Patent application number | Description | Published |
20080216602 | COATING PROCESS FOR MANUFACTURE OR REPROCESSING OF SPUTTER TARGETS AND X-RAY ANODES - Disclosed is a process for the reprocessing or production of a sputter target or an X-ray anode wherein a gas flow forms a gas/powder mixture with a powder of a material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of two or more thereof and alloys thereof with at least two thereof or with other metals, the powder has a particle size of 0.5 to 150 μm, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed on to the surface of the object to be reprocessed or produced. | 09-11-2008 |
20080271779 | Fine Grained, Non Banded, Refractory Metal Sputtering Targets with a Uniformly Random Crystallographic Orientation, Method for Making Such Film, and Thin Film Based Devices and Products Made Therefrom - The invention relates to a sputtering target which has a fine uniform equiaxed grain structure of less than 44 microns, no preferred texture orientation as measured by electron back scattered diffraction (“EBSD”) and that displays no grain size banding or texture banding throughout the body of the target. The invention relates a sputtering target with a lenticular or flattened grain structure, no preferred texture orientation as measured by EBSD and that displays no grain size or texture banding throughout the body of the target and where the target has a layered structure incorporating a layer of the sputtering material and at least one additional layer at the backing plate interface, said layer has a coefficient of thermal expansion (“CTE”) value between the CTE of the backing plate and the CTE of the layer of sputtering material. The invention also relates to thin films and their use of using the sputtering target and other applications, such as coatings, solar devices, semiconductor devices etc. The invention further relates to a process to repair or rejuvenate a sputtering target. | 11-06-2008 |
20090123690 | Metallic Powder Mixtures - The invention relates to blends of metal, alloy or composite powders having a maximum mean particle diameter D50 of 75, preferably a maximum of 25 μm, which are produced according to a process in which a base powder is first transformed into flake-like particles and these are then crushed in the presence of milling auxiliary agents, with further additives and also the use of these powder blends and moulded objects produced from them. | 05-14-2009 |
20100015467 | METHOD FOR COATING A SUBSTRATE AND COATED PRODUCT - Disclosed is a method of applying coatings to surfaces, wherein a gas flow forms a gas-powder mixture with a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, nickel, cobalt, iron, chromium, aluminum, silver, copper, mixtures of at least two thereof or their alloys with at least two thereof or with other metals, the powder has a particle size of from 0.5 to 150 μm, an oxygen content of less than 500 ppm oxygen and a hydrogen content of less than 500 ppm, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed onto the surface of an object. The coatings prepared are used, for example, as corrosion protection coatings. | 01-21-2010 |
20100047622 | METAL POWDER - The invention provides for a cermet powder containing
| 02-25-2010 |
20100055487 | METHOD FOR COATING A SUBSTRATE SURFACE AND COATED PRODUCT - Disclosed is a process for the reprocessing or production of a sputter target or an X-ray anode wherein a gas flow forms a gas/powder mixture with a powder of a material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of two or more thereof and alloys thereof with at least two thereof or with other metals, the powder has a particle size of 0.5 to 150 μm, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed on to the surface of the object to be reprocessed or produced. | 03-04-2010 |
20120251714 | FINE GRAINED, NON BANDED, REFRACTORY METAL SPUTTERING TARGETS WITH A UNIFORMLY RANDOM CRYSTALLOGRAPHIC ORIENTATION, METHOD FOR MAKING SUCH FILM, AND THIN FILM BASED DEVICES AND PRODUCTS MADE THEREFROM - In various embodiments, sputtering targets are refurbished by spray-depositing a powder within a furrow in the sputtering target to form a layer therein. | 10-04-2012 |
20150311047 | METHODS OF MANUFACTURING LARGE-AREA SPUTTERING TARGETS USING INTERLOCKING JOINTS - In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding. | 10-29-2015 |
Patent application number | Description | Published |
20130094679 | MICROELECTROMECHANICAL LOUDSPEAKER ARRAY, AND METHOD FOR OPERATING A MICROELECTROMECHANICAL LOUDSPEAKER ARRAY - A microelectromechanical loudspeaker array includes a plurality of microelectromechanical loudspeaker elements each having a diaphragm element configured to be deflected from a neutral position into at least one deflection position to produce a sound pulse. The array further includes an actuation device which is configured to put the diaphragm element into the at least one deflection position from the neutral position on the basis of drive signals. The array further includes a control device coupled to the plurality of loudspeaker elements. The control device is configured to send, in each case at a driving time, (i) a first drive signal configured to produce a sound pulse by actuating the diaphragm element, and (ii) a respective second drive signal configured to relax the diaphragm element into the neutral position during a predetermined period of time after the driving time to the actuation device of at least one of the loudspeaker elements. | 04-18-2013 |
20130195654 | Device and Method for Reducing Loads - A device for reducing loads in a drive train of a wind turbine includes a machine support. The wind turbine includes a sensor means, a controllable damper means, an actuating means. The sensor means is configured to detect at least one variable characterizing vibrations and/or misalignments in the drive train. The controllable damper means is configured to produce at least one adjusting torque which compensates at least one torque associated with the load in the drive train. The actuating means is configured to actuate the damping means based on the at least one variable detected by the sensor means. | 08-01-2013 |
20130287232 | PIEZOELECTRIC PARTIAL-SURFACE SOUND TRANSDUCER - A piezoelectric sound transducer using a piezoelectric plastic material is developed from a substrate layer and a layer of a piezoelectric plastic material deposited thereon, the piezoelectric plastic layer covering the substrate layer not completely but having openings. | 10-31-2013 |
Patent application number | Description | Published |
20130081749 | METHODS OF MANUFACTURING HIGH-STRENGTH LARGE-AREA SPUTTERING TARGETS - In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding. | 04-04-2013 |
20130081944 | LARGE-AREA SPUTTERING TARGETS - In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding. | 04-04-2013 |
20130264013 | METHODS OF JOINING METALLIC PROTECTIVE LAYERS - In various embodiments, protective layers are bonded to a steel layer and connected by a layer of unmelted metal powder produced by cold spray. | 10-10-2013 |
20130337159 | METHODS OF REJUVENATING SPUTTERING TARGETS - In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and comprising a sputtering-target material is provided, the sputtering-target material (i) comprising a metal, (ii) defining a recessed furrow therein, and (iii) having a first grain size and a first crystalline microstructure. A powder is spray-deposited within the furrow to form a layer therein, the layer (i) comprising the metal, (ii) having a second grain size finer than the first grain size, and (iii) having a second crystalline microstructure more random than the first crystalline microstructure. Spray-depositing the powder within the furrow forms a distinct boundary line between the layer and the sputtering-target material. | 12-19-2013 |
20140234548 | CERMET POWDER - A cermet powder includes a) from 50 to 90 wt-% of at least one hard material, and b) from 10 to 50 wt-% of a matrix metal composition. The wt.-% for a) and b) are based on a total weight of the cermet powder. The matrix metal composition comprises i) from 40 to 75 wt-% of iron and nickel, ii) from 18 to 35 wt-% of chromium, iii) from 3 to 20 wt.-% of molybdenum, and iv) from 0.5 to 4 wt-% of copper. The wt-% for i) to iv) are based in each case on a total weight of the matrix metal composition. A weight ratio of iron to nickel is from 3:1 to 1:3. | 08-21-2014 |
20140311669 | METHODS OF JOINING METALLIC PROTECTIVE LAYERS - In various embodiments, protective layers are bonded to a steel layer, overlapped, and at least partially covered by a layer of unmelted metal powder produced by cold spray. | 10-23-2014 |
20150034477 | FINE GRAINED, NON BANDED, REFRACTORY METAL SPUTTERING TARGETS WITH A UNIFORMLY RANDOM CRYSTALLOGRAPHIC ORIENTATION, METHOD FOR MAKING SUCH FILM, AND THIN FILM BASED DEVICES AND PRODUCTS MADE THEREFROM - In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and rejuvenated by, e.g., cold spray, is utilized in sputtering processes to produce metallic thin films. | 02-05-2015 |