Patent application number | Description | Published |
20080255817 | MODELING THE TRANSIENT BEHAVIOR OF BHA/DRILL STRING WHILE DRILLING - A method, system and computer program product for performing a drilling operation for an oil field, the oil field having a subterranean formation with geological structures and reservoirs therein. The method involves creating a finite-difference model to simulate behavior of a drilling assembly used to drill a wellbore in the drilling operation, performing a simulation of the drilling operation using the finite-difference model, analyzing a result of the simulation, and selectively modifying the drilling operation based on the analysis. | 10-16-2008 |
20080289877 | SYSTEM AND METHOD FOR PERFORMING A DRILLING OPERATION IN AN OILFIELD - The invention relates to a method for performing a drilling operation at a wellsite having a drilling rig configured to advance a drilling tool into a subsurface. The method steps include obtaining a well trajectory associated with a first volume, obtaining information related to a first subsurface entity associated with a second volume, using a three-dimensional relational comparison to determine that the first volume intersects the second volume to define a first intersection information, updating the well trajectory, based on the first intersection information, to obtain an updated well trajectory, and advancing the drilling tool into the subsurface based on the updated well trajectory. | 11-27-2008 |
20090182472 | REAL-TIME, BI-DIRECTIONAL DATA MANAGEMENT - An example method for real-time bi-directional data management includes receiving a requested data list from a field application, receiving an available data list from a data source, and subscribing to available data by mapping the available data list to the requested data list, the available data having a first data format and a first protocol and including a first context identifier for identifying a portion of data. The method further includes modifying the available data have a second data format and a second protocol, the modified data including the first context identifier, and performing a field operation based on the modified data to generate processed data, the processed data including the first context identifier. The method further includes modifying the processed data to generate second modified data having the first data format and the first protocol, the second modified data being stored in the data source. | 07-16-2009 |
20100271391 | Presenting Textual and Graphic Information to Annotate Objects Displayed by 3D Visualization Software - The present invention relates to a method of displaying a dynamic 2D annotation associated with an object displayed in a 3D scene. The method includes providing a computer system that includes a display device; establishing a view location and direction; orienting the dynamic 2D annotation substantially perpendicular to the view direction; orienting the dynamic 2D annotation substantially horizontal relative to the 3D scene; positioning the dynamic 2D annotation relative to an attachment point on or near the object; extending an attachment handle between the dynamic 2D annotation and the attachment point; and displaying the dynamic 2D annotation and the attachment handle in the 3D scene on the display device. | 10-28-2010 |
Patent application number | Description | Published |
20090100400 | Phase-shifting masks with sub-wavelength diffractive optical elements - The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light. | 04-16-2009 |
20090148779 | Sub-wavelength diffractive elements to reduce corner rounding - The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light. | 06-11-2009 |
20090170012 | Phase-shifting masks with sub-wavelength diffractive opical elements - The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light. | 07-02-2009 |
20110318672 | MASK DESIGN AND OPC FOR DEVICE MANUFACTURE - Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks. | 12-29-2011 |
20130149638 | MASK DESIGN AND OPC FOR DEVICE MANUFACTURE - Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks. | 06-13-2013 |