Patent application number | Description | Published |
20090099122 | USE OF CpG OLIGODEOXYNUCLEOTIDES TO INDUCE EPITHELIAL CELL GROWTH - This disclosure provides a method of inducing epithelial cell growth. The method includes administering an effective amount of a K-type CpG oligonucleotide, thereby inducing epithelial cell growth. The epithelial cell can be in vivo or in vitro. Methods are also provided for inducing wound healing in a subject. The methods include administering to the subject a therapeutically effective amount of at least on K-type CpG ODN. | 04-16-2009 |
20100235686 | EXECUTION HISTORY TRACING METHOD - An execution history tracing method includes tracing an execution history of a CPU upon executing, in a semiconductor device including the CPU, a program by using the CPU, for one or a tracing target, from outside the semiconductor device via software. The execution history tracing method includes recording, in a buffer, target information as trace information about an execution of the one or the tracing target, for each instruction cycle in which the target information is produced as the execution history; and performing data sorting by using the software to group the trace information about the execution of the one or the tracing target, the trace information being recorded for the each instruction execution cycle, for each of the one or the tracing target. | 09-16-2010 |
20100251022 | INTEGRATED CIRCUIT, DEBUGGING CIRCUIT, AND DEBUGGING COMMAND CONTROL METHOD - An integrated circuit includes a bus; a processing unit configured to execute a user program; and a debugging circuit connected to the bus, the debugging circuit transferring a command in a command register to the processing unit via the bus in response to a command transfer request from the processing unit, wherein, when the processing unit halts the execution of the user program and makes a request for the command transfer request to the debugging circuit, the debugging circuit makes a response for freeing the use right of the bus from the processing unit in a period between the command transfer request and the command transfer operation. | 09-30-2010 |
20110077289 | METHOD OF TREATING PNEUMOCONIOSIS WITH OLIGODEOXYNUCLEOTIDES - Methods are disclosed for treating, preventing or reducing the risk of developing occupational lung diseases, such as pneumoconiosis. In several embodiments, the methods include administering a therapeutically effective amount of the suppressive ODN to a subject having or at risk of developing a pneumoconiosis, thereby treating or inhibiting the pneumoconiosis. In several examples, thee subject can have or be at risk of developing silicosis, asbestosis or berryliosis. The method can include selecting a subject exposed to, or at risk of exposure to, inorganic particles, including, but not limited to silica, asbestos, berrylium, coal dust, or bauxite. | 03-31-2011 |
20110302456 | SEMICONDUCTOR INTEGRATED CIRCUIT, OPERATING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT, AND DEBUG SYSTEM - A current measurement unit measuring power supply currents each consumed in a plurality of circuit blocks of which at least one of the circuit blocks includes a processor, and outputting the measurement result as the power supply current values. A selection unit selecting at least one of the power supply current values according to selection information, A trace buffer sequentially holding the power supply current values being selected by the selection unit together with execution information of the processor, and sequentially outputting the held information. By selecting the power supply current values of the circuit blocks required for debugging according to the selection information, the number of external terminals of a semiconductor integrated circuit required for the debugging which includes tracing the power supply current values may be reduced. As a result, a chip size of the semiconductor integrated circuit with a debug function may be reduced. | 12-08-2011 |
20140070840 | Semiconductor Integrated Circuit, Operating Method of Semiconductor Integrated Circuit, and Debug System - A current measurement unit measuring power supply currents each consumed in a plurality of circuit blocks of which at least one of the circuit blocks includes a processor, and outputting the measurement result as the power supply current values. A selection unit selecting at least one of the power supply current values according to selection information. A trace buffer sequentially holding the power supply current values being selected by the selection unit together with execution information of the processor, and sequentially outputting the held information. By selecting the power supply current values of the circuit blocks required for debugging according to the selection information, the number of external terminals of a semiconductor integrated circuit required for the debugging which includes tracing the power supply current values may be reduced. As a result, a chip size of the semiconductor integrated circuit with a debug function may be reduced. | 03-13-2014 |
20140075249 | Execution History Tracing Method - An execution history tracing method includes tracing an execution history of a CPU upon executing, in a semiconductor device including the CPU, a program by using the CPU, for one or a tracing target, from outside the semiconductor device via software. The execution history tracing method includes recording, in a buffer, target information as trace information about an execution of the one or the tracing target, for each instruction cycle in which the target information is produced as the execution history; and performing data sorting by using the software to group the trace information about the execution of the one or the tracing target, the trace information being recorded for the each instruction execution cycle, for each of the one or the tracing target. | 03-13-2014 |
20140201403 | DEBUG CONTROL CIRCUIT - An integrated circuit includes a bus; a processing unit configured to execute a user program; and a debugging circuit connected to the bus, the debugging circuit transferring a command in a command register to the processing unit via the bus in response to a command transfer request from the processing unit, wherein, when the processing unit halts the execution of the user program and makes a request for the command transfer request to the debugging circuit, the debugging circuit makes a response for freeing the use right of the bus from the processing unit in a period between the command transfer request and the command transfer operation. | 07-17-2014 |
Patent application number | Description | Published |
20080203062 | SWITCHGEAR - A switchgear having interrupters wherein at least two moving contacts are capable of being open and close with respect to respective fixed contacts. The switchgear comprises a non-earthed metal vacuum chamber enclosing the interrupters therein, a connection conductor for connecting the moving contacts, an operating rod connected to the connecting conductor by means of an insulator and protruding from the non-earthed metal vacuum chamber, a sealing means for sealing the protrusion of the operating rod at the non-earthed metal vacuum chamber, circuit terminals protruding from the non-earthed vacuum chamber, an earth layer surrounding an outer periphery of the insulating mold, and apotential control means. The control means for controlling the potential of the non-earthed metal vacuum chamber is connected between the circuit terminals and is connected to the non-earthed metal vacuum chamber at the intermediate point of the potential control means. | 08-28-2008 |
20100000973 | VACUUM SWITCH AND VACUUM SWITCHGEAR - A vacuum switch having a fixed electrode, a movable electrode facing the fixed electrode, an insulating cylinder, end plates covering both axial ends of the insulating cylinder, a vacuum chamber internally accommodating the fixed electrode and the movable electrode, and a solid isolation resin molded on the outside of the vacuum chamber, characterized in that,
| 01-07-2010 |
20100038343 | VACUUM SWITCH - A vacuum switch means a unit switch section comprising a pair of vacuum main circuit switches, an earth switch, operating rods for operating movable conductors of the main circuit vacuum switch and earth switch, and a molding case covering the main circuit switch, earth switch and the operating rods, wherein the operating rods are connectable with an operating mechanism, and the fixed conductors of the main circuit switch and earth switch are connected with bushing conductors. The main circuit vacuum switches are disposed in separate vacuum chambers. The movable conductors of the main circuit switches and electrically connected to each other via a transition conductor, and the movable conductors are operated synchronously by means of a transition rod connected to the transition conductor. | 02-18-2010 |
20100122967 | VACUUM SWITCHGEAR - A vacuum switchgear comprising:
| 05-20-2010 |
20110036811 | Switchgear and Method for Operating Switchgear - A switchgear includes an earthing and disconnecting switch which linearly moves and is switchable to a disconnecting and an earthing positions, a vacuum valve which performs closing and breaking of a current in a vacuum container producing vacuum inside, and a solid insulator with which the earthing and disconnecting switch and the vacuum valve are covered, therein the earthing and disconnecting switch and the vacuum valve are electrically connected, and closing and breaking of a current is performed in the vacuum valve. | 02-17-2011 |
20120175234 | Switch Unit and Switchgear - A switch unit includes a plurality of switches, which are linearly disposed. The movable electrode in one switch and the fixed electrode in another switch are electrically connected to each other. | 07-12-2012 |
20120276755 | Grease for Electrical Contact and Slide Electricity Structure, Power Switch, Vacuum Circuit Breaker, Vacuum-Insulated Switchgear, and Vacuum-Insulated Switchgear Assembling Method - A slide electricity structure according to the present invention uses grease for electrical contacts wherein contact resistance does not gradually increase even when exposed to sliding and lifetime is long, and has a silver-plated spring contact that contacts or separates by way of sliding and grease for electrical contacts that has been applied to the spring contact and contains perfluoropolyether oil having an average molecular weight between 2600 and 12500 as a base oil and PTFE having a primary particle diameter of 1 μm or less as a thickener. | 11-01-2012 |
Patent application number | Description | Published |
20080317193 | EMERGENCY CORE COOLING SYSTEM - An emergency core cooling system is provided with a hybrid safety system composed of an active safety system and a static safety system for ensuring the safety against a severe natural phenomenon such as a giant earthquake and a mega hurricane. An emergency core cooling system for a boiling water reactor includes four safety divisions in total: three safety divisions for an active safety system having a high pressure reactor core cooling system, a low pressure reactor core cooling system, a residual heat removal system, and an emergency diesel generator; and one safety division for a static safety system having an isolation condenser, a gravity drop reactor core cooling system, and a static containment vessel cooling system. | 12-25-2008 |
20100081093 | EXPOSURE APPARATUS INSPECTION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A mask pattern includes a first pattern having a line-and-space pattern extending in a first direction, a second pattern formed as a line-and-space pattern having a larger period than the first pattern and extending in the first direction, a third pattern having a line-and-space pattern extending in a second direction, and a fourth pattern formed as a line-and-space pattern having a larger period than the third pattern and extending in the second direction. Illumination light is obliquely incident on the first pattern and the second pattern from a first oblique direction, illumination light is obliquely incident on the third pattern and the fourth pattern from a second oblique direction, and a relative distance from the first pattern to the second pattern transferred on to an image receptor and a relative distance from the third pattern to the fourth pattern transferred onto the image receptor are measured and an optical characteristic of an exposure apparatus is ascertained based on the relative distances. | 04-01-2010 |
20150053867 | PATTERN FORMATION METHOD, MASK FOR PATTERN FORMATION, METHOD FOR MANUFACTURING MASK, AND PATTERN FORMATION APPARATUS - According to one embodiment, a pattern formation method includes: preparing a mask pattern for interference, a photoelectric conversion unit, and a processing object, the mask pattern for interference being periodically arranged a plurality of light transmissive portions, the photoelectric conversion unit being disposed apart from the mask pattern for interference; applying light to the mask pattern for interference to produce Talbot interference based on transmitted light of the light transmitted through the light transmissive portions; applying interference light produced by the Talbot interference to the photoelectric conversion unit to cause the photoelectric conversion unit to emit electrons based on the interference light; and forming a pattern by applying the electrons to the processing object. | 02-26-2015 |
20150055113 | PATTERN FORMATION METHOD, MASK FOR EXPOSURE, AND EXPOSURE APPARATUS - According to one embodiment, a pattern formation method includes preparing a mask pattern for interference, producing Talbot interference, and forming a pattern by blocking a part of interference light. The mask pattern for interference is arranged periodically a plurality of light transmissive portions. The Talbot interference is based on a transmitted light. The transmitted light is transmitted through the light transmissive portions by applying a light to the mask pattern for interference. The part of interference light is produced by the Talbot interference by means of a mask pattern for light blocking and applying another part of the interference light transmitted through the mask pattern for light blocking to a exposure object member. | 02-26-2015 |
Patent application number | Description | Published |
20090321236 | PUSH SWITCH AND METHOD OF MANUFACTURING THE SAME - Provided is a push switch including: a tubular case; a slider which is supported by the tubular case to reciprocate and advance during a pushing operation; and biasing means for biasing the slider to retreat, wherein the slider upon retreating is automatically returned to a non-operation position by allowing a contact inclined surface provided at a contact portion of the slider to come in contact with a restriction inclined surface provided at a restriction portion of the tubular case, the slider is a mold made of a resin material having a higher thermal contraction coefficient and a lower melting temperature than those of the resin material of the tubular case, the shape of the contact portion is similar to and slightly smaller than the shape of the restriction portion in order that they be complementary to each other, and the tubular case is provided with a pair of restriction inclined surfaces. | 12-31-2009 |
20100032277 | PUSH-TYPE SWITCH DEVICE - Provided is a push-type switch device including: a switch element in which a dome-shaped reversing spring is accommodated in a switch casing; a holder which is mounted to the outside portion of the switch casing so as to define a position relative to the switch casing and has a perforation hole formed at a position adjacent to a center portion of the reversing spring so as to face the center portion; and a driving protrusion which is inserted through the perforation hole so as to reciprocate and is driven to push the reversing spring, wherein when the holder mounted on an upper portion of the switch casing is attached to a predetermined position of the interconnection substrate, the switch casing is held in the interconnection substrate. | 02-11-2010 |
20100038224 | ILLUMINATION SWITCH DEVICE - Provided is an illumination switch device including: a manipulation knob in which a light shielding portion is provided in a front outer surface of a body formed of a light transmitting material except for an illumination portion; hollow sliders, each of which is incorporated into the manipulation knob and is formed of a light shielding material; a casing, which elevatably guides the slider; a switch element, which is operated by the elevation movement of the slider; and a light source, which irradiates light to a rear surface of the manipulation knob via an inner space of the slider, wherein a front end portion of the slider is disposed so as to protrude forward from the casing and the manipulation knob is snap-connected to the front end portion of the slider protruding from the casing, wherein the manipulation knob includes: a skirt portion, which protrudes backward from a peripheral edge portion of the body so as to surround the front end portion of the slider; connection pieces, each of which protrudes backward from a rear surface of the body more than the skirt portion so as to be inserted into the slider; and locking holes, each of which is provided in the connection piece so as to be located on the lower side of the skirt portion, and wherein an inner wall surface of the slider is provided with a locking claw, which is snap-connected to the locking hole. | 02-18-2010 |
20130207673 | HUMIDITY DETECTION SENSOR AND A METHOD FOR MANUFACTURING THE SAME - A humidity detection sensor includes a lower electrode provided on a board, an upper electrode provided so as to face the lower electrode, a humidity sensing film which is formed at least between the lower electrode and the upper electrode and whose dielectric constant changes in response to humidity, and a protective film provided so as to cover the upper electrode. Each of the upper electrode and the protective film has an opening through which the humidity sensing film is partially exposed to the outside. In the opening, the humidity sensing film is provided so as to reach at least a position higher than the position of the lower surface of the protective film. | 08-15-2013 |
Patent application number | Description | Published |
20080301621 | MASK PATTERN CORRECTING METHOD - In a model-based OPC which makes a suitable mask correction for each mask pattern using an optical image intensity simulator, a mask pattern is divided into subregions and the model of optical image intensity simulation is changed according to the contents of the pattern in each subregion. When the minimum dimensions of the mask pattern are smaller than a specific threshold value set near the exposure wavelength, the region is calculated using a high-accuracy model and the other regions are calculated using a high-speed model. | 12-04-2008 |
20090021711 | METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM - A method of inspecting an exposure system uses a mask pattern including a first and a second mask pattern, the first pattern being formed in a line-and-space of a first pitch, the second pattern being disposed in parallel with the first mask pattern and formed in a line-and-space of a second pitch. The method includes illuminating the mask pattern with inspection light at a first angle with the optical axis of the illumination light from a light source, allowing the first mask pattern to diffract the inspection light to generate first diffraction light, and allowing the second mask pattern to diffract the inspection light to generate second diffraction light. The first angle is to allow the first diffraction light to be diffracted asymmetrically with the optical axis into the projection optical system and the second diffraction light to be diffracted symmetrically with the optical axis into the projection optical system. | 01-22-2009 |
20090202136 | Polarization analyzing system, exposure method, and method for manufacturing semiconductor device - A polarization analyzing system includes a data collector collecting information on resist patterns formed over step patterns by first and second lights, the first and second lights being polarized parallel and perpendicular to the step patterns, a residual resist analyzer obtaining first and second relations between a ratio of a space to a line width of the resist patterns and the first and second residues, the first and second residues remaining at orthogonal points of the step patterns and the resist patterns, and a direction chooser choosing an optimum polarization direction reducing residues by comparing the first and second relations. | 08-13-2009 |
20090210851 | LITHOGRAPHY SIMULATION METHOD AND COMPUTER PROGRAM PRODUCT - A lithography simulation method for simulating a lithography process configured to form a pattern on a wafer in which the pattern corresponds to a pattern of a photomask, the lithography process including disposing the photomask above the wafer, disposing an exposure light source above the photomask, and irradiating the wafer with light which is emitted from the exposure light source and has passed through the photomask, the lithography simulation method including assuming a light source corresponding to the exposure light source and used for simulating the lithography process, the light source failing to reflect amplitude transmittance of light emitted from the exposure light source wherein the light is obliquely incident on the photomask, and acquiring a light intensity distribution of the pattern to be formed on the wafer corresponding to the pattern of the photomask by calculation using the light source. | 08-20-2009 |
20090217233 | SIMULATION METHOD AND SIMULATION PROGRAM - A method of simulating an optical intensity distribution on a substrate when a mask pattern formed on the mask is transferred to the substrate through a projection optical system by irradiating an illumination light obliquely on a mask surface of the mask, which comprises setting a phase difference between a zero-order diffraction light and a first-order diffraction light determined according to at least one of a distance between the zero-order diffraction light and the first-order diffraction light on a pupil of the projection optical system, thickness of a light-shielding portion formed on the mask, angle defined by an optical axis direction of the illumination light and an incident direction on the mask, and a difference between a size of the mask pattern and a half cycle of the mask pattern, and carrying out a simulation of the optical intensity distribution on the substrate according to the set phase difference. | 08-27-2009 |
20090246709 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A manufacturing method of a semiconductor device includes preparing a first circuit pattern original plate including a first pattern part of a mark pattern, preparing a second circuit pattern original plate including a second pattern part of the mark pattern, transferring the first pattern part to a mask film on an underlying area to form a first transfer pattern part in the mask film, transferring the second pattern part to the mask film to form a second transfer pattern part in the mask film, and patterning the underlying area by using the mask film including a transfer mark pattern, which is obtained by combining the first transfer pattern part and the second transfer pattern part, as a mask to form an underlying mark pattern in the underlying area. | 10-01-2009 |
20100003608 | METHOD FOR GENERATING MASK PATTERN DATA AND METHOD FOR MANUFACTURING MASK - A method for generating data on mask pattern used to form a device pattern formed on a reflective exposure mask, wherein data on the mask pattern is generated based on a position correction amount table used to correct an amount of transfer position error occurring depending on at least one of pattern size and pattern pitch of the mask pattern when the mask pattern is transferred onto an exposure target member. | 01-07-2010 |
20110151357 | EXPOSURE DOSE MONITORING METHOD AND METHOD OF MANUFACTURING EXPOSURE DOSE MONITORING MASK - According to one embodiment, a monitoring pattern is transferred to a wafer by irradiation with EUV light by using a reflective mask including the monitoring pattern. Then, the line width of the monitoring pattern transferred to the wafer is measured, and a flare intensity distribution to be generated on the wafer is calculated in accordance with the reflecting region area of the mask and the layout direction of the monitoring pattern. After that, the measured line width of the monitoring pattern is corrected based on the calculated flare intensity distribution. Finally, the exposure dose of the monitoring pattern on the wafer is obtained from the corrected line width. | 06-23-2011 |
20150021191 | PATTERN TRANSFER MOLD AND PATTERN FORMATION METHOD - According to one embodiment, a pattern transfer mold includes a base body, first and second stacked bodies, first and second electrodes. The base body includes a base unit including a first surface, a first protrusion provided on the first surface and having a first side surface, and a second protrusion provided on the first surface, separated from the first protrusion, and having a second side surface opposing the first side surface. The first stacked body is provided on the first side surface, and includes first conductive layers and a first insulating layer. The second stacked body is provided on the second side surface, separated from the first stacked body, and includes second conductive layers and a second insulating layer. The first electrode is electrically connected to at least one of the first conductive layers. The second electrode is electrically connected to at least one of the second conductive layers. | 01-22-2015 |
20150042858 | SOLID-STATE IMAGING DEVICE - According to one embodiment, there is provided a solid-state imaging device including a pixel array. In the pixel array, a plurality of pixels are arrayed. The plurality of pixels include an imaging pixel and a focus-detecting pixel. The focus-detecting pixel includes a first photoelectric conversion part, a first diffraction grating, and a second diffraction grating. The first diffraction grating is arranged above the first photoelectric conversion part. The second diffraction grating is arranged between the first photoelectric conversion part and the first diffraction grating. | 02-12-2015 |
Patent application number | Description | Published |
20080319695 | SENSING CIRCUIT, OPTICAL DETECTION CIRCUIT, DISPLAY DEVICE, AND ELECTRONIC APPARATUS - A sensing circuit includes a first sensing element, a second sensing element, a reduction unit, a storage unit, a specifying unit and a detection unit. The reduction unit reduces the amount of the energy applied to the second sensing element. The storage unit stores a degradation characteristic of the sensing element. The specifying unit specifies a rate of degradation. The detection unit detects the amount of the energy on the basis of the rate of degradation. | 12-25-2008 |
20090267121 | SOLID-STATE IMAGE PICKUP DEVICE - A solid-state image pickup device is provided which includes a substrate; a transistor formed on the substrate; a photoelectric conversion element including a first electrode connected to a drain or a source of the transistor, a semiconductor layer stacked on the first electrode, and a second electrode stacked on the semiconductor layer; an insulating layer disposed on the second electrode; and a bias line formed on the insulating layer to be connected to the second electrode, in which the insulating layer contains at least an inorganic insulating film, and the bias line is connected to the second electrode via a contact hole formed in the insulating layer, and a side surface of the semiconductor layer is in contact with the inorganic insulating film. | 10-29-2009 |
20090302202 | SOLID-STATE IMAGE PICKUP DEVICE - There is provided a solid-state image pickup device that has a plurality of scanning lines that extends in a predetermined direction, a plurality of data lines that extends in a direction for intersecting the scanning lines, and a plurality of bias lines within an image pickup area on a substrate. For each of a plurality of pixels disposed in positions corresponding to intersections of the plurality of scanning lines and the plurality of data lines, a field effect transistor that is controlled by the scanning line and a photoelectric conversion element that has a electrode electrically connected to the data line through the field effect transistor and a electrode electrically connected to the bias line are formed, and a constant electric potential line for electrostatic protection is formed on the substrate. For each of bias lines, a bias line electrostatic protection circuit having a protection diode. | 12-10-2009 |
20110114971 | SUBSTRATE FOR SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE - A substrate for a semiconductor device is provided, including: a substrate; a transistor, formed on the substrate, that includes a semiconductor layer, and a gate electrode disposed so as to be opposed to the semiconductor layer with a gate insulating film interposed therebetween; and an underlying film disposed below the semiconductor layer, as an underlayer of the transistor, and formed in an island shape so as to at least partially overlap the semiconductor layer, in a plan view of the substrate. | 05-19-2011 |
20110115006 | SUBSTRATE FOR SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING THE SAME, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS - A substrate for a semiconductor device includes a substrate; a transistor disposed on the substrate and including a semiconductor layer, a first insulating film provided in the form of islands so as to at least partly overlap with the semiconductor layer in plan view on the substrate, and a gate electrode disposed so as to face the semiconductor layer with the first insulating film therebetween; and a second insulating film that is disposed on the substrate as substantially the same film as the first insulating film and that is formed in the form of islands so that at least one of the material and the thickness of the second insulating film is different from that of the first insulating film. | 05-19-2011 |
20110170169 | ELECTROPHORETIC DISPLAY DEVICE AND ELECTRONIC APPARATUS - An electrophoretic display device including: a first substrate; a second substrate that is disposed so as to face the first substrate; an electrophoretic device that is disposed between the first substrate and the second substrate; a plurality of first electrodes that are formed so as to overlie the electrophoretic device side of the first substrate; and a second electrode that is formed on the electrophoretic device side of the second substrate so as to face the plurality of the first electrodes. The second electrode has light reflectivity. | 07-14-2011 |
20110188111 | SUBSTRATE FOR ELECTRO-OPTICAL DEVICES, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS - A electro-optical device is provide with a substrate, a pixel electrode provide for each pixel, a pixel transistor which is provided for each pixel more to a lower layer side through an interlayer insulating film than the pixel electrode and is connected to the pixel electrode, a periphery transistor provided in a periphery region, and a connection wire formed in the same film as the pixel electrode in a region where the interlayer insulating film and a gate insulating film included in the pixel transistor and the periphery transistor are not formed, and electrically connected to the periphery transistor. | 08-04-2011 |
20110193837 | SUBSTRATE FOR ELECTRO-OPTICAL DEVICES, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS - A electro-optical device is provide with a substrate, a pixel electrode, a transistor which is provided more to a lower layer side than the pixel electrode, and a connection electrode which is arranged more to an upper layer side than a gate insulating film, is formed to directly overlap with at least a portion of a gate electrode and a source/drain electrode in a region where the gate insulating film is not formed, and is electrically connected to the transistor. | 08-11-2011 |
20110194170 | ELECTROPHORETIC DISPLAY DEVICE AND ELECTRONIC APPARATUS - An electrophoretic display device includes: a first substrate; a second substrate arranged to face the first substrate, an electrophoretic element arranged between the first substrate and the second substrate; a plurality of pixel electrodes formed on the surface of the electrophoretic element side of the first substrate; an opposing electrode formed on the surface of the electrophoretic element side of the second substrate and facing the plurality of pixel electrodes; a voltage line formed on the surface of the electrophoretic element side of the first substrate; and a partition wall having conductivity which is arranged between the first substrate and the second substrate and electrically connected to the voltage line. | 08-11-2011 |
20110205195 | ELECTROPHORETIC DISPLAY AND ELECTRONIC DEVICE - An electrophoretic display includes a first substrate, a second substrate, an electrophoretic element interposed therebetween, a plurality of scanning lines on an electrophoretic element side surface of the first substrate, a plurality of data lines extending in the crosswise directions of the plurality of scanning lines on the electrophoretic element side surface of the first substrate, a selection transistor connected to one of the scanning lines and one of the data lines, a pixel electrode connected to the selection transistor, and a capacitor with two electrodes, one of the electrode thereof being connected to the selection transistor and the pixel electrode, and the other electrode thereof being connected to one of the scanning lines, wherein a plurality of pixel electrodes are arranged so that a dot density thereof is more than or equal to 200 dpi. | 08-25-2011 |
20110241003 | ELECTRO-OPTICAL DEVICE SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS - In an electro-optical device substrate, first and second pixel switching elements each include a gate electrode formed of a first conductive film, a gate insulation film formed of a first insulation film, a semiconductor layer, a source electrode formed of a second conductive film, and a drain electrode formed of the second conductive film. A first storage capacitor includes a first storage capacitor electrode formed of the second conductive film, a protective film formed of a second insulation film so as to over at least the first storage capacitor electrode, and a pixel electrode formed so as to overlap with the first storage capacitor electrode at least partially with the protective film interposed therebetween. | 10-06-2011 |
20110266599 | SOLID-STATE IMAGE PICKUP DEVICE - A solid-state image pickup device is provided which includes a substrate; a transistor formed on the substrate; a photoelectric conversion element including a first electrode connected to a drain or a source of the transistor, a semiconductor layer stacked on the first electrode, and a second electrode stacked on the semiconductor layer; an insulating layer disposed on the second electrode; and a bias line formed on the insulating layer to be connected to the second electrode, in which the insulating layer contains at least an inorganic insulating film, and the bias line is connected to the second electrode via a contact hole formed in the insulating layer, and a side surface of the semiconductor layer is in contact with the inorganic insulating film. | 11-03-2011 |
20120069425 | ELECTROPHORETIC DISPLAY DEVICE, DRIVING METHOD OF ELECTROPHORETIC DISPLAY DEVICE, AND ELECTRONIC APPARATUS - An electrophoretic device includes: a first substrate and a second substrate; an electrophoretic layer including colored particles that is arranged between the first substrate and the second substrate; first electrodes; first transistors connected to the first electrodes; opposing electrodes that have larger areas than the first electrodes and have transparency; and a reflecting layer that has a larger area than the first electrodes, wherein the gradation is controlled by the area of the colored particles that is visible when the electrophoretic layer is seen from the second substrate side. | 03-22-2012 |
20120138940 | THIN-FILM TRANSISTOR FORMING SUBSTRATE, SEMICONDUCTOR DEVICE, AND ELECTRIC APPARATUS - There is provided a thin-film transistor forming substrate in which at least one of a source electrode, a drain electrode, and a gate electrode, which are constituent elements of a thin film transistor, or a first electrode is included on a face of a substrate main body that is located on any one side in a thickness direction. An embedded wiring that is connected to one of the source electrode, the drain electrode, the gate electrode, and the first electrode is buried inside the substrate main body. | 06-07-2012 |
20120140424 | THIN-FILM TRANSISTOR FORMING SUBSTRATE, SEMICONDUCTOR DEVICE, AND ELECTRIC APPARATUS - A thin-film transistor forming substrate includes a substrate that has flexibility or elasticity and at least one electronic component that is disposed so as to be buried inside the substrate. The electronic component is configured so as to include one or more types of an IC, a capacitor, a resistor, and an inductor. | 06-07-2012 |
20120223929 | ELECTROPHORETIC DISPLAY DEVICE, DRIVING METHOD OF THE SAME, AND ELECTRONIC APPARATUS - The electrophoretic display device includes: an electrophoretic layer which is disposed between first and second substrates disposed to face each other and has a plurality of first electrically-charged particles colored into a first color, a plurality of second electrically-charged particles colored into a second color, and a dispersion medium which retains the first and second electrically-charged particles; first and second pixel electrodes provided on the first substrate; an opposite electrode provided on the second substrate; and a reflective electrode provided at a position on the first substrate side rather than on the electrophoretic layer, wherein the first electrically-charged particle has permeability in a first wavelength region and absorbability in the other wavelength regions, and the second electrically-charged particle has reflectivity in a second wavelength region and absorbability in the other wavelength regions. | 09-06-2012 |
20120224343 | ELECTRICAL DEVICE - An electrical device includes a first substrate and a second substrate which are disposed in an opposing manner so as to interpose a functional element, a first electrode (rear surface electrode) which is provided more to the first substrate side than the functional element, a second electrode which is provided on the second substrate and is electrically connected to the first electrode, and a functional element and an electronic component which drives the functional element in a region which is a region where the first substrate and the second substrate overlap and which is interposed between the first electrode and the second electrode. | 09-06-2012 |
20140211428 | ELECTRICAL DEVICE - In one embodiment, an electrical device includes a first substrate with a first side and a second side, a second substrate opposed to the first side of the first substrate, and a functional element arranged between the first side of the first substrate and the second substrate. The electrical device includes a first electrode arranged to a first substrate side of the functional element and overlaps with the functional element in planar view, and a second electrode arranged to a second substrate side of the functional element and overlaps with the functional element in planar view. The electrical device includes an electronic component arranged between the functional element and the first electrode, overlapping the first electrode and the second electrode in planar view, and driving the functional element. The electrical device includes a connecting section electrically connecting the first electrode to the second electrode. | 07-31-2014 |
20140211429 | ELECTRICAL DEVICE - An electrical device includes a first substrate, a second substrate opposed to a first side of the first substrate, and a functional element between the first side of the first substrate and the second substrate. A first electrode is arranged to a first substrate side of the functional element and overlaps with the functional element. A second electrode is arranged to a second substrate side of the functional element and overlaps with the functional element. An electronic component is arranged between the functional element and the first electrode, overlaps the first and second electrodes, and drives the functional element. A connecting section includes a first wiring, a second wiring, a first contact hole connecting the first electrode to the first wiring, and a second contact hole connecting the first wiring to the second wiring. The first contact hole has a portion that does not overlap with the second contact hole. | 07-31-2014 |
20140211430 | ELECTRICAL DEVICE - In one embodiment, an electrical device includes a first substrate with a first side and a second side, a second substrate opposed to the first side of the first substrate, and a functional element between the first side of the first substrate and the second substrate. A first electrode arranged to a first substrate side of the functional element and overlaps with the functional element in planar view. A second electrode is arranged to a second substrate side of the functional element and overlaps with the functional element in planar view. An electronic component is arranged between the functional element and the first electrode, overlaps with the first electrode and the second electrode in planar view, and drives the functional element. A connecting section electrically connects the first electrode to the second electrode and a protection circuit between an output terminal of the electronic circuit and the first electrode. | 07-31-2014 |
Patent application number | Description | Published |
20080203812 | Brake Control Apparatus for Vehicle - A brake control apparatus for a vehicle includes a first calculating portion for calculating a master cylinder pressure, a first determining portion for determining whether or not the brake operation is performed, a second calculating portion for calculating a target wheel cylinder pressure, a third calculating portion for calculating a controlled pressure, a controlling portion for controlling a pressure difference control valve, a second determining portion for determining whether or not the vehicle is stopped, and a driving portion for specifying a drive pattern of a motor to a first motor drive pattern in a case where the vehicle is not stopped, the motor driving a pump for discharging a brake fluid, the driving means specifying the drive pattern to a second motor drive pattern in a case where the vehicle is stopped, the driving means driving the motor based on the motor driving pattern specified. | 08-28-2008 |
20080255732 | BRAKING CONTROL APPARATUS FOR VEHICLE - A braking control apparatus for a vehicle includes four wheel braking apparatuses for applying a braking torque to wheels, a first hydraulic pressure generating apparatus generating a hydraulic pressure, a vacuum booster generating an assist force for assisting a breaking operation, a first hydraulic circuit, a second hydraulic circuit, a second hydraulic pressure generating apparatus generating an assist hydraulic pressure that is added to the hydraulic pressure, a detecting portion for detecting a braking operation variable, a target value determining portion for determining a first assist hydraulic pressure target value and a second assist hydraulic pressure target value to be both greater than zero over a range where the braking operation variable is greater than a predetermined value at which the assist force by the vacuum booster is started, and a pressure regulating portion for regulating the assist hydraulic pressure to mach the assist hydraulic pressure target value. | 10-16-2008 |
20090024289 | Braking Control Device - Braking discomfort applied to the driver is minimized. Provided are a brake operation amount section ( | 01-22-2009 |
20110198165 | BRAKING CONTROL APPARATUS FOR VEHICLE - A braking control apparatus for a vehicle includes four wheel braking apparatuses for applying a braking torque to wheels, a first hydraulic pressure generating apparatus generating a hydraulic pressure, a vacuum booster generating an assist force for assisting a breaking operation, a first hydraulic circuit, a second hydraulic circuit, a second hydraulic pressure generating apparatus generating an assist hydraulic pressure that is added to the hydraulic pressure, a detecting portion for detecting a braking operation variable, a target value determining portion for determining a first assist hydraulic pressure target value and a second assist hydraulic pressure target value to be both greater than zero over a range where the braking operation variable is greater than a predetermined value at which the assist force by the vacuum booster is started, and a pressure regulating portion for regulating the assist hydraulic pressure to mach the assist hydraulic pressure target value. | 08-18-2011 |
Patent application number | Description | Published |
20080199338 | Multistage compression type rotary compressor - An object is to provide a high inner pressure type multistage compression rotary compressor capable of avoiding beforehand generation of vane fly of a second rotary compression element and realizing a stabilized operation, the rotary compressor includes a communication path which connects an intermediate pressure region to a region having a low pressure as a suction pressure of a first rotary compression element; and a valve device which opens or closes this communication path, the rotary compressor applies a high pressure as a back pressure of an upper vane, and this valve device opens the communication path in a case where a pressure difference between the intermediate pressure and the low pressure increases a predetermined upper limit value before the intermediate pressure reaches the high pressure. | 08-21-2008 |
20080286137 | Multistage compression type rotary compressor - An object is to provide a high inner pressure type multistage compression rotary compressor capable of avoiding beforehand generation of vane fly of a second rotary compression element and realizing a stabilized operation, the rotary compressor includes a communication path which connects an intermediate pressure region to a region having a low pressure as a suction pressure of a first rotary compression element; and a valve device which opens or closes this communication path, the rotary compressor applies a high pressure as a back pressure of an upper vane, and this valve device opens the communication path in a case where a pressure difference between the intermediate pressure and the low pressure increases a predetermined upper limit value before the intermediate pressure reaches the high pressure. | 11-20-2008 |
20080292485 | Multistage compression type rotary compressor - An object is to provide a high inner pressure type multistage compression rotary compressor capable of avoiding beforehand generation of vane fly of a second rotary compression element and realizing a stabilized operation, the rotary compressor includes a communication path which connects an intermediate pressure region to a region having a low pressure as a suction pressure of a first rotary compression element; and a valve device which opens or closes this communication path, the rotary compressor applies a high pressure as a back pressure of an upper vane, and this valve device opens the communication path in a case where a pressure difference between the intermediate pressure and the low pressure increases a predetermined upper limit value before the intermediate pressure reaches the high pressure. | 11-27-2008 |
20110154839 | REFRIGERATING APPARATUS - An object of the present invention is to keep an appropriate high pressure side pressure in a refrigerant circuit while reducing noises of an operation of a blower in a refrigerating apparatus which obtains a critical pressure on a high pressure side. The refrigerating apparatus in which the refrigerant circuit is constituted of a compressor, a gas cooler, reducing means and an evaporator to obtain a supercritical pressure on the high pressure side comprises a blower which air-cools the gas cooler and a control device which controls this blower. This control device controls a revolution speed of the blower based on an outdoor temperature and an evaporation temperature of a refrigerant in the evaporator. | 06-30-2011 |
20110236245 | ROTARY COMPRESSOR - Provided is a rotary compressor capable of reducing oil exiting a refrigerant discharge pipe by regulating positions of a discharge hole and an opening of the refrigerant discharge pipe to be predetermined positions. According to the concept of the invention, a rotary compressor includes: a driving element which is provided inside a sealed container; and a rotary compression element which is provided inside the sealed container so as to be located below the driving element and to be driven by a rotary shaft of the driving element, wherein a refrigerant discharge pipe is inserted from a side surface of the sealed container above the driving element into the sealed container, and is opened in the horizontal direction, wherein a refrigerant compressed by the rotary compression element is discharged from a discharge hole into the sealed container, and is discharged from the refrigerant discharge pipe to the outside of the sealed container, and wherein the position of the discharge hole is set to a position below an area A | 09-29-2011 |
Patent application number | Description | Published |
20090085854 | DISPLAY UNIT - The invention provides a display unit that has a display area and first and second photodetectors | 04-02-2009 |
20110181585 | SEMICONDUCTOR DEVICE AND DRIVING METHOD THEREOF, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE - A semiconductor device includes: a first transistor which is electrically connected between a capacitive element and a data line; a second transistor which is electrically connected between the first transistor and the capacitive element; and a driving unit. The driving unit drives the first and second transistors so that when the data voltage is applied to the capacitive element, both the first and second transistors are turned on, the second transistor is temporarily turned off, after a timing at which both the first and second transistors are turned on, and then turned on again, and the first transistor is turned off at the timing at which the second transistor is temporarily turned off or after the timing and before the second transistor is turned on again. | 07-28-2011 |
20110248909 | ELECTROPHORETIC DISPLAY DEVICE AND ELECTRONIC APPARATUS - Provided is an electrophoretic display device including: a first substrate; a second substrate; an electrophoretic layer which is arranged between the first substrate and the second substrate and has at least a dispersion medium and particles mixed in the dispersion medium; a plurality of first electrodes which is formed in an island shape on the electrophoretic layer side of the first substrate and is provided for each pixel; and a second electrode which is formed on the electrophoretic layer side of the second substrate with an area wider than that of the first pixel electrode. Gradation is controlled using an area of the particles which are visually recognized when the electrophoretic layer is viewed from the second electrode side. | 10-13-2011 |
20110249043 | ELECTROPHORETIC DISPLAY DEVICE, DRIVING METHOD OF THE SAME, AND ELECTRONIC APPARATUS - An electrophoretic display device is provided with a first substrate, a second substrate, an electrophoretic layer which is arranged between the first substrate and the second substrate and has at least a dispersion medium and particles mixed in the dispersion medium, a first electrode which is formed in an island shape on the electrophoretic layer side of the first substrate for each pixel, and a second electrode which is formed on the electrophoretic layer side of the second substrate with an area wider than the first electrode, where gradation is controlled using an area of the particles which are visually recognized when the electrophoretic layer is viewed from the second electrode side. | 10-13-2011 |
20110285756 | ELECTROPHORETIC DISPLAY DEVICE, DRIVING METHOD THEREFOR, AND ELECTRONIC APPARATUS - An electrophoretic display device includes a first substrate and a second substrate, an electrophoretic layer disposed between the first substrate and the second substrate and containing at least a dispersion medium and positively or negatively charged particles mixed in the dispersion medium, first electrodes formed in island shapes and driven independently in respective pixels on a side of the electrophoretic layer of the first substrate, a second electrode formed on a side of the electrophoretic layer of the second substrate and having a larger area than the first electrodes, transistors connected to the first electrodes, and a first control electrode disposed in at least part of an area where the first electrodes are absent above a drain electrode of a first transistor of the transistors. A potential for repelling the particles is applied to the first control electrode. | 11-24-2011 |
Patent application number | Description | Published |
20130280639 | PRODUCTION PROCESS FOR ELECTRODE CATALYST FOR FUEL CELL AND USES THEREOF - A production process for an electrode catalyst for a fuel cell, which includes a step (I) of mixing a nitrogen-containing organic substance, a transition metal compound and conductive particles with a solvent and a step (II) of calcining a mixture obtained in the step (I). | 10-24-2013 |
20130288154 | METHOD FOR PRODUCING FUEL CELL ELECTRODE CATALYST, FUEL CELL ELECTRODE CATALYST, AND USES THEREOF - A method for producing a fuel cell electrode catalyst, including: a step (1) of mixing at least a metal compound (1), a nitrogen-containing organic compound (2), a compound (3) containing fluorine and at least one element A selected from the group consisting of boron, phosphorus, and sulfur, and a solvent to obtain a catalyst precursor solution, a step (2) of removing the solvent from the catalyst precursor solution, and a step (3) of heat-treating a solid residue, obtained in the step (2), at a temperature of 500 to 1100° C. to obtain an electrode catalyst; a portion or the entirety of the metal compound (1) being a compound containing, as a metal element, at least one transition metal element M1 selected from the elements of group 4 and group 5 of the periodic table; and at least one of the compounds (1), (2), and (3) having an oxygen atom. | 10-31-2013 |
20130295483 | METHOD FOR PRODUCING FUEL CELL ELECTRODE CATALYST, FUEL CELL ELECTRODE CATALYST, AND USES THEREOF - A method for producing a fuel cell electrode catalyst including a metal element selected from aluminum, chromium, manganese, iron, cobalt, nickel, copper, strontium, yttrium, tin, tungsten, and cerium and having high catalytic activity through heat treatment at comparatively low temperature. The method including: a step (1) of mixing at least a certain metal compound (1), a nitrogen-containing organic compound (2), and a solvent to obtain a catalyst precursor solution, a step (2) of removing the solvent from the catalyst precursor solution, and a step (3) of heat-treating a solid residue, obtained in the step (2), at a temperature of 500 to 1100° C. to obtain an electrode catalyst; a portion or the entirety of the metal compound (1) being a compound containing, as the metal element, a metal element M1 selected from aluminum, chromium, manganese, iron, cobalt, nickel, copper, strontium, yttrium, tin, tungsten, and cerium. | 11-07-2013 |
20130330659 | METHOD FOR PRODUCING FUEL CELL ELECTRODE CATALYST - A method for producing a fuel cell electrode catalyst, including a step (I) of bringing an aqueous solution of a transition metal compound (1) into contact with ammonia and/or ammonia water to generate a precipitate (A) containing an atom of the transition metal, a step (II) of mixing at least the precipitate (A), an organic compound (B), and a liquid medium (C) to obtain a catalyst precursor liquid, and a step (IV) of subjecting the solid in the catalyst precursor liquid to heat treatment at a temperature of 500 to 1200° C. to obtain an electrode catalyst; a portion or the entirety of the transition metal compound (1) being a compound containing a transition metal element of group 4 or group 5 of the periodic table; and the organic compound (B) being at least one selected from sugars and the like. | 12-12-2013 |