Seiichi Watanabe
Seiichi Watanabe, Odawara-Shi JP
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20100024577 | RESIN MATERIAL MEASURING METHOD AND RESIN MATERIAL MEASURING APPARATUS - A resin material measuring method which obtains a prescribed amount of a resin material by measuring liquid resin material, the resin material measuring method including: charging the resin material having a fluidity into an internal space of a cylinder using a cylinder-piston mechanism which includes: the cylinder having a discharge aperture at one end and the internal space being constant in cross-sectional area; and a piston which is inserted in the internal space; determining a necessary movement stroke length of the piston corresponding to the resin material of a prescribed volume according to a relationship between the volume of the resin material and the cross-sectional area and the movement stroke length; discharging the resin material from the cylinder through the discharge aperture by moving the piston by the determined movement stroke length; and cutting the discharged resin material from the resin material located inside the cylinder. | 02-04-2010 |
20100041807 | OPTICAL MEMBER MANUFACTURING METHOD, OPTICAL MEMBER MANUFACTURING APPARATUS AND OPTICAL MEMBER - A method for manufacturing an optical member from a powdery nano composite material, which includes a thermoplastic resin containing inorganic fine particles, is provided. The method includes: preparing an aggregated intermediate body by heating the powdery nano composite material; and forming the optical member having a finished shape by heat-press molding the intermediate body. | 02-18-2010 |
20100104855 | PREFORM MANUFACTURING METHOD, PREFORM MANUFACTURING APPARATUS, PREFORM AND OPTICAL MEMBER - A method for manufacturing a preform from a nano composite resin that includes a thermoplastic resin containing inorganic fine particles, the preform being a pre-finish product of an optical member having an optical surface formed by press molding, is provided. The method includes: supplying a solution including the nano composite resin and a solvent into a mold which has an approximate optical surface closely resembling the optical surface and an opening to an atmosphere; and evaporating the solvent while a shape of the approximate optical surface is kept, to solidify the solution. | 04-29-2010 |
20100296181 | PLASTIC LENS - A second lens ( | 11-25-2010 |
20110026109 | OPTICAL LENS, OPTICAL SYSTEM UNIT AND IMAGING APPARATUS - In a surveillance camera | 02-03-2011 |
20110043932 | LENS DEVICE - A lens device ( | 02-24-2011 |
Seiichi Watanabe, Mobara-Shi JP
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20100311135 | ISOPROPYL ALCOHOL- PRODUCING BACTERIUM AND METHOD OF PRODUCING ISOPROPYL ALCOHOL USING THE SAME - The invention provides: an isopropyl alcohol-producing bacterium which has an acetoacetate decarboxylase activity, an isopropyl alcohol dehydrogenase activity, a CoA transferase activity and a thiolase activity having been imparted thereto and is capable of producing isopropyl alcohol from a plant-derived material; a method of producing isopropyl alcohol whereby isopropyl alcohol is produced from a plant-derived material by using this isopropyl alcohol-producing bacterium; and an apparatus therefor. | 12-09-2010 |
20120077233 | DNA ENCODING NOVEL ENZYME HAVING D-SERINE SYNTHASE ACTIVITY, METHOD OF PRODUCING THE ENZYME AND METHOD OF PRODUCING D-SERINE BY USING THE SAME - This invention relates to DNA encoding a novel enzyme having activity of synthesizing D-serine from formaldehyde and glycine, recombinant DNA constructed by integrating such DNA into a vector, a transformant transformed with the recombinant DNA, and a method for producing D-serine from formaldehyde and glycine with the use of the enzyme. | 03-29-2012 |
20120244579 | PROCESS FOR PRODUCTION OF MONOSACCHARIDE - A monosaccharide production method of producing a monosaccharide from a lignocellulosic raw material comprising: obtaining a saccharified liquid obtained from a lignocellulosic raw material and a saccharification enzyme; recovering the saccharification enzyme from the saccharified liquid by allowing the saccharification enzyme to be adsorbed on the lignocellulosic raw material; and saccharifying the lignocellulosic raw material using the recovered saccharification enzyme. | 09-27-2012 |
Seiichi Watanabe, Kanagawa JP
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20100225013 | METHOD FOR PRODUCING OPTICAL MEMBER AND OPTICAL MEMBER FORMED BY THE PRODUCTION PROCESS - A method for producing an optical member from a nanocomposite material which includes a thermoplastic resin containing inorganic fine particles is provided. The method includes: | 09-09-2010 |
20120189800 | ELEMENT ARRAY AND ELEMENT ARRAY LAMINATE - Provided is an element array in which an error in pitch among elements in the element array is absorbed surely in a step of laminating a plurality of element arrays so that each group of the elements arrayed in the laminating direction can be aligned with high accuracy. The element array has a plurality of elements arrayed one-dimensionally or two-dimensionally, and a flexible support formed out of a material richer in elasticity than a material forming the elements. The elements are coupled with one another through the support. | 07-26-2012 |
Seiichi Watanabe, Ashigarakami-Gun JP
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20100214663 | METHOD FOR MOLDING OPTICAL MEMBER, APPARATUS FOR MOLDING OPTICAL MEMBER AND OPTICAL MEMBER - A method for molding an optical member from a material of a nanocomposite resin which includes a thermoplastic resin containing inorganic fine particles is provided. The method includes: charging a solution containing a solvent and the nanocomposite resin into a vessel providing at least an optical surface shape and an opening to an atmosphere, and evaporating the solvent from the opening to solidify and form an optical surface of the optical member into a finished shape. | 08-26-2010 |
20140210945 | STEREOSCOPIC ENDOSCOPE DEVICE - Provided is a stereoscopic endoscope device enabling precise observation based on a 3D-image and observation of a wide field of view range based on a 2D-image and enabling the change of the field of view range according to the situation with a simple structure without increasing the size of an imaging unit or complicating the configuration. An imaging unit | 07-31-2014 |
Seiichi Watanabe, Hokkaido JP
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20100089759 | METHOD FOR PRODUCING CONDUCTOR FINE PARTICLES - A method for producing conductor fine particles in which the advantages of conventional vapor phase method and liquid phase method are utilized while eliminating the drawbacks of both methods remarkably. Furthermore, definite guidelines and measure for improvement are given to the greatest problems common to the vapor phase method and liquid phase method, i.e., enhancement in quality of the unit fine particle and a fine particle production method controllably temporarily and regionally. The method for producing conductor fine particles comprises a step for applying a voltage to a pair of electrode consisting of a positive electrode and a negative electrode arranged in conductive liquid and generating plasma in the vicinity of the negative electrode, and a step for producing conductor fine particles by melting the metal material of the negative electrode and then re-solidifying. | 04-15-2010 |
20130243975 | METHOD FOR PRODUCING SURFACE-TREATED METALLIC MATERIAL - There is provided a method for producing a surface-treated metallic material, by use of which a metallic material having a stable and excellent sliding characteristic can be produced with a low environmental load without covering the metallic material surface with an oxide film. The method for producing a surface-treated metallic material includes immersing an anode and a cathode in an electrolyte solution, placing a metallic material used as a material to be treated above the surface of the electrolyte solution, and applying a voltage between the anode and the cathode to treat the metallic material surface, the voltage being equal to or higher than a voltage for causing a complete plasma state. | 09-19-2013 |
20140144782 | METHOD FOR PRODUCING ELECTRICALLY-CONDUCTING MATERIAL WITH MODIFIED SURFACE - A method to inexpensively and efficiently produce conductive materials on the surface of which a nano-level fine structure is formed includes surface modification including immersing a stable anode electrode and a workpiece as a cathode electrode, the workpiece including a conductive material with a work surface, in an electrolytic solution, then applying a voltage not less than a first voltage and less than a second voltage between the stable anode electrode and the workpiece as the cathode electrode immersed in the electrolytic solution, thereby modifying the work surface, the first voltage being a voltage corresponding to a current value that is ½ of the sum of a first maximum current value appearing first in a positive voltage region and a first minimum current value appearing first in the positive voltage region with respect to voltage-current characteristics of a surface modification treatment system, the second voltage exhibiting a complete-state plasma. | 05-29-2014 |
Seiichi Watanabe, Tamano-City JP
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20100050811 | METHOD OF SMELTING COPPER - A method of smelting copper includes: a generating step of generating blister and calcium ferrite slag from copper matte by charging the copper matte into a smelting furnace and oxidizing the copper matte; and a refining step of refining another blister from the calcium ferrite slag in an electrical furnace under a temperature condition of 1250 degrees C. to 1350 degrees C. and under a reductive atmosphere condition of oxygen partial pressure logPO | 03-04-2010 |
20100050813 | METHOD OF SMELTING COPPER - A method of smelting copper includes: a generating step of generating blister and slag from copper matte by charging the copper matte into a smelting furnace and oxidizing the copper matte; a first refining step of refining another blister from the slag by reduction in an electrical furnace; and a charging step of charging the slag into one of the smelting furnace or another smelting furnace for treating copper concentrate and generating matte as repeating flux if copper grade of slag generated in the first refining step is higher than 0.8 weight %. | 03-04-2010 |
Seiichi Watanabe, Houfu-Shi JP
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20100043976 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing electrode where a processing material, is placed and which holds the processing material in the chamber; and a vacuuming unit that is connected to the chamber to discharge the gas in the chamber, in which the chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the object-placing electrode, and the vacuuming unit are disposed coaxially with the center axis of the chamber, and the part for introducing a microwave includes a microwave rotation generator that rotates a polarization plane of the input microwave and supplies the microwave to the chamber. | 02-25-2010 |
20140220489 | METHOD FOR PROCESSING SAMPLE AND SAMPLE PROCESSING APPARATUS - Long-period roughness in patterned resist is reduced in a manufacturing process of a sample such as a semiconductor device. A method for processing a sample to be processed, with patterned resist, in a sample processing apparatus includes: disposing the sample to be processed, with the patterned resist on the stage in the processing chamber; supplying silicon tetrachloride (SiCl | 08-07-2014 |
Seiichi Watanabe, Hofu-Shi JP
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20080217295 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - The present invention provides a plasma processing apparatus or a plasma processing method that can etch a multilayer film structure for constituting a gate structure with high accuracy and high efficiency. A plasma processing method of, on processing a sample on a sample stage | 09-11-2008 |
20090194506 | Plasma Processing Apparatus And Plasma Processing Method - The invention provides a plasma processing apparatus and a plasma processing method capable of controlling the voltage of the processing substrate with high accuracy, thereby enabling a highly accurate plasma processing. According to the invention, a voltage of the processing substrate is measured using a processing substrate with a voltage probe prepared in advance, and based on a bias voltage supplied to an electrostatic chuck mechanism and a bias current flowing through the electrostatic chuck mechanism, a capacity component which is an impedance representing the electric property of the electrostatic chuck mechanism is computed numerically. Then, based on a predetermined expression, the voltage of the processing substrate is estimated using the bias voltage of the processing substrate to be measured, the bias current flowing through the electrostatic chuck mechanism and the capacity component which is the impedance acquired in advance. | 08-06-2009 |
20120145323 | Plasma Processing Apparatus and Plasma Processing Method - A plasma processing apparatus for subjecting a substrate to be processed to plasma processing includes a processing chamber, a substrate electrode having an electrostatic chuck mechanism, a plasma generator, a high-frequency bias power supply which applies a high-frequency bias voltage to the substrate electrode, a voltage monitor which monitors the high-frequency bias voltage, a current monitor which monitors a high-frequency bias current, a measurement storage unit which stores a resistance component, an induction component and a capacity component of the electrostatic chuck mechanism, which have been calculated beforehand as fitting parameters of an expression | 06-14-2012 |
Seiichi Watanabe, Tokuyama JP
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20090165955 | PLASMA PROCESSING APPARATUS AND METHOD WITH CONTROLLED BIASING FUNCTIONS - A plasma processing apparatus including: a phase controller for controlling a phase difference between biasing power supplied to the antenna biasing electrode and biasing power supplied to the substrate electrode to have a difference of 180°±45°; wherein the biasing power supplied to the antenna biasing electrode and the biasing power supplied to the substrate electrode have a same frequency, which same frequency is lower than a frequency of the RF power for plasma generation. A plurality of filters is included, to perform a variety of filtering. | 07-02-2009 |
Seiichi Watanabe, Chiba JP
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20080293098 | Dna Encoding Novel Enzyme Having D-Serine Synthase Activity, Method of Producing the Enzyme and Method of Producing D-Serine by Using the Same - This invention relates to DNA encoding a novel enzyme having activity of synthesizing D-serine from formaldehyde and glycine, recombinant DNA constructed by integrating such DNA into a vector, a transformant transformed with the recombinant DNA, and a method for producing D-serine from formaldehyde and glycine with the use of the enzyme. | 11-27-2008 |
Seiichi Watanabe, Sapporo JP
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20120103412 | METHOD FOR FABRICATING A LASER-INDUCED SURFACE NANOARRAY STRUCTURE, AND DEVICE STRUCTURE FABRICATED USING SAID METHOD - Provided is a method for manufacturing a two-dimensional pattern by simultaneously forming a plurality of quantum dots on a surface of a solid material and making the quantum dots a periodic structure by a laser irradiation, and a device structure and a device fabricated by the method. | 05-03-2012 |
20120285733 | ELECTRONIC COMPONENT PROVIDED WITH CU-AL-CO-BASED ALLOY ELECTRODE OR WIRING - An object of the present invention is to provide an electronic component using a Cu-based conductive material that can suppress oxidization even in a heat treatment in an oxidizing atmosphere and that can suppress an increase in an electrical resistance. In an electronic component having an electrode or a wiring, a ternary alloy made from three elements consisting of Cu, Al, and Co is used as a Cu-based wiring material that can prevent oxidization of the electrode or the wiring. Specifically, part or the whole of the electrode or the wiring has a chemical composition in which an Al content is 10 at % to 25 at %, a Co content is 5 at % to 20 at %, and the balance is composed of Cu and unavoidable impurities, and the chemical composition represents a ternary alloy in which two phases of a Cu solid solution formed by Al and Co being dissolved into Cu and a CoAl intermetallic compound coexist together. | 11-15-2012 |
Seiichi Watanabe, Boise, ID US
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20120225561 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STORAGE MEDIUM - There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence. | 09-06-2012 |
Seiichi Watanabe, Houfu JP
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20120228261 | SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR PROCESSING SAMPLE - There is provided a VUV light processing apparatus that can apply vacuum ultraviolet light to the entire surface of a wafer in excellent reproducibility and can process the wafer with VUV (vacuum ultraviolet) light in excellent reproducibility. A VUV light processing apparatus includes: a chamber connected with a gas supply apparatus and an evacuation apparatus, the chamber being capable of reducing the pressure inside the chamber; a plasma light source that generates VUV light including a wavelength of 200 nm or less, the plasma light source including a plasma generating unit that generates plasma in the chamber; and a VUV transmission filter provided between a stage on which a sample to be processed is placed and the sample in the chamber, the VUV transmission filter transmitting the VUV light including a wavelength of 200 nm or less and not transmitting electrons, ions, and radicals in plasma, the VUV transmission filter having the outer diameter size larger than that of the sample. | 09-13-2012 |
Seiichi Watanabe, Saitama JP
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20140240845 | LENS AND METHOD OF MOLDING LENS - There are provided a lens that is molded with high accuracy and a method of molding the lens. The lens has an optical axis and includes a pair of optical functional surfaces on front and rear surfaces thereof. The lens includes an optical functional portion that includes the pair of optical functional surfaces, an edge portion that is provided at an outer periphery of the optical functional portion, and a connecting portion that is provided between the optical functional portion and the edge portion, connects the optical functional portion with the edge portion, and is thinner than the edge portion in a direction of the optical axis. | 08-28-2014 |
20140319707 | MANUFACTURING METHOD OF OPTICAL DEVICE, AND OPTICAL DEVICE - In order to produce high-quality optical elements stably at all times without the flow of molten resin inside an injection molding cavity being hindered by the protrusion of the outer peripheral edge of a lens after compression molding, a cavity formed when a pair of molds for molding is closed is provided with: an optical-function-part molding cavity ( | 10-30-2014 |
20140346692 | METHOD OF MANUFACTURING OPTICAL ELEMENT - Disclosed is a method of manufacturing an optical element capable of increasing surface accuracy of an optical surface of an optical element with a plastic lens portion. A cavity which is formed when a pair of molds are closed has a compression molding space and an annular injection molding space, and the method includes a compression molding step of casting a compression molding material into the compression molding space of the molds and an injection molding step of injecting an injection molding material into the injection molding space in a state where the molds are closed and forming an injection molded portion at the outer circumferential edge of the compression molded compression molding material. In the injection molding step, before the compression molding material reaches a temperature lower than the glass transition temperature, the injection of the injection molding material starts. | 11-27-2014 |
20150050378 | LENS FORMING APPARATUS - The invention provides a lens forming apparatus that can suppress generation of burrs even if gaps between outer walls of an upper die and a lower die and an inner wall of a trunk die is made wide. A lens forming apparatus | 02-19-2015 |
Seiichi Watanabe, Saitama-Shi JP
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20140347752 | COMPOSITE MOLDED LENS AND METHOD FOR PRODUCING THE SAME - In a composite molded lens, a press-formed lens body is integral with an injection-molded lens frame. The lens body has a lens portion and a flange portion surrounding the lens portion. Eight projections are radially formed on a top surface of the flange portion. The height of the projection increases toward an outer peripheral edge side of the flange portion. A recess is formed on an outer peripheral edge face of the flange portion and located at a position on a line extending from the projection. The recess increases torsional resilience of a joint surface between the lens body and the lens frame and strengthens bonding force there between. | 11-27-2014 |
Seiichi Watanabe, Tokyo JP
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20150154145 | DATA PROCESSING METHOD, DATA PROCESSING APPARATUS AND PROCESSING APPARATUS - The present invention is a data processing apparatus including a data input/output device for receiving data, a storage for storing the data received by the data input/output device, a data processing program storage for storing a data processing program that includes the steps of calculating, using a double exponential smoothing method, a first predicted value that is a predicted value of smoothed data and a second predicted value that is a predicted value of the gradient of the smoothed data, and calculating, using a double exponential smoothing method in which the second predicted value is set as input data, a third predicted value that is a predicted value of smoothed data and a fourth predicted value that is a predicted value of the gradient of the smoothed data, and a data calculation processing apparatus for performing the data processing under the data processing program. | 06-04-2015 |