Patent application number | Description | Published |
20090246646 | LITHOGRAPHIC PELLICLE - A lithographic pellicle is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate adhesive provided on the other end face, wherein corners formed between a pellicle film adhesion face and exposure master plate adhesion face of the pellicle frame and inside and outside faces of the frame are subjected to C chamfering, and the chamfer dimension on the exposure master plate adhesion face is greater than C0.35 (mm) but no greater than C0.55 (mm). | 10-01-2009 |
20090286168 | METHOD FOR STRIPPING PELLICLE AND STRIPPING APPARATUS USED THEREIN - A method for stripping a pellicle from an exposure master plate is provided, the pellicle being a lithographic pellicle that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate pressure-sensitive adhesion layer provided on the other end face, the method including a step of irradiating the pressure-sensitive adhesion layer with UV light. There is also provided a stripping apparatus used in the stripping method, the apparatus including a light source for irradiating the exposure master plate pressure-sensitive adhesion layer with UV light and means for heating the exposure master plate and/or the pellicle frame with which the pressure-sensitive adhesion layer is in contact. | 11-19-2009 |
20110117481 | PELLICLE FOR LITHOGRAPHY - A pellicle for lithography is provided that includes a pellicle frame provided with an atmospheric pressure adjustment hole that extends through from an outer peripheral face to an inner peripheral face, a ratio S/L of a cross-sectional area S (mm | 05-19-2011 |
20110117482 | PELLICLE FOR LITHOGRAPHY - A pellicle for lithography is provided that includes a pellicle frame provided with one or more atmospheric pressure adjustment holes having an inner peripheral face with a shape that opens out in going toward the inside of the pellicle frame. There is also provided a process for producing the pellicle for lithography, the process comprising a step of forming the pellicle for lithography and a step of spray-coating a pressure-sensitive adhesive composition from inside the pellicle frame. | 05-19-2011 |
20120129082 | METHOD OF ADHERING LITHOGRAPHIC PELLICLE AND ADHERING APPARATUS THEREFOR - A method of adhering a lithographic pellicle includes steps of pressing the pellicle frame | 05-24-2012 |
Patent application number | Description | Published |
20130199141 | MULTILAYER FILTER MEDIUM FOR USE IN FILTER, AND FILTER - A multilayer filter medium, which is used as a constituent member of a filter and has a multilayer structure, includes a wet type nonwoven fabric layer A containing 0.5 to 20% by weight, based on layer weight, of short-cut nanofibers which are composed of a fiber-forming thermoplastic polymer, have a single fiber diameter (D) of 100 to 1,000 nm and are cut so that the ratio (L/D) of the length (L) to the single fiber diameter (D) is within the range of 100 to 2,500 and core-sheath conjugate type binder fibers having a single fiber diameter of 5 μm or more, and a nonwoven fabric layer B having a lower density than that of the wet type nonwoven fabric layer A. A filter uses the multilayer filter medium and has the nonwoven fabric layer B arranged on a fluid inlet side. | 08-08-2013 |
20140360145 | FILTER MEDIUM FOR FILTER, METHOD FOR PRODUCING THE SAME, AND FILTER - Provided are a filter medium for a filter, which makes it possible to obtain a filter high in collection efficiency, low in pressure loss and long in filter lifetime, a method for producing the same, and a filter using the filter medium for a filter. A filter medium for a filter is used as a constituent member of a filter and composed of a wet type nonwoven fabric, wherein the filter medium for a filter has a multilayer structure of two or more layers, and there is no interface between the above-mentioned two layers. | 12-11-2014 |