Kroener
Fritz Kroener, Villach AT
Patent application number | Description | Published |
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20150064890 | METHOD FOR PRODUCING A SEMICONDUCTOR - A method for producing a semiconductor is disclosed, the method having: providing a semiconductor body having a first side and a second side; forming an n-doped zone in the semiconductor body by a first implantation into the semiconductor body via the first side to a first depth location of the semiconductor body; and forming a p-doped zone in the semiconductor body by a second implantation into the semiconductor body via the second side to a second depth location of the semiconductor body, a pn-junction forming between said n-doped zone and said p-doped zone in the semiconductor body. | 03-05-2015 |
Sebastian Kroener, Shanghai CN
Patent application number | Description | Published |
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20090285518 | AXIAL ROLLING BEARING - The invention relates to an axial rolling bearing having a cage which contains rolling bodies that are arranged between two running disks. The running disks each have a radial section that forms a raceway and an axially aligned collar which adjoins the raceway. The collars are aligned opposite to one another and overlap in the axial direction. The radially outer disk has a larger diameter than the radially inner running disk. According to the invention, the radial and the axial extent of the two collars of the running disks and the cage are coordinated with one another in such a way that, between them, a labyrinth seal, composed of a plurality of gaps, is formed, and the cage is guided on the collar of the radially inner running disk. | 11-19-2009 |
Zeljka Kroener, Villach AT
Patent application number | Description | Published |
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20160060144 | METHOD OF REMOVING PARTICULATE SILICON FROM AN EFFLUENT WATER - A method of removing particulate silicon from an effluent water in accordance with various embodiments may include: adding a base to the effluent water, an amount of the added base being sub-stoichiometric with regard to a basic oxidation reaction of an entire amount of silicon contained in the effluent water to ortho-silicic acid or ortho-silicate ions; maintaining a resulting mixture of the effluent water and the base in a predetermined temperature range for a period of time, so that a sediment including silicon is formed; and separating the sediment and the effluent water from each other. | 03-03-2016 |