Patent application number | Description | Published |
20100103506 | RECONFIGURABLE OPTICAL AMPLIFIER, REVERSIBLE OPTICAL CIRCULATOR, AND OPTICAL SIGNAL TRANSMISSION SYSTEM - A reconfigurable optical amplifier including a first reversible optical circulator and an optical gain device is provided. The first reversible optical circulator has four I/O ports which are respectively referred to as a first terminal, a second terminal, a third terminal, and a fourth terminal. The four I/O ports sequentially transmit an optical signal in a transmission direction of a forward circulation or a backward circulation according to a control signal. The first terminal is isolated from the adjacent fourth terminal. The optical gain device is connected between the first terminal and the adjacent fourth terminal. The second terminal and the third terminal are respectively connected to a first communication node and a second communication node. | 04-29-2010 |
20100135653 | OPTICAL NETWORK MONITORING SYSTEM AND METHOD THEREOF - An optical network monitoring system and method thereof are proposed. An optical line terminal (OLT) transmits a first optical signal to a plurality of optical interference devices. After the first optical signal passes the optical interference devices, the optical interference devices reflect back a plurality of second optical signals corresponding to the optical interference devices respectively to the optical line terminal. The second optical signals have different optical path differences. An optical/electrical converter unit converts each of the second optical signals into an electrical signal. A spectrum analyzing unit analyzes the electrical signal to extract a frequency component of the electrical signal, thus the fiber connection status to each optical network unit in the optical network system could be obtained. Therefore, the purpose of monitoring the optical network system is achieved. | 06-03-2010 |
20100322624 | BIDIRECTIONAL TRANSMISSION NETWORK APPARATUS BASED ON TUNABLE RARE-EARTH-DOPED FIBER LASER - The present invention discloses a bidirectional transmission network apparatus based on a tunable rare-earth-doped fiber laser source. It is useful in wavelength-division-multiplexing access networks. The fiber ring laser not only generates downstream data traffic but also serves as the wavelength-selecting injection light source for the Fabry-PĂ©rot lasers (or vertical cavity surface emitting lasers) located at the subscriber site. The fiber laser is constructed based on optical filtering, polarization control and noise suppression techniques. | 12-23-2010 |
20120083128 | METHOD FOR ETCHING HIGH-ASPECT-RATIO FEATURES - A method for etching high-aspect-ratio features is disclosed. The method is applicable in forming a nanoscale deep trench having a smooth and angle-adjustable sidewall. The method includes: forming a patterned photoresist layer on a surface of a silicon substrate for exposing a part of the silicon substrate; and supplying a process gas simultaneously containing sulfur hexafluoride (SF | 04-05-2012 |
20130012022 | METHOD FOR FABRICATING SILICON NANOWIRE ARRAYS - A method for larger-area fabrication of uniform silicon nanowire arrays is disclosed. The method includes forming a metal layer with a predetermined thickness on a substrate whose surface has a silicon material by a coating process, the metal layer selected from the group consisting of Ag, Au and Pt; and performing a metal-induced chemical etching for the silicon material by using an etching solution. Accordingly, a drawback that Ag nanoparticles are utilized to perform the metal-induced chemical etching in prior art is solved. | 01-10-2013 |
20130223841 | TIME/WAVELENGTH-DIVISION MULTIPLEXED PASSIVE OPTICAL NETWORK (TWPON) - The present invention discloses a time/wavelength-division multiplexed passive optical network (TWPON), which has an optical splitter ( | 08-29-2013 |
20140030873 | METHOD FOR FABRICATING PATTERNED SILICON NANOWIRE ARRAY AND SILICON MICROSTRUCTURE - A method for fabricating a patterned silicon nanowire array is disclosed. The method includes: forming a patterned protective layer on silicon nanowire array structures, forming a patterned protective layer on the array of silicon nanowire structures, the patterned protective layer defining a covered region and a uncovered region on the array of silicon nanowire structures; using a selective etching to remove the array of silicon nanowire structures defined on the uncovered region; and removing the patterned protective layer remained on the array of silicon nanowire structures. A method for fabricating a silicon microstructure is also disclosed. | 01-30-2014 |