Enyama
Juichi Enyama, Hitachi JP
Patent application number | Description | Published |
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20090205194 | ELECTRIC ROTATING MACHINE AND MANUFACTURING METHOD OF THE SAME - A electric rotating machine includes a rotor winding constituting a part of a rotor, a conductor provided in a center portion in a radial direction of a rotor body for supplying electricity to the rotor winding from the outside, a leader drawn from the conductor to an outside diameter side, and a connecting line constructed by stacking a plurality of conductor plates to electrically connect the rotor winding and the leader. The connecting line consists of a radial direction linear portion which is straight in the radial direction on the leader side, and a bending portion which branches into two routes toward opposite directions to each other in a rotor shaft direction from the radial direction linear portion and has a linear portion formed at a part of the bending portion. The linear portion of the bending portion is joined to a bottom surface of the rotor winding. | 08-20-2009 |
20130214636 | ROTOR COIL FOR ARMATURE OF ROTATING MACHINE AND PRODUCTION METHOD THEREOF - A rotor coil for a revolving armature includes a strand coil that includes a part arranged in a core slot of the rotor and is composed of a plurality of element wires; and a solid coil welded to an end of the strand coil wherein the end of the strand coil and an end of the solid coil are welded by friction stir welding. A manufacturing method of a rotor coil includes the step of performing friction stir welding wherein the friction stir welding is performed for the butt joint with the end of the strand coil arranged in an advancing side defined by a rotation direction of a tool and with the solid coil arranged in a retreating side. | 08-22-2013 |
Momoyo Enyama, Kunitachi JP
Patent application number | Description | Published |
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20100065753 | CHARGED PARTICLE BEAM APPARATUS - With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system. | 03-18-2010 |
20110272576 | CHARGED PARTICLE BEAM APPLIED APPARATUS - Provided is a multi-beam type charged particle beam applied apparatus in an implementable configuration, capable of achieving both high detection accuracy of secondary charged particles and high speed of processing characteristically different specimens. An aperture array ( | 11-10-2011 |
20120061565 | CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD - Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors ( | 03-15-2012 |
20130248731 | ELECTRON BEAM APPARATUS AND LENS ARRAY - There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface. | 09-26-2013 |
20130299697 | CHARGED PARTICLE BEAM APPLIED APPARATUS, AND IRRADIATION METHOD - Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section includes a beam splitting electrode, a lens array upper electrode, a lens array middle electrode, a lens array lower electrode and a movable stage, and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage, of a plurality of aperture pattern sets. | 11-14-2013 |
Momoyo Enyama, Kokubunji JP
Patent application number | Description | Published |
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20090001267 | Charged particle beam apparatus and specimen inspection method - In a multi-charged-particle-beam apparatus, when an electric field and voltage on a surface of a specimen are varied according to characteristics of the specimen, a layout of plural primary beams on the surface of the specimen and a layout of plural secondary beams on each detector vary. Then, calibration is executed to adjust the primary beams on the surface of the specimen to an ideal layout corresponding to the variation of operating conditions including inspecting conditions such as an electric field on the surface and voltage applied to the specimen. The layout of the primary beams on the surface of the specimen is acquired as images displayed on a display of reference marks on the stage. Variance with an ideal state of the reference marks is measured based upon these images and is corrected by the adjustment of a primary electron optics system and others. | 01-01-2009 |
Momoyo Enyama, Tokyo JP
Patent application number | Description | Published |
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20150294833 | CHARGED PARTICLE BEAM APPARATUS - In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles ( | 10-15-2015 |