Patent application number | Description | Published |
20100072245 | High speed and fine substrate alignment apparatus in roll to roll system - Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate. | 03-25-2010 |
20100072661 | Method of manufacturing mold for nano imprint and pattern forming method using the mold for nano imprint - Disclosed herein are a method of manufacturing various replica molds for nano imprint using nano imprint and etching and a method of forming a multi-step pattern or a micro pattern through a nano imprint process using the manufactured replica molds for nano imprint. A pattern forming method using nano imprint may include applying a mold resin between a substrate having a first pattern patterned thereon and a master mold with a second pattern patterned thereon, aligning the substrate and the master mold to imprint a pattern, curing the mold resin, separating the master mold from the substrate, and etching the cured mold resin to manufacture a replica mold for nano imprint. The method may also include forming an imprint resin on a forming substrate, pressing the replica mold into the imprint resin, curing the imprint resin, separating the replica mold from the imprint resin, and washing the first imprint resin. | 03-25-2010 |
20100072675 | Method of forming a pattern using nano imprinting and method of manufacturing a mold to form such a pattern - Example embodiments relate to a method of forming a three-dimensional micro pattern or a multi-step pattern using a nano imprinting process and a method of manufacturing a mold to form such a pattern. A molding polymer may be patterned in a one-step shape on a substrate having UV barrier patterns, thereby easing the manufacture of a mold for multi-step imprinting and simplifying the formation of a multi-step pattern using the one-step shaped mold by avoiding the repetition of more complicated processes. Consequently, it may be possible to form a relatively large-area micro pattern, a relatively large-area pattern usable in flat panel displays, and a nano pattern having a size of several tens of nanometers in a semiconductor process, thereby contributing to the reduction of process costs, the reduction of process time, and the improvement of production yield. | 03-25-2010 |
20100096770 | Method for fabrication of mold for nano imprinting and method for production of photonic crystal using the same - A manufacturing process using a replica mold for nano imprinting having a grid type pattern by combining a nano imprint with a dry etching process is disclosed. In order to attain such a manufacturing process, a method of fabricating a mold for nano imprinting may include arranging a master mold having first patterns over a substrate having metal patterns so that both the first pattern and the metal pattern cross over each other, applying resin between the master mold and the substrate, applying an imprinting treatment of the substrate as well as the master mold, hardening the resin, and etching the hardened resin after the master mold is released, so as to form a replica mold for nano imprint. The nano imprinting process and the etching process may easily form a pattern in a more complicated structure, and therefore, may improve production yield and reduce processing time thereof. | 04-22-2010 |
20100140220 | Nano-imprint lithography methods - In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask. | 06-10-2010 |
20100282162 | Roll-to-roll patterning apparatus and patterning system having the same - Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers. | 11-11-2010 |
20100290143 | Color filter and apparatus and method of manufacturing the same - Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed. | 11-18-2010 |
20110300345 | Surface Having Superhydrophobic Region And Superhydrophilic Region - According to an example embodiment, a patterned surface includes a micro-structural surface with a micro or nano pattern on a substrate, wherein the micro-structural surface has superhydrophobic regions and superhydrophilic regions. | 12-08-2011 |
20120080819 | PATTERNING MOLD AND MANUFACTURING METHOD THEREOF - Disclosed herein is a patterning mold to form a micropattern on a substrate or glass. The disclosed patterning mold includes a body having a patterning part formed at one end of the body. The patterning part may be configured to contact a surface of the substrate, to form a channel. In example embodiments, an ink supply passage communicating with the channel may be formed in the patterning mold, to supply an ink to the channel. In example embodiments, a fixing member is coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body. | 04-05-2012 |
20120082745 | PATTERNING MOLD AND MANUFACTURING METHOD THEREOF - Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body. | 04-05-2012 |
20120108717 | INK COMPOSITION FOR FLEXO PRINTING - An ink composition for flexo printing contains a dye type colorant in order to precisely print. The ink composition for flexo printing includes about 1 to 40 wt. % of a colorant, about 5 to 40 wt. % of a binder, about 20 to 95 wt. % of a solvent and a remainder of an additive, wherein the wt. % of the colorant, the binder, the solvent and the additive is based on a total weight of the ink composition. | 05-03-2012 |
20120160112 | Local Printing Apparatus And Method - According to example embodiments, a printing apparatus includes a wafer delivery unit configured to move and support a wafer, an optical microscope configured to inspect the wafer, a pattern transfer unit configured to display a position of a defect on the wafer detected using the optical microscope. | 06-28-2012 |