Patent application number | Description | Published |
20100069569 | POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION - There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): | 03-18-2010 |
20100133518 | GATE INSULATING FILM FORMING AGENT FOR THIN-FILM TRANSISTOR - There is provided a novel gate insulating film forming material in consideration of not only initial electric properties immediately after the production of a gate insulating film, but also electric properties after other steps are performed while producing a thin-film transistor using the gate insulating film, and even reliability in the electric properties of the produced element. A gate insulating film forming agent for a thin-film transistor comprising an oligomer compound or a polymer compound, both of which contain a repeating unit having a triazinetrione ring containing a hydroxyalkyl-containing group as a substituent on a nitrogen atom, and a solvent; a gate insulating film produced from the gate insulating film forming agent; a thin-film transistor having the gate insulating film; and a method for producing the gate insulating film or thin-film transistor. | 06-03-2010 |
20100159201 | ELECTRODE PATTERNING LAYER COMPRISING POLYAMIC ACID OR POLYIMIDE AND ELECTRONIC DEVICE USING THE SAME - Disclosed is an electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, which uses a highly reliable polyimide resin as an electronic material. An electrode patterning layer for use in the formation of an electrode pattern of any desired shape depending on the difference in wetting property of an electrode-forming solution used, electrode patterning layer being formed by irradiating a layer comprising a polyamic acid having the repeated unit represented by the general formula (1) or polyimide produced by dehydration and cyclization of the polyamic acid with ultraviolet lay to form a pattern: (1) wherein A represents a tetravalent organic group and B represents a divalent organic group in which one or more A's and B's may be used, and n is a positive integer, provided that at least one of A's is a tetravalent organic group having a alicyclic structure. | 06-24-2010 |
20110227056 | FORMING AGENT FOR GATE INSULATING FILM OF THIN FILM TRANSISTOR - It is an object to provide a novel forming agent for a gate insulating film that not only provides high insulating properties for the gate insulating film but also takes account of the electric characteristics of a thin film transistor element. A forming agent for a gate insulating film of a thin film transistor characterized by comprising an oligomer compound or a polymer compound including a structural unit containing a pyrimidinetrione ring having a hydroxyalkyl-containing group as a substituent on a nitrogen atom; a gate insulating film formed by the forming agent; and a thin film transistor. | 09-22-2011 |
20110318907 | COMPOSITION FOR FORMING GATE INSULATING FILM FOR THIN-FILM TRANSISTOR - There is provided a novel composition for forming a gate insulating film taking into consideration also electrical characteristics after other processes such as wiring by irradiation with an ultraviolet ray and the like during the production of an organic transistor using a gate insulating film. A composition for forming a gate insulating film for a thin-film transistor comprising: a component (i): an oligomer compound or a polymer compound containing a repeating unit having a structure in which a nitrogen atom of a triazine-trione ring is bonded to a nitrogen atom of another triazine-trione ring through a hydroxyalkylene group; and a component (ii): a compound having two or more blocked isocyanate groups in one molecule thereof. | 12-29-2011 |
20130140503 | PRECURSOR COMPOSITION FOR FORMING AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER, AMORPHOUS METAL OXIDE SEMICONDUCTOR LAYER, METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE - The invention provides a precursor composition for forming an amorphous metal oxide semiconductor layer, containing a metal salt, a primary amide, and a water-based solution. An amorphous metal oxide semiconductor layer is formed by use of the composition. | 06-06-2013 |
20140155546 | POLYIMIDE PRECURSOR, POLYIMIDE, AND COATING SOLUTION FOR UNDER LAYER FILM FOR IMAGE FORMATION - There is provided a polyimide precursor which can alter the hydrophilicity/hydrophobicity of the surface of a cured film formed readily even by a low level of ultraviolet ray irradiation; and a polyimide produced from the polyimide precursor. The polyimide precursor having a structure represented by the following formula (1): | 06-05-2014 |
20140206135 | COATING LIQUID FOR GATE INSULATING FILM, GATE INSULATING FILM AND ORGANIC TRANSISTOR - To provide a coating fluid for a gate insulating film, which can be baked at a low temperature of at most 180° C.; a gate insulating film having excellent solvent resistance and further having good characteristics in e.g. specific resistance or semiconductor mobility; and an organic transistor employing the gate insulating film. | 07-24-2014 |
Patent application number | Description | Published |
20090046438 | ATTACHMENT STRUCTURE OF AN ATTACHED-PLATE OF A SUBSTRATE - In an attachment structure for attaching an attached-plate to a printed substrate which is installed in a mechanical chassis, the mechanical chassis includes a positioning pin for positioning the printed substrate; and the attached-plate includes a guide groove that engages with the positioning pin and is slidably guided in a predetermined path, a fixing portion to the printed substrate, and an engaging portion that engages with a side portion of the printed substrate. By causing the attached-plate to slide along a substrate side of the printed substrate with the guide groove being engaged with the positioning pin, the guide groove is guided by the positioning pin, whereby the engaging portion engages with the side portion of the printed substrate. In the engagement state, by fixing the fixing portion of the attached-plate to the printed substrate, the attached-plate is attached to the printed substrate. | 02-19-2009 |
20090055845 | Disc drive - There is provided a disc drive including: a turntable that rotatably supports a disc; a drive motor that rotationally drives the turntable; a chassis that accommodates the drive motor and the turntable; a clamper that secures the disc to the turntable; and a cover body that holds the clamper and covers an upper part of the chassis. An inlet located in the proximity of an outer periphery portion of the disc, an outlet located above and at the center of the disc, and an air current path that allows the outlet to communicate with the inlet are formed in the cover body. | 02-26-2009 |
20110283300 | DISK DEVICE - There is provided a disk device having a buffer portion capable of relatively moving at least a rack at the beginning of meshing with a drive gear in an opposite direction to a moving direction of a slide cam member moved by conveyance of a disk, when the disk is conveyed to a replayable position by a disk conveyance mechanism and the slide cam member moves so that the drive gear and the rack are meshed with each other. | 11-17-2011 |
20120005695 | DISK DEVICE - A disk device is provided with a pair of slide cam members respectively starting movement when a disk is conveyed to a replayable position, and a pair of clamper lifters respectively having clamper support portions supporting clamper, the pair of clamper lifters are moved in opposite directions to each other in a horizontal direction orthogonal to a thickness direction of the disk device in conjunction with the movement of the pair of slide cam members, and formed so that timings to start movement in the opposite directions to each other are different from each other, and the clamper support portions have inclined surfaces being contacted with an outer peripheral part of the clamper in accordance with the movement of the pair of clamper lifters in the opposite directions to each other so as to move the clamper in the thickness direction of the disk device. | 01-05-2012 |
20120089995 | DISK APPARATUS - A disk device of the invention is provided with a trigger member rotated by being contacted with and pressed by a disk having a different diameter to be conveyed to a replayable position, a slide cam member which drives a disk installment mechanism by being pressed and moved by the trigger member, and a centering member which centers the disk so that the disk faces a turntable at the replayable position. The trigger member has a rotation shaft portion serving as a rotation center, a disk contact portion to be contacted with the disk, and a pressing portion for pressing the slide cam member, and the centering member is provided movably in a disk conveying direction by being contacted with and pressed by the conveyed disk, and has a guide portion for moving the rotation shaft portion of the trigger member in accordance with movement in the disk conveying direction. | 04-12-2012 |
20130111507 | TURNTABLE | 05-02-2013 |
20130347012 | MAGAZINE BOX - There is provided a magazine box for removably storing a plurality of disc-storing magazines used in a disc apparatus for feeding a disc to each of a plurality of disc drives; wherein the magazines each include a tray for storing the disc, a case for removably storing the tray, and a first locking mechanism for releasably locking the tray to the case; the magazine box further includes a second locking mechanism for releasably locking the case of each of the plurality of magazines to the magazine box, and the second locking mechanism maintains the locked state at least during the automatic tray-ejection from the case in the disc apparatus is conducted. | 12-26-2013 |
Patent application number | Description | Published |
20080281014 | Nanosubstance-Containing Composition, Process for Producing the Same, and Composite Made With the Same - A composition containing a nanosubstance is provided. Since the composition includes a nanosubstance (a), a (meth)acrylate compound (b) including a polar group, and a solvent (c)/polymerizable monomer (i-1), it is capable of being dispersed or solubilized in various solvents such as organic solvents, hydrous organic solvents and in polymerizable monomers without impairing characteristics of the nanosubstance itself wherein the nanosubstance neither separates out nor aggregates during a long-term storage, the composition being excellent in conductivity, film-forming property and moldability and capable of applying to or coating a substrate by a simple method. A coated film or cured film of a composite formed by the composition on at least one surface of the substrate shows high transparency, and the composite is excellent in water resistance, weatherability and hardness. | 11-13-2008 |
20140371412 | RESIST COPOLYMER AND RESIST COMPOSITION - Provided is a resist copolymer which has favorable sensitivity, enables a resist pattern to be formed to have a favorable shape, has favorable dry etching resistance when a dry etching is carried out using the resist pattern as a mask, and suppresses the surface roughness of a pattern formed by carrying out a dry etching process to a substrate. | 12-18-2014 |
Patent application number | Description | Published |
20120111099 | COPOLYMER FOR LITHOGRAPHY AND METHOD FOR EVALUATING THE SAME - The present invention provides a method for evaluating lithographic characteristics of a lithographic composition containing a copolymer for lithography without actually preparing the composition. The method comprises the steps of: dissolving the copolymer for lithography in a solvent to prepare a test solution; separating a gel-like substance from the test solution; determining a rate of change of a composition ratio, wherein the rate of change of the composition ratio rate refers to a ratio of a difference obtained by subtracting a composition ratio of constitutional units in the copolymer for lithography from a composition ratio of constitutional units in a gel-like substance to the composition ratio of the constitutional units in the copolymer for lithography. | 05-10-2012 |
20120115086 | METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE - A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high. | 05-10-2012 |
20130331533 | POLYMER FOR LITHOGRAPHY - A copolymer obtained by polymerizing two or more types of monomers, wherein among fractions obtained by dividing an eluate showing peaks relative to the copolymer, in an elution curve obtained by gel permeation chromatography (GPC), into eight fractions in order of fractionation, such that each fraction has the same volume, a difference between a monomer composition ratio of a copolymer contained in a first eluted fraction and a monomer composition ratio of all copolymers is −3 mol % to +3 mol % in any of the constitutional units derived from the respective monomers. | 12-12-2013 |
20140134539 | ALCOHOL COMPOUND AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING LACTONE COMPOUND, (METH)ACRYLATE ESTER AND METHOD FOR PRODUCING SAME, POLYMER AND METHOD FOR PRODUCING SAME, AND RESIST COMPOSITION AND METHOD FOR PRODUCING SUBSTRATE USING SAME - To provide an alcohol compound containing fewer impurities at a high yield by conducting the following steps: a hydroboration process in which a reaction mixture is obtained by reacting in a solvent a compound represented by formula (C) and a boron agent selected from a group of diborane and borane complexes; and an oxidation process in which the pH of the reaction mixture is set at 0.5 to 4, which is conducted after treating the reaction mixture with hydrogen peroxide. In the formula, A | 05-15-2014 |