Patent application number | Description | Published |
20080233756 | Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles - In a semiconductor device manufacturing apparatus that processing a substrate by applying a voltage to a gas to create a plasma, positively charged particles are trapped or guided at the instant that the cathode voltage is stopped, by an electrode to which is imparted a negative voltage, so as to prevent particles reaching the substrate. | 09-25-2008 |
20100018552 | CLEANING DEVICE AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS - Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device | 01-28-2010 |
20100104760 | VACUUM EXHAUST METHOD AND A SUBSTRATE PROCESSING APPARATUS THEREFOR - A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member. | 04-29-2010 |
20100118302 | METHOD AND APPARATUS FOR DETECTING FOREIGN MATERIALS AND STORAGE MEDIUM - A foreign material detecting method for detecting a foreign material attached to a substrate surface includes a spraying step of spraying an organic solvent or an oil-phase material containing a halogen element to the substrate surface, a condensing step of emphasizing the foreign material by condensing the sprayed organic solvent or oil-phase material around the foreign material attached to the substrate surface by controlling a temperature of the substrate surface, and a surface inspecting step of detecting the foreign material emphasized by the condensation of the organic solvent or the oil-phase material by a surface inspecting device. | 05-13-2010 |
20100154821 | COMPONENT CLEANING METHOD AND STORAGE MEDIUM - A method for cleaning a component in a substrate processing apparatus including a processing chamber, foreign materials being attached to the component, at least a part of the component being exposed inside the processing chamber, and the substrate processing apparatus being adapted to load and unload a foreign material adsorbing member into and from the processing chamber. The method includes loading the foreign material adsorbing member into the processing chamber; generating a plasma nearer the component than the foreign material adsorbing member; extinguishing the plasma; and unloading the foreign material adsorbing member from the processing chamber, wherein the generation and the extinguishment of the plasma are repeated alternately and the foreign material adsorbing member has a positive potential at least during the extinguishment of the plasma. | 06-24-2010 |
20100214557 | ABSORPTION SPECTROMETRIC APPARATUS FOR SEMICONDUCTOR PRODUCTION PROCESS - This absorption spectrometric apparatus for semiconductor production process includes a flow passageway switching mechanism connected to a discharging flow passageway of a processing chamber for a semiconductor production process and a multiple reflection type moisture concentration measuring absorption spectrometric analyzer that allows a laser beam from a laser light source to undergo multiple reflection within a cell, detects a light absorbancy change by a gas within the cell, and measures a moisture concentration within the gas. The flow passageway switching mechanism connects the discharging flow passageway by switching between a measuring flow passageway through which the gas is discharged by passing through the cell and a bypass flow passageway through which the gas is discharged without passing through the cell. | 08-26-2010 |
20100216082 | WORK STATION - A work station is installed in a clean room for assembling or storing a component thereon. The work station includes a mounting member for mounting thereon the component, a heating device for heating to maintain an atmosphere surrounding the component mounted on the mounting member at a high temperature and a cover having an uneven structure for preventing a direct contact between the mounting member and the component by covering the mounting member. Further, at least a part of the uneven structure of the cover, the part being in contact with the component, is made of a material without containing a metal atom. | 08-26-2010 |
20100238446 | OPTICAL GAS-ANALYSIS SYSTEM AND A GAS FLOW CELL - A gas flow cell for an optical gas-analysis system encompasses a T-shaped configuration, the configuration is implemented by a single sample-gas introduction port provided at a location of a substantial center in a long axis direction, and the single sample-gas introduction port is aligned along a direction orthogonal to the long axis direction. | 09-23-2010 |
20100332364 | PARTICLE GENERATION FACTOR DETERMINING SYSTEM, CHARGING METHOD AND STORAGE MEDIUM - Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device | 12-30-2010 |
20110204024 | POLISHING METHOD - A defect distribution in the vicinity of a surface of a glass substrate is inspected by a positron annihilation gamma ray measurement. A buffer layer including a brittle layer and/or a coating layer is created on the surface of the glass substrate. The brittle layer is formed by irradiating a gas cluster ion on the surface to deteriorate the glass. The coating layer is formed by coating the surface with a soft substance. Next, a thickness of the created buffer layer is measured by a positron annihilation gamma ray measurement. The surface of the glass substrate is then cleaned. To create a slurry, abrasive particles for the slurry are uniformly scattered on a polishing implement for polishing the glass substrate and a liquid component for the slurry is added thereto. The glass substrate is then chemically mechanically polished from the buffer layer with the slurry. | 08-25-2011 |
20110204027 | SLURRY MANUFACTURING METHOD, SLURRY AND POLISHING METHOD AND APPARATUS USING SLURRY - Abrasive particles having a particle diameter of not more than 100 nm are manufactured from raw material. The manufactured abrasive particles are separately dispersed, and are coated with a polymer. Coated abrasive particles having a particle diameter of not more than 100 nm are selected and are mixed with a liquid component of a slurry to manufacture the slurry. A pH adjuster and a viscosity agent are added to the slurry. A glass substrate is polished using the manufactured slurry. Since the abrasive particles having a particle diameter of more than 100 nm or an agglomerate of the cohering abrasive particles does not contact the glass and does not cause big scratches on the glass, the generation of the scratches of 70 nm or more on the glass during polishing are suppressed. | 08-25-2011 |
20110293401 | TURBOMOLECULAR PUMP, AND PARTICLE TRAP FOR TURBOMOLECULAR PUMP - A turbomolecular pump includes: a rotor ( | 12-01-2011 |
20120031434 | SUBSTRATE CLEANING METHOD - There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate. | 02-09-2012 |
20120055506 | SUBSTRATE CLEANING METHOD - In a substrate cleaning method for cleaning a substrate with fine patterns having grooves or holes whose representative length is 0.1 mm or less, the substrate is arranged in a space which contains water, such that the substrate faces an acute-angled leading end of a discharge electrode which can be cooled, with a predetermined interval therebetween, with a counter electrode being interposed at a predetermined position between the substrate and the discharge electrode. Then, a predetermined voltage is applied between the discharge electrode and the counter electrode while generating dew condensation in the discharge electrode by cooling the discharge electrode. The substrate is cleaned by generating an aerosol containing water particles having sizes of equal to less than 10 nm in the leading end of the discharge electrode and spraying the aerosol on the substrate. | 03-08-2012 |
20120109582 | ABNORMALITY DETECTION SYSTEM, ABNORMALITY DETECTION METHOD, AND RECORDING MEDIUM - Disclosed is an abnormality detection system that accurately detects abnormalities that arise in a device. The abnormality detection system | 05-03-2012 |
20120240533 | PARTICLE CAPTURE UNIT, METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE PROCESSING APPARATUS - A particle capture unit adopted to be exposed to a space in which particles fly includes at least a first layer formed of a plurality of first fiber-like materials and a second layer formed of a plurality of second fiber-like materials. The first fiber-like materials are thinner than the second fiber-like materials and arrangement density of the first fiber-like materials in the first layer is higher than that of the second fiber-like materials in the second layer, the second layer is interposed between the first layer and the space, and the first and second layers are hardened and bonded together by sintering. | 09-27-2012 |
20120325349 | SUBSTRATE ACCOMMODATION DEVICE - A substrate accommodation device can effectively prevent a foreign substance from adhering to a substrate accommodated therein depending on an environment where the substrate accommodation device is used. The substrate accommodation device | 12-27-2012 |
20130056033 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE - A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material | 03-07-2013 |
20130092185 | VACUUM EXHAUST METHOD AND A SUBSTRATE PROCESSING APPARATUS THEREFOR - A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member. | 04-18-2013 |
20130148817 | ABNORMALITY DETECTION APPARATUS FOR PERIODIC DRIVING SYSTEM, PROCESSING APPARATUS INCLUDING PERIODIC DRIVING SYSTEM, ABNORMALITY DETECTION METHOD FOR PERIODIC DRIVING SYSTEM, AND COMPUTER PROGRAM - An abnormality detection apparatus for a periodic driving system includes a detection unit; a data obtaining unit for time series data from the detected sound; a determinism derivation unit configured to derive a plurality of values representing determinism providing an indicator of whether the time series data is deterministic or stochastic or a plurality of intermediate variations in a calculation process of the values representing determinism at a predetermined interval from the time series data; a probability distribution calculation unit. The abnormality detection apparatus further includes a determination unit configured to determine existence or non-existence of abnormality in the periodic driving system based on the probability distribution of the values representing determinism or the intermediate variations. | 06-13-2013 |
20130193087 | WATER TREATMENT DEVICE AND WATER TREATMENT METHOD - Provided is a water treatment device with which organic substances contained in raw water to be treated are decomposed to thereby alleviate the load to be imposed on a downstream filter and with which it is possible to avoid corrosion of the piping or the like. | 08-01-2013 |
20130240479 | METHOD FOR PRODUCING FILTRATION FILTER - To provide a method for producing a filtration filter that can simplify the process for providing clean water or freshwater. By etching silicon substrate | 09-19-2013 |