Patent application number | Description | Published |
20100180925 | THIN-FILM SOLAR CELL MODULE - To provide a thin-film solar cell module capable of preventing damage to a cell and a contact line. | 07-22-2010 |
20110011439 | PHOTOVOLTAIC POWER SYSTEM - A system of high efficiency and low cost is provided as a photovoltaic power system comprising a solar cell connected to a power converter. | 01-20-2011 |
20110073362 | TERMINAL BOX AND SOLAR CELL MODULE - According to one embodiment, a terminal box includes a box case placed on and fixed to a back film of a solar cell string and a terminal panel formed on the box case. The box case includes a case main body placed on and fixed to the back film of the solar cell string and a terminal panel fixing portion for placing and fixing the terminal panel above the case main body. An opening for passing an output lead wire through the terminal panel is formed continuously from the bottom face of the case main body to the top face of the terminal panel. One edge of the terminal panel is provided so as to protrude from the terminal panel fixing portion such that the tip of the output lead wire can be bent and latched on. | 03-31-2011 |
20110088749 | SOLAR CELL MODULE - In a solar cell module in which each lead wire is disposed on a back face electrode film of a solar cell string with one end thereof connected to an electrode lead-out portion provided at an end of the solar cell string and the other end of the lead wire is bent so as to stand up from the face of the back face electrode film to form an output lead portion, in the output lead portion, only one side of a tip-side portion of the lead wire including a bent portion is coated with an insulating film. | 04-21-2011 |
20110232748 | SOLAR CELL MODULE AND MANUFACTURING METHOD THEREOF - In a solar cell module and a manufacturing method thereof according to an embodiment of the present invention, a solar cell ( | 09-29-2011 |
20110265845 | THIN-FILM SOLAR CELL MODULE - The thin-film solar cell module according to the present invention has: a substrate; and a cell module having three or more cell strings, each of which has a constant width, wherein each cell string has a plurality of solar cells having the same width as the cell string and connected in series, the cell strings have the same length as the solar cells connected in series and are provided on the substrate in parallel connection so as to be aligned, the solar cells respectively have a front surface electrode, a photoelectric conversion layer and a rear surface electrode layered in this order, each cell string has contact lines electrically connecting the front surface electrode of a first solar cell to the rear surface electrode of a second solar cell, and the cell strings at both ends in the three or more cell strings have a width narrower than the other cell string. | 11-03-2011 |
20110265846 | THIN-FILM SOLAR CELL MODULE AND THIN-FILM SOLAR CELL ARRAY - The thin-film solar cell module according to the present invention has a substrate and a cell module that includes three or more cell strings, each of which has a constant width, and is characterized in that each cell string has a plurality of solar cells which are connected in series, the cell strings are provided on the substrate so as to be aligned in a direction perpendicular to a direction in which the solar cells are connected in series and connected to each other in parallel, the solar cells each have a front surface electrode, a photoelectric conversion layer and a rear surface electrode stacked in this order, the cell strings have contact lines which electrically connect the front surface electrode of one of neighboring solar cells of the solar cells and the rear surface electrode of the other, the solar cells being included in the cell string, and have the same width as the cell string, and at least one of the cell strings at the two ends of the above described three or more cell strings has a width greater than the other cell strings. | 11-03-2011 |
20120028381 | SOLAR BATTERY PANEL INSPECTION APPARATUS, METHOD OF INSPECTING SOLAR BATTERY PANEL, AND METHOD OF MANUFACTURING SOLAR BATTERY PANEL - A solar battery panel inspection apparatus is an apparatus for inspecting a solar battery panel including a transparent insulating substrate having a main surface, and a transparent electrode layer, a semiconductor photoelectric conversion layer and a back electrode layer which are sequentially stacked and having an outer circumferential insulating region in which the main surface is exposed, to check the insulation performance of the outer circumferential insulating region. The solar battery panel inspection apparatus includes the first terminal to be brought into contact with the back electrode layer; the second terminal to be brought into contact with a region of or in proximity to an outer circumferential edge of the outer circumferential insulating region; one or more third terminals to be brought into contact with the outer circumferential insulating region between the first terminal and the second terminal; a voltage application unit for applying a voltage each between two terminals selected from these terminals; and a current detection unit detecting a current flowing between the two terminals to which a voltage is applied. | 02-02-2012 |
Patent application number | Description | Published |
20100144162 | METHOD OF FORMING CONFORMAL DIELECTRIC FILM HAVING Si-N BONDS BY PECVD - A method of forming a conformal dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD) includes: introducing a nitrogen- and hydrogen-containing reactive gas and an additive gas into a reaction space inside which a semiconductor substrate is placed; applying RF power to the reaction space; and introducing a hydrogen-containing silicon precursor in pulses into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film having Si—N bonds on the substrate. | 06-10-2010 |
20100178423 | METHOD FOR CONTROLLING FLOW AND CONCENTRATION OF LIQUID PRECURSOR - A method for controlling flow and concentration of a liquid precursor includes: supplying a carrier gas to a first auto-pressure regulator and outputting therefrom the carrier gas at a first pressure to a precursor reservoir; outputting the mixture of the vaporized precursor and the carrier gas from the precursor reservoir; and supplying the mixture to a second auto-pressure regulator and outputting therefrom the mixture at a second pressure to a reactor via an orifice. | 07-15-2010 |
20100221925 | METHOD OF FORMING CONFORMAL DIELECTRIC FILM HAVING Si-N BONDS BY PECVD - A method of forming a conformal dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD) includes: introducing a nitrogen- and hydrogen-containing reactive gas and a rare gas into a reaction space inside which a semiconductor substrate is placed; applying RF power to the reaction space; and introducing a hydrogen-containing silicon precursor as a first precursor and a hydrocarbon gas as a second precursor in pulses into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film doped with carbon and having Si—N bonds on the substrate. | 09-02-2010 |
20100255218 | Method of Depositing Silicon Oxide Film by Plasma Enhanced Atomic Layer Deposition at Low Temperature - A method of depositing a silicon oxide film on a resist pattern or etched lines formed on a substrate by plasma enhanced atomic layer deposition (PEALD) includes: providing a substrate on which a resist pattern or etched lines are formed in a PEALD reactor; controlling a temperature of a susceptor on which the substrate is placed at less than 50° C. as a deposition temperature; introducing a silicon-containing precursor and an oxygen-supplying reactant to the PEALD reactor and applying RF power therein in a cycle, while the deposition temperature is controlled substantially or nearly at a constant temperature of less than 50° C., thereby depositing a silicon oxide atomic layer on the resist pattern or etched lines; and repeating the cycle multiple times substantially or nearly at the constant temperature to deposit a silicon oxide atomic film on the resist pattern or etched lines. | 10-07-2010 |
20110014795 | Method of Forming Stress-Tuned Dielectric Film Having Si-N Bonds by Modified PEALD - A method of forming stress-tuned dielectric films having Si—N bonds on a semiconductor substrate by modified plasma enhanced atomic layer deposition (PEALD), includes: introducing a nitrogen-and hydrogen-containing reactive gas and an additive gas into a reaction space inside which a semiconductor substrate is placed; applying RF power to the reaction space using a high frequency RF power source and a low frequency RF power source; and introducing a hydrogen-containing silicon precursor in pulses into the reaction space wherein a plasma is excited, thereby forming a stress-tuned dielectric film having Si—N bonds on the substrate. | 01-20-2011 |
20110086516 | METHOD OF DEPOSITING DIELECTRIC FILM HAVING Si-N BONDS BY MODIFIED PEALD METHOD - A method of forming dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced atomic layer deposition (PEALD), includes: introducing a nitrogen- and hydrogen-containing reactive gas and a rare gas into a reaction space inside which the semiconductor substrate is placed; introducing a hydrogen-containing silicon precursor in pulses of less than 1.0-second duration into the reaction space wherein the reactive gas and the rare gas are introduced; exiting a plasma in pulses of less than 1.0-second duration immediately after the silicon precursor is shut off; and maintaining the reactive gas and the rare gas as a purge of less than 2.0-second duration. | 04-14-2011 |
20110217838 | METHOD FOR FORMING INTERCONNECT STRUCTURE HAVING AIRGAP - A method for forming an interconnect structure with airgaps, includes: providing a structure having a trench formed on a substrate; depositing a spacer oxide layer on sidewalls of the trench as sidewall spacers by plasma enhanced atomic layer deposition; filling the trench having the sidewall spacers with copper; removing the sidewall spacers to form an airgap structure; and encapsulating the airgap structure, wherein airgaps are formed between the filled copper and the sidewalls of the trench. | 09-08-2011 |
20120058282 | Method of Forming Conformal Film Having Si-N Bonds on High-Aspect Ratio Pattern - A method of forming a conformal dielectric film having Si—N bonds on a substrate having a patterned surface includes: introducing a reactant gas into a reaction space; introducing a silicon precursor in pulses of less than 5-second duration into the reaction space; applying a first RF power to the reaction space during the pulse of the silicon precursor; applying a second RF power to the reaction space during the interval of the silicon precursor pulse, wherein an average intensity of the second RF power during the interval of the silicon precursor pulse is greater than that of the first RF power during the pulse of the silicon precursor; and repeating the cycle to form a conformal dielectric film having Si—N bonds with a desired thickness on the patterned surface of the substrate. | 03-08-2012 |
20120220139 | METHOD OF DEPOSITING DIELECTRIC FILM BY MODIFIED PEALD METHOD - A method of forming a film on a semiconductor substrate by plasma enhanced atomic layer deposition (PEALD), includes: introducing a nitrogen- and hydrogen-containing reactive gas and a rare gas into a reaction space inside which the semiconductor substrate is placed; introducing a precursor in pulses of less than 1.0-second duration into the reaction space wherein the reactive gas and the rare gas are introduced; exiting a plasma in pulses of less than 1.0-second duration immediately after the precursor is shut off; and maintaining the reactive gas and the rare gas as a purge of less than 2.0-second duration. | 08-30-2012 |
20130084714 | Method for Forming Single-Phase Multi-Element Film by PEALD - A method for forming a single-phase multi-element film on a substrate in a reaction zone by PEALD repeating a single deposition cycle. The single deposition cycle includes: adsorbing a precursor on the substrate in the absence of reactant and plasma; decomposing the precursor adsorbed on the substrate by an inert gas plasma; and reacting the decomposed precursor with a reactant gas plasma in the presence of the inert gas plasma. The multi-element film contains silicon and at least two non-metal elements constituting a matrix of the film, the precursor contains silicon and optionally at least one non-metal element to be incorporated in the matrix, and the reactant gas contains at least one non-metal element to be incorporated in the matrix. | 04-04-2013 |
Patent application number | Description | Published |
20090070343 | METHOD FOR MANAGING A DATABASE SYSTEM - To provide a database which has plural log storage areas, and eliminates the sort in the restoration process by means of the application of logs, thereby carrying out the restoration quickly. A management server allocates DB servers to a corresponding one of plural data storage areas so as to access the corresponding one. The DB servers store data to the allocated data storage areas. When the data is referenced or updated, a log representing a data change history is stored in preset log areas for each data server. When the management server transmits a notification to change the data storage areas, area remapping logs are stored in log areas. | 03-12-2009 |
20090125678 | METHOD FOR READING DATA WITH STORAGE SYSTEM, DATA MANAGING SYSTEM FOR STORAGE SYSTEM AND STORAGE SYSTEM - Provided is a database management system obtains storage mapping information which associates addresses in a plurality of physical disk drives within the storage system and addresses in logical disk drives including these physical disk drives, to create queues individually for each of the plurality of physical disk drives. The database management system receives a plurality of read requests which request to read data out of the physical disk drives via the logical disk drives provided by the storage system, sorts the read requests by their destination, and accumulates the read requests in the respective queues associated with the request destination physical disk drives. The database management system reallocates the accumulated read requests into an order that shortens the data read time in each physical disk drive, and then issues the read requests to the storage system. | 05-14-2009 |
20100023480 | INDEXING METHOD OF DATABASE MANAGEMENT SYSTEM - A database management system has a plurality of database servers and data can be transferred between them by partitioning a data area into small areas and altering allocation of the small areas to the database servers. After altering the configuration, there occurs degradation in processing speed that accompanies re-creation of the index. If this problem is solved by using conventional techniques, noticeable degradation in processing speed will occur to a specific query at the time of a steady state operation. Accordingly, an index created for each of the small areas and an index to all of the small areas are allocated to the database server and used in combination. | 01-28-2010 |
20100211577 | DATABASE PROCESSING SYSTEM AND METHOD - Provided is a database system in which sorting of query results is sped up. The database system stores storage location information in which storage locations of the pieces of data are recorded in a given order. When there is no second task, which is executed based on data that is fetched in a first task, whether every piece of data requested in a third task, which is executed before the first task, has been fetched is determined. In the case where every piece of data requested in the third task has been fetched, data fetched in the first task is output. In the case where some of the data requested in the third task has not been fetched, data fetched in the first task is kept in a temporary buffer until every piece of data requested in the third task is fetched, and then output. | 08-19-2010 |
20100293156 | DATABASE PROCESSING METHOD AND DATABASE PROCESSING SYSTEM - Provided is a database processing system including: a computer for outputting data in response to a received query request; and a storage system including a storage device for storing the data, in which: the storage device stores a plurality of partial indices indicating a storage location of the data; the data stored in the storage device is grouped; and the computer is configured to: receive the query request for the data; acquire one of the plurality of partial indices; specify, based on the query request for the data and the acquired one of the plurality of partial indices, a location at which the requested data is stored; and send a request to acquire the data stored at the specified location to the storage system. Accordingly, in the database processing system, a time period necessary to input and output the data is shortened. | 11-18-2010 |
Patent application number | Description | Published |
20090200251 | CLAMPING MECHANISM FOR SEMICONDUCTOR DEVICE - A clamping mechanism for a semiconductor substrate includes: a C-shaped pickup plate; a susceptor top plate having a periphery adapted to receive and support an inner periphery portion of the C-shaped pickup plate thereon; and a clamp comprising (i) a top ring portion for clamping the substrate by sandwiching a periphery of the substrate between the top ring portion and the susceptor top plate and (ii) a pickup plate supporting portion adapted to support an outer periphery portion of the C-shaped pickup plate, wherein the C-shaped pickup plate is movable between the top ring portion and the pickup plate supporting portion, and the clamp is movable upward together with the C-shaped pickup plate and the susceptor top plate. | 08-13-2009 |
20100062862 | GAMING MACHINE THAT SENSES PLAYER PLAYING GAME THEREON - A gaming machine includes at least a human body detection sensor. The human body detection sensor is disposed on a lower face of a housing portion, so as to face downward and face a cabinet main body. In addition, the gaming machine is provided with a sound sensor on an upper face thereof, and starts executing a game in a case where the human body detection sensor responds and then the sound sensor detects a player's voice. | 03-11-2010 |
20100124618 | Method of Forming Insulation Film Using Plasma Treatment Cycles - A film forming cycle based on pulse CVD or ALD is repeated multiple times to form a single layer of insulation film, while a reforming cycle is implemented in the aforementioned process, either once or multiple times per each film forming cycle, by treating the surface of formed film using a treating gas that has been activated by a plasma. | 05-20-2010 |
20100124621 | Method of Forming Insulation Film by Modified PEALD - A method of forming an insulation film by alternating multiple times, respectively, a process of adsorbing a precursor onto a substrate and a process of treating the adsorbed surface using reactant gas and a plasma, wherein a plasma is applied in the process of supplying the precursor. | 05-20-2010 |
20100184302 | Method of Forming Conformal Dielectric Film Having Si-N Bonds by PECVD - A method of forming a conformal dielectric film having Si—N bonds on a semiconductor substrate by plasma enhanced chemical vapor deposition (PECVD) includes: introducing a nitrogen- and hydrogen-containing reactive gas and an additive gas into a reaction space inside which a semiconductor substrate is placed; applying RF power to the reaction space; and introducing a hydrogen-containing silicon precursor in pulses into the reaction space wherein a plasma is excited, thereby forming a conformal dielectric film having Si—N bonds on the substrate. | 07-22-2010 |
20110165948 | GAMING MACHINE OF REDUCED INSTALLATION AREA AND IMPROVED VISIBILITY - Provided is a gaming machine having a cabinet. Between the back as a back face and the right side face of the sides of the cabinet, the gaming machine has a right end side, which is formed by cutting a plane parallel to the gravitational direction in a manner to join lines spaced at predetermined distances in the individual directions of the back and the right side face from a line of intersection, on which the back and the right side face intersect when extended. The gaming machine also has a left end side between the back and a left side face. Moreover, the right end side and the left end side are symmetric with respect to a plane dividing the cabinet equally to the right and left. | 07-07-2011 |
20120200951 | CONTENT DUPLICATION DEVICE AND CONTENT DUPLICATION SYSTEM - A duplication device is provided. When content is duplicated by recording, in a recording medium of a recording destination, the same content as content recorded in a recording medium of a duplication source, even if a reading speed is slower than a writing speed, the duplication device can reduce a duplication time as much as possible. The duplication device | 08-09-2012 |
20130144867 | DATABASE PROCESSING METHOD, DATABASE PROCESSING SYSTEM AND DATABASE SERVER - It is provided a database processing method including: a first step of receiving a query request instructing to output the requested data as query results in a designated order; a second step of generating a query execution plan including an order of accessing tables for storing the data based on the received query request; a third step of acquiring the data requested based on the query request from the database based on the generated query execution plan; a fourth step of generating intermediate results including the acquired data; a fifth step of sorting the generated intermediate results in the designated order; a sixth step of judging, for each of the intermediate results, whether an order of the sorted intermediate results has been determined; and a seventh step of outputting the intermediate results whose order has been determined as the query results in order from a head thereof. | 06-06-2013 |
20130159303 | COMPUTER SYSTEM, DATA RETRIEVAL METHOD AND DATABASE MANAGEMENT COMPUTER - A computer system, comprising: a computer for outputting a result in response to a request; and a storage system for storing data output based on the request, the computer including: a request reception module for receiving the request; a processing procedure generation module for generating a plurality of processing procedures including an order of access to the data stored in the plurality of storage devices; a data division module for dividing the data; an information obtaining module for obtaining load information indicating a load condition of the storage system; an allotment determination module for determining, based on the obtained load information, allotments for allocating the divided data to be processed by the generated plurality of processing procedures; and a processing execution module for executing, based on the determined allotments, the generated plurality of processing procedures in parallel. | 06-20-2013 |
20150112965 | DATABASE MANAGEMENT SYSTEM, COMPUTER, AND DATABASE MANAGEMENT METHOD - A database management system (DBMS) generates a query execution plan including information representing one or more database (DB) operations necessary for executing a query, and executes the query in accordance with the query execution plan. In the execution of the query, the DBMS dynamically generates tasks for executing the DB operations and executes the dynamically generated tasks. The query execution plan includes a plurality of query blocks, which are sets of one or more DB operations. When newly generating a task, the DBMS executes determination processing of simultaneous-task-generation number. The determination processing of simultaneous-task-generation number is to calculate, targeting each of the query blocks, the number of simultaneous task generation, which is the number of tasks simultaneously generatable as tasks for executing the query block. The number of the dynamically generated tasks is equal to or smaller than the number of simultaneous task generation. | 04-23-2015 |
20150112966 | DATABASE MANAGEMENT SYSTEM, COMPUTER, AND DATABASE MANAGEMENT METHOD - A database management system (DBMS) generates a query execution plan including information indicating one or more database (DB) operations necessary to execute the query. The DBMS dynamically generates a task for executing the DB operation in execution of the query. The DBMS performs a determination processing of simultaneous-task-generation number when newly creating a task. The determination processing of simultaneous-task-generation number is to calculate the number of simultaneous task generation, which is the number of tasks that can be generated simultaneously, based on the number of tasks which can be newly generated, a first memory resource amount which is the amount of memory resources necessary to be allocated per task newly generated, and a second memory resource amount which is the number of memory resources that can be newly allocated. The number of tasks generated dynamically and simultaneously is equal to or smaller than the calculated number of simultaneously generatable tasks. | 04-23-2015 |
20150112967 | DATABASE MANAGEMENT SYSTEM, COMPUTER, AND DATABASE MANAGEMENT METHOD - A database management system (DBMS) generates a query execution plan including information representing one or more database (DB) operations necessary for executing a query and executes the query based on the query execution plan. In the execution of the query, the DBMS dynamically generates a task for executing a DB operation and executes the dynamically generated task. The DBMS executes a task in a plurality of threads executed by a processor core. | 04-23-2015 |
20160004370 | GAMING MACHINE - A gaming machine includes a motherboard unit having a substrate on which a semiconductor device is mounted, the semiconductor device being a single package sealing therein a main processor having a CPU function for executing a game processing and sub processor capable of executing video processing, wherein the motherboard unit is connected to a power supply unit, the main processor and the sub processor are connected to each other via a bus of a certain communication protocol, and the main processor, at a time of powering on by the power supply unit, preferentially activates the sub processor as a GPU for executing graphics processing which is a part of the game processing, before a connection destination of a bus of a communication protocol other than the certain communication protocol. | 01-07-2016 |
20160004727 | DATABASE MANAGEMENT SYSTEM AND DATABASE MANAGEMENT METHOD - A database management system receives a new data table input to a database; and executes unique constraint determination processing of determining whether each comparison-subject value as each value registered in a target column in the new data table is different from each comparison reference value as each value registered in a target column in a stored data table in the database, and stores the new data table in a second database area different from a first database area storing the stored data table in the database when a determination result obtained in the unique constraint determination processing is true. | 01-07-2016 |
20160005265 | GAMING MACHINE - It is an object of the present invention to provide a gaming machine whose casing is made compact with a reduced number of components of a radiation mechanism. A slot machine comprising a casing | 01-07-2016 |
20160005266 | GAMING MACHINE WITH LOCKING FUNCTION - A gaming machine includes: a casing top having an upper door device capable of being opened/closed; a casing bottom having a lower door device capable of being opened/closed; an upper door lock mechanism capable of locking the upper door device; and an lower door lock mechanism capable of locking the lower door device, wherein the upper door lock mechanism is provided inside the casing bottom. | 01-07-2016 |
Patent application number | Description | Published |
20090087170 | INFORMATION RECORDING MEDIUM IN WHICH ONE LAND PRE-PIT IS FORMED IN EACH GROUP UNIT OF WOBBLES FORMED BY EACH "N" CYCLES OF WOBBLES - An optical disc ( | 04-02-2009 |
20090087171 | INFORMATION RECORDING MEDIUM IN WHICH GROOVE TRACKS ARE WOBBLED BY FREQUENCY 2n TIMES WOBBLE FREQUENCY OF STANDARD - An optical disc ( | 04-02-2009 |
20090317058 | INFORMATION RECORDING MEDIUM, INFORMATION RECORDING DEVICE AND METHOD, INFORMATION REPRODUCING DEVICE AND METHOD, AND COMPUTER PROGRAM - An optical disc ( | 12-24-2009 |
20140300638 | IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD, DISPLAY, AND ELECTRONIC APPARATUS - An image processing device includes: a sub-image generation section, the sub-image generation section configured to generate a third sub-image by providing a peripheral image including at least a first region that is a transparent region around a first sub-image and to perform a filtering process on the entire or a part of a second sub-image including the first sub-image and the peripheral image; and a composition section configured to composite together a frame image and the third sub-image. | 10-09-2014 |
20150130913 | IMAGE PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, IMAGE PROCESSING METHOD, AND PROGRAM - Provided is an image processing apparatus including a parallax acquiring unit configured to acquire a parallax of each of a plurality of stereoscopic pictures in a moving picture including the plurality of stereoscopic pictures chronologically as a moving picture parallax, and a parallax generating unit configured to generate a parallax causing a position in front of all of the plurality of stereoscopic pictures corresponding to the moving picture parallax acquired in a certain period of time to be a display position of a user interface picture as a user interface parallax. | 05-14-2015 |
20150138315 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND PROGRAM - Provided is an image processing apparatus including a subtitle information acquiring unit configured to acquire subtitle information to be combined with a main stereoscopic picture, a parallax acquiring unit configured to acquire a parallax causing the subtitle information to be stereoscopically displayed, a stereoscopic subtitle picture generating unit configured to generate a stereoscopic subtitle picture to be stereoscopically displayed at a display position according to the parallax based on the subtitle information, and an edge processing unit configured to change intensity of an edge in the stereoscopic subtitle picture according to the parallax. | 05-21-2015 |
20150138316 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND PROGRAM - Provided is an image processing apparatus including a subtitle information acquiring unit configured to acquire subtitle information to be combined with a main stereoscopic picture, a parallax acquiring unit configured to acquire a parallax causing the subtitle information to be stereoscopically displayed, a stereoscopic subtitle picture generating unit configured to generate a stereoscopic subtitle picture to be stereoscopically displayed at a display position according to the parallax from the subtitle information, and an enlarging/reducing unit configured to enlarge or reduce the stereoscopic subtitle picture in a manner that a size of the stereoscopic subtitle picture increases as the display position approaches a front side. | 05-21-2015 |
20160052407 | CONTACTLESS CHARGING DEVICE AND METHOD FOR CONTROLLING POWER SUPPLY - A plurality of projections is arranged in a matrix on the upper surface of the housing of a contactless charging unit ( | 02-25-2016 |
20160086312 | IMAGE PROCESSING APPARATUS AND IMAGE PROCESSING METHOD - [Object] To avoid an image quality deterioration due to image processing while maintaining a resolution of an image in a variable-rate-controlled stream. | 03-24-2016 |
Patent application number | Description | Published |
20090096107 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In a semiconductor integrated circuit device, an element forming region and a metal wiring layer are covered with a passivation layer on a semiconductor substrate which is cut out in a rectangular shape. At four corners of the device, the passivation layer is provided with corner non-wiring regions formed directly on the semiconductor substrate. Thus, crack generation on the passivation layer due to heat stress can be suppressed. | 04-16-2009 |
20090219065 | Semiconductor Device and Electronic Apparatus - A read-start-timing set circuit is connected to a timing terminal (CT | 09-03-2009 |
20090309117 | PROTECTION CIRCUIT, AND SEMICONDUCTOR DEVICE AND LIGHT EMITTING DEVICE USING SUCH PROTECTION CIRCUIT - In a protection circuit connected, via lines including an inductance component, to a circuit to be protected, a first transistor is arranged on a path to ground from a connection point of the protection circuit and the line. A second transistor is arranged on a path to ground from a connection point of the circuit to be protected and the line, and extracts, from a connection point, a current corresponding to a current flowing in the first transistor. The first and the second transistors are NPN bipolar transistors having a base and an emitter are commonly connected. A resistor is connected between the base and the emitter of the first transistor, and a diode is connected between the base and a collector. | 12-17-2009 |
20140234341 | ACUTE HEPATIC INSUFFICIENCY DEPRESSANT AND METHOD FOR EVALUATING DRUG EFFICACY THEREOF - The present invention provides a therapeutic agent for acute liver failure containing a hepatocyte growth factor (HGF), particularly an agent for treating fulminant hepatitis or late onset hepatic failure or suppression of progression of acute liver failure without hepatic coma to fulminant hepatitis or late onset hepatic failure. The present invention also provides a method for evaluating the efficacy of HGF including measuring the amount of α-fetoprotein (liver regeneration biomarker) and/or soluble Fas (anti-apoptotic biomarker) in a sample obtained from a liver injury patient administered with HGF. | 08-21-2014 |
20140299970 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - A semiconductor integrated circuit device includes: a rectangular shaped semiconductor substrate; a metal wiring layer formed on or over the semiconductor substrate; and a passivation layer covering the metal wiring layer. A corner non-wiring region where no portion of the metal wiring layer is formed is disposed in a corner of the semiconductor substrate. A slit is formed in a portion of the metal wiring layer which is close to the corner of the semiconductor substrate. The passivation layer includes a first passivation layer which is formed on the metal wiring layer and a second passivation layer which is formed on the first passivation layer. The first passivation layer is formed of a material that is softer than a material of the second passivation layer. | 10-09-2014 |
Patent application number | Description | Published |
20140087564 | PLASAMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - Provided is a plasma processing apparatus, which includes a table unit installed within a processing vessel and configured to place a substrate thereon, a purge gas supply unit configured to supply a process gas into the processing vessel, a plasma generating unit configured to turn the process gas to plasma, a magnetic field forming mechanism installed at a lateral side of the table unit and configured to form magnetic fields in a processing atmosphere in order to move electrons existing in the plasma of the process gas along a surface of the substrate; and an exhaust mechanism configured to exhaust gas from the interior of the processing vessel. The magnetic fields are opened at at-least one point in a peripheral edge portion of the substrate such that a loop of magnetic flux lines surrounding the peripheral edge portion of the substrate is not formed. | 03-27-2014 |
20140126980 | SUBSTRATE PROCESSING APPARATUS - Provided is a substrate processing apparatus which includes: first and second vacuum transfer chambers which are partitioned from each other; processing chambers configured to perform a vacuum processing onto substrates; a load lock chamber installed to be sandwiched between the first and second vacuum transfer chambers, and including partition valves installed between the load lock chamber and a normal pressure atmosphere, and between the load lock chamber and each of the first and second vacuum transfer chambers; and substrate mounting tables inside the load lock chamber and configured to move between an upper position at which the substrates are transferred between the load lock chamber and the normal pressure atmosphere, and a lower position at which the substrates are transferred between the load lock chamber and the first or second vacuum transfer chamber. | 05-08-2014 |
20140295677 | FILM FORMING METHOD AND FILM FORMING APPARATUS - A method of forming an oxide film on an object to be processed, includes: supplying a film-forming raw material gas into a processing chamber; performing at least one of exhausting the processing chamber and supplying a purge gas into the processing chamber to remove gas remaining in the processing chamber; supplying an oxidant gas into the processing chamber; and performing at least one of exhausting the processing chamber and supplying the purge gas into the processing chamber to remove gas remaining in the processing chamber, wherein supplying an oxidant gas includes: supplying a first oxidant gas into the processing chamber at a first concentration; and supplying a second oxidant gas into the processing chamber at a second concentration higher than the first concentration. | 10-02-2014 |
20150107517 | Plasma Processing Apparatus - A plasma processing apparatus includes a plasma generation chamber in which plasma active species are generated, a process chamber configured to accommodate processing target objects stacked in a vertical direction, the plasma active species generated in the plasma generation chamber being supplied into the process chamber, a plasma source gas supply pipe disposed inside the plasma generation chamber and extending in the vertical direction, a plasma source gas being introduced from one end of the plasma source gas supply pipe and discharged through gas discharge holes formed in the plasma source gas supply pipe in the vertical direction, and a pair of plasma electrodes, arranged to face each other, configured to apply an electric field to the plasma source gas discharged into the plasma generation chamber. A size of a discharge area interposed between the pair of plasma electrodes is varied in the vertical direction. | 04-23-2015 |
20150118865 | METHOD AND APPARATUS FOR FORMING SILICON OXYCARBONITRIDE FILM, SILICON OXYCARBIDE FILM AND SILICON OXYNITRIDE FILM - A method for forming a silicon oxycarbonitride film includes supplying a gas containing a silicon precursor having an oxygen-containing group onto a process surface of a workpiece, supplying a gas containing a carbon precursor onto the process surface, and supplying a nitriding gas onto the process surface subjected to the supplying a gas containing a silicon precursor and the supplying a gas containing a carbon precursor. The silicon oxycarbonitride film is formed on the process surface by the supplying the gas containing the silicon precursor, the supplying gas containing the carbon precursor and the supplying a nitriding gas without performing an oxidation process. | 04-30-2015 |
20150235846 | METHOD AND APPARATUS FOR FORMING SILICON OXIDE FILM - A silicon oxide film forming method includes: forming an amorphous silicon film, including: adsorbing an adsorbate containing silicon to a workpiece by supplying a source gas containing chlorine and silicon into a reaction chamber accommodating the workpiece, activating the source gas, and reacting the activated source gas with the workpiece; and removing chlorine contained in the adsorbate by supplying hydrogen gas into the reaction chamber and activating the hydrogen gas, and reacting the activated hydrogen gas with the adsorbate, wherein removing the chlorine is performed after adsorbing the adsorbate is performed, thereby forming the amorphous silicon film on the workpiece; and forming a silicon oxide film on the workpiece by supplying an oxidizing gas into the reaction chamber and oxidizing the amorphous silicon film, wherein forming the amorphous silicon film and forming the silicon oxide film are repeated in this order plural times. | 08-20-2015 |
20150267292 | CLEANING METHOD OF SILICON OXIDE FILM FORMING APPARATUS, SILICON OXIDE FILM FORMING METHOD, AND SILICON OXIDE FILM FORMING APPARATUS - A cleaning method of a silicon oxide film forming apparatus for removing a deposit adhering to the inside of the silicon oxide film forming apparatus after a silicon oxide film is formed on a workpiece by supplying a process gas into a reaction chamber of the silicon oxide film forming apparatus. The cleaning method includes oxidizing the deposit adhering to the inside of the silicon oxide film forming apparatus by supplying an oxidizing gas into the reaction chamber, and cleaning the inside of the silicon oxide film forming apparatus by supplying a cleaning gas into the reaction chamber and removing the oxidized deposit. | 09-24-2015 |
20150275360 | Vacuum Processing Apparatus - Provided is a vacuum processing apparatus, which includes: a rotatable table installed in a vacuum vessel and configured to horizontally rotate around its center axis; a drive mechanism configured to rotate the rotatable table; a plurality of substrate holding units circumferentially arranged on the rotatable table and configured to obliquely hold a plurality of substrates with a front surface of each of the substrates oriented in a rotation direction of the rotatable table; a heating unit configured to heat the substrates held by the substrate holding units; a processing gas supply unit configured to supply a processing gas onto the substrates held by the substrate holding units; and a vacuum exhaust mechanism configured to vacuum-exhaust the interior of the vacuum vessel. | 10-01-2015 |
20150318170 | FILM FORMING METHOD - A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere includes performing a cycle a plurality of times. The cycle includes: supplying a source gas containing a source to the substrate in a vacuum vessel to adsorb the source onto the substrate; forming an ozone atmosphere containing ozone having a concentration not less than that where a chain decomposition reaction is caused in the vacuum vessel; and forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate active species of oxygen, and oxidizing the source adsorbed onto the surface of the substrate by the active species to obtain the oxide. | 11-05-2015 |
20150348778 | Film Forming Method of SiCN Film - A method of forming an SiCN film on a surface to be processed of an object, the method including: supplying an Si source gas containing an Si source into a processing chamber having the object accommodated therein; and supplying a gas containing a nitriding agent into the processing chamber after supplying the Si source gas, wherein a compound of nitrogen and carbon is used as the nitriding agent and wherein R | 12-03-2015 |
20150354060 | FILM FORMATION APPARATUS, FILM FORMATION METHOD, AND STORAGE MEDIUM - A film formation apparatus of forming a thin film by stacking a molecular layer of an oxide on a surface of a substrate in a vacuum atmosphere formed within a vacuum chamber includes: a source gas supply unit supplying a source gas containing a source to the substrate; an atmosphere gas supply unit supplying an atmosphere gas to the vacuum chamber; an energy supply unit supplying energy to the ozone atmosphere; a control unit configured to output a control signal for repeatedly performing a cycle including a supply of the source gas, a supply of the atmosphere gas, and a supply of energy plural times; a buffer region connected to the vacuum chamber, an inert gas being supplied to the buffer region; and a partition unit partitioning the buffer region with respect to the vacuum chamber and making the buffer region communicate with the vacuum chamber. | 12-10-2015 |
20150361550 | FILM FORMATION APPARATUS, FILM FORMATION METHOD, AND STORAGE MEDIUM - Film formation apparatus includes: rotation mechanism to repeat alternately placing the substrate in first region and second region; raw material gas supply unit to supply the first region with gaseous raw material; processing space formation member to move up and down to form processing space isolated from the first region; atmosphere gas supply unit to supply atmosphere gas for forming ozone atmosphere where chain decomposition reaction is generated; energy supply unit to forcibly decompose the ozone by supplying energy to the ozone atmosphere and to obtain the oxide by oxidizing the raw material adsorbed to surface of the substrate; buffer region connected to the processing space and being supplied with inert gas; and partition unit to partition the buffer region off from the processing space when the atmosphere gas is supplied to the processing space and to have the buffer region communicate with the processing space when ozone is decomposed. | 12-17-2015 |