Patent application number | Description | Published |
20100003010 | IMAGING APPARATUS AND METHOD TO CONTROL THE SAME - An imaging apparatus and a method to control the same are provided. When a captured image is recorded (or stored), a category of the image is obtained according to a feature of the image, and a file of the image assigned a file name determined based on the category is created and stored, thereby enabling more convenient classification of a large number of images. To accomplish this, the method to control an imaging apparatus includes obtaining an image and recording the image assigned a file name determined based on a category of the image. | 01-07-2010 |
20100015920 | APPARATUS AND METHOD FOR CONTROLLING QUALITY OF SERVICE OF MASTER BLUETOOTH TERMINAL IN PICONET - An apparatus for controlling Quality of Service (QoS) of a master Bluetooth® terminal in a piconet. A file-specific band setting unit sets information about files and information about bandwidths set for the files, which are stored in the master Bluetooth® terminal, for a content meta database. A QoS controller checks the content meta database when an arbitrary slave Bluetooth® terminal requests file download service, and provides the set bandwidth information of the corresponding file. A balancing Bluetooth® Network Encapsulation Protocol (BNEP) creates a virtual interface when the slave Bluetooth® terminal is accessed, and sets a bandwidth of the virtual interface, which is set for the slave Bluetooth® terminal requesting the download service, to a bandwidth of the corresponding file when the set bandwidth information of the file for which the download service is requested is received from the QoS controller, and provides the download service to the slave Bluetooth® terminal. | 01-21-2010 |
20100128139 | IMAGE EDITING METHOD AND AN IMAGE EDITING APPARATUS USING THE SAME - An image editing method and an image editing apparatus include dividing an entire image, generating representative images, and generating edited images. Accordingly, a user may edit photographed images, recorded images or reproduced images more easily and conveniently. | 05-27-2010 |
20100149356 | DISPLAY METHOD AND PHOTOGRAPHING APPARATUS AND DISPLAY APPARATUS USING THE SAME - A display method and a photographing apparatus and display apparatus using the display method include displaying a photographed image and received images, and changing a mode of one of the images when a display area of one of the images is changed. Therefore, it is possible to view or record one or more images photographed by one or more external photographing apparatuses in real-time. | 06-17-2010 |
20100171863 | METHOD TO ENLARGE AND CHANGE DISPLAYED IMAGE AND PHOTOGRAPHING APPARATUS USING THE SAME - A method to enlarge and change an image displayed by a photographing apparatus, and a photographing apparatus using the same. The enlargement method includes adding guide information regarding a zoom-in area and compensating the guide information based on the zoom-in command. | 07-08-2010 |
20100271485 | IMAGE PHOTOGRAPHING APPARATUS AND METHOD OF CONTROLLING THE SAME - A method of controlling an image photographing apparatus to track a subject using a non-viewable pixel region of an image sensor includes detecting a motion vector of a subject when a moving image is photographed, determining whether a non-viewable pixel region of an image sensor is present in the direction of the detected motion vector of the subject, and moving a photographing region to the non-viewable pixel region so as to track the motion of the subject. Accordingly, the moving subject may be tracked within a range of a predetermined Field of View (FOV) of the image photographing apparatus without an additional hardware system. | 10-28-2010 |
20100296806 | IMAGE PHOTOGRAPHING APPARATUS AND METHOD OF CONTROLLING THE SAME - A method of controlling an image photographing apparatus includes checking a photographing mode of the image photographing apparatus, displaying a characteristic curve indicating a relationship between photographing conditions and a recommended region if the checked photographing mode is a manual mode to manually adjust the photographing conditions, and changing the photographing conditions if a user specifies any point of the characteristic curve or the periphery of the characteristic curve. Accordingly, it may be possible to implement the user interface which is conveniently and easily controlled. | 11-25-2010 |
20120156867 | METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming a gate structure through a first insulating interlayer on a substrate such that the gate structure includes a spacer on a sidewall thereof, forming a first hard mask on the gate structure, partially removing the first insulating interlayer using the first hard mask as an etching mask to form a first contact hole such that the first contact hole exposes a top surface of the substrate, forming a metal silicide pattern on the top surface of the substrate exposed by the first contact hole, and forming a plug electrically connected to the metal silicide pattern. | 06-21-2012 |
20120169914 | METHOD TO ENLARGE AND CHANGE DISPLAYED IMAGE AND PHOTOGRAPHING APPARATUS USING THE SAME - A method to enlarge and change an image displayed by a photographing apparatus, and a photographing apparatus using the same. The enlargement method includes adding guide information regarding a zoom-in area and compensating the guide information based on the zoom-in command. | 07-05-2012 |
20120322224 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE - In a method of fabricating a semiconductor device, a target layer and a first material layer are sequentially formed on a substrate. A plurality of second material layer patterns are formed on the first material layer, the second material layer patterns extending in a first horizontal direction. A plurality of hardmask patterns extending in a second horizontal direction are formed on the plurality of second material layer patterns and the first material layer, wherein the second horizontal direction is different from the first horizontal direction. A first material layer pattern is formed by etching the first material layer using the plurality of hardmask patterns and the plurality of second material layer patterns as etch masks. A target layer pattern with a plurality of holes is formed by etching the target layer using the first material layer pattern as an etch mask. | 12-20-2012 |
20140264672 | MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME - In a method of an MRAM device, first and second patterns are formed on a substrate alternately and repeatedly in a second direction. Each first pattern and each second pattern extend in a first direction perpendicular to the second direction. Some of the second patterns are removed to form first openings extending in the first direction. Source lines filling the first openings are formed. A mask is formed on the first and second patterns and the source lines. The mask includes second openings in the first direction, each of which extends in the second direction. Portions of the second patterns exposed by the second openings are removed to form third openings. Third patterns filling the third openings are formed. The second patterns surrounded by the first and third patterns are removed to form fourth openings. Contact plugs filling the fourth openings are formed. | 09-18-2014 |
20150076616 | SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes forming a gate structure through a first insulating interlayer on a substrate such that the gate structure includes a spacer on a sidewall thereof, forming a first hard mask on the gate structure, partially removing the first insulating interlayer using the first hard mask as an etching mask to form a first contact hole such that the first contact hole exposes a top surface of the substrate, forming a metal silicide pattern on the top surface of the substrate exposed by the first contact hole, and forming a plug electrically connected to the metal silicide pattern. | 03-19-2015 |
Patent application number | Description | Published |
20120258289 | METHOD OF FABRICATING NANOSTRUCTURE ARRAY AND DEVICE INCLUDING NANOSTRUCTURE ARRAY - Provided are a method of fabricating a nanostructure array and a device including the nanostructure array. Nanoscale patterning is caused at an interface of a resist layer by light passed through a focusing layer. By such nanoscale patterning, a nanostructure array is fabricated on a substrate in various ways. As the focusing layer, an array of beads or lenses is used, and a pattern of the resist layer may include a nanoscale pore-opening and an undercut structure connected to a lower portion of the opening. The method facilitates adjustment of the size and shape of nanostructures and the interval between the nanostructures. Also, performance of the device including the nanostructure array can be improved. In particular, the method and device result in a sensor having improved sensitivity and reliability optimized for an environment and purpose to be used. | 10-11-2012 |
20130120752 | FIBER-OPTIC SURFACE PLASMON RESONANCE SENSOR AND SENSING METHOD USING THE SAME - A fiber-optic surface plasmon resonance sensor may include an optical fiber and a surface plasmon excitation layer. The optical fiber may include a core, a cladding surrounding the core, and a depression. The surface plasmon excitation layer may include a first excitation layer, a second excitation layer and an optical waveguide layer between the first excitation layer and the second excitation layer. Incident light incident through the core may be coupled to the surface plasmon excitation layer at a specific angle of incidence and wavelength satisfying the surface plasmon resonance condition. Depending on the polarizing direction of the incident light, an s-polarized component may be coupled to the guided-wave mode in the optical waveguide layer constituting the surface plasmon excitation layer. | 05-16-2013 |
20130168789 | LOCALIZED SURFACE PLASMON RESONANCE SENSOR USING CHALCOGENIDE MATERIALS AND METHOD FOR MANUFACTURING THE SAME - A localized surface plasmon resonance sensor may include a localized surface plasmon excitation layer including a chalcogenide material. The chalcogenide material may include: a first material including at least one of selenium (Se) and tellurium (Te); and a second material including at least one of germanium (Ge) and antimony (Sb). The localized surface plasmon excitation layer may be prepared by forming a thin film including the chalcogenide material and crystallizing the thin film to have a predetermined pattern by irradiating laser on the thin film. | 07-04-2013 |
20150327724 | CYLINDRICAL COOKER - A cylindrical cooker is provided. The cooker includes: a cooking pan; a housing; one or more supports; and a cooking pan cover. The cooking pan includes a protrusion part extended upwardly from the bottom surface at the center, forming cooking space between the inner wall of the cooking pan and the protrusion part. The protrusion part includes a force transfer unit. The housing is shaped to be open at the top. The housing includes: a rotation shaft for transmitting rotational force from a motor to the force transfer unit; a heater for heating the inside surface of the protrusion part or the outer sidewall of the cooking pan and a cooking pan receiving part for receiving the cooking pan. The supports support the cooker from the floor at an angle between the floor and the cooker when it is laid down. The cooking pan cover includes a locking unit. | 11-19-2015 |
Patent application number | Description | Published |
20150321314 | NOZZLE, DEVICE, AND METHOD FOR HIGH-SPEED GENERATION OF UNIFORM NANOPARTICLES - A nozzle, a device, and a method for high-speed generation of uniform nanoparticles allow a particle generation gas formed of carbon dioxide to pass through the nozzle, thereby forming uniform nanoparticles at high speed. An orifice that adjusts an opening and closing cross-sectional area of a throat of the nozzle is provided to cause uniform nuclei generation without an additional cooling device, a dilating portion that has a cross-sectional area and a dilation angle increasing toward an outlet side of the nozzle is provided to grow the nuclei through a first dilation portion (having a relatively gradual dilation angle) and thus cause particle generation, and the generated particles are accelerated through a second dilating portion that has a steeper dilation angle than the first dilating portion. | 11-12-2015 |
20150323252 | METHOD FOR REMOVING LIQUID MEMBRANE USING HIGH-SPEED PARTICLE BEAM - A method for removing a liquid membrane using a high-speed particle beam includes a wet washing step of washing an object by using a washing solution, and a dry washing step of simultaneously removing the washing solution remaining on the object and pollutants or foreign substances in the washing solution by spraying sublimation particles. | 11-12-2015 |
20150325429 | DRY SEPARATION APPARATUS, NOZZLE FOR GENERATING HIGH-SPEED PARTICLE BEAM FOR DRY SEPARATION, AND DRY SEPARATION METHOD USING HIGH-SPEED PARTICLE BEAM - A dry separation method is a dry separation method for ashing a photoresist, including a spraying and separating step of spraying sublimation particles on the photoresist and separating the photoresist. A dry separation apparatus is a dry separation apparatus for ashing a photoresist, including a nozzle for generating a high-speed particle beam that includes sublimation particles. The nozzle generates ultra-high speed uniform nanoparticles by passing therethrough a particle generation gas including carbon dioxide, and includes an expanding portion having a shape so that the cross sectional area thereof becomes wider toward a discharge side of the nozzle. The expanding portion sequentially includes a first expanding portion and a second expanding portion, and an average expansion angle of the second expanding portion is bigger than an expansion angle of the first expanding portion. | 11-12-2015 |