Patent application number | Description | Published |
20110116939 | ROTARY PUMP DEVICE AND VEHICLE BRAKE CONTROL SYSTEM - A first and a second rotary pumps are provided in a first pump casing of a pump body, which is inserted into a cylindrical recessed portion of a housing | 05-19-2011 |
20120068559 | ROTATING SHAFT SUPPORT APPARATUS AND MAGNETIC MOTOR HAVING THE SAME - A apparatus is provided in which, in a state before being assembled to a drive target, one end of a rotating shaft is not supported by a bearing, and in this state, the rotating shaft is pressed to the side of a bracket by coil springs and thus centering of the rotating shaft is maintained. In this way, axial run-out of the rotating shaft before a magnetic motor is assembled to the drive target is inhibited. Thus, damage and deterioration in assembly efficiency as a result of axial run-out of the rotating shaft can be inhibited, such as deterioration in assembly efficiency caused by adhesion between a magnet and coils wound on an armature core, for example. | 03-22-2012 |
20120070222 | SHAFT COUPLING APPARATUS - A shaft coupling apparatus is provided in which a cylindrically-shaped hole is provided on a leading end surface of a shaft, the hole having a central axis that is different from a rotational central axis of the shaft, and a cylindrically-shaped hole is provided on a leading end surface of a shaft, the hole having a central axis that is different from a rotational central axis of the shaft. The shafts are coupled by pressure fitting a cross-sectionally circular pin in the hole and by loosely fitting the pin in the hole, the pin corresponding to an inner diameter of the hole and the hole. | 03-22-2012 |
Patent application number | Description | Published |
20150251582 | CUP HOLDER - There is provided a cup holder including a holder body, an opening formed in a side wall of the holder body, a support supported on the side wall so as to advance into or retreat from a storage space through the opening, and a leaf spring disposed between the support and the side wall and biasing the support in a direction in which the support advances into the storage space. The support has a turning shaft serving as a center of swinging of the support and a swinging portion swinging around the turning shaft by turning of the turning shaft. On a peripheral edge of the opening formed in the side wall, a nipped portion protrudes to the outside of the side wall and swingably holds the support by being nipped between the turning shaft and the swinging portion while the support advances or retreats. | 09-10-2015 |
20150274383 | LID OPENING/CLOSING MECHANISM - A lid opening/closing mechanism includes an arm, an arc-shaped gear, a first fixed gear, a damper, a second fixed gear, and a tension spring. The arm is disposed integrally to project from the lid to swing about a swing center as the lid opens and closes. The arc-shaped gear is formed in the arm. The first fixed gear is disposed in the body, and meshes with the arc-shaped gear. The damper is disposed in the arm, and includes a damper gear. The second fixed gear is disposed in the body, is formed along a movement locus of the damper moving as the lid moves to open and close, and meshes with the damper gear. The tension spring is disposed between the body and the arc-shaped gear to urge the lid in an opening direction. | 10-01-2015 |
Patent application number | Description | Published |
20100101643 | COMPOUND, PHOTOELECTRIC CONVERTER AND PHOTOELECTROCHEMICAL CELL - A complex compound (I) obtained by coordinating a compound represented by the following formula (II), hereinafter abbreviated as compound (II), to a metal atom. In the formula, R | 04-29-2010 |
20110127515 | PHOTOELECTRIC CONVERSION ELEMENT - Disclosed is a photoelectric conversion element comprising a pair of electrodes, at least one of which is transparent or translucent, and a photoactive layer provided between the electrodes, wherein the photoactive layer contains an electron donating compound and an electron accepting compound, and the electron donating compound or the electron accepting compound is a polymer compound having a repeating unit represented by the following formula (I), and the proportion of the repeating unit represented by the formula (I) is the highest among all of the repeating units contained in the polymer compound: | 06-02-2011 |
20120305899 | POLYMER COMPOUND, AND THIN FILM AND INK COMPOSITION EACH CONTAINING SAME - An object of the present invention is to provide a polymer compound providing high charge mobility. The polymer compound of the present invention has a repeating unit represented by the formula ( | 12-06-2012 |
Patent application number | Description | Published |
20090271050 | TRAVEL CONTROL DEVICE - Information for generating a target speed pattern is computed from information acquired from various sensors and a running mode input switch, so as to generate the target speed pattern (S | 10-29-2009 |
20110276220 | VEHICLE GROUP CONTROL METHOD AND VEHICLE GROUP CONTROL DEVICE - A vehicle group control device for controlling the arrangement of vehicles within a vehicle group including plural vehicles, the vehicle group control device including: a periphery monitoring performance grasping unit which grasps a periphery monitoring performance of each vehicle constituting the vehicle group; and an arrangement determination unit which determines the arrangement of the vehicles within the vehicle group on the basis of the periphery monitoring performance of each vehicle. Accordingly, since the periphery monitoring performance of each vehicle within the vehicle group is grasped and the arrangement of the vehicles within the vehicle group can be determined on the basis of the periphery monitoring performance of each vehicle, it is possible to efficiently drive the entire vehicle group. | 11-10-2011 |
20120004835 | VEHICLE CONTROL DEVICE - A vehicle control device includes: a road-to-vehicle communication device which acquires information regarding the volume of traffic in a predetermined section on a road where a vehicle travels and which transmits the traffic volume information to a determination section; a deceleration acquisition section which acquires deceleration of a vehicle in front in the predetermined section and transmits information regarding the deceleration to the determination section; the determination section which determines whether or not a lane change is necessary on the basis of the traffic volume information acquired by the road-to-vehicle communication device and the deceleration acquired by the deceleration acquisition section; and an instruction section which instructs at least either the host vehicle or a vehicle behind to change lane when the determination section determines that a lane change is necessary. Therefore, it is possible to provide a vehicle control device capable of suppressing the occurrence of a traffic jam. | 01-05-2012 |
20130144516 | TRAFFIC CONTROL SYSTEM, VEHICLE CONTROL SYSTEM, AND TRAFFIC CONTROL METHOD - A traffic control system provides a driver of a vehicle, which runs in a predetermined running state among vehicles running on a road with information on the suppression of traffic congestion on the road. The predetermined running state is, for example, a running state constituting a cause of traffic congestion on the road. The information may be provided by urging the driver to perform a driving operation of at least one of acceleration and lane change. | 06-06-2013 |
20130325284 | TRAFFIC CONGESTION DETECTION APPARATUS AND VEHICLE CONTROL APPARATUS - A traffic congestion detection apparatus includes a traveling information acquisition unit for acquiring traveling information relating to a traveling state of a vehicle, and a traveling zone determination unit for determining which one of at least three zones including a central zone of a congestion area the vehicle is traveling in, based on current traveling information acquired by the traveling information acquisition unit. | 12-05-2013 |
Patent application number | Description | Published |
20130017496 | METHOD FOR MANUFACTURING RECORDING HEADAANM Matsumoto; KeijiAACI Yokohama-shiAACO JPAAGP Matsumoto; Keiji Yokohama-shi JPAANM Asai; KazuhiroAACI Kawasaki-shiAACO JPAAGP Asai; Kazuhiro Kawasaki-shi JPAANM Honda; TetsuroAACI Oita-shiAACO JPAAGP Honda; Tetsuro Oita-shi JPAANM Uohashi; KunihitoAACI Yokohama-shiAACO JPAAGP Uohashi; Kunihito Yokohama-shi JPAANM Koyama; ShujiAACI Kawasaki-shiAACO JPAAGP Koyama; Shuji Kawasaki-shi JPAANM Ohsumi; MasakiAACI Yokosuka-shiAACO JPAAGP Ohsumi; Masaki Yokosuka-shi JP - A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator. | 01-17-2013 |
20130330673 | PROCESS FOR PRODUCING EJECTION ORIFICE FORMING MEMBER AND LIQUID EJECTION HEAD - A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image. | 12-12-2013 |
20140068940 | PROCESS FOR PRODUCING LIQUID EJECTION HEAD - The invention provides a process for producing a liquid ejection head having an ejection orifice forming member in which an ejection orifice for ejecting a liquid has been formed, and a substrate having an energy-generating element for generating energy for ejecting a liquid from the ejection orifice on the side of a front surface thereof, the process includes the steps of providing a film having a support, a first layer and a second layer in this order, arranging the film on the substrate in such a manner that the second layer faces the front surface, detaching the support from the film arranged, forming the ejection orifice in the second layer, and removing at least a part of the first layer from the second layer. | 03-13-2014 |
20140083974 | PROCESS FOR PRODUCING LIQUID EJECTION HEAD - A process for producing a liquid ejection head, comprising providing a substrate with an energy-generating element for ejecting liquid and a wiring; forming a flow path wall forming layer containing a negative photosensitive resin on the substrate; exposing a portion to be a flow path wall of the flow path wall forming layer; forming an ejection orifice forming layer containing a negative photosensitive resin on the flow path wall forming layer; applying a material for a water-repellent layer onto the ejection orifice forming layer; drying a solvent contained in the applied material to form the water-repellent layer; exposing another region than a portion to be an ejection orifice of the ejection orifice forming layer and the water-repellent layer; and dissolving and removing the non-exposed portions, wherein the boiling point of the solvent is not more than the drying temperature in the step to form the water-repellent layer. | 03-27-2014 |
20140141379 | METHOD OF PRODUCING INK EJECTION HEAD - Provided is a method of producing an ink ejection head including a substrate, an ink ejection energy-generating element, a flow path-forming member, and an ejection orifice-forming member having an ink ejection orifice, the ink ejection orifice having, on a side open to an outside, a portion whose sectional area is constant and a portion whose sectional area increases from the portion to an ink ejection energy-generating element side, the method including: forming, on the substrate, a first negative photosensitive resist; forming, on the first negative photosensitive resist, a second negative photosensitive resist; partially mixing the first negative photosensitive resist and the second negative photosensitive resist to form a compatible layer; and subjecting the second negative photosensitive resist and the compatible layer to collective exposure and development to form the ink ejection orifice. | 05-22-2014 |
20150130874 | METHOD OF MANUFACTURING SUBSTRATE FOR LIQUID EJECTION HEAD, SUBSTRATE FOR LIQUID EJECTION HEAD, LIQUID EJECTION HEAD, AND PRINTING APPARATUS - A method of manufacturing a substrate for a liquid ejection head including an ejection port forming member which has formed therein ejection ports, includes the steps of: forming a first layer by using a first layer forming member; forming a second layer on the first layer by using a second layer forming member; and hardening a partial region of each of the first layer and the second layer and removing a region different from the partial region so as to form the ejection ports, resulting in that the first layer and the second layer constitute the ejection port forming member, and a member containing a solvent to dissolve the first layer forming member and a photo-acid-generating agent having an acid strength weaker than an acid strength of the photo-acid-generating agent contained in the first layer forming member is used as the second layer forming member. | 05-14-2015 |
20150151544 | METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A method for manufacturing a liquid discharge head includes a transferring step of transferring a dry film supported by a supporting member to a substrate having a hole, and a peeling step of peeling the supporting member off the dry film on the substrate. In the peeling step, the dry film is in contact with a wall surface defining the hole in the substrate. | 06-04-2015 |
20150197092 | METHOD OF MANUFACTURING STRUCTURE AND METHOD OF MANUFACTURING LIQUID EJECTION HEAD - A method of manufacturing a structure includes (1) positioning a first resin layer provided on a first supporting member on a substrate having a through hole, with the first resin layer facing toward the substrate, and releasing the first supporting member from the first resin layer; and (2) positioning a second resin layer provided on a second supporting member on the first resin layer from which the first supporting member has been released, with the second resin layer facing toward the first resin layer, and releasing the second supporting member from the second resin layer. A first resin layer portion that is above the through hole is removed before or simultaneously with the releasing of the first supporting member. | 07-16-2015 |
Patent application number | Description | Published |
20100219913 | SURFACE ACOUSTIC WAVE RESONATOR AND SURFACE ACOUSTIC WAVE OSCILLATOR - A surface acoustic wave resonator includes: an IDT which is disposed on a quartz crystal substrate with an Euler angle of (−1.5°≦φ≦1.5°, 117°≦θ≦142°, 41.9°≦|ψ|≦49.57°) and which excites a surface acoustic wave in an upper mode of a stop band; and an inter-electrode-finger groove formed by recessing the quartz crystal substrate between electrode fingers of the IDT, wherein the following expression: | 09-02-2010 |
20110309897 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC APPARATUS - A surface acoustic wave (SAW) resonator and a SAW oscillator and an electronic apparatus including the resonator are to be provided. A SAW resonator includes: an IDT exciting a SAW using a quartz crystal substrate of Euler angles (−1.5°≦φ≦1/5°, 117°≦θ≦142°, 42.79°≦|ψ|≦49.57°; one pair of reflection units arranged so as allow the IDT to be disposed therebetween; and grooves acquired by depressing the quartz crystal substrate located between electrode fingers. When a wavelength of the SAW is λ, and a depth of the grooves is G, “0.01λ≦G” is satisfied. | 12-22-2011 |
20120062069 | SURFACE ACOUSTIC WAVE DEVICE, ELECTRONIC APPARATUS, AND SENSOR APPARATUS - A SAW device has an IDT which is provided on the principal surface of a quartz crystal substrate having Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦142°, 42.79≦|ψ|≦49.57°) and excites a SAW in a stopband upper end mode, and a pair of reflectors which are arranged on both sides of the IDT. Inter-electrode-finger grooves are recessed between the electrode fingers of the IDT, and inter-conductor-strip grooves are recessed between the conductor strips of the reflectors. A first direction (X′ axis) perpendicular to the electrode fingers and the conductor strips intersects the electrical axis (X axis) of the quartz crystal substrate at an angle ψ. At least a part of the IDT and the reflectors are arranged in a second direction intersecting the first direction at an angle α of 1.0°≦α≦2.75°. An excellent frequency-temperature characteristic and a high Q value in an operation temperature range are realized simultaneously. | 03-15-2012 |
20120062070 | SURFACE ACOUSTIC WAVE DEVICE, ELECTRONIC APPARATUS, AND SENSOR APPARATUS - A SAW device has an IDT which is provided on the principal surface of a quartz crystal sustrate having Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦42°, ψ) and excites a SAW in a stopband upper end mode. Inter-electrode-finger grooves | 03-15-2012 |
20120062329 | SURFACE ACOUSTIC WAVE DEVICE, ELECTRONIC APPARATUS, AND SENSOR APPARATUS - A SAW device | 03-15-2012 |
20120139652 | VIBRATION DEVICE, OSCILLATOR, AND ELECTRONIC APPARATUS - A vibration device includes: a first vibrator having a 3rd-order function temperature characteristic in which a 3rd-order temperature coefficient is −γ | 06-07-2012 |
20120139653 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC APPARATUS - A surface acoustic wave resonator which can realize favorable frequency-temperature characteristics and suppress frequency variations is provided. The surface acoustic wave resonator includes a quartz crystal substrate with Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦142°, and 42.79°≦|Ψ|≦49.57°), and an IDT that is provided on the quartz crystal substrate, includes a plurality of electrode fingers, and excites a stop band upper end mode surface acoustic wave, wherein inter-electrode finger grooves are provided between the electrode fingers in a plan view, and wherein if a line occupation rate of convex portions of the quartz crystal substrate disposed between the inter-electrode finger grooves is ηg, and a line occupation rate of the electrode fingers disposed on the convex portions is ηe, η | 06-07-2012 |
20130027144 | SAW DEVICE, SAW OSCILLATOR, AND ELECTRONIC APPARATUS - A SAW device includes a SAW chip formed of a piezoelectric substrate and an IDT formed thereon, a base substrate that supports the SAW chip, and a fixing member that fixes the SAW chip to the base substrate. The SAW chip that forms a cantilever is supported by the base substrate via the fixing member in a position where the IDT does not overlap with the fixing member in a plan view of the SAW chip. The length W of the SAW chip in a y-axis direction and the length D of the fixing member in the y-axis direction satisfy 101-31-2013 | |
20130027147 | SURFACE ACOUSTIC WAVE RESONATOR AND SURFACE ACOUSTIC WAVE OSCILLATOR - A surface acoustic wave resonator includes: an IDT which is disposed on a quartz crystal substrate with an Euler angle of (−1.5°≦φ≦1.5°, 117°≦θ≦142°, 41.9°≦|ψ|≦49.57°) and which excites a surface acoustic wave in an upper mode of a stop band; and an inter-electrode-finger groove formed by recessing the quartz crystal substrate between electrode fingers of the IDT, wherein the following expression: | 01-31-2013 |
20140055207 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC APPARATUS - A surface acoustic wave resonator includes a quartz crystal substrate with preselected Euler angles, and an IDT that is provided on the quartz crystal substrate, that includes a plurality of electrode fingers, and that excites a stop band upper end mode surface acoustic wave. Inter-electrode finger grooves are provided in the quartz crystal substrate between the electrode fingers in a plan view. When a wavelength of the surface acoustic wave is λ, a first film thickness of the electrode finger is H, and a first depth of the inter-electrode finger groove is G, and when a line occupation rate of convex portions of the quartz crystal substrate disposed between the inter-electrode finger grooves is ηg, and a line occupation rate of the electrode fingers disposed on the convex portions is ηe, the following relationships are satisfied 0.0407λ≦G+H; and ηg>ηe. | 02-27-2014 |
20140266483 | SAW DEVICE, SAW OSCILLATOR, AND ELECTRONIC APPARATUS - A SAW device includes a SAW chip formed of a piezoelectric substrate and an IDT formed thereon, a base substrate that supports the SAW chip, and a fixing member that fixes the SAW chip to the base substrate. The SAW chip that forms a cantilever is supported by the base substrate via the fixing member in a position where the IDT does not overlap with the fixing member in a plan view of the SAW chip. The length W of the SAW chip in a y-axis direction and the length D of the fixing member in the y-axis direction satisfy 109-18-2014 | |
20150116049 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC APPARATUS - A surface acoustic wave (SAW) resonator and a SAW oscillator and an electronic apparatus including the resonator are to be provided. A SAW resonator includes: an IDT exciting a SAW using a quartz crystal substrate of Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦142°, 42.79°≦|ψ|≦49.57°); one pair of reflection units arranged so as allow the IDT to be disposed therebetween; and grooves acquired by depressing the quartz crystal substrate located between electrode fingers. When a wavelength of the SAW is λ, and a depth of the grooves is G, “0.01λ≦G” is satisfied. | 04-30-2015 |
Patent application number | Description | Published |
20100102669 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND SURFACE ACOUSTIC WAVE MODULE DEVICE - A surface acoustic wave resonator includes a piezoelectric substrate and an interdigital transducer (IDT) that includes electrode fingers exciting a surface acoustic wave on the piezoelectric substrate, a first region at a center of the IDT, and a second region and a third region at opposite sides of the IDT. In the IDT, a line occupation rate at which an electromechanical coupling coefficient becomes a maximum is different from the line occupation rate at which reflection of the surface acoustic wave becomes a maximum. | 04-29-2010 |
20100244626 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC INSTRUMENT - A SAW resonator which, using a quartz crystal substrate with Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦142°, and 42.79°≦|105|≦49.57°, includes an IDT which excites a stop band upper end mode SAW, and grooves hollowed out of the substrate positioned between electrode fingers configuring the IDT, wherein, when the wavelength of the SAW is λ and the depth of the inter-electrode finger grooves is G, λ and G satisfy the relationship of 0.01λ≦G and wherein, when the line occupation rate of the IDT is η, the groove depth G and line occupation rate η satisfy the relationships of −2.0000×G/λ+0.7200≦η≦−2.5000×G/λ+0.7775 provided that 0.0100λ≦G≦0.0500λ, −3.5898×G/λ+0.7995≦η≦−2.5000+G/λ+0.7775 provided that 0.0500λ09-30-2010 | |
20110199160 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND SURFACE ACOUSTIC WAVE MODULE UNIT - It is possible to reduce the size of a surface acoustic wave (SAW) resonator by enhancing a Q value. In a SAW resonator in which an IDT having electrode fingers for exciting SAW is disposed on a crystal substrate, the IDT includes a first region disposed at the center of the IDT and a second region and a third region disposed on both sides of the first region. A frequency is fixed in the first region and a portion in which a frequency gradually decreases as it approaches an edge of the IDT is disposed in the second region and the third region. When the frequency of the first region is Fa, the frequency at an edge of the second region is Fb | 08-18-2011 |
20110199163 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND SURFACE ACOUSTIC WAVE MODULE UNIT - In a surface acoustic wave resonator in which an IDT having electrode fingers for exciting surface acoustic waves is formed on a crystal substrate, the line occupying ratio causing the maximum electromechanical coupling coefficient and the line occupying ratio causing the maximum reflection of the surface acoustic waves in the IDT are different from each other, the center of the IDT has the line occupying ratio causing an increase in electromechanical coupling coefficient in comparison with the edges of the IDT, and the edges of the IDT have the line occupying ratio causing an increase in reflection of the surface acoustic waves in comparison with the center of the IDT. | 08-18-2011 |
20110204984 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND SURFACE ACOUSTIC WAVE MODULE UNIT - It is possible to reduce the size of a surface acoustic wave resonator by enhancing the Q value. In a surface acoustic wave resonator in which an IDT having electrode fingers for exciting surface acoustic waves is formed on a crystal substrate, a line occupying ratio is defined as a value obtained by dividing the width of one electrode finger by the distance between the center lines of the gaps between one electrode finger and the electrode fingers adjacent to both sides thereof, and the IDT includes a region formed by gradually changing the line occupying ratio from the center to both edges so that the frequency gradually becomes lower from the center to both edges than the frequency at the center of the IDT. | 08-25-2011 |
20120105165 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND SURFACE ACOUSTIC WAVE MODULE DEVICE - A surface acoustic wave resonator includes a piezoelectric substrate and an interdigital transducer (IDT) that includes electrode fingers exciting a surface acoustic wave on the piezoelectric substrate, a first region at a center of the IDT, and a second region and a third region at opposite sides of the IDT. In the IDT, a line occupation rate at which an electromechanical coupling coefficient becomes a maximum is different from the line occupation rate at which reflection of the surface acoustic wave becomes a maximum. | 05-03-2012 |
20120212301 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC INSTRUMENT - A SAW resonator which, using a quartz crystal substrate with Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦142°, and 41.9°≦|ψ|≦49.57°), includes an IDT that excites a stop band upper end mode SAW, and an inter-electrode finger groove provided between electrode fingers configuring the IDT. When a wavelength of the SAW is λ, a first depth of the inter-electrode finger groove is G, a line occupation rate of the IDT is η, and an electrode film thickness of the IDT is H, λ, G, η and H satisfy the relationship of 008-23-2012 | |
20130127554 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND SURFACE ACOUSTIC WAVE MODULE UNIT - It is possible to reduce the size of a surface acoustic wave (SAW) resonator by enhancing a Q value. In a SAW resonator in which an IDT having electrode fingers for exciting SAW is disposed on a crystal substrate, the IDT includes a first region disposed at the center of the IDT and a second region and a third region disposed on both sides of the first region. A frequency is fixed in the first region and a portion in which a frequency gradually decreases as it approaches an edge of the IDT is disposed in the second region and the third region. When the frequency of the first region is Fa, the frequency at an edge of the second region is Fb | 05-23-2013 |
20150042408 | SURFACE ACOUSTIC WAVE RESONATOR, SURFACE ACOUSTIC WAVE OSCILLATOR, AND ELECTRONIC INSTRUMENT - A SAW resonator which, using a quartz crystal substrate with Euler angles (−1.5°≦φ≦1.5°, 117°≦θ≦142°, and 41.9°≦|ψ|≦49.57°, includes an IDT that excites a stop band upper end mode SAW, and an inter-electrode finger groove provided between electrode fingers configuring the IDT. When a wavelength of the SAW is λ, a first depth of the inter-electrode finger groove is G, a line occupation rate of the IDT is η, and an electrode film thickness of the IDT is H, λ, G, η and H satisfy the relationship of 002-12-2015 | |