Patent application number | Description | Published |
20130208605 | METHOD AND APPARATUS FOR UE-BASED HANDOVER DURING NETWORK COVERAGE HOLES - Apparatus and methods are described herein for efficiently handing over a user equipment from an earlier-technology network back to a later-technology network upon detecting the end of a coverage hole in the later-technology network. The UE may be configured to measure signals from the later-technology network. When the UE discovers, upon establishment or reestablishment of a PS data connection, that the later-technology network signal exceeds a defined threshold, the UE may initiate a handover back to the later-technology network. | 08-15-2013 |
20130258883 | DYNAMIC MEASUREMENT RATES TO SPEED UP CELL RESELECTIONS - A method, an apparatus, and a computer program product for wireless communication are provided in which a switch to a second network is facilitated by increasing a rate of measurement of certain quantities of the second network while in an idle state in a first network. The rate of measurement maybe increased to an integer multiple of a frequency associated with a discontinuous reception cycle configured for the first network. | 10-03-2013 |
20140198659 | CELL RANGE EXPANSION ELASTICITY CONTROL - In some aspects, a method for carrying out load balancing between cells in a heterogeneous network includes measuring loads within macro clusters in the network. The method additionally includes identifying one or more macro clusters experiencing unbalanced load conditions, and sending balancing indicators to one or more cells in the identified macro cluster(s). In other aspects, a method for carrying out load balancing in a heterogeneous network includes reporting cell loads within a macro cluster, and monitoring for balancing indicators. The method further includes responding to a balancing indicator by iteratively adjusting a value of an individual cell offset for a cell until one or more conditions is satisfied. Example conditions include accomplishment of handover, to or from the cell, of one or more low mobility User Equipment (UE), and making a determination that the value of the individual cell offset has reached a threshold prohibiting further adjustment. | 07-17-2014 |
20150092751 | CELL RANGE EXPANSION ELASTICITY CONTROL - In some aspects, a method for carrying out load balancing between cells in a heterogeneous network includes measuring loads within macro clusters in the network. The method additionally includes identifying one or more macro clusters experiencing unbalanced load conditions, and sending balancing indicators to one or more cells in the identified macro cluster(s). In other aspects, a method for carrying out load balancing in a heterogeneous network includes reporting cell loads within a macro cluster, and monitoring for balancing indicators. The method further includes responding to a balancing indicator by iteratively adjusting a value of an individual cell offset for a cell until one or more conditions is satisfied. Example conditions include accomplishment of handover, to or from the cell, of one or more low mobility User Equipment (UE), and making a determination that the value of the individual cell offset has reached a threshold prohibiting further adjustment. | 04-02-2015 |
20150230223 | USER EQUIPMENT (UE) AUTONOMOUS SWITCHING OF SIMULTANEOUS PHYSICAL UPLINK SHARED CHANNEL (PUSCH) AND PHYSICAL UPLINK CONTROL CHANNEL (PUCCH) TRANSMISSIONS - Certain aspects provide a method for autonomous switching of simultaneous physical uplink shared channel (PUSCH) and physical uplink control channel (PUCCH) transmissions by a user equipment (UE). A method for wireless communications by a UE is provided. The method generally includes determining whether a power limited condition exists and transmitting simultaneously on multiple uplink channels or transmitting on a single uplink channel based on the determination. | 08-13-2015 |
Patent application number | Description | Published |
20110209660 | METHODS AND APPARATUS FOR DEPOSITION PROCESSES - Methods and apparatus for deposition processes are provided herein. In some embodiments, an apparatus may include a substrate support comprising a susceptor plate having a pocket disposed in an upper surface of the susceptor plate and having a lip formed in the upper surface and circumscribing the pocket, the lip configured to support a substrate on the lip; and a plurality of vents extending from the pocket to the upper surface of the susceptor plate to exhaust gases trapped between the backside of the substrate and the pocket when a substrate is disposed on the lip. Methods of utilizing the inventive apparatus for depositing a layer on a substrate are also disclosed. | 09-01-2011 |
20120270384 | APPARATUS FOR DEPOSITION OF MATERIALS ON A SUBSTRATE - Methods and apparatus for deposition of materials on a substrate are provided herein. In some embodiments, an apparatus for processing a substrate may include a process chamber having a substrate support disposed therein to support a processing surface of a substrate, an injector disposed to a first side of the substrate support and having a first flow path to provide a first process gas and a second flow path to provide a second process gas independent of the first process gas, wherein the injector is positioned to provide the first and second process gases across the processing surface of the substrate, a showerhead disposed above the substrate support to provide the first process gas to the processing surface of the substrate, and an exhaust port disposed to a second side of the substrate support, opposite the injector, to exhaust the first and second process gases from the process chamber. | 10-25-2012 |
20140273518 | METHODS FOR FORMING LAYERS ON SEMICONDUCTOR SUBSTRATES - Methods of forming a layer on a substrate may include providing a substrate to a process chamber, the process chamber having a gas port, an exhaust, and a plasma port disposed between the gas port and the exhaust; providing a process gas from the gas port in a first direction such that the process gas flows across the substrate; providing a plasma such that a flow of the plasma interacts with a flow of the process gas at an angle that is non-perpendicular; and rotating the substrate while providing the process gas and the plasma, wherein a thickness profile of the layer is controlled by adjusting at least one of a flow velocity of the process gas, a flow velocity of the plasma, the angle the flow of the plasma interacts with the flow of the process gas, or a direction of rotation of the substrate. | 09-18-2014 |
Patent application number | Description | Published |
20100075488 | CVD REACTOR WITH MULTIPLE PROCESSING LEVELS AND DUAL-AXIS MOTORIZED LIFT MECHANISM - An apparatus for processing a substrate, comprising a processing chamber and a substrate support and lift pin assembly disposed within the chamber. The substrate support and lift pin assembly are coupled to a lift mechanism that controls positioning of the substrate support and the lift pins and provides rotation for the substrate support. The lift mechanism includes at least one sensor capable of generating a signal when clearance between the substrate support and the lift pins allows rotation of the substrate support to begin. The substrate support capable of concurrent axial motion and rotation may be used in a processing chamber comprising multiple processing zones separated by edge rings. Substrates may be subjected to successive or cyclical processes by moving between the multiple processing zones. | 03-25-2010 |
20140113458 | MINIMAL CONTACT EDGE RING FOR RAPID THERMAL PROCESSING - Embodiments of the disclosure generally relate to a support ring that supports a substrate in a process chamber. In one embodiment, the support ring comprises an inner ring, an outer ring connecting to an outer perimeter of the inner ring through a flat portion, an edge lip extending radially inwardly from an inner perimeter of the inner ring to form a supporting ledge, and a substrate support extending upwardly from a top surface of the edge lip. The substrate support may be a continuous ring-shaped body disposed around a circumference of the edge lip. The substrate support supports a substrate about its entire periphery from the back side with minimized contact surface to thermally disconnect the substrate from the edge lip. Particularly, the substrate support provides a substantial line contact with the back surface of the substrate. | 04-24-2014 |
20140265101 | MINIMAL CONTACT EDGE RING FOR RAPID THERMAL PROCESSING - Embodiments of the present invention generally relate to a support ring for supporting a substrate during thermal processing in a process chamber. The support ring generally includes a ring body, an outer rib extending from a first surface of the ring body, a midrib extending from the first surface of the ring body, and a substrate support extending from a second surface of the ring body. The support ring reduces thermal coupling between a substrate and the support ring. | 09-18-2014 |
Patent application number | Description | Published |
20110174212 | EPITAXIAL CHAMBER WITH CROSS FLOW - Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a substrate support disposed therein to support a processing surface of a substrate at a desired position within the process chamber; a first inlet port to provide a first process gas over the processing surface of the substrate in a first direction; a second inlet port to provide a second process gas over the processing surface of the substrate in a second direction different from the first direction, wherein an azimuthal angle measured between the first direction and the second direction with respect to a central axis of the substrate support is up to about 145 degrees; and an exhaust port disposed opposite the first inlet port to exhaust the first and second process gases from the process chamber. | 07-21-2011 |
20140105582 | MINIMAL CONTACT EDGE RING FOR RAPID THERMAL PROCESSING - Embodiments of edge rings for substrate supports of semiconductor substrate process chambers are provided herein. In some embodiments, an edge ring for a semiconductor process chamber may include an annular body having a central opening, an inner edge, an outer edge, an upper surface, and a lower surface, an inner lip disposed proximate the inner edge and extending downward from the upper surface, and a plurality of protrusions extending upward from the inner lip and disposed along the inner edge of the annular body, wherein the plurality of protrusions are arranged to support a substrate above the inner lip and over the central opening, wherein the inner lip is configured to substantially prevent light radiation from travelling between a first volume disposed above the edge ring and a second volume disposed below the edge ring when a substrate is disposed on the plurality of protrusions. | 04-17-2014 |
20150162230 | APPARATUS FOR SELF-CENTERING PRE-HEAT RING - Embodiments described herein generally relate to an apparatus for aligning a preheat member. In one embodiment, an alignment assembly is provided for a processing chamber. The alignment assembly includes a lower liner, a preheat member; an alignment mechanism formed on a bottom surface of the preheat member; and an elongated groove formed in a top surface of the lower liner and configured to engage with the alignment mechanism. | 06-11-2015 |
20150329966 | SHOWERHEAD DESIGN - Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned. | 11-19-2015 |
20150340266 | THERMAL PROCESSING SUSCEPTOR - In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim. | 11-26-2015 |
20150368796 | APPARATUS FOR GAS INJECTION TO EPITAXIAL CHAMBER - Embodiments described herein generally relate to apparatus for forming silicon epitaxial layers on semiconductor devices. Deposition gases and etching gases may be provided sequentially or simultaneously to improve epitaxial layer deposition characteristics. A gas distribution assembly may be coupled to a deposition gas source and an etching gas source. Deposition gas and etching gas may remain separated until the gases are provided to a processing volume in a processing chamber. Outlets of the gas distribution assembly may be configured to provide the deposition gas and etching gas into the processing volume with varying characteristics. In one embodiment, outlets of the gas distribution assembly which deliver etching gas to the processing volume may be angled upward relative to a surface of a substrate. | 12-24-2015 |
20150368829 | SUBSTRATE THERMAL CONTROL IN AN EPI CHAMBER - In one embodiment, a susceptor for a thermal processing chamber is provided. The susceptor includes a base having a front side and a back side made of a thermally conductive material opposite the front side, wherein the base includes a peripheral region surrounding a recessed area having a thickness that is less than a thickness of the peripheral region, and a plurality of raised features protruding from one or both of the front side and the back side. | 12-24-2015 |
20160133504 | SUSCEPTOR DESIGN TO REDUCE EDGE THERMAL PEAK - Implementations of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one implementation, the susceptor includes a first rim surrounding and coupled to an inner region, and a second rim disposed between the inner rim and the first rim. The second rim includes an angled support surface having a plurality of cut-outs formed therein, and the angled support surface is inclined with respect to a top surface of the inner region. | 05-12-2016 |
Patent application number | Description | Published |
20100129482 | Intermittent flow extrusion process and food product - An extrusion process incorporates a forming manifold where a tubular flow of a second material is intermittently interrupted while a core flow of a first material is discharged substantially continuously. Subsequently, the core flow is severed to form individual food items or treats for humans, animals, and the like, where the tubular flow results in an outer component surrounding an inner component which protrudes from one or both ends of the outer component. Material of the core flow is bone-like, while material of the tubular flow is meat like. Material of the tubular flow may include material from the core flow subjected to mixing in a static mixer to achieve a marbled texture of the outer material. | 05-27-2010 |
20100129498 | Intermittent flow extrusion process and food product - An extrusion process incorporates a forming manifold where a tubular flow of a second material is intermittently interrupted while a core flow of a first material is discharged substantially continuously. Subsequently, the core flow is severed to form individual food items or treats for humans, animals, and the like, where the tubular flow results in an outer component surrounding an inner component which protrudes from one or both ends of the outer component. Material of the core flow is bone-like, while material of the tubular flow is meat like. Material of the tubular flow may include material from the core flow subjected to mixing in a static mixer to achieve a marbled texture of the outer material. | 05-27-2010 |
20100303970 | CAT TREAT - A pet treat having a sugar-based edible portion including a palatant material and a support portion. Incorporation of starch provides a hard-candy texture for the edible portion. The pet treat may be formed as a lollipop, a toy, or a lozenge using either a batch process or a continuous process. Features to interest a pet include a resilient mount, or a rotatable mount. An adhesive mount can attach the support to a variety of surfaces. A replaceable cover and rejuvenant container may be used. | 12-02-2010 |
20100304002 | CAT TREAT - A pet treat having a sugar-based edible portion including a palatant material and a support portion. Incorporation of starch provides a hard-candy texture for the edible portion. The pet treat may be formed as a lollipop, a toy, or a lozenge using either a batch process or a continuous process. Features to interest a pet include a resilient mount, or a rotatable mount. An adhesive mount can attach the support to a variety of surfaces. A replaceable cover and rejuvenant container may be used. | 12-02-2010 |
20120058227 | Dog Chew Treats - A dog chew treat is fashioned from a composition comprising sugar, fiber, and flour. Preferably, the sugar is dextrose, and the flour is pre-gelatinized wheat flour. The composition may be molded into the shape of a bone, or other treat. A palatant coating may be applied to the molded product. Colors may be added for different aesthetics such as a marbling pattern. Functional ingredients may be used to provide health benefits. | 03-08-2012 |
20140335223 | PET TREAT - A pet treat is disclosed, which includes a rotatable, lickable spherical portion; and a support having an internal cavity shaped to conform to the outside of the spherical portion, and wherein the spherical portion is freely rotatable within the support. | 11-13-2014 |
Patent application number | Description | Published |
20110258442 | System and method for secured peer-to-peer broadcast of instantaneous testimony in text format - A method and apparatus for securely broadcasting an instantaneous deposition testimony is provided. The method includes capturing a witness's testimony, authenticating the testimony, transmitting the testimony in instantaneous to authorized subscribers, viewers and participants remotely located from the deposition through a peer-to-peer network connection using the Internet. Accordingly, the invention allows subscribing attorneys to interactively access and save the textual deposition documents, while also allowing interactive communication between the deposing attorney and attorneys or colleagues at the home-office or other remote locations, during the deposition. | 10-20-2011 |
20110258657 | System and method for secured digital video broadcasting of instantaneous testimony - A method and apparatus for securely broadcasting an instantaneous deposition testimony video stream is provided. The method includes capturing a witness's testimony via video, audio and text, authenticating the testimony, transmitting the testimony instantaneously to authorized subscribers, viewers and participants remotely located from the deposition through a peer-to-peer network connection using the Internet. Accordingly, the invention allows subscribing attorneys to interactively access and save the textual, video and audio deposition contents, while also allowing interactive communication between the deposing attorney and attorneys or colleagues at the home-office or other remote locations, during the deposition. | 10-20-2011 |