Yong Kook
Yong Kook Kim, Seoul KR
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20090252007 | Method and apparatus for recording management information on a recording medium and the recording medium - The write-once recording medium has a data structure for managing temporary defect management areas, TDMAs, of the recording medium, where each TDMA is for at least storing temporary defect management information. In one embodiment, the recording medium includes a TDMA access indicator, TAI, area for selectively storing data indicating which one of the TDMAs is currently in use. | 10-08-2009 |
20110311081 | MEMS MICROPHONE AND MANUFACTURING METHOD THEREOF - A micro electro mechanical system (MEMS) microphone capable of preventing a membrane and a back plate from being contacting each other by an overvoltage, an external shock, and the like, and a method of manufacturing the MEMS microphone. The MEMS microphone includes a silicon substrate in which a back chamber is to be formed; a back plate which is formed on the silicon substrate and has formed therein a plurality of sound holes; a membrane which is formed on the silicon substrate at a predetermined distance apart from the back plate to form an air gap; and a contact-preventing electrode unit which is formed on the silicon substrate and applies a repulsive force to the membrane. | 12-22-2011 |
20110316100 | MEMS MICROPHONE AND METHOD FOR MANUFACTURING SAME - A micro electro mechanical systems (MEMS) microphone, and a method of manufacturing the MEMS microphone having an interval between a membrane and a back plate, the interval being correctly adjusted by forming the membrane and the back plate after an air-gap forming portion on a silicon substrate. Since the membrane and/or the back plate are/is formed by electroless plating, a sacrificial layer is easily planarized, and a residual stress is easily removed or controlled. The MEMS microphone includes a silicon substrate in which a back chamber is formed and on which an air-gap forming portion is formed above the chamber by etching the silicon substrate to a predetermined depth above the chamber; a membrane formed on the air-gap forming portion of the silicon substrate or the silicon substrate; and a back plate that is formed on the air-gap forming portion or the silicon substrate so as to be spaced apart from the membrane, wherein an air gap is formed between the membrane and the back plate. | 12-29-2011 |
Yong Kook Kim, Uiwang-Si KR
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20120168780 | RESIN FOR TRANSPARENT ENCAPSULATION MATERIAL, AND ASSOCIATED ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE - A resin for an encapsulation material includes a first polysiloxane including hydrogen bound to silicon (Si—H) at its terminal end, and a second polysiloxane including an alkenyl group bound to silicon (Si-Vi) at its terminal end, wherein a ratio (Si—H/Si-Vi) of hydrogen bound to silicon (Si—H) in the first polysiloxane to the alkenyl group bound to silicon (Si-Vi) in the second polysiloxane is about 1 to about 1. | 07-05-2012 |
20120168815 | ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE PREPARED USING THE SAME - An encapsulation material and an electronic device, the encapsulation material including a resin, the resin including a first polysiloxane including hydrogen bonded with silicon (Si—H) at a terminal end thereof, and a second polysiloxane including an alkenyl group bonded with silicon (Si-Vi) at a terminal end thereof, a phosphor, and a density controlling agent, wherein a weight ratio of the density controlling agent to the phosphor is about 1.5:1 to about 10:1. | 07-05-2012 |
20140357792 | RESIN FOR TRANSPARENT ENCAPSULATION MATERIAL, AND ASSOCIATED ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE - A resin for an encapsulation material includes a first polysiloxane including hydrogen bound to silicon (Si—H) at its terminal end, and a second polysiloxane including an alkenyl group bound to silicon (Si-Vi) at its terminal end, wherein a ratio (Si—H/Si-Vi) of hydrogen bound to silicon (Si—H) in the first polysiloxane to the alkenyl group bound to silicon (Si-Vi) in the second polysiloxane is about 1 to about 1. | 12-04-2014 |
Yong Kook Park, Anyang-Si KR
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20120085171 | DEVICE FOR MEASURING SPEED OF MATERIAL - A device for measuring a speed of a material includes a body unit disposed at an exit side of a rolling stand and placed below a material which is transferred from the rolling stand; and a speed measuring unit installed on the body unit and constructed to measure a speed of the material transferred from the rolling stand. | 04-12-2012 |
20120128027 | APPARATUS AND METHOD FOR MEASURING THE TEMPERATURE OF A MATERIAL - An apparatus for measuring a temperature of a material includes a body unit disposed on an exit side of a heating furnace; a temperature measuring unit installed on the body unit and constructed to measure a temperature of a material which is extracted from the heating furnace; a foreign substance removing unit installed on the body unit and constructed to inject a fluid toward the material so as to remove foreign substances adhered to the material; and a moving unit installed on the body unit and constructed to move the temperature measuring unit. | 05-24-2012 |
Yong-Kook Jung, Daejeon KR
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20140275425 | VINYL CHLORIDE-BASED COPOLYMER RESIN AND A METHOD OF PREPARING THE SAME - The present invention relates to an inner-plasticized vinyl chloride-based copolymer resin not requiring plasticizers and a preparation method thereof. Specifically, the vinyl chloride-based copolymer resin is prepared by a suspension polymerization method of initiating the polymerization of vinyl chloride monomer, feeding a certain amount of butyl acrylate continuously or discontinuously thereinto and carrying out the additional polymerization at the temperature higher than the polymerization initiation temperature so as to prepare a core-shell type vinyl chloride-based random copolymer resin. | 09-18-2014 |
Yong-Kook Kim, Gyeonggi-Do KR
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20100112641 | PROCESS FOR PRODUCING AND PURIFYING FACTOR VIII AND ITS DERIVATIVES - Disclosed is a method for producing proteins having factor VIII procoagulant activity in serum-free medium by in vitro culturing of mammalian cells, wherein the serum-free medium contains an inhibitor against the protease released from cultured cells. In accordance with this invention, the inhibitor can protect the cleavage of a target protein during cultivation and increase homogeneity of a target molecule, wherein the inhibitor can be a dextran sulfate. This invention also relates to a method of purifying target molecules from the culture medium containing both a target molecule and selected inhibitors by affinity chromatography. | 05-06-2010 |
Yong-Kook Kim, Suwon-Si, Gyeonggi-Do KR
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20150322096 | SILOXANE MONOMER, ENCAPSULANT COMPOSITION, ENCAPSULANT AND ELECTRONIC DEVICE - A siloxane monomer obtained from a compound represented by Chemical Formula 1 and a compound represented by Chemical Formula 2, an encapsulant composition including the siloxane monomer, an encapsulant obtained by curing the encapsulant composition, and an electronic device including the encapsulant are disclosed. | 11-12-2015 |
Yong-Kook Park, Anyang-Sii KR
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20160038984 | APPARATUS FOR CONTROLLING CAMBER AND METHOD FOR SAME - Provided is a camber control apparatus and method capable of reducing camber of a slab sizing press (SSP). The camber control apparatus and method may calculates a camber amount through an imaging process and differently set zeroing of anvils at a work side and a drive side, thereby reducing camber. Thus, the camber control apparatus and method can reduce quality defects such as telescope, twist, wave, and roll mark, increase the lifetime of equipment by reducing a variation in load applied to the equipment, and minimize a cost caused by an equipment accident. | 02-11-2016 |
Yong-Kook Park, Yongin-Si KR
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20160079367 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device may have a structure that prevents or reduces an etching amount of certain portions, such as a part of a source/drain region. Adjacent active fins may be merged with a blocking layer extending between adjacent the source/drain region. The blocking layer may be of a material that is relatively high-resistant to the etchant. | 03-17-2016 |