Patent application number | Description | Published |
20080294281 | Dynamic inline yield analysis and prediction - In one embodiment, a method for predicting yield includes calculating a criticality factor (CF) for each of a plurality of defects detected in an inspection process step of a wafer, and determining a yield-loss contribution of the inspection process step to the final yield based on CFs of the plurality of defects and the yield model built for a relevant design. The yield-loss contribution of the inspection process step is then used to predict the final yield for the wafer. | 11-27-2008 |
20080295047 | Stage yield prediction - In one embodiment, a method for predicting yield during the design stage includes receiving defectivity data identifying defects associated with previous wafer designs, and dividing the defects into systematic defects and random defects. For each design layout of a new wafer design, yield is predicted separately for the systematic defects and the random defects. A combined yield is then calculated based on the yield predicted for the systematic defects and the yield predicted for the random defects. | 11-27-2008 |
20080295048 | Inline defect analysis for sampling and SPC - In one embodiment, an inline defect analysis method includes receiving geometric characteristics of individual defects and design data corresponding to the individual defects, determining which of the individual defects are likely to be nuisance defects using the geometric characteristics and the corresponding design data, and refraining from sampling the defects that are likely to be nuisance defects. | 11-27-2008 |
20080295063 | Method and apparatus for determining factors for design consideration in yield analysis - Embodiments of the present invention provide methods and apparatuses for determining factors for design consideration in yield analysis of semiconductor fabrication. In one embodiment, a computer-implemented method for determining factors for design consideration in yield analysis of semiconductor fabrication includes obtaining a geometric characteristic of a defect on a chip and obtaining design data of the chip, where the design data is associated with the defect. The method further includes determining a criticality factor of the defect based on the geometric characteristic and the design data, and outputting the criticality factor. | 11-27-2008 |
20090104342 | PHOTOVOLTAIC FABRICATION PROCESS MONITORING AND CONTROL USING DIAGNOSTIC DEVICES - The formation of diagnostic devices on the same substrate used to fabricate a photovoltaic (PV) cell is described. Such devices, also referred to as process diagnostic vehicles (PDVs), are configured for in-line monitoring of electrical characteristics of PV cell features and are formed on the substrate using the same process steps for PV cell fabrication. The data collected via the PDVs can be used to tune or optimize subsequent PV cell fabrication, i.e., used as feedback for the fabrication process. Alternatively, the data collected via PDVs can be fed forward in the fabrication process, so that later process steps performed on a PV cell substrate can be modified to compensate for issues detected on the PV cell substrate via the PDVs. | 04-23-2009 |
20100073011 | LIGHT SOAKING SYSTEM AND TEST METHOD FOR SOLAR CELLS - A method and apparatus for exposing a solar device to simulated environmental conditions is described. In one embodiment, a chamber is described. The chamber includes a frame defining a partial enclosure having an interior volume, the frame comprising a door selectively sealing an opening in the frame, a plurality of lighting devices coupled to the enclosure interior of an open wall, each of the plurality of lighting devices being positioned to direct light toward an upper surface of a platen disposed in the interior area, and a plurality of fan units positioned in an opening formed in a sidewall of the frame, each of the plurality of fan units positioned to direct ambient air flow from the outside of the enclosure toward the platen and between the plurality of lighting devices to exit through the open wall. | 03-25-2010 |
20100197051 | METROLOGY AND INSPECTION SUITE FOR A SOLAR PRODUCTION LINE - Embodiments of the present invention generally relate to a system used to form solar cell devices using processing modules adapted to perform one or more processes in the formation of the solar cell devices. In one embodiment, the system is adapted to form thin film solar cell devices by accepting a large unprocessed substrate and performing multiple deposition, material removal, cleaning, sectioning, bonding, and various inspection and testing processes to form multiple complete, functional, and tested solar cell devices that can then be shipped to an end user for installation in a desired location to generate electricity. In one embodiment, the system provides inspection of solar cell devices at various levels of formation, while collecting and using metrology data to diagnose, tune, or improve production line processes during the manufacture of solar cell devices. | 08-05-2010 |
20110117680 | INLINE DETECTION OF SUBSTRATE POSITIONING DURING PROCESSING - Embodiments of the present invention generally provide a method for detecting the position of a substrate within a processing chamber. Embodiments of the present invention are particularly useful for the detection of a mis-positioned solar cell substrate during photoabsorber layer deposition processes within a solar cell production line. Reflected power is measured during processing of a substrate and communicated to a system controller. The system controller compares the measured reflected power with an established range of reflected power. If the measured reflected power is substantially out of range, the system controller signals for the chamber to be taken offline for inspection, maintenance, and/or repair. The system controller may further divert the flow of substrates within the production line around the offline chamber without shutting down the entire solar cell production line. | 05-19-2011 |