Patent application number | Description | Published |
20100088415 | METHOD AND APPARATUS FOR LOCATING FACILITIES - A method and apparatus for providing facility location plans for a network are disclosed. For example, the method identifies a facility and a number of nearest active clients associated with a minimized cost per unit demand of connecting these clients to this facility. The method then connects the number of nearest active clients to the facility associated with the minimized cost per unit demand. In one embodiment, the method iterates this process with the remaining clients until all demands have been assigned to facilities. | 04-08-2010 |
20100169891 | METHOD AND APPARATUS FOR LOCATING LOAD-BALANCED FACILITIES - A method and apparatus for providing a facility location plan for a network with a V-shaped facility cost are disclosed. For example, the method receives an event from a queue, wherein the event comprises an open event or a tight event. The method connects a plurality of adjacent clients to a facility, if the event comprises the open event, and adds a new client-facility edge to a graph comprising a plurality of client-facility edges, if the event comprises the tight event. | 07-01-2010 |
20110012898 | Global Registration of Multiple 3D Point Sets Via Optimization on a Manifold - A method for registering multiple 3D point sets by determining optimal relative positions and orientations of the 3D point sets. Initial values are determined for the rotation matrices corresponding to the relative orientations of reference frames of the 3D point sets. A registration error cost function is optimized on a product manifold of all of the rotation matrices to determine optimal values of the rotation matrices. The optimal values of the rotation matrices are used to determine optimal values for translation vectors corresponding to the relative positions of the reference frames of the 3D point sets. The 3D point sets are registered on a common reference frame using the optimal rotation matrices and the optimal translation vectors. | 01-20-2011 |
20130121568 | System and Method of Image Upsampling - A method includes receiving an image having a first resolution and generating an upsampled image having a second resolution based on the image. A multi-dimensional data structure corresponding to a multi-dimensional image space is generated from the upsampled image. Each node of the data structure is determined based on a weighted sum of values of one or more pixels in the upsampled image. Each of the one or more pixels corresponds to a pixel in the received image and is located within a region of the image space having a vertex defined by the node. A filter modifies the values of the nodes and a second upsampled image is generated based on the modified values of the nodes. Each pixel of the second upsampled image not corresponding to a pixel in the received image is determined based on a weighted sum of the modified values of one or more nodes. | 05-16-2013 |
20130336585 | SYSTEM AND METHOD OF BILATERAL IMAGE FILTERING - A method includes generating a first principle bilateral filtered image component from a source image. The first principle bilateral filtered image component corresponds to a second pixel value of a set, the second pixel value greater than or equal to a first pixel value. The method includes selectively updating a result pixel of a result image based on the first principle bilateral filtered image component and deallocating the first principle bilateral filtered image component. After deallocating the first principle bilateral filtered image component, a second principle bilateral filtered image component is generated from the source image. The second principle bilateral filtered image component corresponds to a third pixel value. The third pixel value is greater than the second pixel value. The third pixel value is less than or equal to a fourth pixel value. The result pixel is selectively updated based on the second principle bilateral filtered image component. | 12-19-2013 |
20130342629 | APPARATUS AND METHOD FOR MODIFICATION OF TELECOMMUNICATION VIDEO CONTENT - A method that incorporates teachings of the subject disclosure may include, for example, utilizing a system including at least one processor for determining a video modification plan for a received video stream of a video call session according to the at least one party associated with the video call session, modifying, by the system, a plurality of background images of the received video stream according to the video modification plan to generate a plurality of modified background images, and generating, by the system, a modified video stream according to the plurality of modified background images. Other embodiments are disclosed. | 12-26-2013 |
20140313277 | SYSTEM AND METHOD FOR PROVIDING SEPARATE COMMUNICATION ZONES IN A LARGE FORMAT VIDEOCONFERENCE - A system that incorporates the subject disclosure performs, for example, displaying a video image of a remote scene at a display surface, wherein the remote scene is remote from the display surface. Overlapping video images are obtained from different vantage points of a local scene observable from the display surface. A composite video image is generated of the local scene from the video images and forwarded to the remote location. A first audio signal is generated representing first sounds associated with a first region of the local scene without representing other sounds associated with a second region of the local scene. The first audio signal is forwarded to audio processing equipment at the remote location to present the first sounds at a first region of the remote scene at the remote location without presenting the first sounds at a second region of the remote scene. Other embodiments are disclosed. | 10-23-2014 |
20150071533 | GUIDED IMAGE UPSAMPLING USING BITMAP TRACING - A method of increasing resolution of an image includes generating vector contours associated with a first image and scaling the vector contours to a second resolution. The first image has a first resolution, and the second resolution is greater than the first resolution. The vector contours are rendered to generate a guiding image at the second resolution, and a second image is generated from the first image based on the guiding image, by using joint upsampling. The second image is generated at the second resolution. The vector contours can be generated by bitmap tracing binary images at different quantization levels. An apparatus and computer readable device implementing the method of increasing the resolution of an image are also provided. | 03-12-2015 |
20150078675 | METHOD AND APPARATUS FOR IMAGE FILTERING - A system that incorporates the subject disclosure may include, for example, partitioning the image into a group of blocks, calculating principle bilateral filtered image components for a first subset of the group of blocks where the principle bilateral filtered image components are not calculated for a second subset of the group of blocks, and applying an infinite impulse response filter to the image using the principle bilateral filtered image components. Other embodiments are disclosed. | 03-19-2015 |
20150324960 | METHOD AND APPARATUS FOR IMAGE FILTERING - A system that incorporates the subject disclosure may include, for example, partitioning the image into a group of blocks, calculating principle bilateral filtered image components for a first subset of the group of blocks where the principle bilateral filtered image components are not calculated for a second subset of the group of blocks, and applying an infinite impulse response filter to the image using the principle bilateral filtered image components. Other embodiments are disclosed. | 11-12-2015 |
Patent application number | Description | Published |
20090315173 | HEAT-TRANSFER STRUCTURE - An apparatus | 12-24-2009 |
20090321044 | ACTIVE HEAT SINK DESIGNS - A heat sink includes a surface and a first active element connected to the surface. The first active element is configured to move from a first position relative to the surface to a second position relative to the surface. The movement alters the heat transfer characteristics of the heat sink. | 12-31-2009 |
20090321045 | MONOLITHIC STRUCTURALLY COMPLEX HEAT SINK DESIGNS - A heat sink includes a base and a heat exchange element monolithically connected to the base. The heat exchange element has a surface that at least partially bounds first and second paths through the heat exchange element. The surface forms an upper boundary of the first and second paths and includes an opening therethrough connecting the first and second paths. | 12-31-2009 |
20090321046 | FLOW DIVERTERS TO ENHANCE HEAT SINK PERFORMANCE - A heat sink includes a base and fins attached to the base. A flow diverter is in contact with the base or at least one of the fins and is configured to disturb a laminar flow region of a fluid flowing adjacent to at least one of the fins or the base. | 12-31-2009 |
20140262194 | FLOW DIVERTERS TO ENHANCE HEAT SINK PERFORMANCE - A heat sink comprising a base, fins attached to the base and a flow diverter in contact with the base or at least one of the fins. The flow diverter has a rectangular cross-sectional profile in a plane that is coplanar with and elevated above a plane of the base and spanning the entire separation distance, and, a segment of the flow diverter is angled towards the base to direct the fluid flow towards the base. | 09-18-2014 |
20140290925 | FLOW DIVERTERS TO ENHANCE HEAT SINK PERFORMANCE - A heat sink comprising a base, fins attached to the base and a flow diverter in contact with the base or at least one of the fins. The flow diverter has a rectangular cross-sectional profile in a plane that is coplanar with and elevated above a plane of the base and spanning the entire separation distance, and, a segment of the flow diverter is angled towards the base to direct the fluid flow towards the base. | 10-02-2014 |
20150014841 | HEAT-TRANSFER STRUCTURE - An apparatus comprising a first substrate having a first surface, a second substrate having a second surface facing the first surface and an array of metallic raised features being in contact with the first surface to the second surface, a portion of the raised features having a mechanical bend or buckle plastic deformation produced therein via a compressive force. One or more of the metallic raised features has one or more surface singularities therein prior to the mechanical bend or the buckle plastic deformation produced by the compressive force. | 01-15-2015 |
Patent application number | Description | Published |
20120287433 | Reconfigurable Spectroscopic Ellipsometer - A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element. | 11-15-2012 |
20120320377 | Optical System Polarizer Calibration - A method to calibrate a polarizer in polarized optical system at any angle of incidence, by decoupling the calibration from a polarization effect of the system, by providing a calibration apparatus that includes a substrate having a polarizer disposed on a surface thereof, with an indicator on the substrate for indicating a polarization orientation of the polarizer, loading the calibration apparatus in the polarized optical system with the indicator in a desired position, determining an initial angle between the polarization orientation and a reference of the polarized optical system, acquiring spectra using the polarized optical system at a plurality of known angles between the polarization orientation and the reference of the polarized optical system, using the spectra to plot a curve indicating an angle of the polarizer in the polarized optical system, and when the angle of the polarizer is outside of a desired range, adjusting the angle of the polarizer, and repeating the steps of acquiring the spectra, and plotting a curve indicating the angle of the polarizer. | 12-20-2012 |
20130003068 | Measurement of Critical Dimension - A spectroscopic instrument for conducting multi-wavelength, multi-azimuth, multi-angle-of-incidence readings on a substrate, the instrument having a broadband light source for producing an illumination beam, an objective for directing the illumination onto the substrate at multiple azimuth angles and multiple angels-of-incidence simultaneously, thereby producing a reflection beam, an aperture plate having an illumination aperture and a plurality of collection apertures formed therein for selectively passing portions of the reflection beam having desired discreet combinations of azimuth angle and angle-of-incident, a detector for receiving the discreet combinations of azimuth angle and angle-of-incident and producing readings, and a processor for interpreting the readings. | 01-03-2013 |
20130033704 | LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM - The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage. | 02-07-2013 |
20130114085 | Dynamically Adjustable Semiconductor Metrology System - The present invention may include an illumination source, a detector, a selectably adjustable optical system including a dynamically adjustable illumination pupil of the illumination arm, a dynamically adjustable collection pupil of the collection arm, a dynamically adjustable illumination field stop of the illumination arm, a dynamically adjustable collection field stop of the collection arm, a sensor configured to measure one or more optical characteristics of one or more components of the optical system, and a control system configured to selectably dynamically adjust at least one of the illumination pupil, the collection pupil, the illumination field stop, the collection field stop, and a spectral radiance of the illumination source. | 05-09-2013 |
20130321810 | Small Spot Size Spectroscopic Ellipsometer - Methods and systems for small angle CD metrology with a small spot size are introduced to increase measurement sensitivity while maintaining adequate throughput necessary for modern semiconductor manufacture. A small angle CD metrology system includes a small angle spectroscopic ellipsometry (SE) subsystem combined with a small angle spectroscopic reflectometry system, both operated at small angles of incidence. The small angle SE subsystem is configured to operate in a complete Mueller Matrix mode to further improve measurement sensitivity. The small angle CD metrology system includes an objective having all reflective surfaces in the light path. In some embodiments, the all-reflective objective is a Schwartzschild objective having an axicon mirror element to further reduce measurement spot size. In some embodiments, the small angle CD metrology system includes a dynamic aperture subsystem to isolate specific ranges of angles of incidence and azimuth for improved measurement sensitivity. | 12-05-2013 |
20140043608 | Optical System Polarizer Calibration - An apparatus to calibrate a polarizer in a polarized optical system at any angle of incidence. The apparatus decouples the polarization effect of the system from the polarization effect of the sample. The apparatus includes a substrate with a polarizer disposed on the surface. An indicator on the substrate indicates the polarization orientation of the polarizer, which is in a predetermined orientation with respect to the substrate. | 02-13-2014 |
20140340682 | METROLOGY SYSTEM CALIBRATION REFINEMENT - Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters. | 11-20-2014 |
20140375981 | MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS - An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image. | 12-25-2014 |
20150176985 | Measurement Of Multiple Patterning Parameters - Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a single patterned target and a multiple patterned target are measured, the collected data fit to a combined measurement model, and the value of a structural parameter indicative of a geometric error induced by the multiple patterning process is determined based on the fit. In some other examples, light having a diffraction order different from zero is collected and analyzed to determine the value of a structural parameter that is indicative of a geometric error induced by a multiple patterning process. In some embodiments, a single diffraction order different from zero is collected. In some examples, a metrology target is designed to enhance light diffracted at an order different from zero. | 06-25-2015 |
20150285735 | MULTIPLE ANGLES OF INCIDENCE SEMICONDUCTOR METROLOGY SYSTEMS AND METHODS - An apparatus includes (i) a bright light source for providing an illumination beam at multiple wavelengths selectable with a range from a deep ultraviolet wavelength to an infrared wavelength, (ii) illumination optics for directing the illumination beam towards a sample at selectable sets of angles of incidence (AOI's) or azimuth angles (AZ's) and polarization states to provide spectroscopic ellipsometry, wherein the illumination optics include an apodizer for controlling a spot size of the illumination beam on the sample at each of the selectable AOI/AZ sets, (iii) collection optics for directing an output beam from the sample in response to the illumination beam at each of the selectable AOI/AZ sets and polarization states towards a detector that generates an output signal or image based on the output beam, and (v) a controller for characterizing a feature of the sample based on the output signal or image. | 10-08-2015 |