Dongkwan
Dongkwan Kim, Suwon-Si KR
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20100183227 | Person detecting apparatus and method and privacy protection system employing the same - A person detection apparatus and method, and a privacy protection system using the method and apparatus, the person detection apparatus includes: a motion region detection unit, which detects a motion region from a current frame image using motion information between frames; and a person detecting/tracking unit, which detects a person in the detected motion region using shape information of persons, and performs a tracking process on a motion region detected as the person in a previous frame image within a predetermined tracking region. | 07-22-2010 |
Dongkwan Kim, Gyeonggi-Do KR
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20100077307 | SYSTEM AND METHOD FOR PRODUCING VIDEO MAP - Disclosed is a system and method for providing a moving picture map, the system including: a moving picture upload part for uploading moving pictures for one or more objects; and a map provision part for forming a moving picture map showing relations to other moving pictures according to subject matters, based on indexes corresponding to the moving pictures, and providing the moving picture map to a user interface for a moving picture search. Therefore, a user can be allowed to easily retrieve a number of moving pictures, and a manual and a review about a predetermined product can be made in a moving picture format for provision of the moving picture containing the manual and the review to consumers. | 03-25-2010 |
Dongkwan Kim, Broomfield, CO US
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20110166306 | Methods For Extensive Dark Curing Based on Visible-Light Initiated, Controlled Radical Polymerization - Optimized methods to achieve extensive dark curing from a three-component visible light-initiated system though controlled radical polymerization and compositions useful in these optimized methods are provided. These compositions and methods are particularly suited for use in certain dental applications. | 07-07-2011 |
Dongkwan Lee, Bridgewater, NJ US
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20100183851 | Photoresist Image-forming Process Using Double Patterning - A process for forming a double photoresist pattern is disclosed. | 07-22-2010 |
20120028195 | Composition for Coating over a Photoresist Pattern - The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention. | 02-02-2012 |
Dongkwan Won, Changwon-Si KR
Patent application number | Description | Published |
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20150348666 | GRAPHENE, COMPOSITION FOR PREPARING GRAPHENE, AND METHOD OF PREPARING GRAPHENE USING THE COMPOSITION - Graphene, a composition for preparing graphene, and a method of preparing graphene using the composition are disclosed. | 12-03-2015 |