Sakama
Minoru Sakama, Tokushima JP
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20150241568 | DEVICE FOR MEASURING RADIATION INTENSITY OF SMALL SEALED RADIATION SOURCE FOR CANCER THERAPY - Provided is a radiation intensity measuring apparatus for each of small sealed radiation sources for cancer therapy capable of measuring multiple cartridges efficiently and rapidly. | 08-27-2015 |
Mitsunori Sakama, Hiratsuka JP
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20100144077 | SUBSTRATE PROCESSING APPARATUS AND METHOD AND A MANUFACTURING METHOD OF A THIN FILM SEMICONDUCTOR DEVICE - A substrate processing apparatus includes a plurality of evacuable treatment chambers connected to one another via an evacuable common chamber, and the common chamber is provided with means for transporting a substrate between each treatment chamber. More specifically, a substrate processing apparatus includes a plurality of evacuable treatment chambers, at least one of said treatment chambers having a film formation function through a vapor phase reaction therein, at least one of said treatment chambers having an annealing function with light irradiation and at least one of said treatment chambers having a heating function therein. The apparatus also has a common chamber through which said plurality of evacuable treatment chambers are connected to one another, and a transportation means provided in said common chamber for transporting a substrate between each treatment chamber. | 06-10-2010 |
Mitsunori Sakama, Atsugi JP
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20090029509 | Substrate processing apparatus and method and a manufacturing method of a thin film semiconductor device - A substrate processing apparatus includes a plurality of evacuable treatment chambers connected to one another via an evacuable common chamber, and the common chamber is provided with means for transporting a substrate between each treatment chamber. More specifically, a substrate processing apparatus includes a plurality of evacuable treatment chambers, at least one of said treatment chambers having a film formation function through a vapor phase reaction therein, at least one of said treatment chambers having an annealing function with light irradiation and at least one of said treatment chambers having a heating function therein. The apparatus also has a common chamber through which said plurality of evacuable treatment chambers are connected to one another, and a transportation means provided in said common chamber for transporting a substrate between each treatment chamber. | 01-29-2009 |
Mitsunori Sakama, Kanagawa JP
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20090197012 | PLASMA CVD APPARATUS - In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber | 08-06-2009 |
20110034215 | Semiconductor Device and Method for Manufacturing the Same - An object of the present invention is to prevent the deterioration of a TFT (thin film transistor). The deterioration of the TFT by a BT test is prevented by forming a silicon oxide nitride film between the semiconductor layer of the TFT and a substrate, wherein the silicon oxide nitride film ranges from 0.3 to 1.6 in a ratio of the concentration of N to the concentration of Si. | 02-10-2011 |
20120045593 | PLASMA CVD APPARATUS - In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber | 02-23-2012 |
20120187411 | Semiconductor Device and Method for Manufacturing the Same - An object of the present invention is to prevent the deterioration of a TFT (thin film transistor). The deterioration of the TFT by a BT test is prevented by forming a silicon oxide nitride film between the semiconductor layer of the TFT and a substrate, wherein the silicon oxide nitride film ranges from 0.3 to 1.6 in a ratio of the concentration of N to the concentration of Si. | 07-26-2012 |
Mitsunori Sakama, Kabagawa JP
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20140139776 | Semiconductor Device and Method for Manufacturing the Same - An object of the present invention is to prevent the deterioration of a TFT (thin film transistor). The deterioration of the TFT by a BT test is prevented by forming a silicon oxide nitride film between the semiconductor layer of the TFT and a substrate, wherein the silicon oxide nitride film ranges from 0.3 to 1.6 in a ratio of the concentration of N to the concentration of Si. | 05-22-2014 |
Tadayuki Sakama, Yokohama JP
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20140204798 | METHOD FOR SETTING NETWORK INFORMATION IN COMMUNICATION DEVICE, COMMUNICATION SYSTEM, AND COMMUNICATION DEVICE - A first communication device communicates with a second communication device based on first setting information stored in a first storage unit of the first communication device. The first communication device transmits the first setting information to the second communication device. The second communication device stores the first setting information received from the first communication device in a second storage unit. The first communication device receives, after first hardware of the first communication device is replaced, the first setting information stored in the second storage unit from the second communication device. The first communication device stores, after the replacement, the first setting information received from the second communication device in the first storage unit of the first communication device after the replacement. | 07-24-2014 |
Tadayuki Sakama, Kawasaki JP
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20100016013 | Method And Apparatus For Transmitting Data Between Radio Equipment And Radio Equipment Controls - Radio equipment (RE) is shared so as to use a plurality of types of radio signals, and data (IQ data) of the plurality of types of radio signals and monitoring control data are variably arranged in a frame for transmitting and receiving data between the RE and radio equipment controls (RECs). A plurality of types of data are simultaneously transmitted and received by one communication link between the RE and the RECs. | 01-21-2010 |
20100074121 | WIRELESS DEVICE AND METHOD OF CONTROLLING AND MONITORING WIRELESS DEVICE - A wireless device connected to a plurality of wireless control devices connecting with a monitoring device, and controlled and monitored by the monitoring device via the wireless control device, the wireless device includes a transmitting and receiving unit transmitting and receiving a signal to and from the wireless control device. The wireless device includes a selecting unit selecting, from within the plurality of wireless control devices, the one wireless control device which transmits and receives a control and monitor signal, contained in the signal, by which the monitoring device controls and monitors a self-device. | 03-25-2010 |
Yuusuke Sakama, Osaka JP
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20120192609 | LUBRICATING-OIL COMPOSITION FOR FORGING MOLDING AND FORGING MOLDING APPARATUS - An object is to provide a lubricating-oil composition for forging molding excellent in lubricity, and a forging molding apparatus also suitable for the lubricating-oil composition of the present invention. | 08-02-2012 |