140138875 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus molds and cures an imprint material on a substrate using a mold to thereby form a pattern on the substrate. The apparatus includes a first drive mechanism configured to apply a force in a planar direction of the mold and change the planar shape of the pattern portion formed in the mold, and a second drive mechanism configured to deform the mold about an axis (for example, the Y axis) that is orthogonal to the pressing direction of the mold and the uncured resin (for example, the Z axis) and a direction of the force applied by the first drive mechanism (for example, the X axis). | 05-22-2014 |
20150123313 | IMPRINT APPARATUS, IMPRINTING MOLD, AND METHOD OF MANUFACTURING ARTICLE - An imprint apparatus for forming a pattern on a substrate by contacting an imprint material on the substrate with a mold includes a mold holding member configured to hold the mold and a mold deforming mechanism for applying a force to a side surface of the mold in a direction along a pattern face of the mold in which the pattern is formed in order to deform the pattern formed in the mold held by the mold holding member. The mold deforming mechanism includes a contact portion to contact with the side surface of the mold to press against the side surface. The contact portion is shaped such that a dimension of part of the contact portion to contact with the side surface of the mold is less than a dimension of part of the contact portion away from the side surface of the mold. | 05-07-2015 |