Patent application number | Description | Published |
20090049268 | PORTABLE STORAGE DEVICE AND METHOD OF MANAGING RESOURCE OF THE PORTABLE STORAGE DEVICE - Provided are a portable storage device and a method of managing a resource of the portable storage device. The method includes converting a first DRM application into a ready status from an idle status if task processing of the first DRM application is required, and converting the first DRM application into a pending status and a second DRM application into the ready status from the idle status if task processing of the second DRM application is required. | 02-19-2009 |
20090300372 | SOLID STATE DISK AND INPUT/OUTPUT METHOD - Disclosed is a solid state disk including a storage unit configured to store data, and a control part configured to control enciphering and writing operation for the data using a key value and an initialization vector. The initialization vector is generated by processing an address corresponding to the data. | 12-03-2009 |
20090316899 | ENCRYPTION/DECRYPTION DEVICE AND SECURITY STORAGE DEVICE - Provided are an encryption/decryption device and a security storage device including same. The encryption/decryption device includes a first enc/decrypter, a second enc/decrypter, a controller configured to provide a plurality of control signals in response to a setting signal, and a path selection circuit configured to connect the first enc/decrypter and the second enc/decrypter in either a series arrangement or a parallel arrangement in response to a first control signal among the plurality of control signals. | 12-24-2009 |
20100211801 | DATA STORAGE DEVICE AND DATA MANAGEMENT METHOD THEREOF - Provided is a data storage device including: a storage medium that stores a first type of cipher text; and a storage controller that forms the first type of cipher text by scattering a second type of cipher text in a plurality of random numbers and that transfers the first type of cipher text to the storage medium through an internal bus or an external bus. | 08-19-2010 |
20150227755 | ENCRYPTION AND DECRYPTION METHODS OF A MOBILE STORAGE ON A FILE-BY-FILE BASIS - A method for operating a system including a memory device and a host is provided. The method includes requesting, by the host, the memory device to transmit a context ID list including context IDs, assigning, by the host, a context ID among the context IDs to an application based on the context ID list received from the memory device, and transmitting, by the host, the context ID assigned to the application to the memory device when the host transmits a file corresponding to the application to the memory device or receives the file from the memory device. | 08-13-2015 |
Patent application number | Description | Published |
20090041951 | MAGNETIC ENHANCEMENT FOR MECHANICAL CONFINEMENT OF PLASMA - A method for processing a substrate is provided. The substrate is placed in a process chamber. A gas is provided from a gas source to the process chamber. A plasma is generated from the gas in the process chamber. The gas flows through a gap adjacent to at least one confinement ring to provide physical confinement of the plasma. Magnetic confinement of the plasma is provided to enhance the physical confinement of the plasma. | 02-12-2009 |
20090121324 | ETCH WITH STRIATION CONTROL - A method for etching a feature in an etch layer is provided. A patterned photoresist mask is formed over the etch layer with photoresist features with sidewalls wherein the sidewalls of the photoresist features have striations forming peaks and valleys. The striations of the sidewalls of the photoresist features are reduced. The reducing the striations comprises at least one cycle, wherein each cycle comprises etching back peaks formed by the striations of the sidewalls of the photoresist features and depositing on the sidewalls of the photoresist features. Features are etched into the etch layer through the photoresist features. The photoresist mask is removed. | 05-14-2009 |
20090286400 | PLASMA PROCESS WITH PHOTORESIST MASK PRETREATMENT - A method for etching features in a dielectric layer through a photoresist (PR) mask is provided. The PR mask is patterned using laser light having a wavelength not more than 193 nm. The PR mask is pre-treated with a noble gas plasma, and then a plurality of cycles of a plasma process is provided. Each cycle includes a deposition phase that deposits a deposition layer over the PR mask, the deposition layer covering a top and sidewalls of mask features of the PR mask, and a shaping phase that shapes the deposition layer deposited over the PR mask. | 11-19-2009 |
20100068885 | SIDEWALL FORMING PROCESSES - An etch layer underlying a patterned photoresist mask is provided. A plurality of sidewall forming processes are performed. Each sidewall forming process comprises depositing a protective layer on the patterned photoresist mask by performing multiple cyclical depositions. Each cyclical deposition involves at least a depositing phase for depositing a deposition layer over surfaces of the patterned photoresist mask and a profile shaping phase for shaping vertical surfaces in the deposition layer. Each sidewall forming process further comprises a breakthrough etch for selectively etching horizontal surfaces of the protective layer with respect to vertical surfaces of the protective layer. Afterwards, the etch layer is etched to form a feature having a critical dimension that is less than the critical dimension of the features in the patterned photoresist mask. | 03-18-2010 |
Patent application number | Description | Published |
20120128524 | STEEL WIRE ROD HAVING EXCELLENT COLD HEADING QUALITY AND HYDROGEN DELAYED FRACTURE RESISTANCE, METHOD OF MANUFACTURING THE SAME, AND MEHOD OF MANUFACTURING BOLT USING THE SAME - Provided are a high-strength, high-manganese steel wire rod having excellent cold heading quality and not requiring spheroidizing and quenching-tempering treatments during manufacturing a bolt and a method of manufacturing a bolt using the steel wire rod. The method of manufacturing a steel wire rod includes heating a steel containing 12 to 25 wt % of Mn within a temperature range of 1100° C. to 1250° C., hot rolling the heated steel within a temperature range of 700° C. to 1100° C., and cooling the hot rolled steel to a temperature of 200° C. or less and cold caliber rolling or drawing to manufacture a steel wire rod. | 05-24-2012 |
20150267285 | Low-Alloy Duplex Stainless Steel Having Outstanding Corrosion Resistance and Hot Working Properties - Provided is a lean duplex stainless steel used in industrial facilities including fresh water, pulp and paper making, chemical and construction facilities. The lean duplex stainless steel comprises, in weight percentage (%), C: over 0 to 0.06 or less, Si: over 0 to 1.5% or less, Mn: over 0 to 2% or less, Cr: 19 to 23%, Ni: 1.8 to 3.5%, Mo: 0.5 to 1.0%, Cu: 0.3 to 1.0%, N: 0.16 to 0.30%, Al: 0.003 to 0.05%, B: 0.001 to 0.005% and Ca: 0.001 to 0.01%. In the stainless steel, the content of O of the stainless steel is 0.01% or less. The stainless steel comprises Fe and other unavoidable impurities as remnants. | 09-24-2015 |