Lorusso
Gian Francesco Lorusso, Overijse BE
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20080229273 | SYSTEMS AND METHODS FOR UV LITHOGRAPHY - A method of designing a lithographic mask for use in lithographic processing of a substrate is disclosed. The lithographic processing comprises irradiating mask features of a lithographic mask using a predetermined irradiation configuration. In one aspect, the method comprises obtaining an initial design for the lithographic mask comprising a plurality of initial design features having an initial position. The method further comprises applying at least one shift to at least one initial design feature and deriving there from an altered design so as to compensate for shadowing effects when irradiating the substrate using a lithographic mask corresponding to the altered design in the predetermined irradiation configuration. Also disclosed herein are a corresponding design, a method of setting up lithographic processing, a system for designing a lithographic mask, a lithographic mask, and a method of manufacturing it. | 09-18-2008 |
20080315125 | METHOD AND SYSTEM FOR MEASURING CONTAMINATION OF A LITHOGRAPHICAL ELEMENT - A method and system for measuring contamination of a lithographic element is disclosed. In one aspect, the method comprises providing a first lithographical element in a process chamber. The method further comprises providing a second lithographical element in the process chamber. The method further comprises covering part of the first lithographical element providing a reference region. The method further comprises providing a contaminant in the process chamber. The method further comprises redirecting an exposure beam via the test region of the first lithographical element towards the second lithographical element whereby at least one of the lithographical elements gets contaminated by the contaminant. The method further comprises measuring the level of contamination of the at least one contaminated lithographical element in the process chamber. | 12-25-2008 |
20090103069 | DETECTION OF CONTAMINATION IN EUV SYSTEMS - A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system. The first reflectivity change is larger than an average reflectivity change upon formation of a thicker contamination layer on the capping layer and larger than an average reflectivity change upon formation of an equal contamination on the actual mirrors of the optics of the system. | 04-23-2009 |
20120075604 | Methods and Systems for Evaluating Extreme Ultraviolet Mask Flatness - Disclosed are methods and systems for determining a topography of a lithographic optical element and/or a holder of a lithographic optical element. In one embodiment, the method includes directing electromagnetic radiation towards a lithographic optical element, where the electromagnetic radiation comprises electromagnetic radiation in a first predetermined wavelength range and electromagnetic radiation in a second predetermined wavelength range. The method further includes using the lithographic optical element to adsorb the electromagnetic radiation in the first predetermined wavelength range, and to reflect at least a portion of the electromagnetic radiation in the second predetermined wavelength range towards a substrate comprising a photosensitive layer, thereby exposing the photosensitive layer to form an exposed photosensitive layer. The method still further includes performing an evaluation of the exposed photosensitive layer and, based on the evaluation, determining a topography of the lithographic optical element. | 03-29-2012 |
20120099092 | DETECTION OF CONTAMINATION IN EUV SYSTEMS - A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system. The first reflectivity change is larger than an average reflectivity change upon formation of a thicker contamination layer on the capping layer and larger than an average reflectivity change upon formation of an equal contamination on the actual minors of the optics of the system. | 04-26-2012 |
Giuseppe Lorusso, Torino IT
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20090198424 | METHOD AND APPARATUS FOR CONTROLLING PICKUP ON UPHILL FOR A MOTOR-VEHICLE PROVIDED WITH AN AUTOMATIC OR ROBOTIZED GEARBOX - A method and apparatus to control the pickup on an uphill slope of an automotive vehicle provided with an automatic or robotised gearbox provide the definition of a control strategy of the gear box operation, also according to the gradient of the uphill slope, which is preferably calculated based on a longitudinal acceleration value of the automotive vehicle, and based on the altitude at which the automotive vehicle can be found, which is preferably calculated based on a detected atmospheric pressure value. In this way, it is also possible to consider the reduction in the engine torque due to the reduction in the air density with altitude. | 08-06-2009 |
Marco Lorusso, Civitella Di Romagna (fc) IT
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20110275497 | GYMNASTIC MACHINE - Regulating group for adjusting the initial operating position of an interface associated with a gymnastic machine comprising a frame; a load group connected to the interface through a respective transmission device; a support group designed to carry the interface movable relative to the frame; the regulating group comprising a return device suitable, in use, to define, at the initial operating position, a stop for the movement of the interface relative to the frame; wherein the return device can be connected, in use, to the transmission device through a given coupling, so that to each variation in the initial operating position actuated through the return device corresponds a respective given variation in the operating configuration of the transmission device. | 11-10-2011 |
Mark D. Lorusso, Portsmouth, NH US
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20150101970 | Modular Filter Capsule Apparatus - Disclosed is a capsule apparatus having a filter housing defining a filter chamber with a top cap having a plurality of ports extending substantially laterally from a top end of the top cap. The lateral and substantially uniform orientation of the ports facilitates connection to panel mount assemblies and improves filter maintenance processes. A transfer tube extending the length of the capsule allows the introduction of heated fluids from a top mounted inlet port to a bottom of the capsule chamber to allow or a substantially uniform heat gradient in the capsule filter chamber. A dispersion ring or dispersion plate may be secured to a distal end of the transfer tube to promote uniform dispersion of liquids and/or gases introduced into the capsule apparatus. An alternative shield secured in the housing defines a first chamber in fluid communication with an inlet and a second chamber wherein the two chambers are in fluid communication via an opening defined by a lower end of the shield and a bottom of the filter chamber. An alternative capsule apparatus has an outlet tube extending downwardly from a top mounted outlet port in fluid communication with an enclosed filter membrane secured below a column of loose filter media. | 04-16-2015 |
Tom Lorusso, Seattle, WA US
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20090069725 | ENHANCED ULTRASOUND PLATFORM - An enhanced ultrasound housing and enhanced ultrasound platform facilitates a technician-friendly layout by providing a beneficial ergonomic layout. Control switches may also be configured to provide convenient implementation of ultrasound techniques. Further, an enhanced ultrasound housing and enhanced ultrasound platform provides physical protection to the device. Physical protection may come in the form of an exoskeletal member, or from a covering which inhibits liquid penetration. | 03-12-2009 |
Vito Lorusso, Bussero IT
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20100202967 | FIBRIN BINDING PEPETIDE CONJUGATES FOR DIAGNOSTIC AND THERAPEUTIC APPLICATIONS - The present invention relates to a novel class of diagnostically or therapeutically effective compounds comprising novel peptides able to bind fibrin, to a process for their preparation and to compositions thereof for use in therapy and diagnostics. The compounds of the invention bind, in particular, to fibrin present in the extracellular matrix (EC) of tumor or connective tissue of stroma thus acting as targeting moieties able to bring and successfully bound an active moiety linked thereto to fibrin depositions inside solid tumors. | 08-12-2010 |