Tsuyoshi Moriya
Tsuyoshi Moriya, Yamanashi JP
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20090258148 | METHOD OF PRODUCING CERAMIC SPRAY-COATED MEMBER, PROGRAM FOR CONDUCTING THE METHOD, STORAGE MEDIUM AND CERAMIC SPRAY-COATED MEMBER - A ceramic spray-coated member capable of surely controlling adhesion and detachment of water is produced by spraying a given ceramic onto a surface of a base material, in which an organic matter adsorbed on a surface of the ceramic spray-coated member is removed and the surface of the ceramic spray-coated member is stabilized by chemically bonding to water. | 10-15-2009 |
20100068395 | METHOD OF PRODUCING CERAMIC SPRAY-COATED MEMBER, PROGRAM FOR CONDUCTING THE METHOD, STORAGE MEDIUM AND CERAMIC SPRAY-COATED MEMBER - A ceramic spray-coated member capable of surely controlling adhesion and detachment of water is produced by spraying a given ceramic onto a surface of a base material, in which an organic matter adsorbed on a surface of the ceramic spray-coated member is removed and the surface of the ceramic spray-coated member is stabilized by chemically bonding to water. | 03-18-2010 |
20100136230 | METHOD OF CLEANING POWDERY SOURCE SUPPLY SYSTEM, STORAGE MEDIUM, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD - A method of cleaning a powdery source supply system prevents outflow of particles from a chamber or an introduction line in a film forming process. A substrate processing system includes a powdery source supply system and a film forming processing unit. The powdery source supply system includes an ampoule for accommodating a powdery source, a carrier gas supply unit for supplying a carrier gas into the ampoule, an introduction line for connecting the ampoule and the film forming processing unit, a purge line branched from the introduction line, and a valve for opening or closing the introduction line. When the valve is opened and the interior of the purge line is evacuated prior to the film forming process, the carrier gas supply unit supplies a carrier gas so that the viscous force acting on particles by the carrier gas is greater than the viscous force in the film forming process. | 06-03-2010 |
20100161278 | METHOD FOR DIAGNOSING ABNORMAL PLASMA DISCHARGE, ABNORMAL PLASMA DISCHARGE DIAGNOSTICS SYSTEM, AND COMPUTER PROGRAM - Provided are a data obtaining section ( | 06-24-2010 |
20110094680 | VACUUM APPARATUS INCLUDING A PARTICLE MONITORING UNIT, PARTICLE MONITORING METHOD AND PROGRAM, AND WINDOW MEMBER FOR USE IN THE PARTICLE MONITORING - A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride. | 04-28-2011 |
20130255881 | INTERNAL MEMBER OF A PLASMA PROCESSING VESSEL - An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd. In addition, at least a portion of the film is sealed by a resin. | 10-03-2013 |
Tsuyoshi Moriya, Nirasaki City JP
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20090228215 | SYSTEM AND METHOD FOR DETECTING PARTICLE GENERATION SOURCE, AND STORAGE MEDIUM THEREFOR - A system for determining occurrence factors of particles includes a user interface device, and an apparatus for detecting the occurrence factors of particles. The apparatus for detecting the occurrence factors of particles includes a storage unit that stores a program for executing a calculation method for calculating a likelihood of each of the occurrence factors of particles in the form of a score; and a calculation unit for calculating the score for each of the occurrence factors of particles based on particle distributions at least on a surface of a substrate using the stored program. The user interface device displays the calculated score for each of the occurrence factors of particles. | 09-10-2009 |
20100101608 | SUBSTRATE CLEANING METHOD AND APPARATUS - A substrate cleaning method for cleaning and removing foreign materials adhered to a surface of a substrate includes heating the substrate to peel off the foreign materials from the surface of the substrate by a thermal stress, removing the foreign materials from the surface of the substrate by a temperature gradient created in a proximity of the surface of the substrate, and collecting the foreign materials removed from the surface of the substrate by a collecting unit facing the substrate. | 04-29-2010 |
Tsuyoshi Moriya, Nirasaki JP
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20100083982 | PARTICLE REMOVAL APPARATUS AND METHOD AND PLASMA PROCESSING APPARATUS - A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle charging control member for positively charging particles generated within the chamber by positive ions of an ion sheath region formed in a region other than the vicinity of the substrate to be processed, wherein positively charged particles are discharged from the chamber via the gas exhaust port. Therefore, there is no plasma disturbance or metal contamination, and thus can be applied to a practical use. | 04-08-2010 |
Tsuyoshi Moriya, Yokohama JP
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20100054722 | FOCUSING POSITION DETERMINING APPARATUS, IMAGING APPARATUS AND FOCUSING POSITION DETERMINING METHOD - Provided are a focusing position determining apparatus, an imaging apparatus, and a focusing position determining method, the method including setting an aperture to a first aperture value; driving a focus lens through a first range of positions as a first drive; during the first drive, obtaining images periodically, and calculating a first sampling of contrast values from the obtained images; calculating a first focus position from the first sampling of contrast values; setting the aperture to a second aperture value; driving a focus lens through a second range of positions as a second drive, the second range of positions being based on the first focus position; during the second drive, obtaining images periodically, and calculating a second sampling of contrast values from the obtained images; calculating a focusing position from the second sampling of contrast values; and driving the focus lens to the calculated focusing position. | 03-04-2010 |
Tsuyoshi Moriya, Yokohama-Shi JP
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20120154625 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND PROGRAM RECORDING MEDIUM - An image processing apparatus, an image processing method, and a program recording medium are provided. The image processing apparatus includes a color reproduction correction unit for correcting an image signal formed by an imaging element according to a color reproduction matrix; a color reproduction matrix storage unit for storing a registered color reproduction matrix or an inverse matrix of the registered color reproduction matrix for each light source coordinates in a color space; and a color reproduction matrix calculation unit for interpolating inverse matrices of registered color reproduction matrices corresponding to at least two light source coordinates stored in the color reproduction matrix storage unit according to estimated light source coordinates in the color space, which are obtained from the image signal, and calculating an inverse matrix of a result of the interpolation as the color reproduction matrix. | 06-21-2012 |
Tsuyoshi Moriya, Minato-Ku JP
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20130186858 | ETCHING METHOD, ETCHING APPARATUS, AND RING MEMBER - Etching is performed through the following process. A substrate is loaded into a processing chamber and mounted on a mounting table therein. Then, in the state where a ring member at least a surface of which is made of a same material as a main component of an etching target film is provided to surround the substrate, a processing gas is injected in a shower-like manner from a gas supply unit oppositely facing the substrate and the etching target film is etched by using a plasma of the processing gas; and evacuating the inside of the processing chamber through an exhaust path. Through this process, unbalanced distribution of plasma active species in the vicinity of a circumferential edge portion of the substrate can be suppressed. | 07-25-2013 |
20130226752 | METHOD FOR CALCULATING BILL FOR USE OF WATER PURIFICATION SYSTEM AND WATER PURIFICATION SYSTEM - To provide a billing method for use of a water purification system that gives incentives for using the water purification system. Such a water purification system is equipped with water purification apparatus having controller and with monitoring server connected to water purification apparatus via public network and having controller. Filtration filter of water purification apparatus has water quality sensor, which measures water quality data of inflow water, and water quality sensor, which measures water quality data of purified water. Water quality data measured by water quality sensors are transmitted to controller and controller. Usage fees for the water purification system are calculated corresponding to improvement rates of water quality, which are calculated based on water quality data of inflow water and water quality data of purified water. | 08-29-2013 |