Patent application number | Description | Published |
20130012710 | Formation of N-Protected bis-3,6-(4-aminoalkyl)-2,5,diketopiperazine - The disclosed embodiments detail improved methods for the synthesis of diketopiperazines from amino acids. In particular improved methods for the cyclocondensation and purification of N-protected 3,6-(aminoalkyl)-2,5-diketopiperazines from N-protected amino acids. Disclosed embodiments describe methods for the synthesis of 3,6-bis-[N-protected aminoalkyl]-2,5-diketopiperazine comprising heating a mixture of an amino acid in the presence of a catalyst in an organic solvent. The catalyst is selected from the group comprising sulfuric acid, phosphoric acid, p-toluenesulfonic acid, 1-propylphosphonic acid cyclic anhydride, tributyl phosphate, phenyl phosphonic acid and phosphorous pentoxide among others. The solvent is selected from the group comprising: dimethylacetamide, N-methyl-2-pyrrolidone, diglyme, ethyl glyme, proglyme, ethyldiglyme, m-cresol, p-cresol, o-cresol, xylenes, ethylene glycol and phenol among others. | 01-10-2013 |
20150073149 | Formation of N-Protected bis-3,6-(4-aminoalkyl)-2,5,diketopiperazine - The disclosed embodiments detail improved methods for the synthesis of diketopiperazines from amino acids. In particular improved methods for the cyclocondensation and purification of N-protected 3,6-(aminoalkyl)-2,5-diketopiperazines from N-protected amino acids. Disclosed embodiments describe methods for the synthesis of 3,6-bis-[N-protected aminoalkyl]-2,5-diketopiperazine comprising heating a mixture of an amino acid in the presence of a catalyst in an organic solvent. The catalyst is selected from the group comprising sulfuric acid, phosphoric acid, p-toluenesulfonic acid, 1-propylphosphonic acid cyclic anhydride, tributyl phosphate, phenyl phosphonic acid and phosphorous pentoxide among others. The solvent is selected from the group comprising: dimethylacetamide, N-methyl-2-pyrrolidone, diglyme, ethyl glyme, proglyme, ethyldiglyme, m-cresol, p-cresol, o-cresol, xylenes, ethylene glycol and phenol among others. | 03-12-2015 |
Patent application number | Description | Published |
20100320571 | BIPOLAR TRANSISTOR STRUCTURE AND METHOD INCLUDING EMITTER-BASE INTERFACE IMPURITY - A bipolar transistor structure and a method for fabricating the bipolar transistor structure include: (1) a collector structure located at least in-part within a semiconductor substrate; (2) a base structure contacting the collector structure; and (3) an emitter structure contacting the base structure. The interface of the emitter structure and the base structure includes an oxygen impurity and at least one impurity selected from the group consisting of a fluorine impurity and a carbon impurity, to enhance performance of a bipolar transistor within the bipolar transistor structure. The impurities may be introduced into the interface by plasma etch treatment, or alternatively a thermal treatment followed by an anhydrous ammonia and hydrogen fluoride treatment, of a base material from which is comprised the base structure. | 12-23-2010 |
20110018060 | METHOD AND STRUCTURES FOR IMPROVING SUBSTRATE LOSS AND LINEARITY IN SOI SUBSTRATES - Methods and structures for improving substrate loss and linearity in SOI substrates. The methods include forming damaged crystal structure regions under the buried oxide layer of SOI substrates and the structures included damaged crystal structure regions under the buried oxide layer of the SOI substrate. | 01-27-2011 |
20110037161 | ELECTROSTATIC CHUCKING OF AN INSULATOR HANDLE SUBSTRATE - A back of a dielectric transparent handle substrate is coated with a blanket conductive film or a mesh of conductive wires. A semiconductor substrate is attached to the transparent handle substrate employing an adhesive layer. The semiconductor substrate is thinned in the bonded structure to form a stack of the transparent handle substrate and the semiconductor interposer. The thinned bonded structure may be loaded into a processing chamber and electrostatically chucked employing the blanket conductive film or the mesh of conductive wires. The semiconductor interposer may be bonded to a semiconductor chip or a packaging substrate employing C4 bonding or intermetallic alloy bonding. Illumination of ultraviolet radiation to the adhesive layer is enabled, for example, by removal of the blanket conductive film or through the mesh so that the transparent handle substrate may be detached. The semiconductor interposer may then be bonded to a packaging substrate or a semiconductor chip. | 02-17-2011 |
20110057319 | ARRANGING THROUGH SILICON VIAS IN IC LAYOUT - A portion of an IC layout that includes a plurality of through silicon vias (TSVs) is evaluated to identify linearly aligned TSVs. The portion of the IC layout is modified to reduce a number of the linearly aligned TSVs, resulting in less wafer breakage. | 03-10-2011 |
Patent application number | Description | Published |
20160072469 | SWITCHABLE FILTERS AND DESIGN STRUCTURES - Switchable and/or tunable filters, methods of manufacture and design structures are disclosed herein. The method of forming the filters includes forming at least one piezoelectric filter structure comprising a plurality of electrodes formed on a piezoelectric substrate. The method further includes forming a micro-electro-mechanical structure (MEMS) comprising a MEMS beam formed above the piezoelectric substrate and at a location in which, upon actuation, the MEMS beam shorts the piezoelectric filter structure by contacting at least one of the plurality of electrodes. | 03-10-2016 |
20160083245 | PLANAR CAVITY MEMS AND RELATED STRUCTURES, METHODS OF MANUFACTURE AND DESIGN STRUCTURES - A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending. | 03-24-2016 |
20160093523 | SEMICONDUCTOR STRUCTURE WITH AIRGAP - A field effect transistor (FET) with an underlying airgap and methods of manufacture are disclosed. The method includes forming an amorphous layer at a predetermined depth of a substrate. The method further includes forming an airgap in the substrate under the amorphous layer. The method further includes forming a completely isolated transistor in an active region of the substrate, above the amorphous layer and the airgap. | 03-31-2016 |
20160096721 | PLANAR CAVITY MEMS AND RELATED STRUCTURES, METHODS OF MANUFACTURE AND DESIGN STRUCTURES - A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending. | 04-07-2016 |
20160099124 | PLANAR CAVITY MEMS AND RELATED STRUCTURES, METHODS OF MANUFACTURE AND DESIGN STRUCTURES - A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending. | 04-07-2016 |
Patent application number | Description | Published |
20120188557 | Apparatus, optical assembly, method for inspection or measurement of an object and method for manufacturing a structure - An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly. | 07-26-2012 |
20130099957 | Optical Assembly for Laser Radar - A compact optical assembly for a laser radar system is provided, that is configured to move as a unit with a laser radar system as the laser radar system is pointed at a target and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the laser radar. The optical assembly comprises a light source, a lens, a scanning reflector and a fixed reflector that are oriented relative to each other such that: (i) a beam from the light source is reflected by the scanning reflector to the fixed reflector; (ii) reflected light from the fixed reflector is reflected again by the scanning reflector and directed along a line of sight through the lens; and (iii) the scanning reflector is moveable relative to the source, the lens and the fixed reflector, to adjust the focus of the beam along the line of sight. | 04-25-2013 |
20130194563 | OPTICAL ASSEMBLY FOR LASER RADAR - A compact optical assembly for a laser radar system is provided, that is configured to move as a unit with a laser radar system as the laser radar system is pointed at a target and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the laser radar. The optical assembly comprises a light source, a lens, a scanning reflector and a fixed reflector that are oriented relative to each other such that: (i) a beam from the light source is reflected by the scanning reflector to the fixed reflector; (ii) reflected light from the fixed reflector is reflected again by the scanning reflector and directed along A line of sight through the lens; and (iii) the scanning reflector is moveable relative to the source, the lens and the fixed reflector, to adjust the focus of the beam along the line of sight. | 08-01-2013 |
Patent application number | Description | Published |
20140116260 | Kitchen Appliance and Method of Using Same - A kitchen appliance includes a housing that defines a cavity. The housing has a housing rim defining an opening to the cavity. A heating or cooling element is disposed within the housing to heat or cool the cavity. A container has a generally hollow interior and a container rim. A lid is sized and shaped to at least partially cover the opening of the container when placed on the container. The lid has an exterior surface and an opposing interior surface. At least one latching mechanism or handle is operable to seal the contents of the appliance within the appliance. | 05-01-2014 |
20140199459 | Sandwich Making Appliance and Method of Making a Sandwich with the Same - A small cooking appliance comprises a bottom housing, a top housing, and a ring assembly. The bottom housing has a top surface that forms a bottom cooking surface of the appliance. The top housing has a bottom surface that forms a top cooking surface of the appliance. The top housing is movably attached to the bottom housing and moveable between a closed position and an open position. The ring assembly is positionable between the top and bottom cooking surfaces when the top housing is in its closed position. The ring assembly comprises a top ring, a bottom ring, and an optional center cooking plate. The center cooking plate is movable between (i) a closed position in which a space defined by the ring assembly is divided into top and bottom cooking cavities and (ii) an open position. | 07-17-2014 |
20140217084 | Sandwich Making Appliance and Method of Making a Sandwich with the Same - A small cooking appliance comprises a bottom housing, a top housing, and a ring assembly. The bottom housing has a top surface that forms a bottom cooking surface. The top housing has a bottom surface that forms a top cooking surface. The top housing is movably attached to the bottom housing and moveable between a closed position and an open position. The ring assembly is positioned between the top and bottom cooking surfaces when the top housing is in its closed position. The ring assembly comprises a top ring, a bottom ring, and a center cooking plate. The center cooking plate is adapted to be removably inserted between the top ring and the bottom ring such that a space defined by the ring assembly is divided into top and bottom cooking cavities when the center cooking plate is inserted between the top ring and the bottom ring. | 08-07-2014 |
20140345476 | SANDWICH MAKING APPLIANCE AND METHOD OF MAKING A SANDWICH - A small cooking appliance comprises a bottom housing, a top housing, and a cooking assembly. The bottom housing has a top surface that forms a bottom cooking surface of the appliance. The top housing has a bottom surface that forms a top cooking surface of the appliance. The top housing is movably attached to the bottom housing and moveable between a closed position and an open position. The cooking assembly is positioned between the top and bottom cooking surfaces when the top housing is in its closed position. The cooking assembly comprises a top cooking assembly portion, a bottom cooking assembly portion and a center cooking plate therebetween. | 11-27-2014 |
20150157172 | Sandwich Making Appliance and Method of Making a Sandwich with the Same - An appliance for cooking a food item comprises a bottom housing, a top housing, and a cooking assembly. The cooking assembly comprises a top heated plate, a bottom heated plate, and a center ring therebetween. The top heated plate is selectively movable between (i) an open position and (ii) a closed position in which a top cooking cavity is selectively formed by the top heated plate and the top housing when the top housing is in a closed position. The bottom heated plate is selectively movable between (i) an open position and (ii) a closed position in which a bottom cooking cavity is selectively formed by the bottom housing and the bottom heated plate. A center cooking cavity is selectively formed by the top heated plate, the center ring, and the bottom heated plate when the top and bottom heated plates are in their respective closed positions. | 06-11-2015 |
20150208862 | Sandwich Making Appliance and Method of Making a Sandwich with the Same - This disclosure relates to a small cooking appliance with a bottom housing, a top housing, and a ring assembly. An uppermost cooking cavity is defined in the top housing and may be used to cook or heat a top food layer. The uppermost cooking cavity includes a floor that forms an uppermost cooking surface. The uppermost cooking cavity may an open top. In an alternative embodiment, the appliance may comprise a hinged or pivoting lid to selectively close off the open top of the uppermost cooking cavity. The uppermost cooking surface may be heated by one or more heating elements in the top housing. The appliance cooks a food item in an assembled manner save a top food layer of the food item needs to be manually removed from the uppermost cooking cavity and placed onto the other layers. | 07-30-2015 |
20150259849 | Gravity-Fed Combined Iron and Steamer - An iron includes a housing, a sole plate coupled to the housing and having a plurality of openings formed therein, a water reservoir in the housing, a first steam chamber in selective fluid communication with the water reservoir via a first feed channel, and a heater in thermal communication with the sole plate and the first steam chamber. The heater heats the sole plate and water in the first steam chamber received from the water reservoir to generate steam. A steam nozzle is mounted to the housing and is in fluid communication with the first steam chamber for emitting at least a first volume of the steam. A feedback tube extends between the first steam chamber and the water reservoir for passing at least a second volume of the steam to the water reservoir. | 09-17-2015 |
20160053429 | Gravity-Fed Combined Iron and Steamer - An iron includes a housing, a sole plate coupled to the housing and having a plurality of openings formed therein, a water reservoir in the housing, a first steam chamber in selective fluid communication with the water reservoir via a first feed channel, and a heater in thermal communication with the sole plate and the first steam chamber. The heater heats the sole plate and water in the first steam chamber received from the water reservoir to generate steam. A steam nozzle is mounted to the housing and is in fluid communication with the first steam chamber for emitting at least a first volume of the steam. A three-position switch coupled to first and second valves includes a first position where the first and second valves are closed. In a second position, the first valve is open and the second valve is closed. In a third position, the second valve is open and the first valve is closed. | 02-25-2016 |
Patent application number | Description | Published |
20080241763 | METHOD OF FORMING A DUAL DAMASCENE STRUCTURE UTILIZING A DEVELOPABLE ANTI-REFLECTIVE COATING - A method of patterning a structure in a thin film on a substrate is described. A film stack on the substrate includes the thin film on the substrate, a developable anti-reflective coating (ARC) layer on the thin film, and a first photo-resist layer on the developable ARC layer. The first photo-resist layer and the developable ARC layer are imaged with a first image pattern and developed to form the first image pattern in the first photo-resist layer and the developable ARC layer. Thereafter, the first photo-resist layer is removed, and the developable ARC layer is modified by thermal treatment. A second photo-resist layer is then formed on the modified ARC layer, and the second photo-resist layer is imaged with a second image pattern and developed to form the second image pattern in the second photo-resist layer. The first and second image patterns are then transferred to the thin film. | 10-02-2008 |
20080292973 | Method for etching using a multi-layer mask - A method of dry developing a multi-layer mask on a substrate is described. The method comprises forming the multi-layer mask on the substrate, wherein the multi-layer mask comprises a lithographic layer overlying a second mask layer. A feature pattern is then formed in the lithographic layer using a lithographic process, wherein the feature pattern comprises a first critical dimension (CD). Thereafter, the feature pattern is transferred from the lithographic layer to the second mask layer using a dry plasma etching process, wherein the dry plasma etching process comprises introducing a process gas, forming plasma from the process gas, and exposing the substrate to the plasma. During the pattern transfer, the first CD in the lithographic layer is reduced to a second CD in the silicon-containing layer. | 11-27-2008 |