Patent application number | Description | Published |
20120244705 | POST-TUNGSTEN CMP CLEANING SOLUTION AND METHOD OF USING THE SAME - A post-W CMP cleaning solution consists of carboxylic acid and deionized water. The carboxylic acid may be selected from the group consisting of (1) monocarboxylic acids; (2) dicarboxylic acids; (3) tricarboxylic acids; (4) polycarboxylic acids; (5) hydroxycarboxylic acids; (6) salts of the above-described carboxylic acids; and (7) any combination thereof. The post-W CMP cleaning solution can work well without adding any other chemical additives such as surfactants, corrosion inhibitors, pH adjusting agents or chelating agents. | 09-27-2012 |
20120258596 | Process of planarizing a wafer with a large step height and/or surface area features - A blanket stop layer is conformally formed on a layer with a large step height. A first chemical mechanical polishing process is performed to remove the blanket stop layer atop the layer in the raised region. A second chemical mechanical polishing process is performed to planarize the wafer using the blanket stop layer as a stop layer when the layer is lower than or at a same level as the blanket stop layer or using the layer as a stop layer when the blanket stop layer is lower than or at a same level as the layer, or a selective dry etch is performed to remove the layer in the raised region. Thus, the layer in the raised region can be easily removed without occurrence of dishing in the non-raised region which is protected by the blanket stop layer. | 10-11-2012 |
20120314171 | DISPLAY DEVICES HAVING ELECTROLESSLY PLATED CONDUCTORS AND METHODS - In one or more embodiments, display devices having electrolessly plated conductors and methods are disclosed. One such embodiment is directed to a method of forming a reflective pixel array for a display device, including forming a plurality of conductive pads, each of the conductive pads corresponding to a reflective pixel, and electrolessly plating each of the conductive pads with a reflective conductor. | 12-13-2012 |
20120315754 | INTERCONNECTION BARRIER MATERIAL DEVICE AND METHOD - Interconnects containing ruthenium and methods of forming can include utilization of a sacrificial protective material. Planarization or other material removal operations can be performed on a substrate having a recess, the recess containing a ruthenium containing material along with the sacrificial protective material. The protective material is later removed, and a conductor can be filled in the remaining recess. | 12-13-2012 |
20130032870 | METHODS OF FORMING A MULTI-TIERED SEMICONDUCTOR DEVICE AND APPARATUSES INCLUDING THE SAME - Methods of forming multi-tiered semiconductor devices are described, along with apparatuses that include them. In one such method, a silicide is formed in a tier of silicon, the silicide is removed, and a device is formed at least partially in a void that was occupied by the silicide. One such apparatus includes a tier of silicon with a void between tiers of dielectric material. Residual silicide is on the tier of silicon and/or on the tiers of dielectric material and a device is formed at least partially in the void. Additional embodiments are also described. | 02-07-2013 |
20130320538 | Integrated Circuit Substrates Comprising Through-Substrate Vias And Methods Of Forming Through-Substrate Vias - A method of forming a through-substrate via includes forming a through-substrate via opening at least partially through a substrate from one of opposing sides of the substrate. A first material is deposited to line and narrow the through-substrate via opening. The first material is etched to widen at least an elevationally outermost portion of the narrowed through-substrate via opening on the one side. After the etching, a conductive second material is deposited to fill the widened through-substrate via opening. Additional implementations are disclosed. Integrated circuit substrates are disclosed independent of method of manufacture. | 12-05-2013 |
20140004698 | DEVICES, SYSTEMS, AND METHODS RELATED TO PLANARIZING SEMICONDUCTOR DEVICES AFTER FORMING OPENINGS | 01-02-2014 |
20140038414 | Process of planarizing a wafer with a large step height and/or surface area features - A blanket stop layer is conformally formed on a layer with a large step height. A first chemical mechanical polishing process is performed to remove the blanket stop layer atop the layer in the raised region. A second chemical mechanical polishing process is performed to planarize the wafer using the blanket stop layer as a stop layer when the layer is lower than or at a same level as the blanket stop layer or using the layer as a stop layer when the blanket stop layer is lower than or at a same level as the layer, or a selective dry etch is performed to remove the layer in the raised region. Thus, the layer in the raised region can be easily removed without occurrence of dishing in the non-raised region which is protected by the blanket stop layer. | 02-06-2014 |
20140183740 | METHODS OF EXPOSING CONDUCTIVE VIAS OF SEMICONDUCTOR DEVICES AND ASSOCIATED STRUCTURES - Methods of exposing conductive vias of semiconductor devices may comprise conformally forming a barrier material over conductive vias extending from a backside surface of a substrate. A self-planarizing isolation material may be formed over the barrier material. An exposed surface of the self-planarizing isolation material may be substantially planar. A portion of the self-planarizing isolation material, a portion of the barrier material, and a portion of protruding material of the conductive vias may be removed to expose the conductive vias. Removal of the self-planarizing isolation material, the barrier material, and the conductive vias may be stopped after exposing at least one laterally extending portion of the barrier material. | 07-03-2014 |
20150035150 | CONDUCTIVE INTERCONNECT STRUCTURES INCORPORATING NEGATIVE THERMAL EXPANSION MATERIALS AND ASSOCIATED SYSTEMS, DEVICES, AND METHODS - Semiconductor devices having interconnects incorporating negative expansion (NTE) materials are disclosed herein. In one embodiment a semiconductor device includes a substrate having an opening that extends at least partially through the substrate. A conductive material having a positive coefficient of thermal expansion (CTE) partially fills the opening. A negative thermal expansion (NTE) having a negative CTE also partially fills the opening. In one embodiment, the conductive material includes copper and the NTE material includes zirconium tungstate. | 02-05-2015 |
20150044860 | MULTI-TIERED SEMICONDUCTOR APPARATUSES INCLUDING RESIDUAL SILICIDE IN SEMICONDUCTOR TIER - Methods of forming multi-tiered semiconductor devices are described, along with apparatuses that include them. In one such method, a silicide is formed in a tier of silicon, the silicide is removed, and a device is formed at least partially in a void that was occupied by the silicide. One such apparatus includes a tier of silicon with a void between tiers of dielectric material. Residual silicide is on the tier of silicon and/or on the tiers of dielectric material and a device is formed at least partially in the void. Additional embodiments are also described. | 02-12-2015 |
20150115445 | DEVICES, SYSTEMS AND METHODS FOR MANUFACTURING THROUGH-SUBSTRATE VIAS AND FRONT-SIDE STRUCTURES - Methods of manufacturing semiconductor devices and semiconductor devices with through-substrate vias (TSVs). One embodiment of a method of manufacturing a semiconductor device includes forming an opening through a dielectric structure and at least a portion of a semiconductor substrate, and forming a dielectric liner material having a first portion lining the opening and a second portion on an outer surface of the dielectric structure laterally outside of the opening. The method further includes removing the conductive material such that the second portion of the dielectric liner material is exposed, and forming a damascene conductive line in the second portion of the dielectric liner material that is electrically coupled to the TSV. | 04-30-2015 |
20150145146 | METHODS OF EXPOSING CONDUCTIVE VIAS OF SEMICONDUCTOR DEVICES AND RELATED SEMICONDUCTOR DEVICES - Methods of exposing conductive vias of semiconductor devices may involve positioning a barrier material over conductive vias extending from a backside surface of a substrate to at least substantially conform to the conductive vias. A self-planarizing isolation material may be positioned on a side of the barrier material opposing the substrate. An exposed surface of the self-planarizing isolation material may be at least substantially planar. A portion of the self-planarizing isolation material, a portion of the barrier material, and a portion of at least some of the conductive vias may be removed to expose each of the conductive vias. Removal may be stopped after exposing at least one laterally extending portion of the barrier material proximate the substrate. | 05-28-2015 |
20150206801 | DEVICES, SYSTEMS, AND METHODS RELATED TO PLANARIZING SEMICONDUCTOR DEVICES AFTER FORMING OPENINGS - Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a stop layer and a dielectric liner including dielectric material along sidewalls of openings, e.g., through-substrate openings, of the semiconductor device and excess dielectric material outside the openings. The method further includes forming a metal layer including metal plugs within the openings and excess metal. The excess metal and the excess dielectric material are simultaneously chemically-mechanically removed using a slurry including ceria and ammonium persulfate. The slurry is selected to cause selectivity for removing the excess dielectric material relative to the stop layer greater than about 5:1 as well as selectivity for removing the excess dielectric material relative to the excess metal from about 0.5:1 to about 1.5:1. | 07-23-2015 |
Patent application number | Description | Published |
20130216784 | SUPERHYDROPHOBIC FILMS - Superhydrophobic films (200, 400) are disclosed. More particularly, durable superhydrophobic films (200, 400) having discrete flat faces (206, 406) spaced apart by valleys (208, 408) where the valleys and faces are covered by nanostructures or nanoparticles (424) are disclosed. Various methods of making such films are also disclosed. | 08-22-2013 |
20140302269 | ADHESIVE ARTICLE WITH RELEASE LAYER INCLUDING POLYMERIZED (METH)ACRYLATED SILICONE - An adhesive article including a pressure sensitive adhesive layer and a release layer in contact with the pressure sensitive adhesive layer. The release layer includes a polymer matrix that includes polymerized (meth)acrylated silicone and a plurality of nanovoids. | 10-09-2014 |
20150017386 | NANOSTRUCTURED MATERIALS AND METHODS OF MAKING THE SAME - Material comprising sub-micrometer particles dispersed in a polymeric matrix. The materials are useful in article, for example, for numerous applications including display applications (e.g., liquid crystal displays (LCD), light emitting diode (LED) displays, or plasma displays); light extraction; electromagnetic interference (EMI) shielding, ophthalmic lenses; face shielding lenses or films; window films; antireflection for construction applications, and construction applications or traffic signs. | 01-15-2015 |
Patent application number | Description | Published |
20130214518 | AIRBAG WITH TETHERED SLIT - An airbag having a base end, a front panel and at least one panel opposing the front panel, the airbag having a cutout in the front panel, an inner perimeter of the cutout having first and second sides, a first panel having first and second edges, the first edge of the first panel is attached to the first side of the cutout, a second panel having third and fourth edges, the third edge is attached to the second edge of the first panel and the fourth edge is attached to the second side of the cutout, wherein the first and second panels define a slit member in cutout of the front panel, and a tether attached along a backside of the slit member and attached to an inner surface of the at least one panel opposing the front panel of the airbag. | 08-22-2013 |
20130221646 | AIRBAG WITH TETHERED SLIT - An airbag having a base end, a front panel and at least one panel opposing the front panel, the airbag having a cutout in the front panel, an inner perimeter of the cutout having first and second sides, a first panel having first and second edges, the first edge of the first panel is attached to the first side of the cutout, a second panel having third and fourth edges, the third edge is attached to the second edge of the first panel and the fourth edge is attached to the second side of the cutout, wherein the first and second panels define a slit in cutout of the front panel, and a tether attached along a backside of the slit and attached to an inner surface of the at least one panel opposing the front panel of the airbag. | 08-29-2013 |
20140077516 | ASYMMETRICAL GRAB HANDLE FOR VEHICLE - A grab handle assembly for a vehicle has an asymmetrical handle that spans between a first end and a second end. The first end is operably coupled with an A-pillar of a frame of the vehicle. The second end is operably coupled with the A-pillar below the first end. The asymmetrical handle has a slanted portion and a curved portion, configured to provide a smooth downward transition between the A-pillar and the handle and to slidably deflect a forward moving object. The slanted portion extends down from the first end at a first angle. The curved portion protrudes outward and upward from the second end at a second angle to join the slanted portion. The first angle is less than the second angle and the first angle is less than thirty-five degrees, such that the first angle provides a smooth transition to the handle. | 03-20-2014 |
20150054265 | VEHICLE SIDE AIR CURTAIN WITH CONTROLLED PRESSURE CHAMBER - A vehicle side air curtain has an inflator, a main inflatable chamber, and an integral separate, self-contained controlled pressure chamber in limited fluid communication with the main inflatable chamber of the side air curtain and disposed for impact by the head and upper thoracic region of a vehicle occupant. The main inflatable chamber is inflated to an initial pressure within an initial impact time period immediately following actuation of the inflator and a second lower stabilized pressure thereafter to extend the duration of the pressurization of the main inflatable chamber of the side air curtain beyond the initial impact time period. The controlled pressure chamber of the side air curtain is inflated to an initial pressure substantially lower than the first pressure of the main inflatable chamber and favorable to side impact occupant protection immediately following actuation of the inflator pressure. | 02-26-2015 |
20150074969 | INTEGRATED PASSENGER AIRBAG - An integrated airbag in the inflated condition has a main airbag portion defining an upper chamber and a lower extended portion defining a chamber depending from the main airbag portion. The main airbag portion in the inflated condition acts against the head and torso of the occupant so as to generate a restraining force against the occupant, and the lower extended portion in the inflated condition acts against the pair of knees of the occupant so as to mitigate the femur forces on the knees of the motor vehicle occupant generated by contact with the lower portion of the instrument panel during the impact. | 03-19-2015 |
20150130171 | SIDE CURTAIN AIRBAG FOR VEHICLE HAVING INFLATABLE EXTENSION - A curtain airbag system for an automotive vehicle is disclosed. The system includes a curtain module substantially embedded in the roof rail in its normal, non-inflated state. The module includes an inflatable curtain attached to an inflator. The inflatable curtain has a forward portion. An elongated and inflatable extension is attached to the forward portion of the curtain. When the curtain is inflated in an impact event the elongated and inflatable extension extends from the curtain and at least partially overlaps the A-pillar and at least part of the grab handle. The elongated and inflatable extension is a first extension and extends from the forward portion of said curtain. The inflatable curtain may include a second, triangular-shaped extension extendable from the forward portion of the curtain when the curtain is inflated. | 05-14-2015 |
Patent application number | Description | Published |
20100293101 | METHOD AND DEVICE FOR GENERATING A SINGLE-USE FINANCIAL ACCOUNT NUMBER - A device for facilitating financial account transactions is described which includes a processing unit including a cryptographic processor. The device also includes an input unit, a display unit and a memory device connected to the processing unit. The memory device contains a private cryptographic key, a first data element and a second data element. The processing unit encrypts the first data element using the private cryptographic key and the second data element, modifies the second data element, combines the encrypted first data element and the second data element to generate a single-use financial account identifier, and displays the single-use financial account identifier. This identifier is then transmitted to a central processor for authorization of the transaction. The central processor extracts and decrypts data elements from the transmitted identifier using the private cryptographic key, compares those data elements with data elements stored in a memory, and verifies the single-use financial account identifier in accordance with the comparison. | 11-18-2010 |
20100299259 | METHOD AND DEVICE FOR GENERATING A SINGLE-USE FINANCIAL ACCOUNT NUMBER - A device for facilitating financial account transactions is described which includes a processing unit including a cryptographic processor. The device also includes an input unit, a display unit and a memory device connected to the processing unit. The memory device contains a private cryptographic key, a first data element and a second data element. The processing unit encrypts the first data element using the private cryptographic key and the second data element, modifies the second data element, combines the encrypted first data element and the second data element to generate a single-use financial account identifier, and displays the single-use financial account identifier. This identifier is then transmitted to a central processor for authorization of the transaction. The central processor extracts and decrypts data elements from the transmitted identifier using the private cryptographic key, compares those data elements with data elements stored in a memory, and verifies the single-use financial account identifier in accordance with the comparison. | 11-25-2010 |
20100306105 | METHOD AND DEVICE FOR GENERATING A SINGLE-USE FINANCIAL ACCOUNT NUMBER - A device for facilitating financial account transactions is described which includes a processing unit including a cryptographic processor. The device also includes an input unit, a display unit and a memory device connected to the processing unit. The memory device contains a private cryptographic key, a first data element and a second data element. The processing unit encrypts the first data element using the private cryptographic key and the second data element, modifies the second data element, combines the encrypted first data element and the second data element to generate a single-use financial account identifier, and displays the single-use financial account identifier. This identifier is then transmitted to a central processor for authorization of the transaction. The central processor extracts and decrypts data elements from the transmitted identifier using the private cryptographic key, compares those data elements with data elements stored in a memory, and verifies the single-use financial account identifier in accordance with the comparison. | 12-02-2010 |
20110196730 | METHOD AND APPARATUS FOR SELLING SUBSCRIPTIONS TO PERIODICALS IN A RETAIL ENVIRONMENT - A system comprises a point-of-sale (POS) terminal, a MS controller, a retail subscription system. The POS terminal allows a cashier to enter subscription sales data into the POS controller. The POS controller maintains databases on available subscriptions and produces databases containing data relating to subscriptions sold to customers. The retail subscription system verifies the subscriptions by reference to its own databases and transmits the subscriptions to a fulfillment house for distribution. | 08-11-2011 |
20130024281 | METHOD AND APPARATUS FOR SELLING SUBSCRIPTIONS TO PERIODICALS IN A RETAIL ENVIRONMENT - A system comprises a point-of-sale (POS) terminal, a POS controller, a retail subscription system. The POS terminal allows a cashier to enter subscription sales data into the POS controller. The POS controller maintains databases on available subscriptions and produces databases containing data relating to subscriptions sold to customers. The retail subscription system verifies the subscriptions by reference to its own databases and transmits the subscriptions to a fulfillment house for distribution. | 01-24-2013 |
Patent application number | Description | Published |
20130096938 | MANAGING HEALTHCARE SERVICES - System and method for facilitating a medical order/prescription of a prescription product, including a memory device to store predefined forms for the prescription product corresponding to a plurality of providers. A receiver receives prescription product information for the prescription product, patient intake information for the patient, including provider information for the patient, and a benefits summary related to the patient. A transmitter transmits the benefits verification request. A processor can be configured to generate the benefits verification request for the patient based on the patient intake information, select one of the predefined forms based on at least the patient provider information, populate at least one field of the selected predefined form based on the user intake information, and release the populated predefined form to facilitate a medical order/prescription of the prescription product to the patient. | 04-18-2013 |
20140180705 | MANAGING HEALTHCARE SERVICES - System and method for facilitating a medical order/prescription of a prescription product, including a memory device to store predefined forms for the prescription product corresponding to a plurality of providers. A receiver receives prescription product information for the prescription product, patient intake information for the patient, including provider information for the patient, and a benefits summary related to the patient. A transmitter transmits the benefits verification request. A processor can be configured to generate the benefits verification request for the patient based on the patient intake information, select one of the predefined forms based on at least the patient provider information, populate at least one field of the selected predefined form based on the user intake information, and release the populated predefined form to facilitate a medical order/prescription of the prescription product to the patient. | 06-26-2014 |
Patent application number | Description | Published |
20120205558 | Tools, Methods and Devices for Mitigating Extreme Ultraviolet Optics Contamination - Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective surface configured to reflect EUV radiation. The method may further include exposing the optically reflective surface to EUV radiation thereby generating electrons. The method may also include applying an electromagnetic field to the optically reflective surface, the electromagnetic field configured to reduce reactions initiated by the electrons on the optically reflective surface. The applied electromagnetic field may be constant or varied and also may have different biases. | 08-16-2012 |
20130202990 | COATING OF SHIELD SURFACES IN DEPOSITION SYSTEMS - A deposition chamber shield having a stainless steel coating of from about 100 microns to about 250 microns thick wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm | 08-08-2013 |
20130202991 | PROCESS FOR CLEANING SHIELD SURFACES IN DEPOSITION SYSTEMS - A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm | 08-08-2013 |
20140242500 | Process For Cleaning Shield Surfaces In Deposition Systems - A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm | 08-28-2014 |
20140242501 | Coating Of Shield Surfaces In Deposition Systems - A deposition chamber shield having a stainless steel coating of from about 100 microns to about 250 microns thick wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm | 08-28-2014 |
Patent application number | Description | Published |
20140162465 | PLASMA SHIELD SURFACE PROTECTION - Apparatuses and methods are provided for electrostatically inhibiting particle contamination of a surface of a process structure, such as a mask or reticle. The apparatuses include a plasma-generating system configured to establish a plasma shield over the surface of the process structure. The plasma shield includes a plasma region and a plasma sheath over the surface of the process structure, with the plasma sheath being disposed, at least partially, adjacent to the surface of the process structure, between the plasma region and the surface of the process structure. The plasma shield facilitates negatively charging particles within the plasma shield, and electrostatically inhibits negatively-charged particle contamination of the surface of the process structure to be protected. | 06-12-2014 |
20140170533 | EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) ALTERNATING PHASE SHIFT MASK - An alternating phase shift mask for use with extreme ultraviolet lithography is provided. A substrate with a planar top surface is used as a base for the phase shift mask. A spacer layer serves as a Fabry-Perot cavity for controlling the phase shift difference between two adjacent surfaces of the phase shift mask and controlling the reflectivity from the top of the second multilayer. A protective layer serves as an etch stop layer to protect a first multilayer region in certain regions of the phase shift mask, while other regions of the phase shift mask utilize a second multilayer region for achieving a phase shift difference. Some embodiments may further include an absorber layer region to provide areas with no reflectance, in addition to the areas of alternating phase shift. Embodiments of the present invention may be used to monitor the focus and aberration of a lithography tool. | 06-19-2014 |
20140255828 | EUVL PROCESS STRUCTURE FABRICATION METHODS - Methods are provided for fabricating a process structure, such as a mask or mask blank. The methods include, for instance: providing a silicon substrate; forming a multi-layer, extreme ultra-violet lithography (EUVL) structure over the silicon substrate; subsequent to forming the multi-layer EUVL structure over the crystalline substrate, reducing a thickness of the silicon substrate; and attaching a low-thermal-expansion material (LTEM) substrate to one of the multi-layer EUVL structure, or the reduced silicon substrate. In one implementation, the silicon substrate is a silicon wafer with a substantially defect-free surface upon which the multi-layer EUVL structure is formed. The multi-layer EUVL structure may include multiple bi-layers of a first material and a second material, as well as a capping layer, and optionally, an absorber layer, where the absorber layer is patternable to facilitating forming a EUVL mask from the process structure. | 09-11-2014 |