Oomatsu
Chie Oomatsu, Hiroshima-Ken JP
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20100330443 | HYDROGEN PRODUCTION METHOD, HYDROGEN PRODUCTION SYSTEM, AND FUEL CELL SYSTEM - A hydrogen production method includes: a first process in which nitrogen compounds of metal and water are reacted to produce ammonia and hydroxide of the metal; a second process in which hydrogen compounds of a metal and the ammonia produced in the first process are reacted; and a third process in which hydrogen compounds of a metal and the hydroxide of the metal produced in the first process are reacted. | 12-30-2010 |
Chie Oomatsu, Higashihiroshima-Shi JP
Patent application number | Description | Published |
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20090291040 | ACTIVATION METHOD FOR LITHIUM HYDRIDE, AND HYDROGEN GENERATION METHOD - A lithium hydride activation method includes: a nitrification treatment process of reacting lithium hydride with a nitride and therefore forming a chemical compound layer stable to the nitride, on a surface of the lithium hydride; and a particle size reduction process of reducing a particle size of the lithium hydride provided with the chemical compound layer by a mechanical pulverization treatment after the nitrification treatment process is performed. A hydrogen generation method includes generating hydrogen by reacting ammonia with the lithium hydride activated by the activation method. | 11-26-2009 |
Tadashi Oomatsu, Kanagawa JP
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20090283937 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD - A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns. | 11-19-2009 |
Tadashi Oomatsu, Haibara-Gun JP
Patent application number | Description | Published |
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20140220353 | UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME - Provided is the pattern formability and line edge roughness of the resultant substrate. | 08-07-2014 |
20150014819 | UNDERLYING FILM COMPOSITION FOR IMPRINTS AND PATTERN FORMING METHOD USING THE SAME - Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent. | 01-15-2015 |