Patent application number | Description | Published |
20090244506 | SLM Calibration - Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals. | 10-01-2009 |
20100284064 | GRATING FOR EUV-RADIATION, METHOD FOR MANUFACTURING THE GRATING AND WAVEFRONT MEASUREMENT SYSTEM - A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees. | 11-11-2010 |
20110194096 | LIQUID FILLED LENS ELEMENT, LITHOGRAPHIC APPARATUS COMPRISING SUCH AN ELEMENT AND DEVICE MANUFACTURING METHOD - A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane. | 08-11-2011 |
20120057143 | Illumination System for Use in a Stereolithography Apparatus - The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body. | 03-08-2012 |
20120063131 | Illumination System for Use in a Stereolithography Apparatus - The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size. | 03-15-2012 |
Patent application number | Description | Published |
20100128241 | LITHOGRAPHIC APPARATUS PROVIDED WITH A SWAP BRIDGE - A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement. | 05-27-2010 |
20110096305 | SHUTTER MEMBER, A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed. | 04-28-2011 |