Patent application number | Description | Published |
20080200100 | Substrate Processing Apparatus - A substrate processing apparatus ( | 08-21-2008 |
20080274670 | Substrate Peripheral Portion Measuring Device, and Substrate Peripheral Portion Polishing Apparatus - A projecting/receiving unit ( | 11-06-2008 |
20090004952 | Polishing apparatus and polishing method - A polishing apparatus according to the present invention is suitable for use in polishing a periphery of a substrate such as a semiconductor wafer. The polishing apparatus includes a holding section configured to hold the workpiece, a polishing head configured to bring the polishing tape into contact with the workpiece, a supply reel configured to supply the polishing tape to the polishing head, a rewind reel configured to rewind the polishing tape that has contacted the workpiece, and a swinging mechanism configured to cause the polishing head to perform a swinging motion with its pivot lying on a predetermined point. | 01-01-2009 |
20090017730 | Polishing apparatus and polishing method - A polishing apparatus has a polishing tape ( | 01-15-2009 |
20090017733 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus ( | 01-15-2009 |
20090093192 | DEVICE FOR AND METHOD OF POLISHING PERIPHERAL EDGE OF SEMICONDUCTOR WAFER - A device for polishing the peripheral edge part of a semiconductor wafer includes a wafer stage for holding the wafer, a wafer stage unit including devices for rotating the wafer stage, causing the wafer stage to undergo a rotary reciprocating motion within the same plane as the surface of the wafer stage, and moving the wafer stage parallel to the surface, a notch polishing part for polishing the notch on the wafer and a bevel polishing part for polishing the beveled part of the wafer. Pure water is supplied to the wafer to prevent it from becoming dry as it is transported from the notch polishing part to the bevel polishing part. | 04-09-2009 |
20090142992 | Polishing apparatus and polishing method - The present invention provides a polishing apparatus for polishing a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position. | 06-04-2009 |
20090325465 | POLISHING APPARATUS, POLISHING METHOD, AND PROCESSING APPARATUS - The present invention provides a polishing apparatus and a polishing method capable of calculating outside diameters of rolls of a polishing tape on a polishing-tape supply reel and a polishing-tape recovery reel and capable of calculating a remaining amount of the polishing tape and a consumption of the polishing tape from the outside diameters of the rolls. This polishing apparatus includes a polishing-tape supply reel ( | 12-31-2009 |
20100178851 | POLISHING APPARATUS AND POLISHING METHOD - A polishing apparatus for polishing a periphery of a substrate includes a substrate holder configured to rotate the substrate, a first polishing section configured to polish the periphery of the substrate by bringing a polishing layer of a first polishing tool into contact with the periphery of the substrate when rotated by the substrate holder, and a second polishing section configured to polish the periphery of the substrate by bringing a polishing layer of a second polishing tool into contact with the periphery of the substrate when rotated by the substrate holder. The polishing layer of the first polishing tool has hard first abrasive grains, and the polishing layer of the second polishing tool has second abrasive grains that are softer than the first abrasive grains. | 07-15-2010 |
20100267317 | Substrate holder and substrate holding method - A substrate holder is a mechanism for holding a substrate, to be polished, by vacuum suction. The substrate holder includes a substrate-holding stage having a suction surface for the substrate, and a fluid passage selectively coupled to a vacuum source and a fluid supply source. The suction surface has a plurality of closed sections surrounded by convexities, and the fluid passage includes a plurality of communication passages which are in fluid communication with the plurality of closed segments respectively and independently. | 10-21-2010 |
20110003537 | POLISHING APPARATUS AND POLISHING METHOD - A polishing apparatus according to the present invention includes a substrate holder ( | 01-06-2011 |
20110003540 | POLISHING APPARATUS - A polishing apparatus according to the present invention includes a polishing tape ( | 01-06-2011 |
20110165825 | POLISHING APPARATUS - A polishing apparatus according to the present invention is a polishing apparatus for polishing a periphery (a bevel portion, a notch portion, an edge-cut portion) of a substrate (W) by bringing a polishing tool ( | 07-07-2011 |
20120061309 | SEAWATER DESALINATION SYSTEM AND ENERGY EXCHANGE CHAMBER - A seawater desalination system which can solve a problem of wear of a sliding member and can suppress mixing of concentrated seawater and seawater by making an energy exchange chamber no-piston configuration is provided. | 03-15-2012 |
20120208437 | POLISHING APPARATUS AND POLISHING METHOD - A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position. | 08-16-2012 |
20120267292 | SEAWATER DESALINATION SYSTEM AND ENERGY EXCHANGE CHAMBER - An energy exchange chamber is used for exchanging pressure energy between concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus and a part of seawater to be treated by the reverse-osmosis membrane separation apparatus in a seawater desalination system. The energy exchange chamber includes a concentrated seawater distributor communicating with a concentrated seawater port and configured to distribute a flow of the concentrated seawater flowing therein all over a horizontal plane of an interior of a chamber, and a seawater distributor communicating with a seawater port and configured to distribute a flow of the seawater flowing therein all over a horizontal plane of the interior of the chamber. The concentrated seawater and the seawater introduced into the chamber are brought into direct contact with each other over the horizontal plane of the interior of the chamber to exchange pressure energy between the concentrated seawater and the seawater. | 10-25-2012 |
20130233785 | SEAWATER DESALINATION SYSTEM AND ENERGY RECOVERY APPARATUS - An energy recovery apparatus exchanges pressure energy between concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus and a part of seawater to be treated by the reverse-osmosis membrane-separation apparatus in a seawater desalination system for producing fresh water from the seawater. The energy recovery apparatus includes two perforated plates provided at a concentrated seawater port side in a chamber, and two perforated plates provided at a seawater port side in the chamber. The two perforated plates comprises a first perforated plate and a second perforated plate. The first perforated plate and the second perforated plate at the concentrated seawater port side and the seawater port side are arranged to meet certain requirements including one of an open area ratio of the first perforated plate, an open area ratio of the second perforated plate, and a distance between the first perforated plate and the second perforated plate. | 09-12-2013 |
20140021122 | SEAWATER DESALINATION SYSTEM AND ENERGY EXCHANGE CHAMBER - A seawater desalination system produces fresh water from seawater by passing the seawater pressurized by a pump through a reverse-osmosis membrane-separation apparatus to separate the seawater into fresh water and concentrated seawater. An energy exchange chamber is provided for utilizing pressure energy of the concentrated seawater discharged from the reverse-osmosis membrane-separation apparatus as energy for pressurizing part of the seawater. The energy exchange chamber includes a concentrated seawater port for introducing and discharging the concentrated seawater, a seawater port for introducing and discharging the seawater, and a plurality of partitioned fluid passages provided in the chamber to allow the concentrated seawater port and the seawater port to communicate with each other. | 01-23-2014 |