Patent application number | Description | Published |
20090016205 | Optical Recording Medium and Method for Reproducing Information From Optical Recording Medium - An optical recording medium includes a substrate, a first dielectric layer, a recording layer, a second dielectric layer, a super-resolution layer, and a third dielectric layer, which are provided in that order. The super-resolution layer is formed of a material configured such that voids are generated when the material is irradiated with DC light at a predetermined irradiation power for 1 to 300 seconds. Therefore, super-resolution reproduction can be made such that the irradiation power of a readout laser beam does not depend on the size of a recording mark. | 01-15-2009 |
20090269542 | OPTICAL RECORDING MEDIUM - An object of the invention is to write-once record and reproduce, or only reproduce, a mark smaller than the resolution limit; obtain a high level of reproduction performance (CNR and the like); and realize a high level of reproduction durability. In the invention, between a signal reproducing functional layer composed of Sb or Te and a protecting layer there is introduced a thermally stable diffusion preventing layer, and thereby reactions between the signal reproducing functional layer and the protecting layer due to increased temperature can be prevented or suppressed while increasing reproduction durability. | 10-29-2009 |
20090323071 | OPTICAL MEASUREMENT APPARATUS AND OPTICAL MEASUREMENT METHOD FOR A LIQUID OR MOLTEN MATERIAL - An apparatus for optical measurement of a liquid or molten material, which has: a transparent container which has a bottom face and is capable of containing a to-be-measured material therein, with the bottom face at least having a flat face and being transparent; and an optical device that irradiates a light to the bottom face of the container and that detects and measures a reflected light from the bottom face; and a method for optically measuring a liquid or molten material using the apparatus. | 12-31-2009 |
20100055397 | MOLD FOR OPTICAL DEVICE WITH ANTI-REFLECTION STRUCTURE, METHOD FOR PRODUCING THE SAME, AND OPTICAL DEVICE - A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semispherical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical island-like microparticles; and using the multiple islandlike microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum. | 03-04-2010 |
20100075114 | MOLD FOR OPTICAL ELEMENT, HAVING NANOSTRUCTURE, MOLD FOR NANOSTRUCTURE, METHOD FOR MANUFACTURING THE MOLD, AND OPTICAL ELEMENT - This invention provides a method for manufacturing a mold for an optical element having a nanostructure of nano-order fine depressions and elevations on a surface of a substrate. The method includes: forming at least one etching transfer layer on the substrate, and forming a thin film for hemispherical fine particle formation on the etching transfer layer; forming multiple hemispherical island-shaped fine particles, with any of thermal-, photo- and gas reactions or combination thereof to cause any of aggregation, decomposition and nucleation functions of a material of the thin film; and forming a conical pattern on the fine surface of the substrate, by successively etching the etching transfer layer and the substrate with a reactant gas, using the multiple island-shaped fine particles as a protective mask, thereby manufacturing a mold for an optical element having fine depressions and elevations or a nanostructure mold face on the surface of the substrate. | 03-25-2010 |
20100091639 | OPTICAL RECORDING MEDIUM FOR PERFORMING SUPER RESOLUTION REPRODUCTION AND OPTICAL RECORDING AND REPRODUCTION METHOD THEREOF - The invention performs super resolution reproduction with a recording layer and a signal reproducing functional layer laminated on a grooved substrate. A length of a mark recorded in a Mark Position method is only one length that is less than the resolution limit in an optical system to be used, and recording marks are formed both on a land and in a groove of the grooved substrate. | 04-15-2010 |
20100167015 | ETCHING RESIST - An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor. | 07-01-2010 |
20100181548 | SOLID-STATE MEMORY AND SEMICONDUCTOR DEVICE - A solid memory may include a recording layer including Ge, Sb and Te as major components. The recording layer may include a superlattice. The recording layer may include multi-layers each having a parent phase showing a phase transformation in solid-states, the phase transformation causing change in electrical property of the recording layer. The recording layer may include an Sb | 07-22-2010 |
20120300305 | MOLD FOR OPTICAL DEVICE WITH ANTI-REFLECTION STRUCTURE, METHOD FOR PRODUCING THE SAME, AND OPTICAL DEVICE - A process for producing through simple operations a molding die for optical device having an antireflective structure of nano-order microscopic uneven plane on a substratum surface. The molding die for optical device having microscopic uneven plane (antireflective structure die plane) on a surface of substratum is produced by a process comprising forming one or more etching transfer layers on substratum; forming thin film for formation of semisperical microparticles on the etching transfer layers; causing the thin film to undergo aggregation, or decomposition, or nucleation of the material by the use of any of thermal reaction, photoreaction and gas reaction or a combination of these reactions so as to form multiple semispherical islandlike microparticles; and using the multiple island like microparticles as a protective mask, carrying out sequential etching of the etching transfer layers and substratum by reactive gas to thereby form a conical pattern on the microscopic surface of the substratum. | 11-29-2012 |