Patent application number | Description | Published |
20130073327 | URBAN TRANSPORTATION SYSTEM AND METHOD - A transportation system and a method for operating the transportation system are provided. The transportation system provides a flexible, on-demand, and door-to-door transportation service to improve the accessibility of an existing public transit system. The transportation system may be operated by or in conjunction with the transit system and is uniquely different from either taxi, shuttle, or bus service. A vehicle of the transportation system transports a passenger between a pickup location and a predetermined node in response to a service request initiated by the passenger according to instructions that are dynamically determined in real time in consideration of the pickup location, a current location of the vehicle, and a predetermined travel time between the pickup location and the node. | 03-21-2013 |
20150012320 | ROAMING TRANSPORT DISTRIBUTION MANAGEMENT SYSTEM - A roaming transport distribution management apparatus and method are provided. A controller selects transports within a defined service zone in response to customer transit requests from customer locations or a central hub which are capable of meeting maximum transit time to the end destination in either an inbound or outbound direction from the hub. A hub manager varies the position and/or the size of an exclusive coverage area of each transport within the overall service zone to insure a dense accumulation of transports over the entire service zone and alters the position of other transports in response to the movement of a transport inbound or outbound from the hub with a passenger. The hub manager can vary the size of the exclusive coverage area of each transport to account for population and request call densities and the number of available transports. | 01-08-2015 |
20150227871 | ROAMING TRANSPORT DISTRUCTION MANAGEMENT SYSTEM - A roaming transport distribution management apparatus and method are provided. A controller selects transports within a defined service zone in response to customer transit requests from customer locations for customer pick-up and delivery inbound or outbound directions from the hub. A hub manager varies the position and/or the size of an exclusive coverage area of each transport within the overall service zone to insure a dense accumulation of transports over the entire service zone and alters the position of other transports in response to the movement of a transport inbound or outbound from the hub with a passenger. The hub manager can vary the size of the exclusive coverage area of each transport to account for population and request call densities and the number of available transports. In addition, the transport system may be used to transport goods from a delivery source to a customer designated location within the service zone as well as coupling the goods with the customer at a central hub when the customer arrives at the central hub. | 08-13-2015 |
Patent application number | Description | Published |
20100132889 | ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH - A method for etching an ultra high aspect ratio feature in a dielectric layer through a carbon based mask is provided. The dielectric layer is selectively etched with respect to the carbon based mask, wherein the selective etching provides a net deposition of a fluorocarbon based polymer on the carbon based mask. The selective etch is stopped. The fluorocarbon polymer is selectively removed with respect to the carbon based mask, so that the carbon based mask remains, using a trimming. The selectively removing the fluorocarbon polymer is stopped. The dielectric layer is again selectively etched with respect to the carbon based mask, wherein the second selectively etching provides a net deposition of a fluorocarbon based polymer on the carbon based mask. | 06-03-2010 |
20100273332 | METHOD AND APPARATUS FOR HIGH ASPECT RATIO DIELECTRIC ETCH - An apparatus for etching high aspect ratio features is provided. A plasma processing chamber is provided, comprising a chamber wall forming a plasma processing chamber enclosure, a lower electrode, an upper electrode, a gas inlet, and a gas outlet. A high frequency radio frequency (RF) power source is electrically connected to at least one of the upper electrode or lower electrode. A bias power system is electrically connected to both the upper electrode and the lower electrode, wherein the bias power system is able to provide a bias to the upper and lower electrodes with a magnitude of at least 500 volts, and wherein the bias to the lower electrode is pulsed to intermittently. A gas source is in fluid connection with the gas inlet. A controller is controllably connected to the gas source, the high frequency RF power source, and the bias power system. | 10-28-2010 |
20110021030 | REDUCING TWISTING IN ULTRA-HIGH ASPECT RATIO DIELECTRIC ETCH - An apparatus for etching a dielectric layer contained by a substrate is provided. An etch reactor comprises a top electrode and a bottom electrode. An etch gas source supplies an etch gas into the etch reactor. A first Radio Frequency (RF) source generates a first RF power with a first frequency and supplies the first RF power into the etch reactor, whereas the first frequency is between 100 kilo Hertz (kHz) and 600 kHz. A second RF source generates a second RF power with a second frequency and supplies the second RF power into the etch reactor, whereas the second frequency is at least 10 mega Hertz (MHz). | 01-27-2011 |
20130264201 | METHOD AND APPARATUS FOR HIGH ASPECT RATIO DIELECTRIC ETCH - An apparatus for etching high aspect ratio features is provided. A plasma processing chamber is provided, comprising a chamber wall forming a plasma processing chamber enclosure, a lower electrode, an upper electrode, a gas inlet, and a gas outlet. A high frequency radio frequency (RF) power source is electrically connected to at least one of the upper electrode or lower electrode. A bias power system is electrically connected to both the upper electrode and the lower electrode, wherein the bias power system is able to provide a bias to the upper and lower electrodes with a magnitude of at least 500 volts, and wherein the bias to the lower electrode is pulsed to intermittently. A gas source is in fluid connection with the gas inlet. A controller is controllably connected to the gas source, the high frequency RF power source, and the bias power system. | 10-10-2013 |