Staveley
Catheryn Staveley, Houston, TX US
Patent application number | Description | Published |
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20110161133 | Planning and Performing Drilling Operations - The present disclosure relates to dynamically incorporating and economically validating drilling decisions. A computer system having a memory and central processing unit is provided and a knowledge store residing in the computer system is populated with data. The data may include surface drilling parameter data, bottomhole assembly data, bit records, measurement-while-chilling data, logging-while-drilling data, drilling event data, and lessons learned data. The data may be correlated data from one or more offset wells. One or more computerized static or dynamic contextual earth models are provided and used to dynamically incorporate and economically validate the drilling decisions. The one or more earth models can be updated in real-time. | 06-30-2011 |
Christopher Barry Staveley, Bracknell Berkshire GB
Patent application number | Description | Published |
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20110048136 | PRESSURE SENSOR ASSEMBLY AND METHOD OF USING THE ASSEMBLY - A pressure sensor assembly comprises a sensor housing having a flexible wall that is configured to deform in response to a pressure difference between the interior and exterior of the sensor housing; —a first fiber optical cable section that is bonded to the flexible wall of the sensor housing such that the length of the first fiber optical cable section changes in response to deformation of the wall in response to the said pressure difference; a second fiber optical cable section which is bonded to a thermal reference body, which body is connected to the sensor housing by a strain decoupled connection mechanism, such as a tack weld or flexible glue, and is configured to deform substantially solely in response to thermal deformation, such that the length of the second fiber optical cable section solely changes in response to thermal deformation of the thermal reference body. | 03-03-2011 |
Roy Eric Staveley, Austin, TX US
Patent application number | Description | Published |
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20100086212 | Method and System for Dispositioning Defects in a Photomask - A method and system for dispositioning defects in a photomask are provided. A method for dispositioning defects in a photomask includes analyzing photomask topography data including data representing a design topology of at least a first photomask, the first photomask corresponding to a first layer in a photolithographic process. Based at least on the analysis, one or more safe regions of the first photomask are identified, each safe region corresponding to a region of the first layer insensitive to potential defects located in the first photomask. | 04-08-2010 |