Patent application number | Description | Published |
20100018028 | RELEASE LAYER FOR PERMANENT MASTER FOR PATTERNED MEDIA MANUFACTURING - The invention relates to a method of manufacturing a patterned media Ni stamper comprising depositing a perfluorodecyltrichlorosilane release layer. The release layer eliminates bonding at the master-stamper interface. A permanent master for manufacturing a patterned media stamper is also provided. | 01-28-2010 |
20100221581 | PROCESS FOR FABRICATING PATTERNED MAGNETIC RECORDING MEDIA - A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer. | 09-02-2010 |
20110195276 | RESIST ADHENSION TO CARBON OVERCOATS FOR NANOIMPRINT LITHOGRAPHY - In an imprint lithography process, a carbon overcoat (COC) layer has nitrogen introduced into an upper surface region thereof before application of an adhesion layer to the COC/substrate combination. This results in the formation of a thin layer of nitrogenated carbon at the surface of the COC layer that promotes covalent bonding with the functional groups of the adhesion layer and, thus, significantly improves resist adhesion upon imprint template removal. Thus, an embodiment of an imprint lithography method comprises introducing nitrogen into an upper surface region of the COC layer, forming an adhesion layer on the nitrogenated COC layer, forming resist on the adhesion layer, contacting the resist with an imprint template having patterned features formed therein such that the resist fills the patterned features of the imprint template, and separating the imprint template from the resist such that a negative image of the patterned features is formed in the resist. An embodiment of an imprint structure comprises a substrate, a COC layer formed on the substrate, the COC layer having a nitrogenated upper surface region formed therein, and adhesion layer formed on the COC layer, and resist formed on the adhesion layer. | 08-11-2011 |
20130143002 | METHOD AND SYSTEM FOR OPTICAL CALLIBRATION DISCS - A system and method for optical calibration discs includes dispensing a resist layer on a portion of a substrate. A surface of the substrate and a topographically patterned surface of predetermined objects of a template are contacted together, wherein the contacting causes the resist layer between the portion of the substrate and the template to conform to the topographically patterned surface, and the resist layer includes nano-scale voids. The nano-scale voids are reduced by longer spread time, thinner resist, and removal of the residual resist layer together with the voids by using a descum step. The resist layer is hardened into a negative image of the topographically patterned surface, wherein the negative image includes surfaces that are operable to be individually measured by an optical reader. The substrate and the template are separated, wherein the resist layer adheres to the surface of the substrate. | 06-06-2013 |
20130196122 | METHOD OF SURFACE TENSION CONTROL TO REDUCE TRAPPED GAS BUBBLES - The embodiments disclose a method of surface tension control to reduce trapped gas bubbles in an imprint including modifying chemistry aspects of interfacial surfaces of an imprint template and a substrate to modify surface tensions, differentiating the interfacial surface tensions to control interfacial flow rates of a pre-cured liquid resist and controlling pre-cured liquid resist interfacial flow rates to reduce trapping gas and prevent trapped gas bubble defects in cured imprinted resist. | 08-01-2013 |
20140113064 | METHOD AND SYSTEM FOR OPTICAL CALIBRATION - A system and method of calibrating optical measuring equipment includes optically measuring discrete objects of a first known predictable pattern from a calibration apparatus, wherein the first known predictable pattern is a bit pattern. A recording surface optical reader is calibrated based on the optically measuring. Using the first known predictable pattern, contamination is filtered from the results of the optically measuring. | 04-24-2014 |