Patent application number | Description | Published |
20080237185 | PLASMA PROCESSING APPARATUS OF SUBSTRATE AND PLASMA PROCESSING METHOD THEREOF - A substrate plasma processing apparatus includes a chamber of which an interior is evacuated under a predetermined vacuum condition; an RF electrode which is disposed in the chamber and configured so as to hold a substrate to be processed on a main surface thereof; an opposing electrode which is disposed opposite to the RF electrode in the chamber; an RF voltage applying device for applying an RF voltage with a predetermined frequency to the RF electrode; and a pulsed voltage applying device for applying a pulsed voltage to the RF electrode so as to be superimposed with the RF voltage and which includes a controller for controlling a timing in application of the pulsed voltage and defining a pause period of the pulsed voltage. | 10-02-2008 |
20100072172 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage. | 03-25-2010 |
20110223750 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS - According to an embodiment, a method for manufacturing a semiconductor device is disclosed. The method includes: arranging a semiconductor substrate on a first electrode out of first and second electrodes arranged to be opposed to each other in a vacuum container; applying negative first pulse voltage and radio-frequency voltage to the first electrode, the negative first pulse voltage being superimposed with the radio-frequency voltage; applying negative second pulse voltage to the second electrode in an off period of the first pulse voltage; and processing the semiconductor substrate or a member on the semiconductor substrate by plasma formed between the first and second electrodes. | 09-15-2011 |
20110269290 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - In one embodiment, a method of manufacturing a semiconductor device includes forming a first film containing boron (B) on a member to be etched, the member being a semiconductor substrate, or a film formed on the semiconductor substrate, and forming a second film formed of a silicon oxide film on the first film. The method further includes pressing an original plate having a pattern formed in an uneven shape onto the second film to transfer the pattern to the second film, and etching the first film by using the second film where the pattern is transferred as a mask, with an etching gas that contains fluoromethane (CH | 11-03-2011 |
20120034785 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - According to one embodiment, a semiconductor device manufacturing method includes collectively etching layers of a multilayered film including silicon layers and silicon oxide films alternately stacked on a semiconductor substrate. The etching gas of the etching contains at least two types of group-VII elements and one of a group-III element, a group-IV element, a group-V element, and a group-VI element, the energy of ions entering the semiconductor substrate when performing the etching is not less than 100 eV, and an addition ratio of the group-III element, the group-IV element, the group-V element, the group-VI element, and the group-VII element to the group-VII element is 0.5 (inclusive) to 3.0 (inclusive). | 02-09-2012 |
20120228263 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In one embodiment, a substrate processing apparatus, includes: a chamber; a first electrode disposed in the chamber; a second electrode disposed in the chamber to face the first electrode, and to hold a substrate; an RF power supply to apply an RF voltage with a frequency of 50 MHz or more to the second electrode; and a pulse power supply to repeatedly apply a voltage waveform including a negative voltage pulse and a positive voltage pulse of which delay time from the negative voltage pulse is 50 nano-seconds or less to the second electrode while superposing on the RF voltage. | 09-13-2012 |
Patent application number | Description | Published |
20100025617 | METAL OXIDE - Provided is a piezoelectric material excellent in piezoelectricity. The piezoelectric material includes a perovskite-type complex oxide represented by the following General Formula (1). | 02-04-2010 |
20100052113 | EPITAXIAL FILM, PIEZOELECTRIC ELEMENT, FERROELECTRIC ELEMENT, MANUFACTURING METHODS OF THE SAME, AND LIQUID DISCHARGE HEAD - There are disclosed an epitaxial film, comprising: heating an Si substrate provided with an SiO | 03-04-2010 |
20100081559 | FERROELECTRIC CERAMIC MATERIAL - Provided is a ferroelectric ceramic material containing BaTiO | 04-01-2010 |
20110012050 | PIEZOELECTRIC MATERIAL - Provided is a piezoelectric material including a lead-free perovskite-type composite oxide which is excellent in piezoelectric characteristics and temperature characteristics and is represented by the general formula (1): | 01-20-2011 |
20110079883 | FERROELECTRIC THIN FILM - Provided is a ferroelectric thin film formed on a substrate and having an amount of remanent polarization increased in its entirety. The ferroelectric thin film contains a perovskite-type metal oxide formed on a substrate, the ferroelectric thin film containing a column group formed of multiple columns each formed of a spinel-type metal oxide, in which the column group is in a state of standing in a direction perpendicular to a surface of the substrate, or in a state of slanting at a slant angle in a range of −10° or more to +10° or less with respect to the perpendicular direction. | 04-07-2011 |
20130330541 | METAL OXIDE - Provided is a piezoelectric material excellent in piezoelectricity. The piezoelectric material includes a perovskite-type complex oxide represented by the following General Formula (1). | 12-12-2013 |
20140106170 | SODIUM NIOBATE POWDER, METHOD OF MANUFACTURING A SODIUM NIOBATE POWDER, PLATE-LIKE PARTICLE, METHOD OF MANUFACTURING A PLATE-LIKE PARTICLE, AND METHOD OF MANUFACTURING AN ORIENTED CERAMICS - Provided are methods of manufacturing an oriented ceramics containing sodium niobate and a raw material thereof. Specifically, provided is a sodium niobate powder, including cuboidal sodium niobate particles having an average side length of 0.1 μm or more to 100 μm or less, at least one face of the cuboid including a (100) plane in pseudo-cubic notation, in which the sodium niobate powder has a perovskite single-phase structure. | 04-17-2014 |
20140117811 | PIEZOELECTRIC ELEMENT, MULTILAYERED PIEZOELECTRIC ELEMENT, LIQUID DISCHARGE HEAD, LIQUID DISCHARGE APPARATUS, ULTRASONIC MOTOR, OPTICAL APPARATUS, AND ELECTRONIC APPARATUS - A lead-free piezoelectric element that stably operates in a wide operating temperature range contains a lead-free piezoelectric material. The piezoelectric element includes a first electrode, a second electrode, and a piezoelectric material that includes a perovskite-type metal oxide represented by (Ba | 05-01-2014 |
20140131611 | PIEZOELECTRIC MATERIAL - A lead-free piezoelectric material that has stable, excellent piezoelectric constant and mechanical quality factor in a wide operating temperature range is provided. A piezoelectric material include a perovskite-type metal oxide represented by (Ba | 05-15-2014 |
20140145106 | PIEZOELECTRIC MATERIAL - A lead-free piezoelectric material that does not undergo depolarization in a wide operating temperature range and has a good piezoelectric constant is provided. A piezoelectric material include a perovskite-type metal oxide represented by (Ba | 05-29-2014 |
20140184876 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, AND ELECTRONIC APPARATUS - A piezoelectric material includes, as a main component, a perovskite-type metal oxide represented by a general formula (Ba | 07-03-2014 |
20140218588 | DUST REMOVING DEVICE AND IMAGING DEVICE - Provided is a dust removing device that can be designed and controlled appropriately and has high dust removal performance even at low temperature, and an imaging device using the dust removing device. In a dust removing device to be set on a base, including a piezoelectric element formed of a piezoelectric material and a pair of opposing electrodes, a vibration member, and a fixation member containing at least a high molecular compound component, a phase transition temperature T from a first ferroelectric crystal phase to a second ferroelectric crystal phase of the piezoelectric material is set to −60° C.≦T≦−5° C., and whereby, the dust removing device can be designed and controlled appropriately and high dust removal performance can be obtained even at low temperature. | 08-07-2014 |
20140292160 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, MULTILAYERED PIEZOELECTRIC ELEMENT, LIQUID EJECTION HEAD, LIQUID EJECTION APPARATUS, ULTRASONIC MOTOR, OPTICAL EQUIPMENT, VIBRATION APPARATUS, DUST REMOVING APPARATUS, IMAGING APPARATUS, AND ELECTRONIC EQUIPMENT - Provided is a lead-free piezoelectric material having a satisfactory and stable piezoelectric constant and electric insulation property in a wide practical temperature range. Provided is a piezoelectric material, including a perovskite-type metal oxide represented by the following general formula (1) as a main component, the piezoelectric material containing Mn in a content of 0.01 part by weight or more and 0.80 part by weight or less with respect to 100 parts by weight of the perovskite-type metal oxide: (Li | 10-02-2014 |
20140354738 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, LIQUID DISCHARGE HEAD, ULTRASONIC MOTOR, AND DUST REMOVING DEVICE - Provided is a piezoelectric material having high Curie temperature, high insulation property, and high piezoelectric performance, the piezoelectric material including a perovskite-type metal oxide represented by the general formula (1): xBaTiO | 12-04-2014 |
20150015643 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, AND ELECTRONIC EQUIPMENT - A piezoelectric material contains a main component containing a perovskite-type metal oxide having the formula (1); a first auxiliary component composed of Mn; and a second auxiliary component composed of Bi or Bi and Li, wherein the Mn content is 0.04 parts by weight or more and 0.400 parts by weight or less on a metal basis per 100 parts by weight of the metal oxide, the Bi content is 0.042 parts by weight or more and 0.850 parts by weight or less on a metal basis per 100 parts by weight of the metal oxide, and the Li content is 0.028 parts by weight or less (including 0 parts by weight) on a metal basis per 100 parts by weight of the metal oxide. | 01-15-2015 |
20150028249 | PIEZOELECTRIC CERAMICS, PIEZOELECTRIC ELEMENT, LIQUID EJECTION HEAD, ULTRASONIC MOTOR, AND DUST REMOVING DEVICE - Provided is a lead-free piezoelectric ceramics having enhanced mechanical quality factor (Qm) and mechanical strength. The piezoelectric ceramics, includes at least a first crystal grain and a second crystal grain. The first crystal grain has an average equivalent circle diameter of 2 μm or more and 30 μm or less. The first crystal grain includes a perovskite-type metal oxide represented by the following general formula (1) as a main component, and the second crystal grain includes a perovskite-type metal oxide represented by the following general formula (2) as a main component: (1) xBaTiO | 01-29-2015 |
20150041701 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, AND ELECTRONIC APPARATUS - Provided is a lead-free piezoelectric material having satisfactory piezoelectric constant and mechanical quality factor in a device driving temperature range (−30° C. to 50° C.) The piezoelectric material includes a main component containing a perovskite-type metal oxide represented by Formula 1, a first auxiliary component composed of Mn, and a second auxiliary component composed of Bi or Bi and Li. The content of Mn is 0.040 parts by weight or more and 0.500 parts by weight or less based on 100 parts by weight of the metal oxide on a metal basis. The content of Bi is 0.042 parts by weight or more and 0.850 parts by weight or less and the content of Li is 0.028 parts by weight or less (including 0 parts by weight) based on 100 parts by weight of the metal oxide on a metal basis. | 02-12-2015 |
20150053884 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, AND ELECTRONIC APPARATUS - The present invention provides a lead-free piezoelectric material having a high piezoelectric constant and a high mechanical quality factor in a wide operating temperature range. The piezoelectric material includes a perovskite-type metal oxide represented by Formula (1): | 02-26-2015 |
20150062257 | SODIUM NIOBATE POWDER, METHOD FOR PRODUCING THE SAME, METHOD FOR PRODUCING CERAMIC, AND PIEZOELECTRIC ELEMENT - A sodium niobate powder includes sodium niobate particles having a shape of a cuboid and having a side average length of 0.1 μm or more and 100 μm or less, wherein at least one face of each of the sodium niobate particles is a (100) plane in the pseudocubic notation and a moisture content of the sodium niobate powder is 0.15 mass % or less. A method for producing a ceramic using the sodium niobate powder is provided. A method for producing a sodium niobate powder includes a step of holding an aqueous alkali dispersion liquid containing a niobium component and a sodium component at a pressure exceeding 0.1 MPa, a step of isolating a solid matter from the aqueous dispersion liquid after the holding, and a step of heat treating the solid matter at 500° C. to 700° C. | 03-05-2015 |
20150214469 | PIEZOELECTRIC CERAMIC, METHOD FOR MANUFACTURING THE SAME, PIEZOELECTRIC ELEMENT, AND ELECTRONIC APPARATUS - A piezoelectric ceramic includes a perovskite-type metal oxide containing barium titanate, and Mn. When a surface thereof along the remanent polarization direction is subjected to X-ray diffraction analysis at room temperature, the ratio of the diffraction intensity of the (002) plane to the diffraction intensity of the (200) plane is 1.0 or more, the diffraction peak of the (002) plane has a half width of 1.2° or less, and the lattice constant of the c-axis thereof and the lattice constant of the a-axis thereof satisfy the relationship 1.004≦c/a≦1.010. | 07-30-2015 |
20150214470 | PIEZOELECTRIC ELEMENT, METHOD FOR MANUFACTURING PIEZOELECTRIC ELEMENT, AND ELECTRONIC APPARATUS - A piezoelectric element includes a piezoelectric material portion. The piezoelectric material portion is made of a piezoelectric ceramic that includes a perovskite-type metal oxide including barium titanate and Mn and that has residual polarization. The piezoelectric material portion has a measurement surface extending in a direction that crosses a direction of the residual polarization of the piezoelectric ceramic, and, after the measurement surface has been polished to have a surface roughness of 200 nm or less, the measurement surface has a (002)/(200) X-ray diffraction intensity ratio of 1.0 or more at room temperature. A ratio c/a of a c-axis lattice constant c to an a-axis lattice constant a of the piezoelectric ceramic at room temperature satisfies 1.004≦c/a≦1.010. A half-width of a (002) diffraction peak of the measurement surface at room temperature is 1.2° or less. | 07-30-2015 |
20150295161 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, AND ELECTRONIC EQUIPMENT - There is provided a lead-free piezoelectric material having a high and stable piezoelectric constant and mechanical quality factor in a wide operating temperature range. | 10-15-2015 |
20150304528 | DUST REMOVAL APPARATUS AND IMAGE PICKUP APPARATUS - A dust removal apparatus includes a vibrating plate, a piezoelectric element, a power supply that applies the piezoelectric element with an alternating voltage; and a control circuit that changes a frequency of the alternating voltage, in which the piezoelectric element includes first and second electrodes and a piezoelectric material, a phase transition temperature T from a first crystal phase to a second crystal phase of the piezoelectric material is −40° C.≦T≦85° C., the change of the frequency is for repeating a frequency sweep operation from a first frequency to a second frequency, and when a frequency at which an audible vibration is generated during the sweep operation is set as fns, a frequency at which the audible vibration is ended is set as fne, and a changing time from fns to fne during the sweep operation is set as Δtn, Δtn≦10 ms is satisfied. | 10-22-2015 |
20150349241 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, METHOD FOR MANUFACTURING PIEZOELECTRIC ELEMENT, AND ELECTRONIC DEVICE - A piezoelectric material that does not contain lead and has excellent and stable piezoelectric properties in a device operating temperature range is provided. The present invention for this purpose is a piezoelectric material including a main component containing a perovskite metal oxide represented by following general formula (1), a first auxiliary component containing Mn, and a second auxiliary component containing Bi charge-disproportionated into trivalent and pentavalent, wherein an amount of the contained Mn is 0.0020 moles or more and 0.0150 moles or less relative to 1 mole of the metal oxide, and an amount of the contained Bi is 0.0004 moles or more and 0.0085 moles or less relative to 1 mole of the metal oxide. | 12-03-2015 |
20150368162 | PIEZOELECTRIC MATERIAL, PIEZOELECTRIC ELEMENT, AND ELECTRONIC EQUIPMENT - There is provided a lead- and potassium-free piezoelectric material having a high piezoelectric constant and a satisfactory insulation property and a piezoelectric element that includes the piezoelectric material. The piezoelectric material contains a perovskite-type metal oxide having the general formula (1): (Na | 12-24-2015 |
Patent application number | Description | Published |
20100086686 | INK JET INK, INK JET RECORDING METHOD, AND INK CARTRIDGE - Provided is an ink jet ink capable of achieving at a high level both ejection stability and storage stability. Provided is an ink jet ink, including at least a pigment, and a star polymer in which four or more (co)polymer chains of an α,β-ethylenically unsaturated monomer are bonded to a central skeleton. The (co)polymer chains have two or more first (co)polymer chains each containing at least an aromatic monomer unit and two or more second (co)polymer chains each containing at least one monomer unit selected from the group consisting of acid monomers and salts of the acid monomers. | 04-08-2010 |
20100086687 | INK JET INK, INK JET RECORDING METHOD, AND INK CARTRIDGE - To provide an ink jet ink capable of achieving both high colorability and excellent bleeding resistance of an image and having excellent storage stability, provided is an ink jet ink including at least a pigment and a star polymer having a structure represented by at least one formula selected from the group consisting of the following general formulae (1) to (3). | 04-08-2010 |
20100086688 | INK JET INK, INK JET RECORDING METHOD, AND INK CARTRIDGE - Provided is an ink jet ink capable of achieving both high colorability and excellent bleeding resistance of an image. The ink jet ink includes at least a pigment and a star polymer in which at least three copolymer chains of α,β-ethylenically unsaturated monomers are bonded to a central skeleton, in which the copolymer chains of the α,β-ethylenically unsaturated monomers are copolymers of at least one first monomer selected from the group consisting of aromatic (meth)acrylates and aromatic (meth)acrylamides and at least one second monomer selected from the group consisting of acid monomers and salts of the acid monomers. | 04-08-2010 |
20110001775 | CLEAR INK, INK JET RECORDING METHOD, INK SET, INK CARTRIDGE, RECORDING UNIT AND INK JET RECORDING APPARATUS - Provided is an ink jet clear ink containing a polymer fine particle. The polymer fine particle has a core-shell structure obtained by polymerizing an α,β-ethylenically unsaturated hydrophobic monomer (b) as a core polymer in the presence of a shell polymer that is a copolymer having at least a unit derived from an α,β-ethylenically unsaturated hydrophobic monomer (a) and a unit derived from a monomer selected from an α,β-ethylenically unsaturated acid monomer and a salt thereof. The α,β-ethylenically unsaturated hydrophobic monomer (b) includes at least a monomer containing a chain structure saturated alkyl group. | 01-06-2011 |
20120147083 | SYNTHESIS METHOD FOR SELF-DISPERSIBLE PIGMENT, SELF-DISPERSIBLE PIGMENT, INK JET INK, INK CARTRIDGE, AND INK JET RECORDING METHOD - Provided is a synthesis method for a self-dispersible pigment, including performing ring-opening addition of a lactone-based compound to an acidic group bonded to a surface of a pigment particle directly or via another atomic group to bond a functional group including an ester group to the surface of the pigment particle. | 06-14-2012 |
20150024134 | IMAGE RECORDING METHOD - An image recording method including applying an ink onto a recording medium; and applying a liquid composition that destabilizes a dispersion state of a pigment in the ink onto the recording medium so as to at least partially overlap with a region in which the ink is applied. The ink contains the pigment, a first soluble polymer, a second soluble polymer, polymer particles, and water. The first water-soluble polymer has a weight-average molecular weight of 1,000-4,000 and has an acid value of 150-300 mgKOH/g. The second water-soluble polymer has an aromatic group and has a weight-average molecular weight of 5,000-30,000 and an acid value of 50-150 mgKOH/g. The polymer particles have a rate of change in volume-average particle size of 20% or less between a pH of 7 and a pH of 9. | 01-22-2015 |
20150191615 | INK JET INK AND INK JET RECORDING METHOD - An ink jet ink including water, a pigment and a polymer. The pigment has a secondary amino group. The polymer contains a unit derived from a monomer having a ring structure containing a tertiary amino group. | 07-09-2015 |
Patent application number | Description | Published |
20080243148 | SUTURE INSTRUMENT - A suture instrument that is inserted into a body and ejects an elongated anchor to be engaged to tissue, consisting of: an elongated member that extends from a proximal end on a hand side to a remote end that is introduced to tissue and has flexibility; a needle that is provided at the remote end of the elongated member, has at the distal end a sharp tip that is capable of puncturing tissue, is capable of housing a plurality of the anchors inside, and is provided with a side hole through which the anchors are capable of passing; a pusher whose remote end abuts the anchor that is housed in the needle and is disposed in a manner to be capable of moving in the axial direction of the elongated member; and a push-out control portion that is provided in the needle or the pusher and changes the movement direction of the anchor that has been moved to a formation position of the side hole by the pusher from the length-wise direction of the needle to a direction heading toward the side hole. | 10-02-2008 |
20090069822 | TISSUE FASTENING TOOL, STENT, APPLICATOR FOR PLACING THE SAME, AND TISSUE FASTENING METHOD THROUGH NATURAL ORIFICE - The tissue fastening apparatus includes: a tissue fastening tool provided with a first tissue fixing section which is hooked onto a first biological tissue and a second tissue fixing section which is hooked onto a second biological tissue adjacent to the first biological tissue; a stent provided with a dilating portion having a diameter which increases from a front end to a rear end of the dilating portion, an indwelled portion which is connected the dilating portion, and a through hole which passes through the dilating portion and the indwelled portion in a longitudinal direction of the stent; and an applicator provided with a tubular puncturing tool in which the tissue fastening tool is inserted, a fastening tool pusher inserted into the puncturing tool to dispenses the tissue fastening tool inserted into the puncturing tool from a distal end of the puncturing tool, and a sheath into which the puncturing tool is inserted to shift the stent which is detachably disposed at the distal end of the sheath relative to the puncturing tool. | 03-12-2009 |
20090088780 | SUTURING DEVICE - A suturing device is disclosed which sutures a tissue using a suture unit having a suture thread with both ends fitted to a first anchor and a second anchor, respectively. The suturing device includes a hollow tip member receiving the first and second anchors; a wire having a front end inserted through the tip member so that the first and second anchors can be released out from the tip member; a flexible tube having a distal end integrally connected at a proximal end of the tip member, through which the wire is inserted so as to freely move forward and backward in the axial direction of the tube; a parallel member inserted through the tube so as to freely move forward and backward in the axial direction of the tube along with the wire; a relative position holding member fitted to the wire so as to hold constant a relative positional relationship between the wire and the parallel member; a forward movement restricting member provided on the tube or the tip member so as to restrict a forward movement of the parallel member; and an operating portion provided at a proximal end side of the wire and the parallel member so as to operate the wire and the parallel member. In a state in which the relative positional relationship between the wire and the parallel member is held constant by the relative position holding member, when the wire is moved in the forward direction until the forward movement of the parallel member is restricted by the forward movement restricting member, only the first anchor is released out from the tip member by the movement of the wire. | 04-02-2009 |
20090125039 | SUTURE INSTRUMENT - A suture instrument that is inserted into a body and ejects an elongated anchor to which a suture thread that sutures a perforation is connected and which is placed on tissue, including a base that extends from a proximal end on a hand side to a remote end that is introduced to tissue and has flexibility; an anchor holding instrument that is disposed at the remote end of the base, is capable of housing a plurality of the anchors inside, and whose distal end that ejects the anchors is approximately pointed in the direction of the proximal end of the base; a tip position changing mechanism that is provided for changing the tip position of the anchor holding instrument and causes the anchor holding instrument to move in a direction that intersects with the axial line of the lengthwise direction of the base; and a position operation device that operates the tip position changing mechanism at the hand side and operates the tip position of the anchor holding instrument. | 05-14-2009 |
20090182192 | TREATING TOOL FOR ENDOSCOPE - An endoscope treatment instrument having a needle for puncturing a biological tissue in a body cavity includes an indicator region provided on the outer surface of the needle including an indicator shape having miniature concave portions, and a plain region without the indicator shape provided in connection with at least one side of the indicator region in the axial line direction of the needle. | 07-16-2009 |
20090259232 | SUTURE DEVICE - A suture device which sutures tissue using a suture unit having a first anchor and a second anchor respectively attached to both ends of a suture thread, wherein a hollow distal member is provided which houses said first anchor and second anchor, the end face of the distal side of said distal member is formed so as to constitute a first sharp angle with the axis of said distal member, the distal side of said second anchor is provided with a sloped face so as to constitute a second sharp angle with the axis of said second anchor which is an angle at or below said first sharp angle, and said first anchor and said second anchor are axially aligned and housed inside said distal member so that said second anchor is positioned on the proximal side. | 10-15-2009 |
20100030236 | SUTURING DEVICE - A suturing device is disclosed which sutures a tissue using a suture unit having a suture thread with both ends fitted to a first anchor and a second anchor, respectively. The suturing device includes: a hollow tip member receiving the first and second anchors; a wire having a front end inserted through the tip member so that the first and second anchors can be released from the tip member; a flexible tube having a distal end integrally connected to a proximal end portion of the tip member, through which the wire is inserted so as to freely move forward and backward in the axial direction of the tube; a main body fixed to a proximal end of a sheath through which the tube is inserted; and a sliding portion fixed to the proximal end of the tube and fitted to the main body so as to freely move with respect to the main body in the axial direction in a sliding manner. The sliding portion includes a slider fixed to the proximal end of the tube, and a slider control portion which controls a sliding movement of the slider with respect to the main body in a normal state, and deactivates the control by a predetermined operation. | 02-04-2010 |
20100030237 | SUTURE INSTRUMENT - A suture instrument includes: a therapeutic insertion section having a suture section formed on the distal end thereof and suturing a tissue endoscopically; a cylindrical main operation unit connected to a proximal end of the therapeutic insertion section; a rod section inserted into the main operation unit along an axial line of the main operation unit from a proximal end of the main operation unit, the rod section conducting operations for discharging a suture thread and a plurality of end section members connected to at least an end of the suture thread from a distal end of the suture section; a pusher's distal end section for pressing the end section member to move corresponding to the operations conducted by the rod section; and a guide mechanism for rotating the rod section by a predetermined degree in the circumferential direction after conducting a linear movement of the pusher's distal end section at a position where one of the end section member is fed from a distal end of the suture section, and guiding so that the rod section is rotated in the circumferential direction by the predetermined degree repeatedly after conducting a linear movement of the pusher's distal end section to a position where the other one of the end section members is fed from the distal end of the suture section, so that each one of the end section members is discharged one after another and so that the end section members can be separated finally. | 02-04-2010 |
Patent application number | Description | Published |
20110073565 | SPIN PROCESSING APPARATUS AND SPIN PROCESSING METHOD - A cup member, a rotary table which is provided in the cup member and is driven to rotate, holding the substrate, a treatment liquid receiver which has a ring shape open upward and is provided to be movable in vertical directions, between inner circumference of the cup member and outer circumference of the rotary table, to receive the plurality of kinds of treatment liquids scattering from the substrate rotating, a linear motor which sets the treatment liquid receiver to height levels by driving the treatment liquid receiver in the vertical directions, respectively corresponding to the plurality of types of treatment liquids supplied for the substrate, and first to third separate flow channels which are provided on the cup member and separately collect the treatment liquids received by the treatment liquid receiver, respectively corresponding to the height levels set by the linear motor. | 03-31-2011 |
20140041694 | CLEANING SOLUTION PRODUCING APPARATUS, CLEANING SOLUTION PRODUCING METHOD, AND SUBSTRATE CLEANING APPARATUS - An cleaning solution producing apparatus according to an embodiment includes: a mixing unit configured to produce a liquid mixture by mixing a hydrogen peroxide solution into an acidic or alkaline liquid, and to raise the pressure of the produced liquid mixture by use of an oxygen gas produced through the decomposition of the hydrogen peroxide solution, or by use of vapor produced by heat of the reaction; and a bubble producing unit configured to produce multiple fine bubbles in the liquid mixture by releasing the pressure of the liquid mixture which is raised by the mixing unit. | 02-13-2014 |
20140261549 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 09-18-2014 |
20140261554 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - In a substrate processing device | 09-18-2014 |
20140261566 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 09-18-2014 |
20150090296 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 04-02-2015 |
20150090297 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 04-02-2015 |
20150090298 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W on which a cleaning liquid and a volatile solvent coexist. The magnetic field forming unit stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W to promote replacement of the cleaning liquid with the volatile solvent. | 04-02-2015 |
20150273491 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus according to the embodiment includes: a nozzle which ejects a treatment liquid onto a treatment target surface of a substrate; a trajectory deflector including a trajectory deflecting surface, which is an annular inclined surface that deflects a traveling direction of the treatment liquid ejected from the nozzle and makes the treatment liquid incident on the treatment target surface, the trajectory deflecting surface having an inclination angle varying in a direction of annular extension of the trajectory deflecting surface; and a position changer which moves an incident position of the treatment liquid on the trajectory deflecting surface in the direction of annular extension of the trajectory deflecting surface. | 10-01-2015 |
20150273534 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus according to an embodiment includes: a liquid supplier configured to supply a processing liquid to a surface of a substrate; a temperature detector configured to detect a surface temperature of the substrate supplied with the processing liquid by the liquid supplier; a temperature monitor configured to determine whether or not the surface temperature detected by the temperature detector has reached a predetermined temperature; and a controller configured to cause the liquid supplier to stop supplying the processing liquid when the temperature monitor determines that the surface temperature has reached the predetermined temperature. | 10-01-2015 |
20160025409 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - According to one embodiment, a substrate processing apparatus ( | 01-28-2016 |
Patent application number | Description | Published |
20100118163 | IMAGE CAPTURING APPARATUS AND IMAGE CAPTURING METHOD - In an image capturing apparatus, a video input unit ( | 05-13-2010 |
20120188379 | AUTOMATIC-TRACKING CAMERA APPARATUS - An automatic-tracking camera apparatus which is capable of realizing continuous and smooth driving and obtaining an image with little position variation of a tracking target from a target position within the image and with little blur. The position of a camera body is changed by a gimbal device. The speed of a tracking target object at the next-after-next start timing of image acquisition by the camera body is predicted. The gimbal device is controlled so that the camera body reaches the position indicated by a position instruction value generated for the next-after-next start timing of image acquisition by the camera body, at the next-after-next start timing, and the speed of the camera body at the next-after-next start timing of image acquisition by the camera body corresponds to the speed predicted for the next-after-next timing of image acquisition. | 07-26-2012 |
20120224033 | THREE-DIMENSIONAL MEASUREMENT METHOD - A field of view available for stereo measurement is expanded using a field of view other than a common field of view. | 09-06-2012 |
20130027546 | IMAGE MEASUREMENT APPARATUS, IMAGE MEASUREMENT METHOD, PROGRAM AND RECORDING MEDIUM - A marker is provided on a support member. A marker position detector detects a specific position of the marker from an image obtained by capturing an object to be measured and the marker by an image sensor. A shift amount calculator obtains a difference between a reference position of the specific position stored in a memory and the detected position, and calculates a shift amount of the image. A correction amount calculator obtains a correction amount, which cancels the calculated shift amount. An image corrector corrects the image with the obtained correction amount, thus obtaining the image with the distortion corrected. A measure measures a picture of the object to be measured by using the image with the distortion corrected. Accordingly, the distortion of the image is corrected with ease with respect to a relative movement between the object to be measured and the image sensor. | 01-31-2013 |
20140371910 | ROBOT SYSTEM AND ROBOT CONTROL METHOD - A robot system includes a robot body, a camera mounted on the robot body and capable of photographing a work piece; and a control device for driving and controlling the robot body based on a trajectory to an instruction point, which is set in advance, and, when the camera arrives at an area in which the camera is capable of photographing the work piece during this driving and controlling, driving and controlling the robot body so that the camera moves linearly toward the work piece, taking an image of the work piece with the camera while the camera is moving linearly, and measuring a position of the work piece from the taken image. | 12-18-2014 |
20150326784 | IMAGE CAPTURING CONTROL METHOD AND IMAGE PICKUP APPARATUS - An image of a work is formed such that the image moves in a fixed direction across an image sensing area of an image sensor. The image of the work is captured by the image sensor when it is at an image capture position, and image data thereof is output in a predetermined output format. The image sensor has an extraction area having a small image size or a small pixel density and is located on a side of an image sensing area of the image sensor from which the moving object enters the image sensing area. When it is detected in this extraction area that the object has arrived at a preliminary detection position located before the image capture position, the mode of the image sensor is switched such that image data is output in the output format, and the image data is output in this output format. | 11-12-2015 |
Patent application number | Description | Published |
20140077155 | LED ARRAY - An LED array includes a substrate and a semiconductor structure layer provided on the substrate. The semiconductor structure layer includes a first semiconductor layer, an active layer formed on the first semiconductor layer, and a second semiconductor layer formed on the active layer. The semiconductor structure layer is partitioned into a plurality of light emitting sections by grooves formed in the semiconductor structure layer. Each groove is defined by two opposite side faces of adjacent light emitting sections. Each side face has a recessed and protruding configuration. In one embodiment, the protrusions and recesses of one side face of one light emitting section fit in respective recesses and protrusions of a corresponding side face of an adjacent light emitting section. | 03-20-2014 |
20140131745 | SEMICONDUCTOR LIGHT EMITTING DEVICE - An LED device includes first and second LED elements containing a lower layer of first conductivity type, an active layer, and an upper layer of second conductivity type, wherein the second LED element has third and fourth electrodes on the lower layer, recessed portion having a side surface exposing the upper, active and lower layers, and reaching the third electrode, fifth electrode disposed on the upper layer extending on the side surface of the recessed portion, and connected with the third electrode, and groove extending from the upper layer and reaching the active layer between the third and fourth electrodes to electrically separate the third electrode from the fourth electrode. | 05-15-2014 |
20140319455 | SEMICONDUCTOR LIGHT EMITTING APPARATUS - A semiconductor light emitting apparatus includes semiconductor lamination of n-type layer, active layer, and p-type layer; recess penetrating the lamination from the p-type layer and exposing the n-type layer; n-side electrode formed on the n-type layer at the bottom of the recess and extending upward above the p-type layer; a p-side electrode formed on the p-type layer and having an opening surrounding the recess in plan view, the n-side electrode extending from inside to above the recess; and an insulating layer disposed between the p-side and the n-side electrodes on the p-type layer, the p-side electrode constituting a reflective electrode reflecting light incident from the active layer, the n-side electrode including a reflective electrode layer covering the opening in plan view and reflects light incident from the emission layer side, the reflective electrode layer having peripheral portion overlapping peripheral portion of the p-side electrode in plan view. | 10-30-2014 |
20140319534 | SEMICONDUCTOR LIGHT EMITTING ELEMENT - A semiconductor light emitting element comprises an optical semiconductor laminated layer providing vias, an electrode that is disposed on a surface of the optical semiconductor laminated layer and separated from the second semiconductor layer in a peripheral portion of the electrode, a first transparent insulating layer that is disposed between the peripheral portion of the electrode and the optical semiconductor laminated layer, and a second transparent insulating layer that is disposed to cover the electrode, that envelops the peripheral portion of the electrode together with the first transparent insulating layer. | 10-30-2014 |