Jee-Eun
Jee-Eun Jung, Yongin-Si KR
Patent application number | Description | Published |
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20120220058 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE - A method of fabricating a semiconductor device includes preparing a layout of the semiconductor device, obtaining contrast of an exposure image of the layout through a simulation under a condition of using a crosspole illumination system, separating the layout into a plurality of sub-layouts based on the contrast of the exposure image, forming a photomask having a mask pattern corresponding to the plurality of sub-layouts, and performing an exposure process using the photomask under an exposure condition of using a dipole illumination system. | 08-30-2012 |
Jee-Eun Lee, Gyeonggi-Do KR
Patent application number | Description | Published |
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20090303825 | SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device includes a first plurality of banks arranged in a first direction to form a first group of banks; a second plurality of banks arranged in the first direction to form a second group of banks, the first group of banks and the second group of banks arranged in a second direction; a first local data line arranged in the second direction to cross a bank of the second plurality of banks and to transfer input/output data; a second local data line arranged in the second direction to transfer input/output data; a global data line disposed in the first direction that crosses the second direction; and a data exchanger disposed between the second plurality of banks and the global data line for configured to controlling data exchange between the first and second local data lines and the global data line. | 12-10-2009 |
Jee-Eun Park, Daejeon KR
Patent application number | Description | Published |
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20140134336 | NANOPOSITIONING SUBSTRATE PREPARATION APPARATUS AND PREPARATION METHOD USING DIP PEN NANOLITHOGRAPHY WITH A SINGLE TIP OR MULTIPLE TIPS USING ATOMIC FORCE MICROSCOPE (AFM) - Provided are method and apparatus to nanoposition ink, the apparatus including: a substrate; a pattern index; an atomic force microscope (AMF) tip configured to form a pattern on the pattern index; a first ink reservoir including a first ink; a second ink reservoir including a second ink; a first cleaning portion configured to remove the first ink from the AMF tip; a second washing portion configured to remove the second ink from the AMF tip; a position determining portion configured to interact with the AMF tip; an electrode connection portion configured to apply a voltage to the position determining portion, in order to determine a position of the AMF tip when the AMF tip interacts with the position determining portion. The AMF tip is configured to configured to interact with the position determining portion, prior to forming the pattern using the first and second inks. | 05-15-2014 |