Patent application number | Description | Published |
20090220692 | METHOD OF SUBSTRATE TREATMENT, RECORDING MEDIUM AND SUBSTRATE TREATING APPARATUS - A method of processing a substrate by a substrate processing apparatus is disclosed. The substrate processing apparatus includes a processing container including a first space where a first processing gas or a second processing gas is supplied onto the substrate and a second space formed around the first space; a first exhaust unit configured to evacuate the first space; and a second exhaust unit configured to evacuate the second space. The method includes a first step of supplying the first processing gas into the first space; a second step of discharging the first processing gas from the first space; a third step of supplying the second processing gas into the first space; and a fourth step of discharging the second processing gas from the first space; wherein the pressure in the second space is adjusted by a pressure-adjusting gas supplied into the second space. | 09-03-2009 |
20090277389 | PROCESSING APPARATUS - A processing apparatus is provided for performing a process on a target object in a processing chamber which can be vacuumized, especially for performing high-k dielectric of HfO, HfSiO, ZrO, ZrSiO, PZT, BST and the like. A film adhesion preventing layer composed of an SAM (self-assembled monolayer) is arranged on the surface of the constituent member of the processing chamber to be exposed to the processing atmosphere in the processing chamber, for instance, on the inner wall surface of the processing chamber. Thus, on the surface of the constituent member, an unnecessary film difficult to be removed by dry cleaning is prevented from being deposited, so that cleaning frequency of the processing apparatus can be remarkably reduced. | 11-12-2009 |
20100015335 | METHOD FOR FORMING SRTIO3 FILM AND STORAGE MEDIUM - A substrate is arranged in a processing chamber, the substrate is heated, and an Sr material, a Ti material and an oxidizing agent are introduced into the processing chamber in the form of gas, the gases are reacted on the heated substrate, and an SrTiO | 01-21-2010 |
20110014797 | METHOD FOR Sr-Ti-O-BASED FILM FORMATION AND STORAGE MEDIUM - A film is formed so that the atomic numbers ratio of Sr to Ti, i.e., Sr/Ti, in the film is not less than 1.2 and not more than 3. The film is then annealed in an atmosphere containing not less than 0.001% and not more than 80% of O | 01-20-2011 |
20110052810 | FILM FORMING METHOD AND STORAGE MEDIUM - An AxByOz-type oxide film can be produced by introducing a first organic metal compound source material, a second organic metal compound source material and an oxidizer into a processing chamber and forming the AxByOz-type oxide film on a substrate. In the production, a compound which has a low vapor pressure and has an organic ligand capable of being decomposed with an oxidizer to produce CO is used as the first organic metal compound source material, a metal alkoxide is used as the second organic metal compound source material, and gaseous O | 03-03-2011 |
20110155177 | METHOD AND DEVICE FOR CLEANING A SUBSTRATE AND STORAGE MEDIUM - In a cleaning method, a substrate having a pattern formed on the surface thereof can be cleaned by using a cleaning fluid, while preventing the pattern protrusions from being flattened when the cleaning fluid is removed or dried. The cleaning method includes the steps of: loading a substrate onto a loading platform inside a processing chamber; heating the substrate; and supplying a cleaning fluid onto the surface of the substrate. The substrate is heated in the substrate heating step so that the Leidenfrost phenomenon occurs and steam of the cleaning fluid is interposed between the substrate and droplets of the cleaning fluid supplied to the substrate in the cleaning fluid supply step. | 06-30-2011 |
20120267340 | FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS - A disclosed film deposition method includes steps of loading plural substrates each of which includes a pattern including a concave part in a reaction chamber in the form of shelves; depositing a silicon oxide film on the plural substrates by supplying a silicon-containing gas and an oxygen-containing gas to the reaction chamber; etching the silicon oxide film deposited on the plural substrates in the step of depositing by supplying a fluorine-containing gas and an ammonia gas to the reaction chamber; and alternately repeating the step of depositing and the step of etching. | 10-25-2012 |
Patent application number | Description | Published |
20110263105 | AMORPHOUS SILICON FILM FORMATION METHOD AND AMORPHOUS SILICON FILM FORMATION APPARATUS - The amorphous silicon film formation method includes forming a seed layer on the surface of a base by heating the base and flowing aminosilane-based gas onto the heated base; and forming an amorphous silicon film on the seed layer by heating the base, supplying silane-based gas containing no amino group onto the seed layer on the surface of the heated base, and thermally decomposing the silane-based gas containing no amino group. | 10-27-2011 |
20110269315 | THIN FILM FORMATION METHOD AND FILM FORMATION APPARATUS - A thin film formation method to form a silicon film containing an impurity on a surface of an object to be processed in a process chamber that allows vacuum exhaust includes alternately and repeatedly performing a first gas supply process in which a silane-based gas composed of silicon and hydrogen is supplied into the process chamber in a state that the silane-based gas is adsorbed onto the surface of the object to be processed and a second gas supply process in which an impurity-containing gas is supplied into the process chamber, to form an amorphous silicon film containing an impurity. Accordingly, an amorphous silicon film containing an impurity having good filling characteristics can be formed even at a relatively low temperature. | 11-03-2011 |
20110287629 | SILICON FILM FORMATION METHOD AND SILICON FILM FORMATION APPARATUS - A silicon film formation method includes a first film formation operation, an etching operation, and a second film formation operation. In the first film formation operation, a first silicon film is formed to fill the groove of the object to be processed. In the etching operation, an opening of the groove is widened by etching the first silicon film formed in the first film formation operation. In the second film formation operation, a second silicon film is formed on the groove having the opening widened in the etching operation to fill the groove. Accordingly, a silicon film is formed on a groove of an object to be processed having the groove provided thereon. | 11-24-2011 |
20120103518 | FILM FORMATION APPARATUS - A film formation apparatus includes a gas supply mechanism for supplying an aminosilane-based gas, and a silane-based gas that does not include an amino group. Processes of forming a seed layer on a surface of the insulation film having the opening reaching the conductive substance and on a bottom surface of the opening by supplying the aminosilane-based gas into the process chamber, and forming a silicon film on the seed layer by supplying the silane-based gas that does not include the amino group into the process chamber, are sequentially performed in the process chamber. | 05-03-2012 |
20120164844 | METHOD AND APPARATUS FOR FORMING OXIDE FILM ON CARBON FILM - A method for forming an oxide film on a carbon film includes the steps of forming a carbon film on an object to be processed; forming an object-to-be-oxidized layer on the carbon film; and forming an oxide film on the object-to-be-oxidized layer while oxidizing the object-to-be-oxidized layer. | 06-28-2012 |
20130005142 | METHOD AND APPARATUS FOR FORMING SILICON FILM - Provided is a method and apparatus for forming a silicon film, which are capable of suppressing generation of a void or seam. The method includes performing a first film-forming process, performing an etching process, performing a doping process, and performing a second film-forming process. In the first film-forming process, a non-doped silicon film that is not doped with an impurity is formed so as to embed a groove of an object. In the etching process, the non-doped silicon film formed via the first film-forming process is etched. In the doping process, the non-doped silicon film etched via the etching process is doped with an impurity. In the second film-forming process, an impurity-doped silicon film is formed so as to embed the silicon film doped via the doping process. | 01-03-2013 |
20130023110 | METHOD AND APPARATUS FOR FORMING AMORPHOUS SILICON FILM - A method of forming an amorphous silicon film includes: forming a seed layer on a surface of a base by heating the base and supplying an amino silane-based gas to the heated base, forming the amorphous silicon film with thickness for layer growth on the seed layer by heating the base and supplying a silane-based gas containing no amino group to the seed layer on the surface of the heated base, and decreasing a film thickness of the amorphous silicon film by etching the amorphous silicon film formed with thickness for layer growth. | 01-24-2013 |
20130084693 | THIN FILM FORMING METHOD AND FILM FORMING APPARATUS - A thin film forming method which forms a seed film and an impurity-containing silicon film on a surface of an object to be processed in a processing container configured to be vacuum exhaustible includes: performing a first step which forms the seed film by supplying a seed film raw material gas including at least any one of an aminosilane-based gas and a higher silane into the processing container; and performing a second step which forms the impurity-containing silicon film in an amorphous state by supplying a silane-based gas and an impurity-containing gas into the processing container. | 04-04-2013 |
20130109155 | METHOD OF FORMING SEED LAYER AND METHOD OF FORMING SILICON-CONTAINING THIN FILM | 05-02-2013 |
20130230975 | METHOD OF FORMING A GERMANIUM THIN FILM - A method of forming a germanium thin film on an underlying film includes forming a germanium seed layer by absorbing a germanium on a surface of the underlying film using an aminogermane-based gas, and forming a germanium thin film on the germanium seed layer using a germane-based gas. | 09-05-2013 |
20130323915 | METHOD AND APPARATUS FOR FORMING SILICON FILM - A method of forming a silicon film includes a first film forming process, an etching process, a doping process, and a second film forming process. In the first film forming process, a silicon film doped with impurities containing boron is formed so as to embed a groove provided on an object to be processed. In the etching process, the silicon film formed in the first film forming process is etched. In the doping process, the silicon film etched in the etching process is doped with impurities containing boron. In the second film forming process, a silicon film doped with impurities containing boron is formed so as to embed the silicon film that is doped in the doping process. | 12-05-2013 |
20140206180 | THIN FILM FORMATION METHOD - A thin film formation method to form an amorphous silicon film containing an impurity on a surface of an object to be processed in a process chamber that allows vacuum exhaust includes supplying a silane-based gas composed of silicon and hydrogen into the process chamber in a state that the silane-based gas is adsorbed onto the surface of the object without supplying an impurity-containing gas, supplying the impurity-containing gas into the process chamber to form the amorphous silicon film containing the impurity without supplying the silane-based gas, and performing the supplying of the silane-based gas and the supplying of the impurity-containing gas alternately and repeatedly such that the impurity reacts with the silane-based gas. | 07-24-2014 |
20140251203 | SELECTIVE EPITAXIAL GROWTH METHOD AND FILM FORMING APPARATUS - A selective epitaxial growth method includes preparing a target object including a single crystal substrate in which an epitaxial growth region is partitioned by a suppression film; and growing the epitaxial layer on the epitaxial growth region of the target object until a predetermined film thickness is obtained. The growing the epitaxial layer includes first source gas supply process of supplying a source gas onto the target object under a first pressure to grow a first epitaxial layer on the epitaxial growth region, first removing process of removing deposits on the suppression film, second source gas supply process of supplying the source gas onto the target object under a second pressure higher than the first pressure, and second removing process of removing the deposits on the suppression film. The second source gas supply process and the second removing process are repeated until the predetermined film thickness is obtained. | 09-11-2014 |
20140331928 | METHOD OF FORMING A GERMANIUM THIN FILM - A method of forming a germanium thin film on an underlying film includes forming a germanium seed layer by absorbing a germanium on a surface of the underlying film using an aminogermane-based gas, and forming a germanium thin film on the germanium seed layer using a germane-based gas. | 11-13-2014 |
20140342534 | METHOD AND APPARATUS FOR FORMING AMORPHOUS SILICON FILM - A method of forming an amorphous silicon film includes: forming a seed layer on a surface of a base by heating the base and supplying an amino silane-based gas to the heated base, forming the amorphous silicon film with thickness for layer growth on the seed layer by heating the base and supplying a silane-based gas containing no amino group to the seed layer on the surface of the heated base, and decreasing a film thickness of the amorphous silicon film by etching the amorphous silicon film formed with thickness for layer growth. | 11-20-2014 |
20150037970 | Silicon Film Forming Method, Thin Film Forming Method and Cross-Sectional Shape Control Method - The present disclosure provides a silicon film forming method for forming a silicon film on a workpiece having a processed surface, including: forming a seed layer by supplying a high-order aminosilane-based gas containing two or more silicon atoms in a molecular formula onto the processed surface and by having silicon adsorbed onto the processed surface; and forming a silicon film by supplying a silane-based gas not containing an amino group onto the seed layer and by depositing silicon onto the seed layer, wherein, when forming a seed layer, a process temperature is set within a range of 350 degrees C. or lower and a room temperature or higher. | 02-05-2015 |
20150056791 | DEPRESSION FILLING METHOD AND PROCESSING APPARATUS - A depression filling method for filling a depression of a workpiece including a semiconductor substrate and an insulating film formed on the semiconductor substrate is provided. The depression penetrating the insulating film is configured so as to extend to the semiconductor substrate. The method includes: forming a thin film of a semiconductor material along a wall surface that defines the depression; annealing the workpiece to cause the semiconductor material of the thin film to move toward a bottom of the depression and to form an epitaxial region corresponding to crystals of the semiconductor substrate; and etching the thin film. | 02-26-2015 |
Patent application number | Description | Published |
20110204344 | METHOD OF STORING LIQUID COMPOSITION FOR ORGANIC SEMICONDUCTOR ELEMENT - Problem to be solved by the present invention is to prevent volatilization of an organic solvent while a liquid composition for an organic semiconductor device is stored by placing in a container, and to prevent deterioration in function of an organic compound for forming an organic semiconductor device. Means for solving the problem is a method of storing a liquid composition for an organic semiconductor device comprising the step of storing the liquid composition for an organic semiconductor device containing an organic compound for forming an organic semiconductor device, and an organic solvent, in a container having a container body, a packing covering an opening part of the container body, and a lid, wherein the container body has an inner wall formed of a material which does not chemically act on the organic solvent nor on the organic compound, and a surface of the packing, which covers the opening part and which comes into contact with the opening-periphery part when the packing and the lid are mounted to the container body to form a sealed state, is formed of a material containing a resin having fluorine atom. | 08-25-2011 |
20110204345 | PROCESS FOR PRODUCING LIQUID COMPOSITION FOR ORGANIC SEMICONDUCTOR ELEMENT - A problem to be solved of the present invention is to provide a liquid composition for an organic semiconductor device having good coating property, wherein the lifetime of the function of an organic semiconductor device is prolonged when an organic layer is formed from the liquid composition for an organic semiconductor device, and a process for producing the liquid composition. A mean for solving the problem is a process for producing a liquid composition for an organic semiconductor device comprising a step of dissolving an organic compound which is solid at 1 atm and 25° C. in an organic solvent which is liquid at 1 atm and 25° C. and has a halogen compound concentration of not more than 100 ppm by weight. | 08-25-2011 |
20120319090 | DEVICE, THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE DEVICE AND METHOD FOR MANUFACTURING THE THIN FILM TRANSISTOR - A problem of the present invention is to provide a device having good characteristics and long life, wherein a functional thin film is formed in a desired region by a coating method; a thin film transistor; a method for producing the device; and a method for producing the thin film transistor. This problem can be solved by a device comprising: a substrate, a first electrode formed on the substrate, a functional thin film formed above the first electrode, and a second electrode disposed above the functional thin film, characterized by further comprising, in a region surrounding the region where the functional thin film is formed, a film containing a compound in which a group containing fluorine and a π-conjugated system are bound together by a cycloalkene structure or a cycloalkane structure. | 12-20-2012 |
20120330047 | COMPOUND - A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency. | 12-27-2012 |
20130002989 | POLYMER COMPOUND AND POLYMER LIGHT EMITTING DEVICE USING THE SAME - A polymer compound containing a structure of the following formula (B): | 01-03-2013 |
20130048962 | ORGANIC ELECTROLUMINESCENT ELEMENT, METHOD FOR PRODUCING SAME, AND DEVICE FOR PRODUCING SAME - Problems to be solved of the present invention are to provide a method for producing an organic electroluminescent device capable of producing an organic electroluminescent device having long lifetime, an organic electroluminescent device having long lifetime, a planar light source, an illumination apparatus and a display apparatus each having long lifetime. Means for solving the problem is a method for producing an organic electroluminescent device comprising a first electrode, a second electrode and a light emitting layer arranged between the first and second electrodes, the light emitting layer containing an organic film, the method comprising a step of applying a solution containing an organic compound onto the surface of a layer which is to be located just below the light emitting layer, to form the organic film in a dark place. | 02-28-2013 |
20140353653 | PROCESS FOR PRODUCING LIQUID COMPOSITION FOR ORGANIC SEMICONDUCTOR ELEMENT - A problem to be solved of the present invention is to provide a liquid composition for an organic semiconductor device having good coating property, wherein the lifetime of the function of an organic semiconductor device is prolonged when an organic layer is formed from the liquid composition for an organic semiconductor device, and a process for producing the liquid composition. A mean for solving the problem is a process for producing a liquid composition for an organic semiconductor device comprising a step of dissolving an organic compound which is solid at 1 atm and 25° C. in an organic solvent which is liquid at 1 atm and 25° C. and has a halogen compound concentration of not more than 100 ppm by weight. | 12-04-2014 |
Patent application number | Description | Published |
20090315453 | POLYMER COMPOUND AND POLYMER LIGHT EMITTING DEVICE USING THE SAME - A polymer compound having a repeating unit of the following formula (1): | 12-24-2009 |
20100033085 | BLOCK COPOLYMER, COMPOSITION USING THE SAME, LIQUID COMPOSITION, LIGHT-EMITTING THIN FILM, AND POLYMER LIGHT-EMITTING DEVICE - Disclosed is a block copolymer characterized by containing a block (A) containing one or more repeating units represented by the general formula (I) below, one or more repeating units represented by the general formula (II) below and one or more repeating units represented by the general formula (III) below, and a block (B) containing one or more repeating units represented by the general formula (III) below and one or more repeating units represented by the general formula (IV) below. (I) (In the formula (I), R | 02-11-2010 |
20100090206 | POLYMER LIGHT-EMITTING DEVICE, POLYMER COMPOUND, COMPOSITION, LIQUID COMPOSITION, AND CONDUCTIVE THIN FILM - Disclosed is a polymer light-emitting device having a light-emitting layer arranged between an anode and a cathode, and a hole transport layer arranged between the light-emitting layer and the anode. This polymer light-emitting device is characterized in that the hole transport layer is a layer containing a polymer compound which contains a repeating unit represented by the general formula (I) below, a repeating unit represented by the general formula (II) below and a repeating unit represented by the general formula (III) below. | 04-15-2010 |
20100096980 | BLOCK COPOLYMER AND POLYMER LIGHT-EMITTING DEVICE - Disclosed is a block copolymer characterized by comprising a block (A) containing a repeating unit composed of a divalent heterocyclic group containing a five-membered ring and a repeating unit composed of an arylene group, and a block (B) containing a repeating unit composed of an arylene group and two different repeating units each composed of a specific divalent aromatic amine residue. Also disclosed is a composition containing the block copolymer, and one of a solvent, a light-emitting material other than the block copolymer, a hole transporting material other than the block copolymer and an electron transporting material other than the block copolymer, or alternatively, a combination of two or more of them. Further disclosed are a luminescent thin film characterized by containing the block copolymer, and a polymer light-emitting device characterized by comprising an anode, a cathode, and an organic layer containing the block copolymer and arranged between the anode and the cathode. | 04-22-2010 |
20100108993 | BLOCK COPOLYMER AND POLYMER LIGHT-EMITTING DEVICE - Disclosed is a block copolymer characterized by containing a block (A) containing two or more different repeating units respectively composed of a specific divalent heterocyclic group, and a repeating unit composed of an arylene group, and a block (B) containing a repeating unit composed of an arylene group and a repeating unit composed of a divalent aromatic amine residue. Also disclosed are a composition containing a solvent, a light-emitting material other than the block copolymer, a hole-transporting material other than the block copolymer, an electron-transporting material other than the block copolymer or a combination of two or more of them, in addition to the block copolymer; a light-emitting thin film characterized by containing the block copolymer; and a polymer light-emitting device characterized by having an anode, a cathode and an organic layer containing the block copolymer and arranged between the anode and the cathode. | 05-06-2010 |
20130306953 | METHOD FOR PRODUCING ELECTROLUMINESCENCE DEVICE - A method is provided for producing an organic EL device, capable of producing an organic EL device having a long light emission life, an organic EL device produced by the production method, and a planar light source, a lightening system and a display device each having the organic EL device. Included is a method for producing an organic electroluminescence device including a first electrode; a second electrode; and an organic layer including an organic compound provided between the first and second electrodes. The organic layer is formed by a method including an organic thin film forming step of forming, by coating, an organic thin film including an organic compound on a surface of a layer on which the organic layer is formed, under low-humidity; and an organic thin film storing step of storing the organic thin film obtained by the organic thin film forming step, under high-humidity. | 11-21-2013 |
Patent application number | Description | Published |
20100260019 | OPTICAL INFORMATION RECORDING APPARATUS AND METHOD - In order to ensure a favorable recording characteristic for a write-once recording medium whose recording layer is made of an organic dye having an absorption spectrum at a wavelength λ=405 nm, this optical information recording apparatus includes a unit to set a write power to form recording marks, a space forming power to form spaces and a pulse width of a cooling pulse, and a unit to record information onto the recording medium according to the setting. The pulse width of the cooling pulse and a ratio of the space recording power to the write power are determined from a favorable region in a plane whose one coordinate axis represents the ratio and whose other coordinate axis represents the pulse width of the cooling pulse. | 10-14-2010 |
20120218875 | OPTICAL INFORMATION RECORDING APPARATUS AND METHOD - To ensure a favorable recording characteristic for a write-once recording medium for a bluish-purple laser, an optical information recording apparatus includes ways to write power to form recording marks, a space forming power to form spaces, pulse width of a cooling pulse and ways to record information onto the optical information recording medium according to the setting of the write power, the setting of the space forming power and the setting of the pulse width of the cooling pulse. At this time, the pulse width of the cooling pulse and a ratio whose numerator is the write power and whose denominator is the space forming power have a preferable region of the recording characteristic, and information is recorded onto the optical recording medium by using values in this range. | 08-30-2012 |
20130245979 | METHOD OF DETERMINATION, INSPECTION APPARATUS, AND INSPECTION SYSTEM - One object is to facilitate maintenance of an inspection apparatus for an optical recording disk. In accordance with one aspect, the present method includes: determining whether an inspection apparatus for inspecting recording conditions of an optical recording disk can be further used based on a divergence index correlated to divergence from a state where the inspection apparatus is calibrated or on a difference between the divergence index and a reference value of the divergence index; and, if it is determined that the inspection apparatus can be further used, setting authorization for inspecting the optical recording disk by the inspection apparatus. This method enables inspection of optical recording disks with ensured inspection performance of the inspection apparatus. | 09-19-2013 |
Patent application number | Description | Published |
20080203832 | ROTARY ELECTRIC MACHINE - In a power generator provided with a stator frame having a stator iron core incorporating a stator coil therein in an inner portion thereof, and a rotor in which a rotor coil rotating so as to oppose to the stator frame and the stator iron core is incorporated, the power generator is provided with a noise insulation plate fixed to a noise insulation plate attaching seat welded to an outer surface of the stator frame by a bolt and a nut, an elastic body (a gasket) is provided in a contact portion between the noise insulation plate attaching seat and the noise insulation plate, and a vibration-proofing rubber washer is provided in a contact portion between the noise insulation plate and the nut. | 08-28-2008 |
20090304316 | HORIZONTAL SHAFT TYPE ROTARY MACHINE - The invention provides a horizontal shaft type rotary machine capable of simply feeding oil into thrust bearing devices. Leak oil introduction means are provided in the circumferential end parts of thrust bearing devices, for introducing leak oil of lubrication oil from horizontal type slide bearing devices onto slide surfaces of the thrust bearing devices. With this configuration, the thrust baring devices can be lubricated with the use of leak oil of lubrication oil from the horizontal type slide bearing devices, and as a result, it is possible to eliminate the necessity of an oil feed system exclusively used for the thrust bearing devices, thereby it is possible to simplify the pipe line arrangement of the oil feed system and the control of oil feed quantity. | 12-10-2009 |
20100045124 | ROTARY ELECTRIC MACHINE - A rotary electric machine, for solving problems that a space for installing the noise insulation enclosure around the rotary electric machine and a base for installing the noise insulation enclosure are necessary, and that the noise insulation enclosure reducing the noise on an outer side of the noise insulation enclosure does not reduce the noise on an inner side thereof, and the inspecting worker entering thereinto is exposed to a loud noise of the rotary electric machine, the rotary electric machine comprising a stator frame having a stator iron core incorporating a stator coil therein in an inner portion thereof, and a rotor in which a rotor coil rotating so as to oppose to the stator frame and the stator iron core is incorporated, further comprising a noise insulation plate fixed to a noise insulation plate attaching seat welded to an outer surface of the stator frame by a bolt and a nut, an elastic body which is provided in a contact portion between the noise insulation plate attaching seat and the noise insulation plate, and a vibration-proofing rubber washer which is provided in a contact portion between the noise insulation plate and the nut. | 02-25-2010 |
20100045126 | ROTOR OF ROTARY-ELECTRIC MACHINE - In a rotor of a rotary-electric machine, in order to improve a cooling performance of a rotor winding on an end portion of the rotor in an axial direction, the rotor winding being held by a retaining ring of the rotor winding formed by laminating conductors in slots of a rotor iron core extending in an axial direction and having slots formed at predetermined intervals in a peripheral direction, ventilation channels through which cooling air flows are formed in the surfaces of the conductors along a longitudinal direction. The ventilation channels have air inlet holes which guide the cooling air and exhaust holes which exhaust the cooling air, the conductors are laminated to constitute the rotor winding, and the conductors include openings of the air inlet holes in bottoms of the conductors on a side opposite to a side on which the ventilation channels are formed. | 02-25-2010 |
20110101801 | FORCED COOLING ROTARY ELECTRIC MACHINE - The invention aims at providing a forced cooling rotary electric machine capable of bringing temperature distribution close to a designed temperature distribution and avoiding becoming a larger size, and employs a wedge formed with ventilation grooves and a wedge not formed with the ventilation grooves to regulate the flow rates of cooling gas passing through air ducts, so that the cooling gas supplied to a part of a stator core, in which temperature is low, can be caused to flow positively to a part in which the temperature is high and the temperature distribution in the axial direction of the stator core can be uniformized. As a result, the temperature distribution in the axial direction of the stator core can be brought close to a designed temperature distribution, and a forced cooling rotary electric machine that need not be made larger in size with a margin can be obtained. | 05-05-2011 |
20120155790 | HORIZONTAL SHAFT TYPE ROTARY MACHINE - The invention provides a horizontal shaft type rotary machine capable of simply feeding oil into thrust bearing devices. Leak oil introduction means are provided in the circumferential end parts of thrust bearing devices, for introducing leak oil of lubrication oil from horizontal type slide bearing devices onto slide surfaces of the thrust bearing devices. With this configuration, the thrust baring devices can be lubricated with the use of leak oil of lubrication oil from the horizontal type slide bearing devices, and as a result, it is possible to eliminate the necessity of an oil feed system exclusively used for the thrust bearing devices, thereby it is possible to simplify the pipe line arrangement of the oil feed system and the control of oil feed quantity. | 06-21-2012 |
Patent application number | Description | Published |
20090082579 | 2-ALKENYL-3-AMINOTHIOPHENE DERIVATIVE AND PROCESS FOR PRODUCING THEREOF - Disclosed is a method for commercially producing 2-alkenyl-3-aminothiophene derivatives, which are useful as intermediates for agricultural chemicals, at low cost. Specifically disclosed is a method for introducing alkenyl groups into the 2-position of 3-aminothiophene derivatives by reacting 3-aminothiophene derivatives represented by the general formula (2) below or salts thereof with a ketone represented by the general formula (1) below without using a protecting group. Also specifically disclosed are 2-alkenyl-3-aminothiophene derivatives (3a) to (3d) which are useful as intermediates for agricultural chemicals, | 03-26-2009 |
20090326247 | METHOD FOR PRODUCING 2-ALKYL-3-AMINOTHIOPHENE DERIVATIVE - The present invention provides a method of producing a 2-alkyl-3-aminothiophene derivative represented by formula (2) by reducing at least one of the 2-alkenyl-3-aminothiophene derivatives represented by formulae (1a) to (1d), or a mixture thereof, or a salt thereof, without using a protecting group for an amino group: | 12-31-2009 |
20100010216 | 2-FLUORINATED ACYL-3-AMINOACRYLONITRILE DERIVATIVE AND METHOD FOR PRODUCING THE SAME - The invention provides a 2-fluorinated acyl-3-aminoacrylonitrile derivative, and a method for producing the same. A desired 2-fluorinated acyl-3-aminoacrylonitrile derivative represented by the following Formula (3) is obtained by reacting a fluorinated acyl derivative with an aminoacrylonitrile derivative. In Formula (3), Rf represents an alkyl group having 1 to 6 carbon atoms which is substituted with at least one fluorine atom, R | 01-14-2010 |
20100016612 | FLUORINE-CONTAINING PYRAZOLECARBONITRILE DERIVATIVE AND METHOD FOR PRODUCING THE SAME, AND FLUORINE-CONTAINING PYRAZOLECARBOXYLIC ACID DERIVATIVE OBTAINED BY USING THE FLUORINE-CONTAINING PYRAZOLECARBONITRILE DERIVATIVE AND METHOD FOR PRODUCING THE SAME - The present invention provides a fluorine-containing pyrazolecarbonitrile derivative and a method for producing the same, and a fluorine-containing pyrazolecarboxylic acid derivative obtained by using the fluorine-containing pyrazolecarbonitrile derivative and a method for producing the same. | 01-21-2010 |
20110015406 | METHOD FOR PRODUCING FLUORINE-CONTAINING ACYLACETIC ACID DERIVATIVE, METHOD FOR PRODUCING FLUORINE-CONTAINING PYRAZOLECARBOXYLIC ACID ESTER DERIVATIVE, AND METHOD FOR PRODUCING FLUORINE-CONTAINING PYRAZOLECARBOXYLIC ACID DERIVATIVE - A halogenating agent is added to a mixture including a base, a fluoroalkylcarboxylic acid derivative and an acrylate derivative to produce a fluoroaclyacetic acid derivative represented by the following Formula (3): | 01-20-2011 |
Patent application number | Description | Published |
20130167070 | METHOD AND DEVICE FOR DISPLAYING IMAGE - An example information-processing device includes a display controller that, when a scaling operation for changing a scale of an image to be displayed is not performed, displays in a display the image with a first magnification, and when the operation is performed, displays in the display the image with a second magnification that is greater than the first magnification. | 06-27-2013 |
20140075376 | DISPLAY CONTROL APPARATUS, STORAGE MEDIUM, DISPLAY CONTROL SYSTEM, AND DISPLAY METHOD - An example display control apparatus includes: a first display controller that displays a portion of content in a predetermined area in a display area; a position detector that detects a position of the portion of content being displayed in the predetermined area; and a second display controller that, if the display area includes a blank area in which the portion of content is not being displayed, displays a scroll indicator indicative of the detected position in the blank area, and if the display area does not include the blank area, prevents display of the scroll indicator. | 03-13-2014 |
20140075391 | DISPLAY CONTROL DEVICE, DISPLAY CONTROL SYSTEM, STORING MEDIUM, AND DISPLAY METHOD - An example information-processing device includes: a display control unit that causes a display unit to display a button image assigned to a function, the button image being selectable by a user, and an object superimposed on the button image; a processing unit that performs a processing corresponding to the function when the button image displayed by the display unit is selected by a user; and a notification control unit that notifies a status of at least the processing performed by the processing unit by changing an appearance of the object displayed by the display unit. | 03-13-2014 |
20140137031 | DISPLAY CONTROL DEVICE, STORING MEDIUM, DISPLAY SYSTEM, AND DISPLAY METHOD - An example display control device including: a first acquisition unit that acquires operation information indicative of an orientation of an device held by a user; a second acquisition unit that acquires size information in dictate of a size of a content displayed on a display; a determination unit that determines, based on the acquired size information, a scrolling amount by which the content displayed on the display is scrolled in a predetermined direction in accordance with the acquired operation information; and a display controller that controls display of the content performed by the display unit to scroll the content by the determined scrolling amount in accordance with the acquired operation information. | 05-15-2014 |
20140137040 | INFORMATION-PROCESSING DEVICE, STORAGE MEDIUM, INFORMATION-PROCESSING SYSTEM, AND INFORMATION-PROCESSING METHOD - An example information-processing device that includes: a first registering unit that registers, in accordance with an operation performed by a user, a link data set indicating a specific data set, a specifying unit that specifies a status of use of a link data set registered by the first registering unit or a status of use of a specific data set indicated by a link data set registered by the first registering unit, and a second registering unit that registers at least one of a plurality of link data sets registered by the first registering unit based on a status of use specified by the specifying unit. | 05-15-2014 |
Patent application number | Description | Published |
20130162501 | METHOD FOR CONTROLLING MULTIPLE DISPLAYS - An information-processing system includes: a first display; a second display, which is a device separate from the first display; and a controller that causes the first display and the second display to display an image, wherein the controller includes: a first display controller that causes the first display to display a first image in accordance with image data; and a second display controller that causes the second display to display selectively the first image having a first magnification, or a second image that is a partial image of the first image and has a second magnification greater than the first magnification. | 06-27-2013 |
20130214993 | METHOD OF DISPLAYING IMAGE - An information-processing device includes: a first display controller that causes a display to display multiple first images in a predetermined arrangement; a second display controller that, upon receipt of a first operation for one of the multiple first images, changes at least part of an arrangement of the multiple first images from the predetermined arrangement, and causes a second image associated with the first image, for which the first operation was received, to be displayed on the display so as not to overlap the multiple first images; and an execution unit that, upon receipt of a second operation for the second image while the second image is displayed, executes a process in accordance with the second operation. | 08-22-2013 |
20130214994 | METHOD OF CONTROLLING MULTIPLE DISPLAYS - An information-processing system includes: a first display; a second display; a first display controller that causes the first display and the second display to display respective images based on identical content; and a second display controller that, when a predetermined condition is met, conceals at least part of the image displayed on the second display. | 08-22-2013 |
20130321469 | METHOD OF CONTROLLING DISPLAY - An exemplary information-processing device includes: a display controller configured to display selectively in a display region of a display device a first image and a second image including the first image, in which second image a display magnification decreases or increases toward an end of the display region. | 12-05-2013 |
20130321473 | METHOD OF CONTROLLING DISPLAY - An exemplary information-processing device includes: a first display controller configured to display selectively on a display a first image and a second image including the first image in a reduced size; and a second display controller configured, while the second display is displayed on the display, to display an indicator image on the display, the indicator image indicating a position of an image to be displayed when display of the second image is changed to display of the first image. | 12-05-2013 |
20130326521 | METHOD OF ASSOCIATING MULTIPLE APPLICATIONS - An example information-processing device includes: am acquisition unit configured to acquire application-related information relating to a first application program; and a presentation unit configured, when a second application program, by which a search can be performed, is activated after activation of the first application program, to present to a user the application-related information acquired by the acquisition unit as a candidate for an item to be searched for. | 12-05-2013 |
20130326540 | METHOD OF ASSOCIATING MULTIPLE APPLICATIONS - An exemplary information-processing device includes: a display controller configured, when a second application program, capable of performing a search is activated during execution of a first application program, to display a second image displayed as a result of execution of the activated second application program, and a first image that has been displayed as a result of execution of the first application program before activation of the second application program; and an execution controller configured to notify the second application program of an event corresponding to an input operation, to execute a process according to a procedure described in the second application program, while maintaining the first image to be displayed. | 12-05-2013 |