Hyesog
Hyesog Lee, Buena Park, CA US
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20100033701 | Superlens and lithography systems and methods using same - A superlens that includes, in one example embodiment, a positive-index material adjacent to a negative-index material, wherein the negative-index material includes aluminum. In a more specific embodiment, the positive-index material includes a dielectric layer, such as Poly(Methyl MethAcrylate) (PMMA), which is less than 50 nanometers thick. The negative-index material includes a smoothed aluminum layer less than 50 nanometers thick. The aluminum layer is disposed on the dielectric layer or vice versa, forming a superlens comprising the aluminum layer and the dielectric layer. In another embodiment, the superlens further includes plural aluminum layers separated by one or more layers of positive-index material. A mask is adjacent to the positive-index material. The mask may include one or more features that extend into a transparent substrate. The mask is positioned so that the positive-index material separates the mask from the smoothed aluminum layer. In an illustrative embodiment, the superlens is adapted for use with thermal lithography using nanoparticles. | 02-11-2010 |
Hyesog Lee, Norwalk, CA US
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20110188032 | Far-field superlensing - An apparatus for creating a sub-wavelength image in the farfield. In an example embodiment, the apparatus includes a far-field superlens that is adapted to generate a sub-wavelength image or a sub-diffraction-limited image at a far field distance from a negative-index material included in the superlens. The example far-field superlens includes a positive-index material and an adjacent positive-index material. The negative-index material has an output aperture at a first surface. A second surface or interface is positioned at a far field distance from the negative-index material such that a cavity or gap is formed between the second surface and the first surface, wherein the second surface represents an imaging surface. The gap may be filled with a dielectric material or may include a vacuum or air. In a more specific embodiment, the superlens further includes a first mechanism for producing one or more sub-diffraction-limited beam features at a far field distance from the negative-index layer via the cavity in which propagating electromagnetic energy from the incident electromagnetic energy propagates. | 08-04-2011 |
Hyesog Lee, Yongin-City KR
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20160139461 | DISPLAY APPARATUS - A display apparatus comprises a display panel and a reflection member. The display panel comprises an array of pixels, the array having a quadrangular shape. The reflection member is disposed in a position not to overlap at least a portion of the array when viewed in a normal direction substantially perpendicular to a major surface of the display panel, the reflection member being configured to reflect light that is emitted from the display panel in a direction slanted with respect to the normal direction. The combination of light emitted from the display panel in the normal direction and the reflected light is configured to form an image having a shape other than a quadrangular shape. | 05-19-2016 |